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1. 发明授权

US08738174B2 Substrate processing apparatus and method for loading and unloading substrates 有权
标题翻译：用于装载和卸载基板的基板处理装置和方法
公开(公告)号：US08738174B2
公开(公告)日：2014-05-27
申请号：US13161824
申请日：2011-06-16
申请人： Jaehyun You , Kyo Woog Koo
发明人： Jaehyun You , Kyo Woog Koo
IPC分类号： G06F7/00 , G06F19/00 , B65G53/46 , B65G21/02 , B65H1/00
CPC分类号： H01L21/67736 , H01L21/6773 , H01L31/1876 , Y02E10/50 , Y02P70/521
摘要： Provided is a substrate processing apparatus for loading substrates such as solar cell substrates on a tray in substrate processing equipment for processing a large number of substrates. The substrate processing apparatus includes: a tray carrying unit configured to receive and carry a tray; a substrate loading conveyor unit on which substrates to be loaded on a tray are arranged in a line; a substrate unloading conveyor unit on which substrates unloaded from a tray are arranged in a line; a first substrate carrying robot configured to pick up substrates from the substrate loading conveyor unit and carry the substrates to a tray placed on the tray carrying unit; and a second substrate carrying robot configured to pick up substrates from a tray placed on the tray carrying unit and carry the substrates to the substrate unloading conveyor unit.
摘要翻译：提供了一种用于在基板处理设备中的托盘上装载诸如太阳能电池基板的基板的基板处理装置，用于处理大量基板。基板处理装置包括：托盘承载单元，其构造成接收和托运托盘; 基板装载传送单元，其上装载在托盘上的基板布置在其上; 基板卸载输送单元，其上从托盘卸载的基板排列成一行; 第一基板承载机器人，其被配置为从所述基板装载传送单元拾取基板，并将所述基板运送到放置在所述托盘承载单元上的托盘; 以及第二基板承载机器人，其构造成从放置在所述托盘承载单元上的托盘拾取基板，并将所述基板运送到所述基板卸载输送单元。

2. 发明授权

US08721834B2 Apparatus for treating substrate 有权
标题翻译：用于处理基材的设备
公开(公告)号：US08721834B2
公开(公告)日：2014-05-13
申请号：US11524320
申请日：2006-09-21
申请人： Kyo-Woog Koo , Jeong-Min Kim
发明人： Kyo-Woog Koo , Jeong-Min Kim
IPC分类号： H01L21/306
CPC分类号： H01L21/67051 , H01L21/6708
摘要： There is provided an apparatus for treating a substrate using a plurality of treatment solutions in sequence. The apparatus includes treatment liquid collecting vessels for separately collecting used treatment solutions, and an exhaust member for separately discharging pollutant gases generated during a process.
摘要翻译：提供了使用多个处理液依次处理基板的装置。该设备包括用于分别收集使用的处理溶液的处理液收集容器和用于分别排出在处理过程中产生的污染气体的排气构件。

3. 发明授权

US08256774B2 Chucking member and spin head and method for chucking substrate using the chucking member 有权
标题翻译：夹头构件和旋转头以及使用夹紧构件夹持衬底的方法
公开(公告)号：US08256774B2
公开(公告)日：2012-09-04
申请号：US11896351
申请日：2007-08-31
申请人： Jung Keun Cho , Kyo-Woog Koo , Bo Ram Chan Sung
发明人： Jung Keun Cho , Kyo-Woog Koo , Bo Ram Chan Sung
IPC分类号： B23B31/103
CPC分类号： B23B31/1269 , B23B2265/12 , H01L21/68728 , Y10T279/18
摘要： A chucking member configured to chuck the edge of a substrate includes a chucking pin which is eccentric from the rotation center. The chucking pin has a streamline shape and includes a first front-end portion disposed at the front end relative to the flow of an air current generated by the rotation of the substrate and a first back-end portion disposed at the back end relative to the flow of the air current. The first front-end portion includes a first tip, and the first front-end portion has a round shape.
摘要翻译：构造成夹持基板的边缘的夹紧构件包括从旋转中心偏心的夹紧销。夹紧销具有流线形状，并且包括相对于由基板的旋转产生的气流的流动而位于前端的第一前端部分和设置在后端相对于基板的第一后端部分气流的流动。第一前端部包括第一末端，第一前端部具有圆形。

