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1. 发明授权

US08594826B2 Method and system for evaluating a machine tool operating characteristics 失效
标题翻译：用于评估机床操作特性的方法和系统
公开(公告)号：US08594826B2
公开(公告)日：2013-11-26
申请号：US13608032
申请日：2012-09-10
申请人： Ehud Aharoni , Robert J. Baseman , Ramona Kei , Oded Margalit , Kevin Mackey , Michal Rosen-Zvi , Raminderpal Singh , Noam Slonim , Hong Lin , Fateh A. Tipu , Adam D. Ticknor , Timothy M. McCormack
发明人： Ehud Aharoni , Robert J. Baseman , Ramona Kei , Oded Margalit , Kevin Mackey , Michal Rosen-Zvi , Raminderpal Singh , Noam Slonim , Hong Lin , Fateh A. Tipu , Adam D. Ticknor , Timothy M. McCormack
IPC分类号： G06F19/00
CPC分类号： G05B23/0216 , G05B23/0229 , G05B2219/32191 , G05B2219/32194 , G05B2219/45031 , G05B2219/50065 , Y02P90/22 , Y02P90/86 , Y10T409/309408
摘要： A method, a system and a computer program product suitable for use in a manufacturing environment comprising a multiplicity of nominally identical independent tools. A computing device generates a multi dimensional array of process trace data derived from at least one of the independent tools, wherein, the array includes data representing a first dimension comprising a list of steps in a manufacturing recipe and data representing a second dimension comprising a list of a set of sensors generating measurements from at least one of the independent tools. The computing device conducts an analysis on at least one preselected subset of the multi dimensional array for the purpose of evaluating at least one operating characteristic of at least one of the independent tools. The computing device presents results of the analysis via a set of hierarchically linked and browseable graphics.
摘要翻译：一种适用于制造环境的方法，系统和计算机程序产品，包括多个名义上相同的独立工具。计算设备生成从至少一个独立工具导出的过程跟踪数据的多维阵列，其中，所述阵列包括表示包括制造配方中的步骤列表的第一维度的数据和表示包括列表的第二维度的数据一组传感器从至少一个独立工具产生测量值。为了评估至少一个独立工具的至少一个操作特征，计算设备对多维阵列的至少一个预选子集进行分析。计算设备通过一组分层链接和可浏览的图形呈现分析结果。

2. 发明申请

US20130006406A1 METHOD AND SYSTEM FOR EVALUATING A MACHINE TOOL OPERATING CHARACTERISTICS 失效
标题翻译：用于评估机床工作特性的方法和系统
公开(公告)号：US20130006406A1
公开(公告)日：2013-01-03
申请号：US13608032
申请日：2012-09-10
申请人： Ehud Aharoni , Robert J. Baseman , Ramona Kei , Oded Margalit , Kevin Mackey , Michal Rosen-Zvi , Raminderpal Singh , Noam Slomin , Hong Lin , Fateh Ali Tipu , Adam Daniel Ticknor , Timothy M. McCormack
发明人： Ehud Aharoni , Robert J. Baseman , Ramona Kei , Oded Margalit , Kevin Mackey , Michal Rosen-Zvi , Raminderpal Singh , Noam Slomin , Hong Lin , Fateh Ali Tipu , Adam Daniel Ticknor , Timothy M. McCormack
IPC分类号： G05B19/18
CPC分类号： G05B23/0216 , G05B23/0229 , G05B2219/32191 , G05B2219/32194 , G05B2219/45031 , G05B2219/50065 , Y02P90/22 , Y02P90/86 , Y10T409/309408
摘要： A method, a system and a computer program product suitable for use in a manufacturing environment comprising a multiplicity of nominally identical independent tools. A computing device generates a multi dimensional array of process trace data derived from at least one of the independent tools, wherein, the array includes data representing a first dimension comprising a list of steps in a manufacturing recipe and data representing a second dimension comprising a list of a set of sensors generating measurements from at least one of the independent tools. The computing device conducts an analysis on at least one preselected subset of the multi dimensional array for the purpose of evaluating at least one operating characteristic of at least one of the independent tools. The computing device presents results of the analysis via a set of hierarchically linked and browseable graphics.
摘要翻译：一种适用于制造环境的方法，系统和计算机程序产品，包括多个名义上相同的独立工具。计算设备生成从至少一个独立工具导出的过程跟踪数据的多维阵列，其中，所述阵列包括表示包括制造配方中的步骤列表的第一维度的数据和表示包括列表的第二维度的数据一组传感器从至少一个独立工具产生测量值。为了评估至少一个独立工具的至少一个操作特征，计算设备对多维阵列的至少一个预选子集进行分析。计算设备通过一组分层链接和可浏览的图形呈现分析结果。

