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1. 发明申请

WO2008000961A3 METHOD AND DEVICE FOR MACHINING A TARGET USING A FEMTOSECOND LASER BEAM 审中-公开
标题翻译：使用FEMTOSECOND激光束加工目标的方法和装置
公开(公告)号：WO2008000961A3
公开(公告)日：2008-02-14
申请号：PCT/FR2007001087
申请日：2007-06-28
申请人： ECOLE POLYTECH , ENSMSE , CENTRE NAT RECH SCIENT , MOUROU GERARD , BOYER GILBERT
发明人： MOUROU GERARD , BOYER GILBERT
IPC分类号： B23K26/06 , B23K26/36
CPC分类号： B23K26/066 , B23K26/0624 , B23K26/361
摘要： The invention relates to a method and device for machining a target using a femtosecond laser beam. The invention consists in taking advantage of the deterministic nature of the ablation threshold and the nonlinear dependence thereof through the use of amplitude or phase pupillary filtering using the polarising effect or any other technique in order to reduce significantly the machining dimensions obtained by focusing a laser beam in nanotechnologies. One such filtering process modifies the distribution of the intensity in the focal plane such as to reduce the maximum of the central component of the spectrum of laser pulses while maintaining the bright rings below the deterministic ablation threshold. The invention associates the femtosecond ablation technique with deterministic threshold and the apodisation technique.
摘要翻译：使用飞秒激光束加工靶的方法和装置技术领域本发明涉及使用飞秒激光束加工靶的方法和装置。本发明在于利用消融阈值的确定性性质及其非线性依赖性通过使用使用偏振效应的振幅或相位瞳孔滤波或任何其他技术以显着减小通过聚焦激光束而获得的加工尺寸在纳米技术。一个这样的滤波过程修改焦平面中的强度分布，以便减少激光脉冲谱的中心分量的最大值，同时将亮环保持在确定性消融阈值以下。本发明将飞秒消融技术与确定性阈值和切趾技术相关联。

2. 发明申请

WO2004097520A3 FIBER LASER-BASED EUV-LITHOGRAPHY 审中-公开
标题翻译：基于光纤激光的EUV-LITHOGRAPHY
公开(公告)号：WO2004097520A3
公开(公告)日：2005-11-10
申请号：PCT/US2004012714
申请日：2004-04-26
申请人： UNIV MICHIGAN , MOUROU GERARD A , GALVANAUSKAS ALMANTAS , THEOBALD WOLFGANG , NEES JOHN , HOU BIXUE
发明人： MOUROU GERARD A , GALVANAUSKAS ALMANTAS , THEOBALD WOLFGANG , NEES JOHN , HOU BIXUE
IPC分类号： G03F20060101 , G03F7/20 , G03F
CPC分类号： B82Y10/00 , G03F7/70033
摘要： A method and apparatus is disclosed for performing lithography operation. A fiber laser (18) is provided that generates laser light that is used by adaptive optics (20) to focus the laser light onto a plasma target (30) to generate plasma as a source of EUV radiation.
摘要翻译：公开了一种执行光刻操作的方法和装置。提供了一种光纤激光器（18），其生成由自适应光学器件（20）使用以将激光聚焦到等离子体靶（30）上以产生作为EUV辐射源的等离子体的激光。

