会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 2. 发明授权
    • Film-forming method for X-ray mask
    • X射线掩模成膜方法
    • US5879840A
    • 1999-03-09
    • US904185
    • 1997-08-01
    • Hideki YabeKaeko KitamuraMasao KouhashiMasamitsu OkamuraKei Sasaki
    • Hideki YabeKaeko KitamuraMasao KouhashiMasamitsu OkamuraKei Sasaki
    • C23C14/50C23C14/54G03F1/22H01L21/027G03F9/00
    • G03F1/22C23C14/505C23C14/545
    • A film-forming method and an apparatus for a X-ray mask and a film-forming apparatus which are able to diminish stress unevenness in the X-ray mask to zero when a X-ray absorber is formed on a mask substrate by sputtering a target 3 during rotation of the mask substrate. Firstly, a dummy mask substrate is prepared instead of a mask substrate. A dummy X-ray absorber 6 is formed on this dummy X-ray substrate 5 within a sputtering range. Secondly, a stress distribution is measured at every position along a straight line passing through a center of the dummy X-ray absorber 6 and then a desirable stress distribution range X is selected at such a location so as to have a good linear characteristic in a portion of a compressive stress curve which decreases toward an outer periphery of the dummy X-ray absorber 6 in the stress distribution. A center of the desirable stress distribution range X is selected as a rotation center, the mask substrate is placed within the desirable stress distribution range X, and the X-ray absorber is formed by this film-forming technology.
    • 当通过溅射在掩模基板上形成X射线吸收体时,能够将X射线掩模中的应力不均匀性降低到零的X射线掩模和成膜装置的成膜方法和装置 在掩模基板旋转期间的目标3。 首先,准备虚设掩模基板来代替掩模基板。 在该虚拟X射线基板5上,在溅射范围内形成虚拟X射线吸收体6。 其次,在通过虚拟X射线吸收体6的中心的直线的每个位置处测量应力分布,然后在这样的位置选择期望的应力分布范围X,使得在 在应力分布中朝向虚拟X射线吸收体6的外周减小的压缩应力曲线的一部分。 选择期望的应力分布范围X的中心作为旋转中心,将掩模基板置于期望的应力分布范围X内,并且通过该成膜技术形成X射线吸收体。