3. 发明申请

US20100249976A1 METHOD AND SYSTEM FOR EVALUATING A MACHINE TOOL OPERATING CHARACTERISTICS 有权
标题翻译：用于评估机床工作特性的方法和系统
公开(公告)号：US20100249976A1
公开(公告)日：2010-09-30
申请号：US12415348
申请日：2009-03-31
申请人： Ehud Aharoni , Robert J. Baseman , Ramona Kei , Oded Margalit , Kevin Mackey , Michal Rosen-Zvi , Raminderpal Singh , Noam Slonim , Hong Lin , Fateh All Tipu , Adam Daniel Ticknor , Timothy M. McCormack
发明人： Ehud Aharoni , Robert J. Baseman , Ramona Kei , Oded Margalit , Kevin Mackey , Michal Rosen-Zvi , Raminderpal Singh , Noam Slonim , Hong Lin , Fateh All Tipu , Adam Daniel Ticknor , Timothy M. McCormack
IPC分类号： G06F17/00
CPC分类号： G05B23/0216 , G05B23/0229 , G05B2219/32191 , G05B2219/32194 , G05B2219/45031 , G05B2219/50065 , Y02P90/22 , Y02P90/86 , Y10T409/309408
摘要： A method and system for evaluating a performance of a semiconductor manufacturing tool while manufacturing microelectronic devices are disclosed. At least one report is generated based on executions of at least one statistical test. The report includes at least one heat map having rows that correspond to sensors, columns that correspond to trace data obtained during recipe steps, and cells at the intersection of the rows and the columns. At least one sensor in the tool obtains trace data of a recipe step while manufacturing at least one microelectronic device. A computing device analyzes the obtained trace data to determine a level of operational significance found in the data and assigns a score to the trace data that indicates a level of operational significance. Then, the computing device places the score in a corresponding cell of the heat map. A user uses the cell for evaluating the tool performance.
摘要翻译：公开了一种用于在制造微电子器件的同时评估半导体制造工具的性能的方法和系统。至少根据执行至少一项统计测试生成一份报告。该报告包括至少一个具有与传感器对应的行的热图，对应于配方步骤期间获得的跟踪数据的列，以及行和列的交叉点处的单元格。工具中至少有一个传感器获得配方步骤的痕迹数据，同时制造至少一个微电子器件。计算设备分析所获得的跟踪数据以确定在数据中发现的操作意义的水平，并向指示操作意义水平的跟踪数据分配分数。然后，计算设备将分数放置在热图的相应单元中。用户使用单元格来评估刀具性能。

4. 发明申请

US20090017632A1 METHODS OF MANUFACTURING SEMICONDUCTOR STRUCTURES USING RIE PROCESS 失效
标题翻译：使用RIE工艺制造半导体结构的方法
公开(公告)号：US20090017632A1
公开(公告)日：2009-01-15
申请号：US12170956
申请日：2008-07-10
申请人： Peter Biolsi , Samuel S. Choi , Kevin Mackey
发明人： Peter Biolsi , Samuel S. Choi , Kevin Mackey
IPC分类号： H01L21/3065
CPC分类号： H01L21/32136 , H01L21/31116
摘要： A method for etching on a semiconductors at the back end of line using reactive ion etching. The method comprises reduced pressure atmosphere and a mixture of gases at a specific flow rate ratio during plasma generation and etching. Plasma generation is induced by a source radio frequency and anisotropic etch performance is induced by a second bias radio frequency.
摘要翻译：使用反应离子蚀刻在线后端的半导体上蚀刻的方法。该方法包括在等离子体产生和蚀刻期间以特定流速比减压气氛和气体混合物。等离子体产生由源射频引起，各向异性蚀刻性能由第二偏置射频引起。

5. 发明申请

US20080166879A1 METHODS OF MANUFACTURING SEMICONDUCTOR STRUCTURES USING RIE PROCESS 失效
标题翻译：使用RIE工艺制造半导体结构的方法
公开(公告)号：US20080166879A1
公开(公告)日：2008-07-10
申请号：US11621660
申请日：2007-01-10
申请人： PETER BIOLSI , SAMUEL S. CHOI , KEVIN MACKEY
发明人： PETER BIOLSI , SAMUEL S. CHOI , KEVIN MACKEY
IPC分类号： H01L21/3065
CPC分类号： H01L21/32136 , H01L21/31116
摘要： A method for etching on a semiconductors at the back end of line using reactive ion etching. The method comprises reduced pressure atmosphere and a mixture of gases at a specific flow rate ratio during plasma generation and etching. Plasma generation is induced by a source radio frequency and anisotropic etch performance is induced by a second bias radio frequency.
摘要翻译：使用反应离子蚀刻在线后端的半导体上蚀刻的方法。该方法包括在等离子体产生和蚀刻期间以特定流速比减压气氛和气体混合物。等离子体产生由源射频引起，各向异性蚀刻性能由第二偏置射频引起。

