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1. 发明申请

US20110096981A1 Focus Finding And Alignment Using A Split Linear Mask 失效
标题翻译：使用分割线性面膜对焦寻找和对齐
公开(公告)号：US20110096981A1
公开(公告)日：2011-04-28
申请号：US12912053
申请日：2010-10-26
申请人： Matthew R. Arnison , Tuan Quang Pham
发明人： Matthew R. Arnison , Tuan Quang Pham
IPC分类号： G06K9/00
CPC分类号： G03F9/7026
摘要： Disclosed is a method for determining a focus parameter for aligning a wafer (W) in an exposure tool (1000) within a measurement tolerance required for the exposure tool, the exposure tool using a lens system (EL) for alignment. The method provides a test chart (1410) associated with the wafer, the test chart having a sharp auto-correlation and then captures (1430), using a lens pupil mask (1420), an image of the test chart, the lens pupil mask having at least two phase ramps which are non-parallel. An auto-correlation (1520) is performed on the captured image (1510) of the test chart to determine the position of the test chart relative to a focal position of the lens system. The focus parameter is then determined (1530, 1540, 1550) for alignment of the wafer using the determined position of the test chart, whereby the focus parameter is determined within the measurement tolerance required by the exposure tool.
摘要翻译：公开了一种用于确定用于使曝光工具（1000）内的晶片（W）在曝光工具所需的测量公差内的对焦参数的方法，所述曝光工具使用用于对准的透镜系统（EL）。该方法提供与晶片相关联的测试图（1410），测试图具有清晰的自相关，然后使用透镜瞳孔掩模（1420）捕获（1430），测试图的图像，透镜瞳孔掩模具有不平行的至少两个相位斜坡。对测试图的拍摄图像（1510）执行自相关（1520）以确定测试图相对于透镜系统的焦点位置的位置。然后确定焦点参数（1530,1540,1550），用于使用测试图的确定位置来对准晶片，由此在曝光工具所需的测量公差内确定焦点参数。

2. 发明授权

US09836855B2 Determining a depth map from images of a scene 有权
公开(公告)号：US09836855B2
公开(公告)日：2017-12-05
申请号：US13606822
申请日：2012-09-07
申请人： David Morgan-Mar , Tuan Quang Pham , Matthew R Arnison , Kieran Gerard Larkin
发明人： David Morgan-Mar , Tuan Quang Pham , Matthew R Arnison , Kieran Gerard Larkin
IPC分类号： G06T7/571 , H04N13/02 , G06T7/00
CPC分类号： G06T7/571 , G06T2207/10148
摘要： A technique determines a depth measurement associated with a scene captured by an image capture device. The technique receives at least first and second images of the scene, in which the first image is captured using at least one different camera parameter than that of the second image. At least first and second image patches are selected from the first and second images, respectively, the selected patches corresponding to a common part of the scene. The selected image patches are used to determine which of the selected image patches provides a more focused representation of the common part. At least one value is calculated based on a combination of data in the first and second image patches, the combination being dependent on the more focused image patch. The depth measurement of the common part of the scene is determined from the at least one calculated value.

3. 发明申请

US20090161945A1 Geometric parameter measurement of an imaging device 有权
标题翻译：成像装置的几何参数测量
公开(公告)号：US20090161945A1
公开(公告)日：2009-06-25
申请号：US12275963
申请日：2008-11-21
申请人： David Morgan-Mar , Stephen James Hardy , Matthew R. Arnison , Kieran Gerard Larkin , Christine Anne Deller
发明人： David Morgan-Mar , Stephen James Hardy , Matthew R. Arnison , Kieran Gerard Larkin , Christine Anne Deller
IPC分类号： G06K9/00 , H04N17/00 , H04N1/00
CPC分类号： H04N17/002 , G06K9/3216 , G06T5/006 , H04N1/00827
摘要： Disclosed is a method of determining at least one three-dimensional (3D) geometric parameter of an imaging device. A two-dimensional (2D) target image is provided having a plurality of alignment patterns. The target image is imaged with an imaging device to form a captured image. At least one pattern of the captured image is compared with a corresponding pattern of the target image. From the comparison, the geometric parameter of the imaging device is then determined. The alignment patterns include at least one of (i) one or more patterns comprising a 2D scale and rotation invariant basis function, (ii) one or more patterns comprising a 1D scale invariant basis function, and (iii) one or more patterns having a plurality of grey levels and comprising a plurality of superimposed sinusoidal patterns, the plurality of sinusoidal patterns having a plurality of predetermined discrete orientations. Also disclosed is a two-dimensional test chart for use in testing an imaging device, the test chart comprising a plurality of alignment patterns, at least one of said alignment patterns including one of those patterns mentioned above.
摘要翻译：公开了一种确定成像装置的至少一个三维（3D）几何参数的方法。提供具有多个对准图案的二维（2D）目标图像。用成像装置成像目标图像以形成捕获的图像。拍摄图像的至少一个图案与目标图像的相应图案进行比较。从比较中，然后确定成像装置的几何参数。对准图案包括（i）包括2D刻度和旋转不变基函数的一个或多个图案中的至少一个，（ii）包括1D尺度不变基函数的一个或多个图案，以及（iii）一个或多个图案，其具有多个灰度级并且包括多个叠加的正弦图案，所述多个正弦图案具有多个预定的离散取向。还公开了用于测试成像装置的二维测试图，测试图包括多个对准图案，至少一个所述对准图案包括上述那些图案之一。

