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    • 1. 发明授权
    • System and method for monitoring and/or controlling attributes of multiple chemical mixtures with a single sensor
    • 用单个传感器监测和/或控制多种化学混合物属性的系统和方法
    • US08518704B2
    • 2013-08-27
    • US11680391
    • 2007-02-28
    • Mark A. CampbellPhuong-Anh TangGary R Anderson
    • Mark A. CampbellPhuong-Anh TangGary R Anderson
    • G01N35/10
    • G01N35/1095G01N35/08
    • A monitoring system is presented. The monitoring system may include a first chemical vessel containing a first chemical mixture and a second chemical vessel containing a second chemical mixture. The monitoring system may further include a sensor configured to selectively receive a first sample flow of the first chemical mixture from the first chemical vessel and a second sample flow of the second chemical mixture from the second chemical vessel. The sensor may be configured to measure a first sample attribute value of the first sample flow and a second sample attribute value of the second sample flow. By multiplexing multiple sample flows through a sensor, the monitoring system may monitor attributes of multiple chemical mixtures without requiring separate sensors for each chemical mixture monitored by the system.In an embodiment, the monitoring system is preferably configured to control an attribute of a chemical mixture. In such a case, the monitoring system may further include a control system configured to receive the first sample attribute value and the second sample attribute value from the sensor. The control system is further preferably configured to input the first sample attribute value into a first attribute control algorithm to calculate a first attribute control output. The first chemical mixture includes a first bulk attribute value, and the control system is preferably configured to direct the adjusting of the first bulk attribute value.
    • 介绍了监控系统。 监测系统可以包括含有第一化学混合物的第一化学容器和含有第二化学混合物的第二化学容器。 监测系统还可以包括被配置为选择性地接收来自第一化学容器的第一化学混合物的第一样品流和来自第二化学容器的第二化学混合物的第二样品流的传感器。 传感器可以被配置为测量第一样本流的第一样本属性值和第二样本流的第二样本属性值。 通过将多个样品流复合通过传感器,监测系统可以监测多种化学混合物的属性,而不需要由系统监测的每种化学混合物的单独的传感器。 在一个实施例中,监控系统优选地被配置为控制化学混合物的属性。 在这种情况下,监视系统还可以包括被配置为从传感器接收第一样本属性值和第二样本属性值的控制系统。 控制系统还优选地被配置为将第一样本属性值输入到第一属性控制算法中以计算第一属性控制输出。 第一化学混合物包括第一批量属性值,并且控制系统优选地被配置为引导第一批量属性值的调整。
    • 3. 发明授权
    • Laser processing apparatus
    • 激光加工设备
    • US5274212A
    • 1993-12-28
    • US955202
    • 1992-10-01
    • Mark A. CampbellJohn J. Sniezek
    • Mark A. CampbellJohn J. Sniezek
    • B23K26/02B23K26/12
    • B23K26/127B23K26/037B23K26/12
    • A door seal apparatus for a laser operating station, comprises a fixed wall with an opening, a turn table device with a turn table wall positioned within the opening, the turn table device having at least two positions in which the turn table wall is substantially parallel and coplanar with the fixed wall, with a gap existing between the fixed wall and turn table wall, cylinders for driving a first plate in a first direction over a first portion of the gap, and a cam plate for operationally engaging the first plate to a second plate and for driving the second plate in a second direction over a second portion of the gap as the first plate is driven in a first direction, wherein the first and second plates prevent direct light leaks from the first and second portions of the gap.
