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1. 发明申请

WO0186282A8 CLEANLINESS EVALUATION IN SPUTTER TARGETS USING PHASE 审中-公开
标题翻译：使用相位的SPUTTER目标中的清洁度评估
公开(公告)号：WO0186282A8
公开(公告)日：2003-02-06
申请号：PCT/US0114403
申请日：2001-05-04
申请人： TOSOH SMD INC , LEYBOVICH ALEXANDER
发明人： LEYBOVICH ALEXANDER
IPC分类号： G01N29/04 , C23C14/34 , G01N29/11 , G01N29/24 , G01N29/30 , G01N29/34 , G01N29/44 , G01N29/48 , G01N29/18
CPC分类号： G01N29/4427 , G01N29/11 , G01N29/2456 , G01N29/30 , G01N29/343 , G01N29/4445 , G01N29/4463 , G01N29/4472 , G01N29/48 , G01N2291/012 , G01N2291/0289 , G01N2291/044 , G01N2291/2695
摘要： An improved method and apparatus for non-destructive cleanliness evaluation in sputter targets using radio frequency waveform phase change and amplitude detection is disclosed. The apparatus acquires phase change and amplitude for a plurality of data points. The method disclosed for characterizing the sputter target material (52) employs the phase change and amplitude magnitude data for calculating cleanliness factors and generating pareto histograms.
摘要翻译：公开了一种用于使用射频波形相位变化和振幅检测的溅射靶中非破坏性清洁度评估的改进方法和装置。该装置获取多个数据点的相位变化和振幅。用于表征溅射靶材料（52）的方法采用用于计算清洁度因子和产生帕累托直方图的相位变化幅度数据。

2. 发明申请

WO2002081767A2 A METHOD FOR DETERMINING A CRITICAL SIZE FOR AN ALUMINUM OXIDE INCLUSION IN AN ALUMINUM OR AN ALUMINUM ALLOY SPUTTER TARGET 审中-公开
标题翻译：用于确定铝或铝合金溅射目标中包含的关键尺寸的方法
公开(公告)号：WO2002081767A2
公开(公告)日：2002-10-17
申请号：PCT/US2002/010516
申请日：2002-04-04
申请人： TOSOH SMD, INC. , WICKERSHAM, Charles, E., Jr. , POOLE, John, E. , LEYBOVICH, Alexander , ZHU, Lin
发明人： WICKERSHAM, Charles, E., Jr. , POOLE, John, E. , LEYBOVICH, Alexander , ZHU, Lin
IPC分类号： C23C
CPC分类号： H01J37/3426 , C23C14/3414
摘要： The present invention relates to a method for determining a critical size for a diameter of an Al 2 O 3 inclusion (38) in an Al or Al alloy sputter target (42) to prevent arcing during sputtering thereof. This method includes providing a sputtering apparatus having an argon plasma. The plasma has a plasma sheath of a known thickness during sputtering under a selected sputtering environment of an Al or Al alloy sputter target having an Al 2 O 3 inclusion-free sputtering surface. When the thickness of the sheath is known for a selected sputtering environment, the critical size of an Al 2 O 3 inclusion (38) can be determined based upon the thickness of the sheath. More specifically, the diameter of an Al 2 O 3 inclusion (38) in an Al or Al alloy sputter target (42) must be less than the thickness of the plasma sheath during sputtering under the selected sputtering environment to inhibit arcing.
摘要翻译：本发明涉及一种用于确定Al或Al合金溅射靶（42）中的Al 2 O 3夹杂物（38）的直径的临界尺寸的方法，以防止溅射期间的电弧。该方法包括提供具有氩等离子体的溅射装置。在Al或Al合金溅射靶的选择溅射环境下，溅射中等离子体具有已知厚度的等离子体护套，其具有不含Al 2 O 3的不含杂质的溅射表面。当对于所选择的溅射环境已知护套的厚度时，可以基于护套的厚度确定Al 2 O 3夹杂物（38）的临界尺寸。更具体地，Al或Al合金溅射靶（42）中的Al 2 O 3夹杂物（38）的直径必须小于在所选择的溅射环境下溅射期间等离子体护套的厚度以抑制电弧。

