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    • 2. 发明申请
    • THIN FILM TRANSISTOR AND MANUFACTURING METHOD THEREOF
    • 薄膜晶体管及其制造方法
    • US20100012943A1
    • 2010-01-21
    • US12429125
    • 2009-04-23
    • Seung-Kyu ParkKunal Satyabhushan GirotraJong-Moo Huh
    • Seung-Kyu ParkKunal Satyabhushan GirotraJong-Moo Huh
    • H01L29/786H01L21/336
    • H01L27/1251H01L27/1248H01L29/66757H01L29/78675
    • The present invention relates to a thin film transistor and a manufacturing method thereof. A thin film transistor according to an exemplary embodiment of the present invention includes: a first electrode arranged on a substrate; a second electrode arranged on the substrate and separated from the first electrode; a first ohmic contact arranged on an upper surface of the first electrode; a second ohmic contact arranged on an upper surface of the second electrode; a first buffer member covering a lateral surface of the first electrode and the second electrode; a semiconductor member contacted with an upper surface of the first buffer member, and the first ohmic contact and the second ohmic contact; an insulating layer arranged on the semiconductor member; and a third electrode arranged on the insulating layer, and disposed on the semiconductor member.
    • 薄膜晶体管及其制造方法技术领域本发明涉及薄膜晶体管及其制造方法。 根据本发明的示例性实施例的薄膜晶体管包括:布置在基板上的第一电极; 布置在所述基板上并与所述第一电极分离的第二电极; 布置在所述第一电极的上表面上的第一欧姆接触; 布置在所述第二电极的上表面上的第二欧姆接触; 覆盖所述第一电极和所述第二电极的侧表面的第一缓冲部件; 与第一缓冲构件的上表面接触的半导体构件,以及第一欧姆接触和第二欧姆接触; 布置在所述半导体部件上的绝缘层; 以及布置在所述绝缘层上的第三电极,并且设置在所述半导体部件上。