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    • 1. 发明授权
    • Process for photoimaging a three dimensional printed circuit substrate
    • 用于三维印刷电路基板的光学成像的方法
    • US5001038A
    • 1991-03-19
    • US121326
    • 1987-11-16
    • Dale W. DorinskiM. William Branan, Jr.Glenn F. UrbishAnthony B. SuppelsaMartin J. McKinleyDouglas W. Hendricks
    • Dale W. DorinskiM. William Branan, Jr.Glenn F. UrbishAnthony B. SuppelsaMartin J. McKinleyDouglas W. Hendricks
    • G03F7/20H05K1/00H05K3/00
    • G03F7/70283G03F7/20G03F7/2022G03F7/70333G03F7/70466H05K3/0082H05K1/0284H05K2203/056H05K3/0002
    • Printed circuit patterns are photolithographically defined on a three dimensional "projection" surface (204) of a printed circuit substrate (202) using a projection image aligner and a photomask (210) having a planar image (210A). The geometry of the projection is restricted such that the slope of the projection surface, as measured at any point on the projection surface and relative to a reference plane which is parallel to the focal plane of the projection image aligner, is less than 90 degrees. A solution of photoresist includes a photoresist solvent, a fluorosurfactant and an aromatic hydrocarbon solvent, and is preferably sprayed over the projection surface. In one method of manufacture, the printed circuit substrate is moved from one position to another during the exposure of the photoresist layer (206). In another method, after a first portion of the projection surface is exposed by a first photomask (502), a second photomask (504) is substituted and the remainder of the projection surface exposed. In still another method, a photomask having a plurality of planar images (604A, 604B and 606A) each image being positioned parallel to the others but separated by a small distance, is used to simultaneously exposed the entire projection surface.
    • 使用投影图像对准器和具有平面图像(210A)的光掩模(210)将印刷电路图案光刻地限定在印刷电路基板(202)的三维“投影”表面(204)上。 突起的几何形状受到限制,使得投影表面的倾斜度(在投影表面上的任何点上相对于平行于投影图像对准器的焦平面的参考平面)测得的小于90度。 光致抗蚀剂溶液包括光致抗蚀剂溶剂,含氟表面活性剂和芳族烃溶剂,并且优选地喷射在投影表面上。 在一种制造方法中,在光致抗蚀剂层(206)的曝光期间,印刷电路基板从一个位置移动到另一个位置。 在另一种方法中,在投影表面的第一部分被第一光掩模(502)暴露之后,替换第二光掩模(504),并且突出表面的其余部分被暴露。 在另一种方法中,使用具有多个平面图像(604A,604B和606A)的光掩模,每个图像平行于另一个平行而被分开一小段距离,以同时曝光整个投影表面。
    • 4. 发明授权
    • Optically controlled radio
    • 光控无线电
    • US5173795A
    • 1992-12-22
    • US730021
    • 1991-07-12
    • M. William Branan, Jr.John D. Wetters
    • M. William Branan, Jr.John D. Wetters
    • H04B10/00
    • H04B10/00
    • A radio device (10) receives optical control signals from a remote control apparatus (22). In one embodiment, both the radio device and remote control apparatus include optical transmitters (58) and receivers (60) so that control and information signals may provided to and received from the radio's operator. In another embodiment, the radio () provides a light signal to the remote control apparatus () that either permits or prohibits (80) the light signal's return to the radio. In this way, the presence or absence of the return light signal comprises optical control signals to control the radio's operation.
    • 无线电设备(10)从遥控设备(22)接收光控制信号。 在一个实施例中,无线电设备和远程控制设备都包括光发射器(58)和接收器(60),使得可以向无线电设备的操作者提供控制和信息信号。 在另一个实施例中,无线电()向远程控制设备()提供光信号,其允许或禁止(80)光信号返回无线电。 以这种方式,返回光信号的存在或不存在包括控制无线电操作的光控制信号。