4. 发明申请

US20110313565A1 Substrate Processing Apparatus And Method For Loading And Unloading Substrates 有权
标题翻译：基板加工装置及基板卸载方法
公开(公告)号：US20110313565A1
公开(公告)日：2011-12-22
申请号：US13161824
申请日：2011-06-16
申请人： Jaehyun Yoo , Kyo Woog Koo
发明人： Jaehyun Yoo , Kyo Woog Koo
IPC分类号： B65G49/00 , G06F17/00
CPC分类号： H01L21/67736 , H01L21/6773 , H01L31/1876 , Y02E10/50 , Y02P70/521
摘要： Provided is a substrate processing apparatus for loading substrates such as solar cell substrates on a tray in substrate processing equipment for processing a large number of substrates. The substrate processing apparatus includes: a tray carrying unit configured to receive and carry a tray; a substrate loading conveyor unit on which substrates to be loaded on a tray are arranged in a line; a substrate unloading conveyor unit on which substrates unloaded from a tray are arranged in a line; a first substrate carrying robot configured to pick up substrates from the substrate loading conveyor unit and carry the substrates to a tray placed on the tray carrying unit; and a second substrate carrying robot configured to pick up substrates from a tray placed on the tray carrying unit and carry the substrates to the substrate unloading conveyor unit.
摘要翻译：提供了一种用于在基板处理设备中的托盘上装载诸如太阳能电池基板的基板的基板处理装置，用于处理大量基板。基板处理装置包括：托盘承载单元，其构造成接收和托运托盘; 基板装载传送单元，其上装载在托盘上的基板布置在其上; 基板卸载输送单元，其上从托盘卸载的基板排列成一行; 第一基板承载机器人，其被配置为从所述基板装载传送单元拾取基板，并将所述基板运送到放置在所述托盘承载单元上的托盘; 以及第二基板承载机器人，其构造成从放置在所述托盘承载单元上的托盘拾取基板，并将所述基板运送到所述基板卸载输送单元。

5. 发明授权

US08038838B2 Spin head, method of operating the spin head and apparatus for treating substrates with the spin head 有权
标题翻译：旋转头，操作旋转头的方法和用旋转头处理底物的装置
公开(公告)号：US08038838B2
公开(公告)日：2011-10-18
申请号：US11945342
申请日：2007-11-27
申请人： Ju Won Kim , Ki Hoon Choi , Jung Keun Cho , Kyo Woog Koo , Jung Bong Choi
发明人： Ju Won Kim , Ki Hoon Choi , Jung Keun Cho , Kyo Woog Koo , Jung Bong Choi
IPC分类号： H01L21/68 , H01L21/027
CPC分类号： H01L21/68728 , H01L21/68742
摘要： A spin head includes chucking pins configures to chuck and unchuck a substrate. Contact portions of the chucking pins and the substrate are varied during a process to prevent a treating solution from remaining at the contact portions.
摘要翻译：旋转头包括夹紧销配置为卡盘和解锁基板。夹持销和基板的接触部分在防止处理溶液残留在接触部分的过程中变化。

