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    • 2. 发明授权
    • Method of making a thin film transistor
    • 制造薄膜晶体管的方法
    • US5130264A
    • 1992-07-14
    • US763485
    • 1991-09-23
    • John R. TroxellMarie I. Harrington
    • John R. TroxellMarie I. Harrington
    • H01L21/762H01L21/336H01L21/84H01L29/78H01L29/786
    • H01L29/66757H01L21/84H01L29/78636H01L29/78675Y10S148/053Y10S148/15
    • A thin film field effect transistor has an island of polysilicon on the surface of a substrate, preferably of an insulating material. A layer of silicon dioxide is on the surface of the substrate and surrounds the polysilicon island. The silicon dioxide layer is of substantially uniform thickness and contacts the edge of the polysilicon island. A gate insulator layer, preferably of silicon dioxide, of substantially uniform thickness is on the surface of the polysilicon island. A conductive gate, preferably of doped polysilicon, is on the gate insulator layer and extends across a portion of the polysilicon island. The portions of the polysilicon island at opposite sides of the gate are doped to form the source and drain of the transistor. The transistor is formed by applying a layer of polysilicon on the surface of a substrate and applying a mask over the portion of the polysilicon layer which is to form the island. The uncovered portion of the polysilicon layer is converted to silicon dioxide, such as by heating in an atmosphere containing oxygen. After removing the mask, the gate insulator layer is formed over the surface of the polysilicon island, and the gate is formed over the gate insulator.
    • 薄膜场效应晶体管在衬底的表面上具有优选为绝缘材料的多晶硅岛。 二氧化硅层位于衬底的表面上并且围绕多晶硅岛。 二氧化硅层具有基本均匀的厚度并且接触多晶硅岛的边缘。 在多晶硅岛的表面上具有基本均匀厚度的栅极绝缘体层,优选二氧化硅。 导电栅极,优选地是掺杂多晶硅,位于栅极绝缘体层上并延伸跨越多晶硅岛的一部分。 在栅极的相对侧的多晶硅岛的部分被掺杂以形成晶体管的源极和漏极。 通过在衬底的表面上施加多晶硅层并在将要形成岛的多晶硅层的部分上施加掩模来形成晶体管。 多晶硅层的未覆盖部分例如通过在含氧气氛中加热而转化为二氧化硅。 在去除掩模之后,在多晶硅岛的表面上形成栅极绝缘体层,并且栅极形成在栅极绝缘体上。
    • 6. 发明授权
    • Retaskable switch-indicator unit
    • 可拆式开关指示器单元
    • US07176885B2
    • 2007-02-13
    • US10731644
    • 2003-12-09
    • John R. TroxellLarry M. OberdierMarie I. Harrington
    • John R. TroxellLarry M. OberdierMarie I. Harrington
    • G09G5/00
    • G06F3/044G06F3/04886G06F2203/04809
    • An integrated switch-indicator unit includes a light emitting diode (LED) structure for providing a plurality of indicators and an overlay input device integrated with the LED structure. The overlay input device includes a non-conductive substrate and a plurality of conductive electrode pairs. The plurality of conductive electrode pairs are formed on the substrate and each form a proximity sensitive region and include a first electrode that receives an input signal and a second electrode that provides an output signal. The first and second electrodes are capacitively coupled and the capacitance of the electrode pair changes when a conductive member, e.g., a user's finger, is located near the electrode pair.
    • 集成开关指示器单元包括用于提供多个指示器的发光二极管(LED)结构和与LED结构集成的覆盖输入设备。 覆盖输入装置包括非导电基板和多个导电电极对。 多个导电电极对形成在衬底上并且各自形成接近敏感区域,并且包括接收输入信号的第一电极和提供输出信号的第二电极。 第一和第二电极电容耦合,并且当导电构件(例如使用者的手指)位于电极对附近时,电极对的电容变化。