3. 发明申请

WO2004097401A1 SYSTEMS AND METHODS FOR NON-CONTACT MEASURING SPUTTERING TARGET THICKNESS ULTRASONIICS 审中-公开
标题翻译：非接触式测量目标厚度超声波的系统和方法
公开(公告)号：WO2004097401A1
公开(公告)日：2004-11-11
申请号：PCT/US2004/012292
申请日：2004-04-21
申请人： TOSOH SMD, INC. , LEYBOVICH, Alexander
发明人： LEYBOVICH, Alexander
IPC分类号： G01N33/00
CPC分类号： G01B17/025 , C23C14/3407 , G01B17/02 , G01D5/48
摘要： A method and apparatus for ultrasonically measuring the thickness of sputter targets of varying shapes. An immersion bubble (32) and transducer (36) provide pulses to a front surface (24) and a front surface/bonded surface (26) interface of a target. The pulses generate reflected echoes that are converted to electric signals. By measuring the difference in time that the electric signals occur the thickness of the target may be approximated to identify whether the thickness of the target is appropriate for use. The system includes a sputter track (15), specimen (20), chuck (28), nozzle (34), columns (60), opening (62), inlet (70), cable (58), gauge (59), turret (90), position (92), remote PC controller (110), electrical line (112), and rear part (84).
摘要翻译：一种用于超声波测量不同形状的溅射靶的厚度的方法和装置。浸入式气泡（32）和换能器（36）向靶的前表面（24）和前表面/接合表面（26）界面提供脉冲。脉冲产生被转换为电信号的反射回波。通过测量电信号发生的时间差，可以近似目标的厚度以识别目标的厚度是否适合使用。该系统包括溅射轨道（15），试样（20），卡盘（28），喷嘴（34），柱（60），开口（62），入口（70），电缆（58）转台（90），位置（92），远程PC控制器（110），电线（112）和后部（84）。

4. 发明申请

WO02081767A3 A METHOD FOR DETERMINING A CRITICAL SIZE OF AN INCLUSION IN ALUMINUM OR ALUMINUM ALLOY SPUTTERING TARGET 审中-公开
标题翻译：一种确定铝或铝合金溅射靶材夹杂物临界尺寸的方法
公开(公告)号：WO02081767A3
公开(公告)日：2002-12-05
申请号：PCT/US0210516
申请日：2002-04-04
申请人： TOSOH SMD INC , WICKERSHAM CHARLES E JR , POOLE JOHN E , LEYBOVICH ALEXANDER , ZHU LIN
发明人： WICKERSHAM CHARLES E JR , POOLE JOHN E , LEYBOVICH ALEXANDER , ZHU LIN
IPC分类号： C23C14/34
CPC分类号： H01J37/3426 , C23C14/3414
摘要： The present invention relates to a method for determining a critical size for a diameter of an Al2O3 inclusion (38) in an Al or Al alloy sputter target (42) to prevent arcing during sputtering thereof. This method includes providing a sputtering apparatus having an argon plasma. The plasma has a plasma sheath of a known thickness during sputtering under a selected sputtering environment of an Al or Al alloy sputter target having an Al2O3 inclusion-free sputtering surface. When the thickness of the sheath is known for a selected sputtering environment, the critical size of an Al2O3 inclusion (38) can be determined based upon the thickness of the sheath. More specifically, the diameter of an Al2O3 inclusion (38) in an Al or Al alloy sputter target (42) must be less than the thickness of the plasma sheath during sputtering under the selected sputtering environment to inhibit arcing.
摘要翻译：本发明涉及一种用于确定Al或Al合金溅射靶（42）中的Al2O3夹杂物（38）的直径的临界尺寸的方法，以防止溅射期间的电弧放电。该方法包括提供具有氩等离子体的溅射设备。在具有不含Al 2 O 3夹杂物的溅射表面的Al或Al合金溅射靶的选定溅射环境下，等离子体具有已知厚度的等离子体鞘。当对于选择的溅射环境已知鞘的厚度时，可基于鞘的厚度确定Al2O3夹杂物（38）的临界尺寸。更具体地，Al或Al合金溅射靶（42）中的Al 2 O 3夹杂物（38）的直径必须小于溅射期间溅射过程中等离子体鞘的厚度以抑制电弧放电。