6. 发明授权

US07934513B2 Facility with multi-storied process chamber for cleaning substrates and method for cleaning substrates using the facility 有权
标题翻译：具有用于清洁基板的多层处理室的设施和使用该设施来清洁基板的方法
公开(公告)号：US07934513B2
公开(公告)日：2011-05-03
申请号：US10574113
申请日：2004-10-07
申请人： Joung-Hyeon Lim , Jung-Keun Cho , Kyo-Woog Koo , In-Ho Bang , Woo-Young Kim , Man-Seok Oh , Hyun-Jong Kim
发明人： Joung-Hyeon Lim , Jung-Keun Cho , Kyo-Woog Koo , In-Ho Bang , Woo-Young Kim , Man-Seok Oh , Hyun-Jong Kim
IPC分类号： B08B3/00
CPC分类号： H01L21/67207 , H01L21/67017 , H01L21/67028 , H01L21/67051 , H01L21/67057 , H01L21/67173 , H01L21/67745
摘要： A facility for cleaning substrates such as semiconductor wafers includes a loading/unloading part, an aligning part where wafers are repositioned from a horizontal state to a vertical state, a cleaning part performing etchant-treating, rinsing, and drying processes for wafers and having a plurality of process chamber stacked, and an interface part where a transfer bath is disposed to transfer wafers between the process chambers. When the wafers are transferred between the process chamber, the transfer bath is filled with deionized water (DI water) to prevent their exposure to the air. Wafers drawn out of the loading/unlading part are repositioned from a horizontal state to a vertical state and are transferred to a first process chamber being one of the process chambers to be subjected to a part of processes. After the wafers are transferred to a second process chamber being the other one of the process chambers to be subjected to the other processes, they are repositioned from a vertical state to a horizontal state. That is, the wafers are transferred along a loop shape to be processed.
摘要翻译：用于清洁诸如半导体晶片的基板的设备包括装载/卸载部分，其中晶片从水平状态重新定位到垂直状态的对准部分，执行晶片的蚀刻处理，漂洗和干燥处理的清洁部件，并且具有多个处理室堆叠，以及界面部分，其中设置传送槽以在处理室之间传送晶片。当晶片在处理室之间转移时，转移浴用去离子水（DI水）填充，以防止它们暴露于空气中。从加载/非拉伸部分引出的晶片从水平状态重新定位到垂直状态，并被转移到作为处理室之一进行一部分处理的第一处理室。在将晶片转移到作为要进行其它处理的另一个处理室的第二处理室之后，它们从垂直状态重新定位到水平状态。也就是说，晶片沿着要被处理的环形传送。

7. 发明申请

US20080127888A1 SPIN HEAD, METHOD OF OPERATING THE SPIN HEAD AND APPARATUS FOR TREATING SUBSTRATES WITH THE SPIN HEAD 有权
标题翻译：旋转头，操作旋转头的方法和用于用旋转头处理衬底的装置
公开(公告)号：US20080127888A1
公开(公告)日：2008-06-05
申请号：US11945342
申请日：2007-11-27
申请人： Ju Won Kim , Ki Hoon Choi , Jung Keun Cho , Kyo Woog Koo , Jung Bong Choi
发明人： Ju Won Kim , Ki Hoon Choi , Jung Keun Cho , Kyo Woog Koo , Jung Bong Choi
IPC分类号： B05C13/02 , B05D3/12 , B05C5/00 , B05C13/00
CPC分类号： H01L21/68728 , H01L21/68742
摘要： A spin head includes chucking pins configures to chuck and unchuck a substrate. Contact portions of the chucking pins and the substrate are varied during a process to prevent a treating solution from remaining at the contact portions.
摘要翻译：旋转头包括夹紧销配置为卡盘和解锁基板。夹持销和基板的接触部分在防止处理溶液残留在接触部分的过程中变化。

8. 发明申请

US20080061519A1 Chucking member and spin head and method for chucking substrate using the chucking member 有权
标题翻译：夹头构件和旋转头以及使用夹紧构件夹持衬底的方法
公开(公告)号：US20080061519A1
公开(公告)日：2008-03-13
申请号：US11896351
申请日：2007-08-31
申请人： Jung Keun Cho , Kyo-Woog Koo , Bo Ram Chan Sung
发明人： Jung Keun Cho , Kyo-Woog Koo , Bo Ram Chan Sung
IPC分类号： B23B5/22
CPC分类号： B23B31/1269 , B23B2265/12 , H01L21/68728 , Y10T279/18
摘要： A chucking member configured to chuck the edge of a substrate includes a chucking pin which is eccentric from the rotation center. The chucking pin has a streamline shape and includes a first front-end portion disposed at the front end relative to the flow of an air current generated by the rotation of the substrate and a first back-end portion disposed at the back end relative to the flow of the air current. The first front-end portion includes a first tip, and the first front-end portion has a round shape.
摘要翻译：构造成夹持基板的边缘的夹紧构件包括从旋转中心偏心的夹紧销。夹紧销具有流线形状，并且包括相对于由基板的旋转产生的气流的流动而位于前端的第一前端部分和设置在后端相对于基板的第一后端部分气流的流动。第一前端部包括第一末端，第一前端部具有圆形。

