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    • 1. 发明授权
    • Vacuum pressure control system
    • 真空压力控制系统
    • US06202681B1
    • 2001-03-20
    • US09496624
    • 2000-02-02
    • Masayuki KouketsuMasayuki WatanabeShinichi NittaHiroshi Takehara
    • Masayuki KouketsuMasayuki WatanabeShinichi NittaHiroshi Takehara
    • F16K3142
    • F16K31/1221F16K37/0091F16K51/02G05D16/2093Y10T137/7762Y10T137/777
    • In a vacuum pressure control system constituted of a vacuum vessel, a vacuum pump sucking gas in the vacuum vessel, a vacuum proportional opening and closing valve disposed on a pipe connecting the vacuum vessel and the vacuum pump, the vacuum proportional opening and closing valve changing its opening to change the vacuum pressure in the vacuum vessel, a pressure sensor to measure the vacuum pressure in the vacuum vessel and a vacuum pressure control device to control the opening of the vacuum proportional opening and closing valve based on the output of the pressure sensor, the vacuum proportional opening and closing valve is provided with a valve seat, a valve member with a tapered surface in its outer periphery and a pilot valve, the valve member being movable along a center line of the valve seat to change a clearance area between the valve seat and the tapered surface, and the vacuum pressure control device controls a servo valve to change the pressure of air to be supplied to the pilot valve based on the output of the pressure sensor.
    • 在由真空容器,在真空容器中吸入气体的真空泵构成的真空压力控制系统中,设置在连接真空容器和真空泵的管道上的真空比例开关阀,真空比例开关阀变化 其打开以改变真空容器中的真空压力,用于测量真空容器中的真空压力的压力传感器和真空压力控制装置,以根据压力传感器的输出来控制真空比例开关阀的打开 所述真空比例开关阀具有阀座,在其外周具有锥形表面的阀构件和先导阀,所述阀构件可沿着所述阀座的中心线移动,以改变所述阀座之间的间隙面积 阀座和锥形表面,并且真空压力控制装置控制伺服阀以改变要供应到的空气的压力 基于压力传感器输出的先导阀。
    • 3. 发明授权
    • Coupling apparatus for chemical fluid flow channel
    • 化学流体通道耦合装置
    • US08544500B2
    • 2013-10-01
    • US13108909
    • 2011-05-16
    • Hiroshi ItafujiMasayuki Kouketsu
    • Hiroshi ItafujiMasayuki Kouketsu
    • F16K11/10B08B9/032
    • F16K27/003F16K27/0236Y10T137/4259Y10T137/8158Y10T137/87249Y10T137/87925
    • This invention provides a chemical fluid flow channel coupling apparatus that couples and decouples chemical fluid flow channels. The coupling apparatus includes a first coupling unit; and a second coupling unit. The first coupling unit includes a first chemical fluid valve member chamber and a first valve member configured to open and close a first chemical fluid opening communicated with the first chemical fluid flow channel; and a purging fluid supply control valve configured to open and close the purging fluid supply flow channel. The second coupling unit includes a second chemical fluid valve member chamber, and a second valve member configured to open and close a second chemical fluid opening connected to the second chemical fluid flow channel; and a purging fluid discharge control valve.
    • 本发明提供一种化学流体流动通道联接装置,其耦合和分离化学流体流动通道。 联接装置包括:第一联接单元; 和第二耦合单元。 第一联接单元包括第一化学流体阀构件室和构造成打开和关闭与第一化学流体流动通道连通的第一化学流体开口的第一阀构件; 以及构造成打开和关闭清洗流体供给流动通道的清洗液供应控制阀。 第二联接单元包括第二化学流体阀构件室和构造成打开和关闭连接到第二化学流体流动通道的第二化学流体开口的第二阀构件; 和清洗液排出控制阀。
    • 7. 发明授权
    • Sample injector
    • 样品注射器
    • US08544350B2
    • 2013-10-01
    • US13041283
    • 2011-03-04
    • Hiroshi ItafujiMasayuki Kouketsu
    • Hiroshi ItafujiMasayuki Kouketsu
    • G01N35/10G01N30/20
    • G01N30/20G01N35/1097G01N2030/201G01N2030/202G01N2030/207
    • This invention provides a sample injector for injecting a fixed amount of a sample into a mobile phase medium and discharging the mobile phase medium with the sample. The sample injector includes a first member having a medium passage for supplying the mobile phase medium and a sample passage for supplying the sample and a second member having a discharge passage for discharging the mobile phase medium with the sample to an outside of the injector. The second member is provided in contact with the first member. The first member and the second member are configured to move to a sample charging position and a sample injection position. The sample charging position is for the sample chamber to connect with the sample passage. The sample injection position is for the sample chamber to connect with the medium passage and the discharge passage.