6. 发明授权

US08285414B2 Method and system for evaluating a machine tool operating characteristics 有权
标题翻译：用于评估机床操作特性的方法和系统
公开(公告)号：US08285414B2
公开(公告)日：2012-10-09
申请号：US12415348
申请日：2009-03-31
申请人： Ehud Aharoni , Robert J. Baseman , Ramona Kei , Oded Margalit , Kevin Mackey , Michal Rosen-Zvi , Raminderpal Singh , Noam Slonim , Hong Lin , Fateh A. Tipu , Adam D. Ticknor , Timothy M. McCormack
发明人： Ehud Aharoni , Robert J. Baseman , Ramona Kei , Oded Margalit , Kevin Mackey , Michal Rosen-Zvi , Raminderpal Singh , Noam Slonim , Hong Lin , Fateh A. Tipu , Adam D. Ticknor , Timothy M. McCormack
IPC分类号： G06F19/00
CPC分类号： G05B23/0216 , G05B23/0229 , G05B2219/32191 , G05B2219/32194 , G05B2219/45031 , G05B2219/50065 , Y02P90/22 , Y02P90/86 , Y10T409/309408
摘要： A method and system for evaluating a performance of a semiconductor manufacturing tool while manufacturing microelectronic devices are disclosed. At least one report is generated based on executions of at least one statistical test. The report includes at least one heat map having rows that correspond to sensors, columns that correspond to trace data obtained during recipe steps, and cells at the intersection of the rows and the columns. At least one sensor in the tool obtains trace data of a recipe step while manufacturing at least one microelectronic device. A computing device analyzes the obtained trace data to determine a level of operational significance found in the data and assigns a score to the trace data that indicates a level of operational significance. Then, the computing device places the score in a corresponding cell of the heat map. A user uses the cell for evaluating the tool performance.
摘要翻译：公开了一种用于在制造微电子器件的同时评估半导体制造工具的性能的方法和系统。至少根据执行至少一项统计测试生成一份报告。该报告包括至少一个具有与传感器对应的行的热图，对应于配方步骤期间获得的跟踪数据的列，以及行和列的交叉点处的单元格。工具中至少有一个传感器获得配方步骤的痕迹数据，同时制造至少一个微电子器件。计算设备分析所获得的跟踪数据以确定在数据中发现的操作意义的水平，并向指示操作意义水平的跟踪数据分配分数。然后，计算设备将分数放置在热图的相应单元中。用户使用单元格来评估刀具性能。

7. 发明授权

US07648274B2 Radiological scanning orientation indicator 失效
标题翻译：放射性扫描方位指示
公开(公告)号：US07648274B2
公开(公告)日：2010-01-19
申请号：US12391167
申请日：2009-02-23
申请人： J. Kevin Mackey
发明人： J. Kevin Mackey
IPC分类号： A61B6/04 , A61B6/06
CPC分类号： A61B6/00 , A61B6/583 , A61B90/39
摘要： A radiological imaging orientation indicator includes a linear indication member having a substantially uniform cross-sectional shape and means for positioning the indication member adjacent a patient's body. When the indication member is located adjacent the patient's body and a sectional scanning image is produced, a cross-section of the indication member will appear in the scanning image, indicating an orientation of the patient's body with respect to the scanning image. The linear indication member is in the form of either of an extruded letter, number and symbol which may be hollow with one or more liquids trapped inside to indicate vertical orientation. The means for positioning the indication member include pants, vests, caps, visors, eyeglass frames, sandals, gloves and collars that can only be attached to a patient's body in one way, thereby preventing confusion in determining the orientation of a scanning image. The invention includes orientation indicators for standard X-rays.
摘要翻译：放射成像取向指示器包括具有基本均匀的横截面形状的线性指示构件和用于将指示构件邻近患者身体定位的装置。当指示构件位于患者身体附近并且产生截面扫描图像时，指示构件的横截面将出现在扫描图像中，指示患者身体相对于扫描图像的取向。线性指示构件是挤出的字母，数字和符号的形式，其可以是中空的，其中一个或多个液体被捕获在内部以指示垂直取向。用于定位指示构件的装置包括裤子，背心，帽子，面罩，眼镜框架，凉鞋，手套和衣领，其只能以一种方式附接到患者身体，从而防止在确定扫描图像的取向上的混乱。本发明包括用于标准X射线的取向指示器。