    • 一种用于激光操作台的门密封装置,包括具有开口的固定壁,具有位于开口内的转台壁的转台装置,转台装置具有至少两个位置,转台台壁基本上平行 并且与固定壁共面,在固定壁和转台壁之间存在间隙,用于在间隙的第一部分上沿第一方向驱动第一板的气缸和用于将第一板与第一板操作地接合的凸轮板 并且当所述第一板沿着第一方向被驱动时,用于在所述间隙的第二部分上沿第二方向驱动所述第二板,其中所述第一板和所述第二板防止从所述间隙的所述第一和第二部分的直接光泄漏。
    • 4. 发明授权
    • System and method for monitoring and/or controlling attributes of multiple chemical mixtures with a single sensor
    • 用单个传感器监测和/或控制多种化学混合物属性的系统和方法
    • US07198753B1
    • 2007-04-03
    • US09366441
    • 1999-08-03
    • Mark A. CampbellPhuong-Anh TangGary R. Anderson
    • Mark A. CampbellPhuong-Anh TangGary R. Anderson
    • G01N30/00
    • G01N35/1097G01N35/08Y10T436/2575
    • A monitoring system is presented. The monitoring system may include a first chemical vessel containing a first chemical mixture and a second chemical vessel containing a second chemical mixture. The monitoring system may further include a sensor configured to selectively receive a first sample flow of the first chemical mixture from the first chemical vessel and a second sample flow of the second chemical mixture from the second chemical vessel. The sensor may be configured to measure a first sample attribute value of the first sample flow and a second sample attribute value of the second sample flow. By multiplexing multiple sample flows through a sensor, the monitoring system may monitor attributes of multiple chemical mixtures without requiring separate sensors for each chemical mixture monitored by the system.In an embodiment, the monitoring system is preferably configured to control an attribute of a chemical mixture. In such a case, the monitoring system may further include a control system configured to receive the first sample attribute value and the second sample attribute value from the sensor. The control system is further preferably configured to input the first sample attribute value into a first attribute control algorithm to calculate a first attribute control output. The first chemical mixture includes a first bulk attribute value, and the control system is preferably configured to direct the adjusting of the first bulk attribute value.
    • 介绍了监控系统。 监测系统可以包括含有第一化学混合物的第一化学容器和含有第二化学混合物的第二化学容器。 监测系统还可以包括被配置为选择性地接收来自第一化学容器的第一化学混合物的第一样品流和来自第二化学容器的第二化学混合物的第二样品流的传感器。 传感器可以被配置为测量第一样本流的第一样本属性值和第二样本流的第二样本属性值。 通过将多个样品流复合通过传感器,监测系统可以监测多种化学混合物的属性,而不需要由系统监测的每种化学混合物的单独的传感器。
    • 8. 发明申请
    • System and Method for Monitoring and/or Controlling Attributes of Multiple Chemical Mixtures with a Single Sensor
    • 用单个传感器监测和/或控制多种化学混合物的属性的系统和方法
    • US20080202216A1
    • 2008-08-28
    • US11680391
    • 2007-02-28
    • Mark A. CampbellPhuong-Anh TangGary R. Anderson
    • Mark A. CampbellPhuong-Anh TangGary R. Anderson
    • G01N33/00
    • G01N35/1095G01N35/08
    • A monitoring system is presented. The monitoring system may include a first chemical vessel containing a first chemical mixture and a second chemical vessel containing a second chemical mixture. The monitoring system may further include a sensor configured to selectively receive a first sample flow of the first chemical mixture from the first chemical vessel and a second sample flow of the second chemical mixture from the second chemical vessel. The sensor may be configured to measure a first sample attribute value of the first sample flow and a second sample attribute value of the second sample flow. By multiplexing multiple sample flows through a sensor, the monitoring system may monitor attributes of multiple chemical mixtures without requiring separate sensors for each chemical mixture monitored by the system.In an embodiment, the monitoring system is preferably configured to control an attribute of a chemical mixture. In such a case, the monitoring system may further include a control system configured to receive the first sample attribute value and the second sample attribute value from the sensor. The control system is further preferably configured to input the first sample attribute value into a first attribute control algorithm to calculate a first attribute control output. The first chemical mixture includes a first bulk attribute value, and the control system is preferably configured to direct the adjusting of the first bulk attribute value.