    • 本发明提供了一种样品注射器,用于将固定量的样品注入到流动相介质中并用样品排出流动相介质。 样本注射器包括具有用于供应流动相介质的介质通道的第一构件和用于供给样品的样品通道和具有用于将具有样品的流动相介质排出到喷射器外部的排出通道的第二构件。 第二构件设置成与第一构件接触。 第一构件和第二构件被配置成移动到样品充电位置和样品注入位置。 样品充电位置用于样品室与样品通道连接。 样品注射位置用于样品室与介质通道和排出通道连接。
    • 8. 发明申请
    • LIQUID VAPORIZATION SYSTEM
    • 液体蒸发系统
    • US20120180724A1
    • 2012-07-19
    • US13498902
    • 2010-03-30
    • Masayuki KouketsuHiroshi Itafuji
    • Masayuki KouketsuHiroshi Itafuji
    • C23C16/46C23C16/52
    • B01B1/005
    • Provided is a liquid vaporization system capable of promoting vaporization of a liquid material while solving a problem of residual liquid material. A liquid vaporization system has a liquid vaporization apparatus having a pump and a vaporizer. The vaporizer has a case, a heater provided inside the case, a heat storage plate heated by the heater, and a mesh. The mesh is formed by interweaving wires and has an overall flat plate shape. By overlapping the mesh on an upper surface of the heat storage plate, minute irregularities are formed on the heat storage plate by the mesh. A nozzle is provided above the mesh, whereby the liquid material is dropped from the nozzle onto the heat storage plate. The liquid material spreads over the heat storage plate in a thin film and is heated and vaporized on the upper surface of the heat storage plate.
    • 提供一种能够促进液体材料的蒸发同时解决残留液体材料的问题的液体蒸发系统。 液体蒸发系统具有液体蒸发装置,其具有泵和蒸发器。 蒸发器具有壳体,设置在壳体内部的加热器,由加热器加热的蓄热板和网。 网格通过交织线形成并具有整体平板形状。 通过在存储板的上表面上重叠网格,通过网格在储热板上形成微小的凹凸。 在网格上方设有喷嘴,由此液体材料从喷嘴落到储热板上。 液体材料以薄膜的形式在储热板上展开,并在储热板的上表面被加热和汽化。
    • 9. 发明申请
    • LIQUID EJECTING APPARATUS
    • 液体喷射装置
    • US20120024989A1
    • 2012-02-02
    • US13264742
    • 2010-04-16
    • Masayuki KouketsuHiroshi Itafuji
    • Masayuki KouketsuHiroshi Itafuji
    • B05B1/34
    • B05C5/0283B05B1/044B05B1/3013B05C5/0225B05C5/0258
    • A liquid ejecting apparatus having a storage portion (20) for storing a treatment liquid, a slit-shaped opening portion (41) for ejecting the treatment liquid, and a connecting passage (42) that has a slit-shaped cross-section and connects the storage portion (20) to the slit-shaped opening portion (41) includes: a valve body portion (50) that is provided in the storage portion (20) to cover the connecting passage (42), and forms a gap (22) together with a lower wall (43) of the storage portion (20) so that the treatment liquid is caused to flow into the connecting passage (42) through the gap (22); a first curved surface portion (44a) that smoothly connects a surface of the lower wall (43) of the storage portion (20) to an inner wall surface (42a) of the connecting passage (42); and a second curved surface portion (51a) that is provided on the valve body portion (50) so as to project to an identical side to the first curved surface portion (44a). With this constitution, air bubbles can be prevented from intermixing with the treatment liquid ejected from the slit-shaped opening portion (41).
    • 一种液体喷射装置,具有用于储存处理液的储存部分(20),用于喷射处理液体的狭缝形开口部分(41)和具有狭缝形横截面的连接通道(42) 所述狭缝状开口部(41)的所述收纳部(20)具有:阀体部(50),其设置在所述收纳部(20)中,以覆盖所述连结通路(42),形成间隙 )与存储部(20)的下壁(43)一起,使得处理液通过间隙(22)流入连接通道(42); 第一弯曲表面部分(44a),其将所述存储部分(20)的下壁(43)的表面平滑地连接到所述连接通道(42)的内壁表面(42a); 以及设置在阀体部分(50)上以与第一曲面部分(44a)相同的一侧突出的第二弯曲表面部分(51a)。 利用这种构造,可以防止气泡与从狭缝状开口部(41)喷出的处理液混合。
    • 10. 发明授权
    • Vacuum pressure control system
    • 真空压力控制系统
    • US06289737B1
    • 2001-09-18
    • US09449979
    • 1999-11-26
    • Masayuki KouketsuMasayuki WatanabeHiroshi Kagohashi
    • Masayuki KouketsuMasayuki WatanabeHiroshi Kagohashi
    • G01L700
    • G05D16/2093
    • In a vacuum pressure control system, the vacuum pressure in a reaction chamber 10 is measured by vacuum pressure sensors 14 and 15 (S22), the measured value is changed at a set vacuum pressure changing speed commanded from the exterior or determined and stored in advance in a controller of the system (S24). The changed value is sequentially generated as an internal command. In response to the sequentially generated internal commands, a desired value of the feedback control is changed in sequence (S26), so that the feedback control is executed as follow-up control (S27). Accordingly, the vacuum pressure in the reaction chamber 10 can be uniformly changed to a desired vacuum at a set vacuum pressure changing speed.
    • 在真空压力控制系统中,通过真空压力传感器14和15测量反应室10中的真空压力(S22),测量值以从外部命令的设定真空压力变化速度改变或预先确定和存储 在系统的控制器中(S24)。 作为内部命令顺序生成更改的值。 响应于顺序产生的内部命令,反馈控制的期望值按顺序改变(S26),从而作为后续控制执行反馈控制(S27)。 因此,能够以设定的真空压力变化速度将反应室10内的真空压力均匀地变更为期望的真空。