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    • 3. 发明授权
    • Phase shift mask and phase shift mask blank
    • 相移掩模和相移掩模空白
    • US6087047A
    • 2000-07-11
    • US153027
    • 1998-09-15
    • Hideaki MitsuiOsamu NozawaMegumi Takeuchi
    • Hideaki MitsuiOsamu NozawaMegumi Takeuchi
    • G03F1/32G03F1/68H01L21/027G03F9/00
    • G03F1/32
    • In a half-tone type phase shift mask blank in which a semi-transparent film is formed on a transparent substrate, and the semi-transparent film serves to shift phase of a first optical light beam which transmits the semi-transparent film for a second optical light beam which directly transmits the transparent substrate and further, serves to reduce strength of the first optical light beam, the semi-transparent film includes silicon and nickel, and at least one selected from the group consisting of nitrogen, oxygen and hydrogen, and the relationship between the silicon and the nickel is specified by a formula in which a rate of [atom % of the nickel in the film] for [atom % of the nickel in the film+atom % of the silicon in the film] falls within the range between 0.15 and 0.5.
    • 在透明基板上形成半透明膜的半色调型相移掩模坯料中,半透明膜用于将透过半透明膜的第一光束的相位偏移一秒 直接透过透明基板的光束,进一步降低第一光束的强度,半透明膜包括硅和镍,以及选自氮,氧和氢的至少一种,以及 硅和镍之间的关系由以下公式确定:其中[膜中的镍原子%的原子%的原子%与膜中的硅的原子%的比率]落入其中 范围在0.15和0.5之间。
    • 7. 发明申请
    • CARBONIZING DEVICE
    • 碳化装置
    • US20120325642A1
    • 2012-12-27
    • US13435237
    • 2012-03-30
    • Mamoru ItoAkiyuki KanekoMegumi Takeuchi
    • Mamoru ItoAkiyuki KanekoMegumi Takeuchi
    • C10B7/14
    • C10B41/08C10B7/14C10B47/40C10B47/46C10B53/00C10B57/02C10K1/08F23G5/006F23G5/027F23G7/12F23G2201/303F23G2201/40F23G2209/281F23G2900/50205Y02E50/14
    • The carbonizing apparatus includes a heating chamber that thermally decomposes a treatment object by heating, a preliminary chamber through which the treatment object is carried from an outside into the heating member in a state in which the heating chamber is substantially shielded from the outside, the preliminary chamber being provided between the heating chamber and the outside, a plurality of cooling chambers in which the treatment object is treated after thermal decomposition, shielding doors that close the preliminary chamber, the heating chamber, and the cooling chambers arranged in series, a transport means that transports the treatment object while opening and closing the shielding doors, and exhaust pipes through which gas discharged from the preliminary chamber, the heating chamber, and the cooling chambers is exhausted. The treatment object is carbonized while being sequentially passed through the preliminary chamber, the heating chamber, and the cooling chambers.
    • 碳化装置包括通过加热使处理对象热分解的加热室,在加热室基本上与外部隔绝的状态下将处理对象从外部搬入加热部件的预备室,预备 腔室设置在加热室和外部之间,多个冷却室,处理对象在热分解后被处理,屏蔽闭合预备室的隔室门,加热室和串联布置的冷却室;输送装置 在打开和关闭屏蔽门的同时传送处理对象,以及从预备室,加热室和冷却室排出的气体排出的排气管。 处理对象在顺序通过预备室,加热室和冷却室时被碳化。
    • 9. 发明授权
    • Phase shift mask and phase shift mask blank
    • 相移掩模和相移掩模空白
    • US06335124B1
    • 2002-01-01
    • US09212855
    • 1998-12-17
    • Hideaki MitsuiOsamu NozawaMegumi Takeuchi
    • Hideaki MitsuiOsamu NozawaMegumi Takeuchi
    • G03F900
    • G03F1/32C23C14/0676C23C14/3414
    • The method of manufacturing a halftone phase shift mask blank enables the accurate and easy control over the composition of an MSi semitransparent film that makes it easy to obtain an MSi semitransparent film having a desired specific component, the formation of film with ease at a good reproducibility and the reduction of defects in the layer. A novel process for the production of a halftone type phase shift mask blank adapted for the preparation of a phase shift mask having a semitransparent film formed on a transparent substrate, said semitransparent film being capable of making the phase of light transmitted directly by said semitransparent film different from that of light transmitted by said transparent substrate by a predetermined amount and reducing the intensity of light, characterized in that said semitransparent film is formed using a sputtering target comprising at least one element selected from the group consisting of metal elements and transition metal elements, silicon and at least one compound selected from the group consisting of oxide, nitride and oxinitride of these elements.
    • 制造半色调相移掩模毛坯的方法能够准确和容易地控制MSi半透明膜的组成,使得容易获得具有所需特定成分的MSi半透明膜,以良好的再现性容易地形成膜 并减少层中的缺陷。 一种用于生产适用于制备在透明基底上形成半透明膜的相移掩模的半色调型相移掩模板的新方法,所述半透明膜能够使由所述半透射膜直接传输的光的相位 与由所述透明基板透射的光预定量的光不同,并且降低光的强度,其特征在于,所述半透明膜使用包括选自金属元素和过渡金属元素中的至少一种元素的溅射靶形成 硅和选自这些元素的氧化物,氮化物和氮氧化物的至少一种化合物。
    • 10. 发明申请
    • CARBONIZING DEVICE
    • 碳化装置
    • US20140079598A1
    • 2014-03-20
    • US14087914
    • 2013-11-22
    • Mamoru ItoAkiyuki KanekoMegumi Takeuchi
    • Mamoru ItoAkiyuki KanekoMegumi Takeuchi
    • C10B41/08
    • C10B41/08C10B7/14C10B47/40C10B47/46C10B53/00C10B57/02C10K1/08F23G5/006F23G5/027F23G7/12F23G2201/303F23G2201/40F23G2209/281F23G2900/50205Y02E50/14
    • The carbonizing apparatus includes a heating chamber that thermally decomposes a treatment object by heating, a preliminary chamber through which the treatment object is carried from an outside into the heating member in a state in which the heating chamber is substantially shielded from the outside, the preliminary chamber being provided between the heating chamber and the outside, a plurality of cooling chambers in which the treatment object is treated after thermal decomposition, shielding doors that close the preliminary chamber, the heating chamber, and the cooling chambers arranged in series, a transport means that transports the treatment object while opening and closing the shielding doors, and exhaust pipes through which gas discharged from the preliminary chamber, the heating chamber, and the cooling chambers is exhausted. The treatment object is carbonized while being sequentially passed through the preliminary chamber, the heating chamber, and the cooling chambers.
    • 碳化装置包括通过加热使处理对象热分解的加热室,在加热室基本上与外部隔绝的状态下将处理对象从外部搬入加热部件的预备室,预备 腔室设置在加热室和外部之间,多个冷却室,处理对象在热分解后被处理,屏蔽闭合预备室的隔室门,加热室和串联布置的冷却室;输送装置 在打开和关闭屏蔽门的同时传送处理对象,以及从预备室,加热室和冷却室排出的气体排出的排气管。 处理对象在顺序通过预备室,加热室和冷却室时被碳化。