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1. 发明申请

US20140204463A1 ZONE PLATE 有权
标题翻译：区域板块
公开(公告)号：US20140204463A1
公开(公告)日：2014-07-24
申请号：US14240393
申请日：2011-09-28
申请人： Ken Harada , Teruo Kohashi
发明人： Ken Harada , Teruo Kohashi
IPC分类号： G02B5/18
CPC分类号： G02B5/1876 , G02B27/42 , G02B27/4233 , G02B27/4266 , G02B27/44 , G21K1/06
摘要： Although, conventionally, there were two methods, (1) a wave was transmitted through a spiral phase plate and (2) a diffraction grating containing an edge dislocation was used, they incurred complication of a configuration and securement of a larger amount of space and were not efficient because each of the spiral wave generation methods needed an incident wave to be a plane wave and at least one time of imaging is necessary at the time of wave irradiation on an observation object. In order to efficiently generate the spiral wave having a sufficient intensity, a structure of edge dislocation is taken in into a pattern of the zone plate and a spiral pattern containing a discontinuous zone is formed. Moreover, a thickness and a quality of material that change the phase of the wave by an odd multiple of π are selected for a material of the wave-blocking section in the pattern.
摘要翻译：虽然通常有两种方法：（1）通过螺旋相板传播波，（2）使用包含边缘位错的衍射光栅，它们引起配置的复杂化并确保更大的空间，不是有效的，因为每个螺旋波产生方法需要入射波为平面波，并且在观察对象上的波照射时需要至少一次成像时间。为了有效地产生具有足够强度的螺旋波，边缘位错的结构被取入到区域板的图案中，并且形成包含不连续区域的螺旋图案。此外，将波的相位改变为奇数倍的材料的厚度和质量; 被选择为图案中的波形阻挡部分的材料。

2. 发明申请

US20130160622A1 LAMINATED BODY MANUFACTURING APPARATUS, AND LAMINATED BODY MANUFACTURING METHOD 有权
标题翻译：层压体制造装置和层压体制造方法
公开(公告)号：US20130160622A1
公开(公告)日：2013-06-27
申请号：US13821140
申请日：2011-09-28
申请人： Hideki Shigematsu , Ugeun Shin , Fumio Takeshima , Kuniaki Akutsu , Masafumi Saito , Ken Harada , Naoki Yamamoto
发明人： Hideki Shigematsu , Ugeun Shin , Fumio Takeshima , Kuniaki Akutsu , Masafumi Saito , Ken Harada , Naoki Yamamoto
IPC分类号： B21D28/02
CPC分类号： H02K15/024 , Y10T83/0448
摘要： A laminated body manufacturing apparatus for manufacturing an annular laminated body in which each layer is defined by a plurality of segments is provided with a feeding unit that sequentially feeds a plurality of parts to be processed on a band-like sheet material to a predetermined processing position; a processing unit that separates the segment from each part to be processed by a shearing processing in the processing position; and a laminating unit that receives the segment that is separated and lowered onto the plurality of segments that are lowered and defining one layer in advance and that rotates the received segment by a predetermined angle in a circumferential direction of the segment, each time when the shearing processing is performed, so as to place the sequentially lowered segment in a position to define the laminated body.
摘要翻译：一种用于制造每个层由多个段限定的环状层叠体的层叠体制造装置设置有馈送单元，其将多个待处理部分以带状片材顺序地馈送到预定的处理位置 ; 处理单元，其通过处理位置中的剪切处理将所述段与要处理的每个部分分离; 以及层叠单元，其接收分离和降低到下降的多个段上并且预先限定一层的段，并且使得接收的段在段的圆周方向上旋转预定角度，每次当剪切时进行处理，以便将顺序降低的片段放置在限定层叠体的位置。

3. 发明申请

US20120241612A1 Electron Beam Biprism Device and Electron Beam Device 审中-公开
标题翻译：电子束双棱镜装置和电子束装置
公开(公告)号：US20120241612A1
公开(公告)日：2012-09-27
申请号：US13514654
申请日：2010-12-06
申请人： Ken Harada , Akira Sugawara , Noboru Moriya
发明人： Ken Harada , Akira Sugawara , Noboru Moriya
IPC分类号： H01J37/26 , H01J3/26
CPC分类号： H01J37/26 , H01J37/1478 , H01J2237/1514 , H01J2237/2614
摘要： Disclosed are an electron beam biprism device and an electron beam device, in which, in order to implement a fringe scan method in an electron beam interferometer, a deflection function in one direction is added to the function of an electron beam biprism, and electron beams passing the left and right sides of a filament electrode can be respectively deflected at different angles.
摘要翻译：公开了一种电子束双棱镜装置和电子束装置，其中为了在电子束干涉仪中实现边缘扫描方法，将一个方向的偏转函数加到电子束双棱镜的功能上，并且电子束通过灯丝电极的左右两侧可以分别以不同的角度偏转。