3. 发明申请

WO2007034317A3 OPTICAL PULE AMPLIFIER WITH HIGH PEAK AND HIGH AVERAGE POWER 审中-公开
标题翻译：具有高峰值和高平均功率的光学PUL放大器
公开(公告)号：WO2007034317A3
公开(公告)日：2007-07-12
申请号：PCT/IB2006002657
申请日：2006-09-21
申请人： ECOLE POLYTECH , MOUROU GERARD , GALVANAUSKAS ALMANTAS , HULIN DANIELE
发明人： MOUROU GERARD , GALVANAUSKAS ALMANTAS , HULIN DANIELE
IPC分类号： H01S3/23 , H01S3/067 , H05H1/22
CPC分类号： H01S3/2383 , H01S3/0057 , H01S3/06758
摘要： The invention relates to an optical pulse amplifier (51) comprising - a first optical fiber amplifier (52a) adapted to receive an input pulse, - a splitter (54a, 54b, 54c) connected to said first optical fiber, said splitter having a plurality of outputs; - a plurality of optical fiber amplifiers (52b, 52c, 52d, 57) , each optical fiber amplifier being connected to one of said plurality of outputs, said plurality of optical fiber amplifiers generating a plurality of output pulse signals. The optical pulse amplifier of the invention has the advantage that it can produce high peak and high average power.
摘要翻译：本发明涉及一种光脉冲放大器（51），包括：适于接收输入脉冲的第一光纤放大器（52a），连接到所述第一光纤的分路器（54a，54b，54c），所述分路器具有多个的产出; - 多个光纤放大器（52b，52c，52d，57），每个光纤放大器连接到所述多个输出中的一个，所述多个光纤放大器产生多个输出脉冲信号。本发明的光脉冲放大器具有能够产生高峰值和高平均功率的优点。

4. 发明申请

WO2004097520A2 FIBER LASER-BASED EUV-LITHOGRAPHY 审中-公开
标题翻译：基于光纤激光的EUV-LITHOGRAPHY
公开(公告)号：WO2004097520A2
公开(公告)日：2004-11-11
申请号：PCT/US2004/012714
申请日：2004-04-26
申请人： THE REGENTS OF THE UNIVERSITY OF MICHIGAN , MOUROU, Gerard, A. , GALVANAUSKAS, Almantas , THEOBALD, Wolfgang , NEES, John , HOU, Bixue
发明人： MOUROU, Gerard, A. , GALVANAUSKAS, Almantas , THEOBALD, Wolfgang , NEES, John , HOU, Bixue
IPC分类号： G03F
CPC分类号： B82Y10/00 , G03F7/70033
摘要： A method and apparatus is disclosed for performing lithography operation. A fiber laser (18) is provided that generates laser light that is used by adaptive optics (20) to focus the laser light onto a plasma target (30) to generate plasma as a source of EUV radiation.
摘要翻译：公开了一种执行光刻操作的方法和装置。提供了一种光纤激光器（18），其生成由自适应光学器件（20）使用以将激光聚焦到等离子体靶（30）上以产生作为EUV辐射源的等离子体的激光。

5. 发明申请

WO2013014536A3 METHOD FOR THE PRODUCTION OF ULTRASHORT AND ULTRAHIGH PEAK POWER LASER PULSES AND SYSTEM FOR PUTTING INTO PRACTICE THIS METHOD 审中-公开
标题翻译：用于生产超声波和超高功率激光脉冲的方法和用于实施本方法的系统
公开(公告)号：WO2013014536A3
公开(公告)日：2013-04-04
申请号：PCT/IB2012001803
申请日：2012-07-26
申请人： ECOLE POLYTECH , MOUROU GERARD , TAJIMA TOSHIKI , FISCH NATHANIEL J , MALKIN VLADIMIR M , TOROKER ZEEV
发明人： MOUROU GERARD , TAJIMA TOSHIKI , FISCH NATHANIEL J , MALKIN VLADIMIR M , TOROKER ZEEV
IPC分类号： H01S3/00 , G02F1/35 , H01S3/23 , H01S3/30
CPC分类号： H01S3/0057 , G02F1/3536 , H01S3/10053 , H01S3/2391 , H01S3/305
摘要： The invention concerns a method for producing ultrashort and ultrahigh peak power laser pulses and a system for putting into practice this method. The production of ultrashort and ultrahigh peak power laser pulses is implemented by amplifying and compressing relatively long and low energy laser pulses to such ultra short and ultrahigh peak power pulses, and the use of the plasma compression technique for producing ultrashort and ultrahigh peak power pulses having a duration in the range of 20 femtoseconds (fs) or less and an energy of at least 10 Kilojoule (kJ), wherein a pump pulse (PP) in the order of picoseconds (ps) and a seed pulse (SS) are applied to the plasma cell (PLC), which are synchronized with one another and adapted to the plasma cell.
摘要翻译：本发明涉及一种用于制造超短距离和超高峰值功率激光脉冲的方法以及用于实践该方法的系统。通过将相对较长和低能量的激光脉冲放大并压缩到这样的超短和超高峰值功率脉冲，并采用等离子体压缩技术来生产超短和超高峰值功率脉冲，从而实现超短波和超高峰值功率激光脉冲的生产，持续时间在20飞秒（fs）或更小的范围内，能量至少为10千焦耳（kJ），其中以皮秒（ps）和种子脉冲（SS）的顺序施加泵脉冲（PP）等离子体电池（PLC），其彼此同步并适应于等离子体电池。

