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1. 发明授权

US06332924B1 Photoresist dispensing device 失效
标题翻译：光刻胶分配装置
公开(公告)号：US06332924B1
公开(公告)日：2001-12-25
申请号：US09506813
申请日：2000-02-18
申请人： Kyoung Sup Shim , Jong Suk Kim
发明人： Kyoung Sup Shim , Jong Suk Kim
IPC分类号： B05C502
CPC分类号： G03F7/162 , B05C11/08 , F16K23/00
摘要： A photoresist dispensing device for use in applying a metered amount of photoresist on a wafer comprises, a photoresist storage tank, a nozzle for spraying the photoresist on the wafer, a feeder unit for drawing a metered amount of the photoresist out of the storage tank and discharging it through the nozzle, a pneumatic control unit for controlling the operation of the feeder unit with the use of pressurized air; and a filter disposed in between the storage tank and the feeder unit for removing alien matters present the photoresist. The feeder unit includes a base having an inlet port leading to the storage tank, an outlet port leading to the nozzle and first through third intermediate passageways interconnecting the inlet and outlet ports, a first cutoff valve mounted on the base at a position between the inlet port and the first intermediate passageway, a diaphragm pump attached to the base at a position between the first and second intermediate passageways, a second cutoff valve secured to the base at a position between the second and third intermediate passageways, and a suck-back valve affixed to the base at a position between the third intermediate passageway and the outlet port.
摘要翻译：用于在晶片上施加计量的光致抗蚀剂的光致抗蚀剂分配装置包括：光致抗蚀剂存储罐，用于在晶片上喷射光致抗蚀剂的喷嘴;用于将定量的光致抗蚀剂从储罐中拉出的进料单元;以及通过喷嘴排出气动控制单元，用于通过使用加压空气来控制供料单元的操作; 以及设置在储存罐和供给单元之间用于除去存在光致抗蚀剂的异物的过滤器。给料单元包括一个底座，其具有通向储罐的入口端口，通向喷嘴的出口和连接入口和出口的第一至第三中间通道;第一截流阀，安装在基座上的入口端口和第一中间通道，在第一和第二中间通道之间的位置附接到基座的隔膜泵，在第二和第三中间通道之间的位置处固定到基座的第二截止阀，以及回吸阀在第三中间通道和出口之间的位置处固定到基座。

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