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    • 3. 发明授权
    • Silicon tactile imaging array and method of making same
    • 硅手机成像阵列及其制作方法
    • US5055838A
    • 1991-10-08
    • US282052
    • 1988-12-09
    • Kensall D. WiseKenichiro Suzuki
    • Kensall D. WiseKenichiro Suzuki
    • B25J13/08G01L1/14G06F3/033G06F3/041
    • B25J13/084G01L1/148G06F3/044G06F2203/04103
    • A high-performance single-crystal silicon tactile imaging array organized in a X-Y matrix of capacitor elements. Metallic column lines are formed on a glass support substrate, while the row lines are formed from a contiguous chain of doubly-supported bridge structures, with one such structure for each sensing element. All of the bridge structures are simultaneously fabricated from a single-crystal silicon semiconductor wafer using a two-step boron diffusion process, followed by a silicon-to-glass electrostatic bonding step and subsequent unmasked wafer dissolution. Each bridge structure has a thick center plate for the sense capacitor supported by thinner beams connected to adjacent row single-crystal silicon support rails bonded to the glass substrate. The force sensitivity and maximum operating range of the tactile imager can be selected over a very wide range by appropriately setting the dimensions of these thinner support beams. The resulting imager is rugged, of high resolution and high density, and is inherently stable over time and temperature.
    • 一种高性能单晶硅触觉成像阵列组织在电容元件的X-Y矩阵中。 金属柱线形成在玻璃支撑基板上,而行线由双重支撑的桥结构的连续链形成,每个感测元件具有一个这样的结构。 所有的桥结构都使用两步硼扩散工艺由单晶硅半导体晶片同时制造,随后是硅 - 玻璃静电结合步骤和随后未掩模的晶片溶解。 每个桥结构具有用于感测电容器的厚中心板,该中心板由与连接到玻璃基板的相邻行单晶硅支撑轨连接的更薄的梁支撑。 可以通过适当地设定这些较薄的支撑梁的尺寸,在非常宽的范围内选择触觉成像器的力灵敏度和最大工作范围。 所得到的成像器坚固耐用,分辨率高,密度高,在时间和温度上固有的稳定性。
    • 6. 发明授权
    • Monolithic fully-integrated vacuum sealed BiCMOS pressure sensor
    • Monolithic全集成真空密封BiCMOS压力传感器
    • US06713828B1
    • 2004-03-30
    • US09465961
    • 1999-12-17
    • Abhijeet V. ChavanKensall D. Wise
    • Abhijeet V. ChavanKensall D. Wise
    • H01L2984
    • G01L9/0073B81B2201/0264B81C1/00246B81C2203/0778G01L9/0042G01L9/12G01P15/0802H01L27/0623
    • A semiconductor device (20) comprises a substrate (24), a first semiconductor region including a recessed area defining a first cavity (36) between the substrate (24) and the first semiconductor region, an electrical transducer (30) positioned within the first cavity (36), a second semiconductor.region including a recessed area defining a second cavity (40) between the substrate (24) and the second semiconductor region, an electrical circuit (34) positioned within the second cavity (40), and at least one electrode connecting the electrical transducer (30) and the electrical device (34). The semiconductor device (20) includes a first external electrode and a second external electrode formed on the substrate (24) and a sealing layer extending around the perimeter of the cavities and sealing the semiconductor regions to the substrate (24). The sealing layer (78) includes a first electrical connection region and a second electrical connection region that are electrically isolated from each other. The first connection region electrically connects a first internal electrode to the first external electrode and the second connection region electrically connects a second internal electrode to the second external electrode through the sealing layer (78).
    • 半导体器件(20)包括衬底(24),第一半导体区域,包括限定在衬底(24)和第一半导体区域之间的第一空腔(36)的凹陷区域;电变换器(30) 空腔(36),第二半导体区域,其包括限定在所述基板(24)和所述第二半导体区域之间的第二空腔(40)的凹陷区域,位于所述第二空腔(40)内的电路(34) 连接电传感器(30)和电气装置(34)的至少一个电极。 半导体器件(20)包括形成在衬底(24)上的第一外部电极和第二外部电极以及围绕腔的周边延伸并将半导体区域密封到衬底(24)的密封层。 密封层(78)包括彼此电绝缘的第一电连接区域和第二电连接区域。 第一连接区域将第一内部电极与第一外部电极电连接,第二连接区域通过密封层(78)将第二内部电极与第二外部电极电连接。
    • 8. 发明授权
    • Self-testing capacitive pressure transducer and method
    • 自检电容式压力传感器及方法
    • US5377524A
    • 1995-01-03
    • US902328
    • 1992-06-22
    • Kensall D. WiseSteve T. Cho
    • Kensall D. WiseSteve T. Cho
    • G01F1/38G01F1/50G01F7/00G01F25/00G01L9/00G01L9/12
    • G01F1/383G01F1/50G01F25/0007G01F7/005G01L27/007G01L9/0073G01L9/12
    • A high-performance switched-capacitor circuit for electronic read-out of a pressure sensor-based ultrasensitive microflow transducer. The microflow transducer uses a differential capacitive pressure sensor to measure flow. Read-out electronics associated with the transducer feature a clocking speed of 100 KHz and drive loads up to 35 pF. The read-out electronics include a high DC gain that nulls out stray input capacitance, which is beneficial for the multichip realization of the microflow transducer disclosed herein. The uncompensated linearity of the overall read-out electronics is 10 bits, and the pressure/flow resolution is 12 bits. An ultrasensitive membrane associated with the pressure sensor does not respond to a pulsed waveform for frequencies above 50 KHz. But for lower frequencies, it deflects in response to the time-average voltage applied across the capacitor plates of the pressure sensor. A self-test mode is provided which employs an extremely long pre-charge pulse. An integrated flowmeter package including transducer and circuitry, and a second circuit for extending the range of the microflowmeter circuitry are also disclosed.