6. 发明申请

WO2004068553A3 METHOD FOR FORMING NANOSCALE FEATURES 审中-公开
标题翻译：形成纳米特征的方法
公开(公告)号：WO2004068553A3
公开(公告)日：2005-05-19
申请号：PCT/US2004002212
申请日：2004-01-26
申请人： UNIV MICHIGAN , HUNT ALAN J , MOUROU GERARD , JOGLEKAR AJIT P , MEYHOFER EDGAR , NEES JOHN A , SPOONER GREG
发明人： HUNT ALAN J , MOUROU GERARD , JOGLEKAR AJIT P , MEYHOFER EDGAR , NEES JOHN A , SPOONER GREG
IPC分类号： B23K26/06 , B23K26/073 , B23K26/36 , B81C1/00
CPC分类号： B23K26/06 , B23K26/0624 , B23K26/0665 , B23K26/073 , B23K26/361
摘要： Here is presented a versatile technique for machining of nanometer-scale features using tightly-focused ultrashort laser pulses. By the invention, the size of features can be reduced far below the wavelength of light, thus enabling nanomachining of a wide range of materials. The features may be extremely small (
摘要翻译：这里介绍了一种用于使用紧密聚焦的超短激光脉冲加工纳米级特征的多功能技术。通过本发明，特征的尺寸可以降低到远低于光的波长，从而使得能够对宽范围的材料进行纳米加工。这些特征可能非常小（<20nm），并且具有高度可重复性。

7. 发明申请

WO2004068553A2 METHOD FOR FORMING NANOSCALE FEATURES 审中-公开
标题翻译：形成纳米特征的方法
公开(公告)号：WO2004068553A2
公开(公告)日：2004-08-12
申请号：PCT/US2004/002212
申请日：2004-01-26
申请人： THE REGENTS OF THE UNIVERSITY OF MICHIGAN , HUNT, Alan, J. , MOUROU, Gerard , JOGLEKAR, Ajit, P. , MEYHOFER, Edgar , NEES, John, A. , SPOONER, Greg
发明人： HUNT, Alan, J. , MOUROU, Gerard , JOGLEKAR, Ajit, P. , MEYHOFER, Edgar , NEES, John, A. , SPOONER, Greg
IPC分类号： H01L
CPC分类号： B23K26/06 , B23K26/0624 , B23K26/0665 , B23K26/073 , B23K26/361
摘要： Here is presented a versatile technique for machining of nanometer-scale features using tightly-focused ultrashort laser pulses. By the invention, the size of features can be reduced far below the wavelength of light, thus enabling nanomachining of a wide range of materials. The features may be extremely small (
摘要翻译：本文介绍了使用紧密聚焦的超短激光脉冲加工纳米尺度特征的通用技术。通过本发明，特征的尺寸可以远低于光的波长，从而能够对各种材料进行纳米加工。特征可能非常小（<20nm），并且具有高度可重现性。

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