4. 发明授权

US08193494B2 Transmission electron microscope and method for observing specimen image with the same 有权
标题翻译：透射电子显微镜和用于观察样品图像的方法
公开(公告)号：US08193494B2
公开(公告)日：2012-06-05
申请号：US12850961
申请日：2010-08-05
申请人： Ken Harada , Akira Sugawara
发明人： Ken Harada , Akira Sugawara
IPC分类号： H01J37/26 , H01J37/04 , G01B15/00
CPC分类号： H01J37/28 , H01J37/295 , H01J2237/1514 , H01J2237/2611 , H01J2237/2614
摘要： A first electron biprism is disposed in a condenser optical system and an observation region of a specimen is irradiated simultaneously with two electron beams of different angles. The two electron beams that have simultaneously transmitted the specimen are spatially separated and focused with a second electron biprism disposed in an imaging optical system and two electron microscopic images of different irradiation angles are obtained. The two picture images are obtained by a detecting unit. Based on the two picture images, a stereoscopic image or two images having different kinds of information of the specimen is/are produced and displayed on a display device.
摘要翻译：第一电子双棱镜设置在聚光镜系统中，并且与两个不同角度的电子束同时照射样本的观察区域。同时透射样品的两个电子束在空间上分离并且与设置在成像光学系统中的第二电子双棱镜聚焦，并且获得两个不同照射角度的电子显微镜图像。两个图像由检测单元获得。基于两个图像，产生并显示具有样本的不同种类的信息的立体图像或两个图像并显示在显示装置上。

5. 发明授权

US07816648B2 Electron interferometer or electron microscope 有权
标题翻译：电子干涉仪或电子显微镜
公开(公告)号：US07816648B2
公开(公告)日：2010-10-19
申请号：US11547054
申请日：2005-03-07
申请人： Ken Harada , Tetsuya Akashi , Yoshihiko Togawa , Tsuyoshi Matsuda
发明人： Ken Harada , Tetsuya Akashi , Yoshihiko Togawa , Tsuyoshi Matsuda
IPC分类号： G01B15/00
CPC分类号： H01J37/295 , H01J37/26 , H01J2237/1514 , H01J2237/2614
摘要： In an electron beam interference system using an electron biprism, which is capable of independently controlling each of the interference fringe spacing s and the interference width W, both of which are important parameters for an interferometer and for an interferogram acquired by the interferometer, an optical system used in a two-stage electron biprism interferometer is adopted. The optical system uses two stages of electron biprisms in an optical axis direction to give the flexibility to the relative magnification relative to a specimen image and that relative to an image of a filament electrode of the electron biprism. In addition, as a two-stage configuration in which two objective lenses (51, 52) are combined, independently controlling the focal length of each objective lens makes it possible to set the relative magnification relative to a specimen image and that relative to an image of the filament electrode of the electron biprism at arbitrary values.
摘要翻译：在使用电子双棱镜的电子束干涉系统中，其能够独立地控制每个干涉条纹间距s和干涉宽度W，这两者都是干涉仪和干涉仪获取的干涉图的重要参数，光学采用两级电子双棱镜干涉仪中使用的系统。光学系统在光轴方向上使用两阶段的电子双棱镜，以相对于标本图像相对于相对放大率以及相对于电子双棱镜的细丝电极的图像具有灵活性。另外，作为组合了两个物镜（51,52）的两级配置，独立地控制每个物镜的焦距使得可以相对于标本图像和相对于图像设置相对放大率的电子双棱镜的灯丝电极的任意值。

6. 发明授权

US07655905B2 Charged particle beam equipment 有权
标题翻译：带电粒子束设备
公开(公告)号：US07655905B2
公开(公告)日：2010-02-02
申请号：US11920132
申请日：2006-05-11
申请人： Ken Harada , Tetsuya Akashi , Yoshihiko Togawa , Tsuyoshi Matsuda , Noboru Moriya
发明人： Ken Harada , Tetsuya Akashi , Yoshihiko Togawa , Tsuyoshi Matsuda , Noboru Moriya
IPC分类号： G21K5/10 , G01N23/00
CPC分类号： G01N23/04 , H01J37/023 , H01J37/067 , H01J37/20 , H01J37/26 , H01J2237/024 , H01J2237/1514 , H01J2237/20207 , H01J2237/20214 , H01J2237/262 , H01J2237/317
摘要： Charged particle beam equipment having a rotary mechanism in which shift of the observing/machining position incident to the rotary operation of the equipment having the rotary mechanism can be corrected conveniently with high precision in a plane perpendicular to the optical axis of the optical system of charged particle beam or in a slightly inclining plane. An X-Y shift incident to rotation in a plane is determined from the angular information of a rotary mechanism such as a sample holder, diaphragms or biprisms in the charged particle beam equipment, and then driving or controlling is performed to cancel the X-Y shift.
摘要翻译：具有旋转机构的带电粒子束设备可以在垂直于带电的光学系统的光轴的平面中以高精度方便地校正入射到具有旋转机构的设备的旋转操作的观察/加工位置的偏移粒子束或稍微倾斜的平面。根据带电粒子束设备中的样本保持器，隔膜或双棱镜等旋转机构的角度信息确定入射到平面中的X-Y偏移，然后执行驱动或控制以消除X-Y偏移。