4. 发明授权

US08818130B2 Geometric parameter measurement of an imaging device 有权
标题翻译：成像装置的几何参数测量
公开(公告)号：US08818130B2
公开(公告)日：2014-08-26
申请号：US12275963
申请日：2008-11-21
申请人： David Morgan-Mar , Stephen James Hardy , Matthew R Arnison , Kieran Gerard Larkin , Christine Anne Deller
发明人： David Morgan-Mar , Stephen James Hardy , Matthew R Arnison , Kieran Gerard Larkin , Christine Anne Deller
IPC分类号： G06K9/00 , G06K9/36 , G06K9/62 , H04N17/00 , H04N17/02 , G01D18/00 , G01D21/00 , G01P21/00 , G01R35/00
CPC分类号： H04N17/002 , G06K9/3216 , G06T5/006 , H04N1/00827
摘要： Disclosed is a method of determining at least one three-dimensional (3D) geometric parameter of an imaging device. A two-dimensional (2D) target image is provided having a plurality of alignment patterns. The target image is imaged with an imaging device to form a captured image. At least one pattern of the captured image is compared with a corresponding pattern of the target image. From the comparison, the geometric parameter of the imaging device is then determined. The alignment patterns include at least one of (i) one or more patterns comprising a 2D scale and rotation invariant basis function, (ii) one or more patterns comprising a 1D scale invariant basis function, and (iii) one or more patterns having a plurality of grey levels and comprising a plurality of superimposed sinusoidal patterns, the plurality of sinusoidal patterns having a plurality of predetermined discrete orientations. Also disclosed is a two-dimensional test chart for use in testing an imaging device, the test chart comprising a plurality of alignment patterns, at least one of said alignment patterns including one of those patterns mentioned above.
摘要翻译：公开了一种确定成像装置的至少一个三维（3D）几何参数的方法。提供具有多个对准图案的二维（2D）目标图像。用成像装置成像目标图像以形成捕获的图像。拍摄图像的至少一个图案与目标图像的相应图案进行比较。从比较中，然后确定成像装置的几何参数。对准图案包括（i）包括2D刻度和旋转不变基函数的一个或多个图案中的至少一个，（ii）包括1D尺度不变基函数的一个或多个图案，以及（iii）一个或多个图案，其具有多个灰度级并且包括多个叠加的正弦图案，所述多个正弦图案具有多个预定的离散取向。还公开了用于测试成像装置的二维测试图，测试图包括多个对准图案，至少一个所述对准图案包括上述那些图案之一。

5. 发明授权

US08571300B2 Focus finding and alignment using a split linear mask 失效
标题翻译：使用分割线性掩模进行焦点查找和对齐
公开(公告)号：US08571300B2
公开(公告)日：2013-10-29
申请号：US12912053
申请日：2010-10-26
申请人： Matthew R. Arnison , Tuan Quang Pham
发明人： Matthew R. Arnison , Tuan Quang Pham
IPC分类号： G06K9/00
CPC分类号： G03F9/7026
摘要： A method of determining a focus parameter for aligning a water in an exposure tool within a measurement tolerance required for the exposure tool, the exposure tool using a lens system for alignment. A test chart is provided having a sharp auto-correlation associated with the wafer. An image of the test chart is captured using a lens pupil mask having at least two phase ramps that are non-parallel. The captured image of the test charge is auto-correlated to determine the position of the test chart relative to a focal position of the lens system. The focus parameter for alignment of the wafer is determined using the determined position of the test chart, whereby the focus parameter is determined within the measurement tolerance required by the exposure tool.
摘要翻译：一种确定用于使曝光工具中的水对准曝光工具所需的测量公差内的焦点参数的方法，所述曝光工具使用用于对准的透镜系统。提供具有与晶片相关联的清晰自相关的测试图。使用具有不平行的至少两个相位斜坡的透镜光瞳掩模来捕获测试图的图像。测试电荷的拍摄图像是自动相关的，以确定测试图相对于透镜系统焦点位置的位置。使用确定的测试图的位置确定晶片对准的焦点参数，由此在曝光工具所需的测量公差内确定焦点参数。

6. 发明申请

US20130063566A1 DETERMINING A DEPTH MAP FROM IMAGES OF A SCENE 有权
标题翻译：从场景图像中确定深度图
公开(公告)号：US20130063566A1
公开(公告)日：2013-03-14
申请号：US13606822
申请日：2012-09-07
申请人： David Morgan-Mar , Tuan Quang Pham , Matthew R. Arnison , Kieran Gerard Larkin
发明人： David Morgan-Mar , Tuan Quang Pham , Matthew R. Arnison , Kieran Gerard Larkin
IPC分类号： H04N13/02
CPC分类号： G06T7/571 , G06T2207/10148
摘要： A technique determines a depth measurement associated with a scene captured by an image capture device. The technique receives at least first and second images of the scene, in which the first image is captured using at least one different camera parameter than that of the second image. At least first and second image patches are selected from the first and second images, respectively, the selected patches corresponding to a common part of the scene. The selected image patches are used to determine which of the selected image patches provides a more focused representation of the common part. At least one value is calculated based on a combination of data in the first and second image patches, the combination being dependent on the more focused image patch. The depth measurement of the common part of the scene is determined from the at least one calculated value.
摘要翻译：技术确定与由图像捕获设备捕获的场景相关联的深度测量。该技术至少接收场景的第一和第二图像，其中利用与第二图像相比不同的相机参数捕获第一图像。分别从第一和第二图像中选择至少第一和第二图像补丁，所选择的补丁对应于场景的公共部分。所选择的图像补丁用于确定所选择的图像补丁中的哪一个提供了公共部分的更集中的表示。基于第一和第二图像补丁中的数据的组合来计算至少一个值，该组合取决于更聚焦的图像补丁。从所述至少一个计算值确定场景的公共部分的深度测量。

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