    • 一种高性能开关电容电路,用于电子读出基于压力传感器的超灵敏微流量传感器。 微流量传感器使用差分电容式压力传感器来测量流量。 与传感器相关的读出电子器件的时钟速度为100 KHz,驱动负载高达35 pF。 读出的电子器件包括一个高直流增益,使杂散输入电容无效,这有利于本文公开的微流量变换器的多芯片实现。 整体读出电子元件的无补偿线性度为10位,压力/流量分辨率为12位。 与压力传感器相关联的超灵敏膜对于频率高于50KHz的脉冲波形不起作用。 但是对于较低的频率,其响应于施加在压力传感器的电容器板上的时间平均电压而偏转。 提供了一种使用非常长的预充电脉冲的自检模式。 还公开了一种包括换能器和电路的集成流量计封装以及用于扩展微流量计电路范围的第二电路。
    • 9. 发明授权
    • Thermopile infrared detector with semiconductor supporting rim
    • 具有半导体支撑边缘的热电偶红外探测器
    • US5100479A
    • 1992-03-31
    • US723806
    • 1991-07-01
    • Kensall D. WiseKhalil Najafi
    • Kensall D. WiseKhalil Najafi
    • G01J5/12H01L35/08H01L35/34
    • H01L35/08G01J5/12H01L35/34G01J2005/123
    • A thermopile detector is disclosed consisting of a semiconductor supporting rim which is doped across all of the rim. The rim supports a series of polycrystalline silicon and metal thermocouples. The fully doped semiconductor area serves as an etch stop for a single-sided etch which eliminates the need for front-to-back alignment of the device. The semiconductor doped rim also serves as a good thermal conductor for supporting the cold junctions. The hot junctions of the thermocouples may be supported by a thin dielectric membrane spanning the device and the cold junctions are formed on the doped rim. The thin dielectric window provides thermal isolation between the semiconductor rim and the center of the window where the hot junctions are located. The thermocouple material layers may be stacked to enable greater thermocouple density on the device. Refractory metals may be employed as the thermocouple metal, to increase sensitivity.
    • 公开了一种热电堆检测器,其由半导体支撑边缘组成,半导体支撑边缘掺杂在所有的边缘上。 边缘支撑一系列多晶硅和金属热电偶。 完全掺杂的半导体区域用作单面蚀刻的蚀刻停止,其消除了对器件的前后对准的需要。 半导体掺杂边缘也用作支持冷接点的良好导热体。 热电偶的热接头可以由横跨该器件的薄电介质膜支撑,并且在掺杂的边缘上形成冷接头。 薄介电窗口提供半导体边缘与热接头所在窗口中心之间的热隔离。 可以堆叠热电偶材料层,以使器件上的热电偶密度更高。 可以使用耐火金属作为热电偶金属,以增加灵敏度。
    • 10. 发明授权
    • Method of manufacturing thermopile infrared detector
    • 制造热电堆红外探测器的方法
    • US5059543A
    • 1991-10-22
    • US586520
    • 1990-09-21
    • Kensall D. WiseKhalil Najafi
    • Kensall D. WiseKhalil Najafi
    • G01J5/12H01L35/08H01L35/34
    • H01L35/08G01J5/12H01L35/34G01J2005/123Y10S148/135Y10S257/93
    • A thermopile detector is disclosed consisting of a semiconductor supporting rim which is doped across all of the rim. The rim supports a series of polycrystalline silicon and metal thermocouples. The fully doped semiconductor area serves as an etch stop for a single-sided etch which eliminates the need for front-to-back alignment of the device. The semiconductor doped rim also serves as a good thermal condutor for supporting the cold junctions. The hot junctions of the thermocouples may be supported by a thin dielectric membrane spanning the device and the cold junctions are formed on the doped rim. The thin dielectric window provides thermal isolation between the semiconductor rim and the center of the window where the hot junctions are located. The thermocouple material layers may be stacked to enable greater thermocouple denisty on the device. Refractory metals may be employed as the thermocouple metal, to increase sensitivity.
    • 公开了一种热电堆检测器,其由半导体支撑边缘组成,半导体支撑边缘掺杂在所有的边缘上。 边缘支撑一系列多晶硅和金属热电偶。 完全掺杂的半导体区域用作单面蚀刻的蚀刻停止,其消除了对器件的前后对准的需要。 半导体掺杂的边缘也用作支持冷接点的良好的热调节器。 热电偶的热接头可以由横跨该器件的薄电介质膜支撑,并且在掺杂的边缘上形成冷接头。 薄介电窗口提供半导体边缘与热接头所在窗口中心之间的热隔离。 可以堆叠热电偶材料层,以使器件上的热电偶更加牢固。 可以使用耐火金属作为热电偶金属,以增加灵敏度。