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    • 8. 发明授权
    • Method for automatically providing data for the focus monitoring of a lithographic process
    • 用于自动提供用于光刻工艺的焦点监控的数据的方法
    • US07277160B2
    • 2007-10-02
    • US11057331
    • 2005-02-11
    • Markus Kirsch
    • Markus Kirsch
    • G03B27/32G03B27/52G03B27/42
    • G03F7/70641
    • A method for automatically providing data for the focus monitoring of a lithographic exposure process is disclosed. Firstly, the file for a wafer is generated, which holds at least the information of the size of the wafer, the position of a plurality of measurement pattern, the order in which the measurement patterns are captured and registered, and the alignment of the measurement pattern. Secondly, this information is stored in a master grid. Thirdly, images are acquired of the pattern of each position stored in the master grid of the generated file, wherein the image acquisition is carried out according to the order as stored. Finally, names are assigned to the acquired images.
    • 公开了一种用于自动提供用于光刻曝光过程的焦点监视的数据的方法。 首先,生成用于晶片的文件,其至少保持晶片尺寸的信息,多个测量图案的位置,捕获和记录测量图案的顺序以及测量的对准 模式。 其次,该信息存储在主网格中。 第三,获取存储在生成文件的主网格中的每个位置的图案的图像,其中根据存储的顺序执行图像采集。 最后,将名称分配给所获取的图像。
    • 9. 发明申请
    • Method for automatically providing data for the focus monitoring of a lithographic process
    • 用于自动提供用于光刻工艺的焦点监控的数据的方法
    • US20060181693A1
    • 2006-08-17
    • US11057331
    • 2005-02-11
    • Markus Kirsch
    • Markus Kirsch
    • G03B27/32
    • G03F7/70641
    • A method for automatically providing data for the focus monitoring of a lithographic exposure process is disclosed. Firstly, the file for a wafer is generated, which holds at least the information of the size of the wafer, the position of a plurality of measurement pattern, the order in which the measurement patterns are captured and registered, and the alignment of the measurement pattern. Secondly, this information is stored in a master grid. Thirdly, images are acquired of the pattern of each position stored in the master grid of the generated file, wherein the image acquisition is carried out according to the order as stored. Finally, names are assigned to the acquired images.
    • 公开了一种用于自动提供用于光刻曝光过程的焦点监视的数据的方法。 首先,生成用于晶片的文件,其至少保持晶片尺寸的信息,多个测量图案的位置,捕获和记录测量图案的顺序以及测量的对准 模式。 其次,该信息存储在主网格中。 第三,获取存储在生成文件的主网格中的每个位置的图案的图像,其中根据存储的顺序执行图像采集。 最后,将名称分配给所获取的图像。