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    • 2. 发明授权
    • Concentricity evaluating system
    • 同心评估系统
    • US4441026A
    • 1984-04-03
    • US315731
    • 1981-10-28
    • Yoshinaga MoriwakiMasaki HorikeMasashi Kamiya
    • Yoshinaga MoriwakiMasaki HorikeMasashi Kamiya
    • G01B11/00G01B5/00G01B7/00G01B7/312G01B11/12G01B11/27G01B21/00G01N21/86
    • G01B11/272G01B11/12G01B5/0002
    • A concentricity evaluating system has a stage supported by a hydrostatic bearing in at least one of radial and thrust directions. The angle of rotation of the stage is detected by a rotation angle detector. On the stage a hollow cylindrical member is fixed coaxially. Onto the upper end face of the hollow cylindrical member or into the hole thereof a light beam is applied from a light emitting means, whereby a clear image of the profile of the hole is formed. The image thus formed is enlarged by an optical system. The light beam passing through the optical system reaches a photodiode array which is positioned across a part of the enlarged image. The hollow cylindrical member is rotated, and a displacement meter is detected how the circumference of the hollow cylindrical member varies as the member rotates. Data from the displacement meter, photodiode array and the rotation angle detector are fed to an interface and processed. The data thus processed are fed to a computer, which perform arithmetic operations on these data, thus evaluating the concentricity of the hollow cylindrical member.
    • 同心度评估系统具有在径向和推力方向中的至少一个中由静压轴承支撑的台阶。 通过旋转角度检测器检测台的旋转角度。 在舞台上,中空圆柱形构件被同轴地固定。 在中空圆柱形构件的上端面或其孔中,从发光装置施加光束,由此形成孔的轮廓的清晰图像。 这样形成的图像被光学系统放大。 通过光学系统的光束到达位于放大图像的一部分的光电二极管阵列。 中空圆柱形构件旋转,并且检测位移计如何随着构件旋转而中空圆柱形构件的圆周变化。 来自位移计,光电二极管阵列和旋转角度检测器的数据被馈送到接口并进行处理。 将这样处理的数据送入计算机,对这些数据执行算术运算,从而评估中空圆柱形构件的同心度。
    • 7. 发明授权
    • Method and an apparatus for aligning first and second objects with each
other
    • 用于将第一和第二物体彼此对准的方法和装置
    • US4902133A
    • 1990-02-20
    • US251842
    • 1988-09-30
    • Toru TojoOsamu KuwabaraMasashi KamiyaHisakazu Yoshino
    • Toru TojoOsamu KuwabaraMasashi KamiyaHisakazu Yoshino
    • G01B11/00G03F9/00H01L21/027H01L21/30H01L21/68
    • G03F9/7049
    • A distance between a mask and a wafer is set such that exposure light beams emerged from the mask are converged by the projection lens to be focused on the wafer. According to the present invention, two mask marks of diffraction gratings are formed on the mask and spaced at a predetermined distance from each other. When the alignment light beams are applied to the mask marks, two diffracted light beams of predetermined order emerge individually from the mask marks in such a manner that the respective optical axes of the two diffracted light beams, which are directed opposite to the advancing direction of the diffracted light beams, intersect each other one the first point. Thus, the diffracted light beams advance as if the diffracted light beams were the two light beams emerging from the first point. Therefore, the two diffracted light beams can be focused on the wafer or neighborhood of it. The diffracted light beams can be incident on a wafer mark which is formed on the wafer and is diffraction grating. Thus rediffracted light beams emerge from the wafer mark and are detected, so that the mask and the wafer are aligned with each other. Accordingly, the alignment can be performed, despite a great diffraction between the wave-lengths of the exposure light beam and the alignment light beam.
    • 设置掩模和晶片之间的距离使得从掩模出射的曝光光束被投影透镜会聚以聚焦在晶片上。 根据本发明,在掩模上形成两个衍射光栅的掩模标记,并以彼此间隔预定距离。 当将对准光束施加到掩模标记时,预定次数的两个衍射光束从掩模标记分别出现,使得两个衍射光束的相应光轴相对于前进方向 衍射光束与第一点相交。 因此,衍射光束如同衍射光束是从第一点出射的两个光束那样前进。 因此,两个衍射光束可以聚焦在晶片或其附近。 衍射光束可以入射到形成在晶片上的晶片标记,并且是衍射光栅。 因此,从晶片标记出现重衍红光,并被检测,使得掩模和晶片彼此对准。 因此,尽管曝光光束的波长与对准光束之间有很大的衍射,但是可以进行对准。