5. 发明申请

WO2011102896A1 SPUTTER TARGET 审中-公开
标题翻译：射击目标
公开(公告)号：WO2011102896A1
公开(公告)日：2011-08-25
申请号：PCT/US2011/000285
申请日：2011-02-16
申请人： TOSOH SMD, INC. , IVANOV, Eugene, Y. , LEYBOVICH, Alexander , RIZER, John
发明人： IVANOV, Eugene, Y. , LEYBOVICH, Alexander , RIZER, John
IPC分类号： C23C14/34
CPC分类号： C23C14/3407 , H01J37/3423 , H01J37/3426 , H01J37/3435 , Y10T29/49826
摘要： In one aspect of the invention, a sputter target is provided comprising a backing plate (40) comprising a front surface and a back surface; and a sputtering plate mounted on said backing plate, the sputtering plate comprising a sputtering surface and a back surface. At least one of the back surface of the sputtering plate, the front surface of the backing plate, or the back surface of the backing plate has at least one groove (30) that is shaped and sized to correspond to an observed region of higher sputtering of the sputtering plate relative to an adjacent area of the sputtering plate. An insert (50) is placed in the groove (s). The backing plate comprises a first material, the sputtering plate comprises a second material, and an insert comprises a third material. In yet another aspect of the sputter target, a method of controlling the electromagnetic properties of a sputter target is provided.
摘要翻译：在本发明的一个方面，提供一种溅射靶，其包括一个包括前表面和后表面的背板（40）以及安装在所述背板上的溅射板，所述溅射板包括溅射表面和背面。溅射板的后表面，背板的前表面或背板的后表面中的至少一个具有至少一个凹槽（30），其形状和尺寸被设计成对应于较高溅射的观察区域的溅射板相对于溅射板的相邻区域。插入件（50）放置在凹槽中。背板包括第一材料，溅射板包括第二材料，并且插入件包括第三材料。在溅射靶的另一方面，提供了一种控制溅射靶的电磁特性的方法。