9. 发明申请

US20080014358A1 Apparatus and method for treating substrate 有权
标题翻译：底物处理装置及方法
公开(公告)号：US20080014358A1
公开(公告)日：2008-01-17
申请号：US11809170
申请日：2007-05-31
申请人： Kyo-Woog Koo , Jung Keun Cho , Bo Ram Chan Sung
发明人： Kyo-Woog Koo , Jung Keun Cho , Bo Ram Chan Sung
IPC分类号： B05C13/00
CPC分类号： H01L21/67051 , H01L21/67028 , H01L21/67034
摘要： An apparatus is provided for supplying a plurality of chemicals or gases to the surface of a substrate to clean and dry the substrate. The apparatus includes a substrate support unit with a chuck on which a substrate is loaded, a bottom chamber having an open top and configured to surround the circumference of the chuck, a top chamber configured to open or close the top of the bottom chamber such that a drying treatment for the substrate is performed while the substrate is isolated from the outside, and an indirect injection nozzle installed at the edge of the top chamber and configured to inject drying fluid toward the center of the top chamber such that the drying fluid is indirectly injected to the substrate. According to the apparatus, it is possible to enhance a substrate drying efficiency, suppress external contamination, and prevent the formation of an oxide layer.
摘要翻译：提供了一种用于将多种化学物质或气体供应到基底表面以清洁和干燥基底的装置。该装置包括具有卡盘的基板支撑单元，其上装载有基板，底部室具有敞开的顶部并且构造成围绕卡盘的圆周;顶部腔室，其构造成打开或关闭底部腔室的顶部，使得在将基板从外部隔离的同时进行基板的干燥处理，以及间接注入喷嘴，其安装在顶部室的边缘并且被配置为朝向顶部室的中心注入干燥流体，使得干燥流体间接地注入基材。根据该装置，能够提高基板干燥效率，抑制外部污染，防止形成氧化物层。

10. 发明授权

US07918910B2 Unit for eliminating particles and apparatus for transferring a substrate having the same 有权
标题翻译：用于消除颗粒的单元和用于转移其的基板的装置
公开(公告)号：US07918910B2
公开(公告)日：2011-04-05
申请号：US12211234
申请日：2008-09-16
申请人： Young-Ki Ahn , Jae-Jeong Jeong , Bo-Ram-Chan Sung , Kyo-Woog Koo
发明人： Young-Ki Ahn , Jae-Jeong Jeong , Bo-Ram-Chan Sung , Kyo-Woog Koo
IPC分类号： B01D46/00
CPC分类号： B08B5/00 , H01L21/67017
摘要： In an apparatus for transferring a substrate, a partition wall is disposed in a vertical direction in a housing to divide an interior space of the housing into a first space and a second space. A pressure generating member divides the first space into an upper space and a lower space and moves in a vertical direction in the first space such that a positive pressure and a negative pressure are alternately generated in the upper space and the lower space. A substrate supporting member is movably disposed in the second space to support and to transfer the substrate. A plurality of gates is disposed on a side wall of the housing and the partition wall, and is opened and closed by the positive pressure and the negative pressure such that the particles are eliminated from the second space to an exterior space via the first space.
摘要翻译：在用于转移衬底的装置中，隔壁在壳体中沿垂直方向设置以将壳体的内部空间分成第一空间和第二空间。压力产生部件将第一空间分成上部空间和下部空间，并且在第一空间中沿垂直方向移动，使得在上部空间和下部空间中交替地产生正压力和负压。衬底支撑构件可移动地设置在第二空间中以支撑和转移衬底。多个门设置在壳体的侧壁和分隔壁上，并且通过正压力和负压打开和关闭，使得颗粒经由第一空间从第二空间移除到外部空间。

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