    • 介绍了监控系统。 监测系统可以包括含有第一化学混合物的第一化学容器和含有第二化学混合物的第二化学容器。 监测系统还可以包括被配置为选择性地接收来自第一化学容器的第一化学混合物的第一样品流和来自第二化学容器的第二化学混合物的第二样品流的传感器。 传感器可以被配置为测量第一样本流的第一样本属性值和第二样本流的第二样本属性值。 通过将多个样品流复合通过传感器,监测系统可以监测多种化学混合物的属性,而不需要由系统监测的每种化学混合物的单独的传感器。 在一个实施例中,监控系统优选地被配置为控制化学混合物的属性。 在这种情况下,监视系统还可以包括被配置为从传感器接收第一样本属性值和第二样本属性值的控制系统。 控制系统还优选地被配置为将第一样本属性值输入到第一属性控制算法中以计算第一属性控制输出。 第一化学混合物包括第一批量属性值,并且控制系统优选地被配置为引导第一批量属性值的调整。
    • 9. 发明授权
    • Process line purge system and method
    • 生产线清洗系统和方法
    • US06536460B1
    • 2003-03-25
    • US08822216
    • 1997-03-21
    • Mark E. YelvertonMark A. Campbell
    • Mark E. YelvertonMark A. Campbell
    • B08B302
    • B08B9/0325B08B9/0328B08B2230/01Y10S134/902Y10T137/0419Y10T137/4259
    • Method and system for purging a process line of a process gas used in a semiconductor wafer fabrication process. Inert gas (e.g., nitrogen gas) is repeatedly charged from an inert gas source into the process line and evacuated using a vacuum system. The vacuum system is preferably supplied with inert gas having a pressure in excess of 30 psig from the inert gas source. The inert gas is introduced into the process line from an inert gas conduit at a predetermined pressure to prevent process gas from liquefying in the process line. A set pressure regulator or an absolute pressure regulator may be used to reduce he pressure of the inert gas to below the vapor pressure of the process gas.
    • 用于吹扫半导体晶片制造工艺中使用的工艺气体的工艺线的方法和系统。 将惰性气体(例如氮气)从惰性气体源重复加入到生产线中,并使用真空系统抽真空。 真空系统优选地从惰性气体源供给具有超过30psig的压力的惰性气体。 惰性气体以预定压力从惰性气体导管引入工艺管线,以防止工艺气体在生产线中液化。 可以使用设定的压力调节器或绝对压力调节器来将惰性气体的压力降低到低于处理气体的蒸汽压力。
    • 10. 发明授权
    • Beam bender support unit
    • 光束弯曲机支撑单元
    • US5274211A
    • 1993-12-28
    • US958981
    • 1992-10-09
    • Mark A. CampbellJohn J. Sniezek
    • Mark A. CampbellJohn J. Sniezek
    • B23K26/06B23K26/08B23K26/10
    • B23K26/0884B23K26/06B23K26/0604B23K26/064
    • An apparatus comprises a laser generator, a laser beam delivery tube, a beam bender, a laser delivery robot, a beam bender support unit, and a three-axis adjustable head. The beam bender support unit comprises a base, a riser, and first and second support plates welded to two side faces of the riser and to the base. The beam bender support unit also comprises a horizontal support arm and first and second arm support plates mounted to the two side faces of the vertical riser and to the horizontal support arm. The beam bender is mounted to the three-axis adjustable head providing adjustment of the location of the beam bender in first and second horizontal directions and a third vertical direction, wherein the beam bender has increased isolation from floor vibrations.
    • 一种装置包括激光发生器,激光束输送管,光束弯曲器,激光输送机器人,光束弯曲支撑单元和三轴可调节头。 梁弯曲支撑单元包括底座,立管以及焊接到提升管和底座的两个侧面的第一和第二支撑板。 梁弯曲支撑单元还包括水平支撑臂和安装到垂直立管的两个侧面和水平支撑臂的第一和第二臂支撑板。 光束弯曲器安装到三轴可调节头,提供了弯曲机在第一和第二水平方向上的位置的调整以及第三垂直方向,其中,弯曲机具有增加的与地面振动的隔离度。