6. 发明申请

WO03014718A3 METHOD AND APPARATUS FOR NON-DESTRUCTIVE TARGET CLEANLINESS CHARACTERIZATION BY TYPES OF FLAWS SORTED BY SIZE AND LOCATION 审中-公开
标题翻译：用尺寸和位置分类的缺陷类型进行非破坏性目标清洁度表征的方法和设备
公开(公告)号：WO03014718A3
公开(公告)日：2003-05-08
申请号：PCT/US0223362
申请日：2002-07-23
申请人： TOSOH SMD INC , LEYBOVICH ALEXANDER
发明人： LEYBOVICH ALEXANDER
IPC分类号： G01N29/04 , C23C14/34 , C23C14/56 , G01N29/11 , G01N29/30 , G01N29/34 , G01N29/44 , G01N29/48 , G01R33/465 , G01N24/00 , B07C5/00 , C23C14/00 , G01N29/00 , G01N33/00
CPC分类号： G01N29/11 , C23C14/3414 , C23C14/564 , G01N29/30 , G01N29/341 , G01N29/4445 , G01N29/48 , G01N2291/015 , G01N2291/0231 , G01N2291/0289 , G01N2291/044 , G01N2291/101 , G01N2291/2698 , G01R33/465
摘要： A preferred, non-destructive method for characterizing sputter target cleanliness includes the steps of sequentially irradiating the test sample (52') with sonic energy (62') predominantly of target sputter track areas; detecting echoes (64') induced by the sonic energy (62'); and discriminating texture-related backscattering noise from the echoes (64') to obtain modified amplitude signals. These modified amplitude signals are compared with one or more calibration values so as to detect flaw data points at certain positions or locations where the comparison indicates the presence of at least one flaw (72'). Most preferably, groups of the flaw data pixels corresponding to single large flaws are bound together so as to generate an adjusted set of flaw data points in which each group is replaced with a single, most significant data point. The adjusted set of flaw data points is used to calculate one or more cleanliness factors, or to plot a histogram, which characterizes the cleanliness sample.
摘要翻译：用于表征溅射靶清洁度的优选的非破坏性方法包括以下步骤：主要由目标溅射轨道区域以声能（62'）顺序照射测试样品（52'）; 检测由声能（62'）引起的回声（64'）; 并从回波（64'）中识别与纹理相关的后向散射噪声以获得修改后的振幅信号。将这些经修改的振幅信号与一个或多个校准值进行比较，以便在比较指示存在至少一个缺陷（72'）的某些位置或位置处检测缺陷数据点。最优选地，将对应于单个大缺陷的缺陷数据像素组绑定在一起，以便生成经调整的一组缺陷数据点，其中每个组被替换为单个最重要的数据点。调整后的一组缺陷数据点用于计算一个或多个清洁度因子，或绘制表征清洁度样本的直方图。

7. 发明申请

WO2003014718A2 METHOD AND APPARATUS FOR NON-DESTRUCTIVE TARGET CLEANLINESS CHARACTERIZATION BY TYPES OF FLAWS SORTED BY SIZE AND LOCATION 审中-公开
标题翻译：通过尺寸和位置分类的不同类型的非破坏性目标清洁特性的方法和装置
公开(公告)号：WO2003014718A2
公开(公告)日：2003-02-20
申请号：PCT/US2002/023362
申请日：2002-07-23
申请人： TOSOH SMD, INC. , LEYBOVICH, Alexander
发明人： LEYBOVICH, Alexander
IPC分类号： G01N24/00
CPC分类号： G01N29/11 , C23C14/3414 , C23C14/564 , G01N29/30 , G01N29/341 , G01N29/4445 , G01N29/48 , G01N2291/015 , G01N2291/0231 , G01N2291/0289 , G01N2291/044 , G01N2291/101 , G01N2291/2698 , G01R33/465
摘要： A preferred, non-destructive method for characterizing sputter target cleanliness includes the steps of sequentially irradiating the test sample with sonic energy predominantly of target sputter track areas; detecting echoes induced by the sonic energy; and discriminating texture-related backscattering noise from the echoes to obtain modified amplitude signals. These modified amplitude signals are compared with one or more calibration values so as to detect flaw data points at certain positions or locations where the comparison indicates the presence of at least one flaw. Most preferably, groups of the flaw data pixels corresponding to single large flaws are bound together so as to generate an adjusted set of flaw data points in which each group is replaced with a single, most significant data point. The adjusted set of flaw data point is used to calculate one or more cleanliness factors, or to plot a histogram, which characterizes the cleanliness of the sample.
摘要翻译：用于表征溅射靶清洁度的优选的非破坏性方法包括以主要为靶溅射轨道区域的声能（62'）顺序照射测试样品（52'）的步骤; 检测由声能（62'）引起的回波（64'）; 以及从回波（64'）辨别纹理相关的后向散射噪声以获得修改的振幅信号。将这些修改的幅度信号与一个或多个校准值进行比较，以便在特定位置或位置处检测缺陷数据点，其中比较指示存在至少一个缺陷（72'）。最优选地，对应于单个大缺陷的缺陷数据像素的组被绑定在一起，以便生成经过调整的缺陷数据点集合，其中每个组被替换为单个最重要的数据点。经调整的缺陷数据点集合用于计算一个或多个清洁度因子，或绘制描绘清洁度样本的直方图。

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