8. 发明授权

US07442650B2 Methods of manufacturing semiconductor structures using RIE process 失效
标题翻译：使用RIE工艺制造半导体结构的方法
公开(公告)号：US07442650B2
公开(公告)日：2008-10-28
申请号：US11621660
申请日：2007-01-10
申请人： Peter Biolsi , Samuel S Choi , Kevin Mackey
发明人： Peter Biolsi , Samuel S Choi , Kevin Mackey
IPC分类号： H01L21/302
CPC分类号： H01L21/32136 , H01L21/31116
摘要： A method for etching on a semiconductors at the back end of line using reactive ion etching. The method comprises reduced pressure atmosphere and a mixture of gases at a specific flow rate ratio during plasma generation and etching. Plasma generation is induced by a source radio frequency and anisotropic etch performance is induced by a second bias radio frequency.
摘要翻译：使用反应离子蚀刻在线后端的半导体上蚀刻的方法。该方法包括在等离子体产生和蚀刻期间以特定流速比减压气氛和气体混合物。等离子体产生由源射频引起，各向异性蚀刻性能由第二偏置射频引起。

9. 发明授权

US08614150B2 Methods of manufacturing semiconductor structures using RIE process 失效
标题翻译：使用RIE工艺制造半导体结构的方法
公开(公告)号：US08614150B2
公开(公告)日：2013-12-24
申请号：US12170956
申请日：2008-07-10
申请人： Peter Biolsi , Samuel S. Choi , Kevin MacKey
发明人： Peter Biolsi , Samuel S. Choi , Kevin MacKey
IPC分类号： H01L21/302
CPC分类号： H01L21/32136 , H01L21/31116
摘要： A method for etching on a semiconductors at the back end of line using reactive ion etching. The method comprises reduced pressure atmosphere and a mixture of gases at a specific flow rate ratio during plasma generation and etching. Plasma generation is induced by a source radio frequency and anisotropic etch performance is induced by a second bias radio frequency.
摘要翻译：使用反应离子蚀刻在线后端的半导体上蚀刻的方法。该方法包括在等离子体产生和蚀刻期间以特定流速比减压气氛和气体混合物。等离子体产生由源射频引起，各向异性蚀刻性能由第二偏置射频引起。

10. 发明申请

US20090154655A1 RADIOLOGICAL SCANNING ORIENTATION INDICATOR 失效
标题翻译：放射学指向指标
公开(公告)号：US20090154655A1
公开(公告)日：2009-06-18
申请号：US12391167
申请日：2009-02-23
申请人： J. Kevin Mackey
发明人： J. Kevin Mackey
IPC分类号： A61B6/08
CPC分类号： A61B6/00 , A61B6/583 , A61B90/39
摘要： A radiological imaging orientation indicator includes a linear indication member having a substantially uniform cross-sectional shape and means for positioning the indication member adjacent a patient's body. When the indication member is located adjacent the patient's body and a sectional scanning image is produced, a cross-section of the indication member will appear in the scanning image, indicating an orientation of the patient's body with respect to the scanning image. The linear indication member is in the form of either of an extruded letter, number and symbol which may be hollow with one or more liquids trapped inside to indicate vertical orientation. The means for positioning the indication member include pants, vests, caps, visors, eyeglass frames, sandals, gloves and collars that can only be attached to a patient's body in one way, thereby preventing confusion in determining the orientation of a scanning image. The invention includes orientation indicators for standard X-rays.
摘要翻译：放射成像取向指示器包括具有基本均匀的横截面形状的线性指示构件和用于将指示构件邻近患者身体定位的装置。当指示构件位于患者身体附近并且产生截面扫描图像时，指示构件的横截面将出现在扫描图像中，指示患者身体相对于扫描图像的取向。线性指示构件是挤出的字母，数字和符号的形式，其可以是中空的，其中一个或多个液体被捕获在内部以指示垂直取向。用于定位指示构件的装置包括裤子，背心，帽子，面罩，眼镜框架，凉鞋，手套和衣领，其只能以一种方式附接到患者身体，从而防止在确定扫描图像的取向上的混乱。本发明包括用于标准X射线的取向指示器。

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