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    • 5. 发明申请
    • PLASMA UNIFORMITY SYSTEM AND METHOD
    • 等离子体均匀系统和方法
    • US20120000606A1
    • 2012-01-05
    • US12829497
    • 2010-07-02
    • Rajesh DoraiKamal HadidiMayur Jagtap
    • Rajesh DoraiKamal HadidiMayur Jagtap
    • C23F1/08C23C16/50H05B31/02C23C16/458
    • H01J37/32633H01J37/32412H01J37/32532
    • A plasma processing tool comprises a plasma chamber configured to generate a plasma from a gas introduced into the chamber where the generated plasma has an electron plasma frequency. A plurality of electrodes disposed within the chamber. Each of the electrodes configured to create a rapidly-rising-electric-field pulse in a portion of the plasma contained in the chamber. Each of said rapidly-rising-electric-field pulses having a rise time substantially equal to or less than the inverse of the electron plasma frequency and a duration of less than the inverse of the ion plasma frequency. In this manner, the electron energy distribution in the generated plasma may be spatially and locally modified thereby affecting the density, composition and temperature of the species in the plasma and consequently the uniformity of the density and composition of ions and neutrals directed at a target substrate.
    • 等离子体处理工具包括等离子体室,其被配置为从引入室中的气体产生等离子体,其中产生的等离子体具有电子等离子体频率。 设置在室内的多个电极。 每个电极被配置为在腔室中包含的等离子体的一部分中产生快速上升的电场脉冲。 所述快速上升电场脉冲中的每一个具有基本上等于或小于电子等离子体频率的倒数的上升时间和小于离子等离子体频率的倒数的持续时间。 以这种方式,所产生的等离子体中的电子能量分布可以在空间上和局部改变,从而影响等离子体中物质的密度,组成和温度,从而影响靶向靶基质的离子和中性粒子的密度和组成的均匀性 。