7. 发明申请

US20090273789A1 Interferometer 失效
标题翻译：干涉仪
公开(公告)号：US20090273789A1
公开(公告)日：2009-11-05
申请号：US11883568
申请日：2006-01-27
申请人： Ken Harada , Tetsuya Akashi , Yoshihiko Togawa , Tsuyoshi Matsuda , Noboru Moriya
发明人： Ken Harada , Tetsuya Akashi , Yoshihiko Togawa , Tsuyoshi Matsuda , Noboru Moriya
IPC分类号： G01B9/02 , H01J3/14
CPC分类号： H01J37/295 , G01N23/00 , G02B19/0014 , G02B19/0047 , G03H5/00 , H01J37/04 , H01J2237/1514 , H01J2237/228 , H01J2237/2614
摘要： A double-biprism electron interferometer is an optical system which dramatically increases the degree of freedom of a conventional one-stage electron interferometer. The double biprism interferometer, however, is the same as the optical system of the single electron biprism in terms of the one-dimensional shape of an electron hologram formed by filament electrodes, the direction of an interference area, and the azimuth of the interference fringes. In other words, the longitudinal direction of the interference area is determined corresponding to the direction of the filament electrodes, and the azimuth of the interference fringes only coincides with and is in parallel with the longitudinal direction of the interference area. An interferometer according to the present invention has upper-stage and lower-stage electron biprisms, and operates with an azimuth angle Φ between filament electrodes of the upper-stage and lower-stage electron biprisms to arbitrarily control an interference area and an azimuth θ of the interference fringes formed therein.
摘要翻译：双二棱镜电子干涉仪是一种显着提高常规一级电子干涉仪自由度的光学系统。然而，双棱镜干涉仪与由单丝电极组成的电子全息图的一维形状，干涉区域的方向和干涉条纹的方位角的单电子双棱镜的光学系统相同。换句话说，干扰区域的长度方向根据灯丝电极的方向确定，并且干涉条纹的方位角仅与干涉区域的纵向方向一致并且平行。根据本发明的干涉仪具有上级和下级电子双极性，并且在上级和下级电子双极之间的细丝电极之间的方位角Φi操作，以任意地控制干扰区域和方位角θ 其中形成的干涉条纹。

8. 发明申请

US20070272861A1 Interferometer 有权
标题翻译：干涉仪
公开(公告)号：US20070272861A1
公开(公告)日：2007-11-29
申请号：US10585359
申请日：2005-01-07
申请人： Ken Harada , Tatsuya Akashi , Yoshihiko Togawa , Tsuyoshi Matsuda
发明人： Ken Harada , Tatsuya Akashi , Yoshihiko Togawa , Tsuyoshi Matsuda
IPC分类号： G01N23/00 , G02B21/00
CPC分类号： H01J37/295 , H01J2237/1514 , H01J2237/2614
摘要： The present invention provides a technique enabling to control fringe spacing s and an interference width W independently of each other, which are important parameters for an interferometer using an electron biprism. In the present invention, two electron biprisms 9u, 9b are used in two stages along the optical axis, and fringe spacing s and an interference width W are controlled independently of each other by controlling a voltage applied to an electrode of each of the electron biprisms. Also Fresnel diffraction can be suppressed.
摘要翻译：本发明提供一种能够彼此独立地控制边缘间隔s和干涉宽度W的技术，这是使用电子双棱镜的干涉仪的重要参数。在本发明中，两个电子双棱镜9u，9b沿着光轴两级使用，并且边缘间隔s和干涉宽度W通过控制施加到每个的电极的电压彼此独立地控制电子双极。也可以抑制菲涅尔衍射。

9. 发明授权

US08946628B2 Electron beam interference device and electron beam interferometry 有权
标题翻译：电子束干涉装置和电子束干涉测量
公开(公告)号：US08946628B2
公开(公告)日：2015-02-03
申请号：US13810934
申请日：2012-02-03
申请人： Ken Harada , Hiroto Kasai
发明人： Ken Harada , Hiroto Kasai
IPC分类号： G01N23/00 , G21K7/00 , H01J37/252 , G01N23/04 , H01J37/26 , H01J37/147
CPC分类号： H01J37/252 , G01N23/04 , H01J37/147 , H01J37/26 , H01J37/295 , H01J2237/221 , H01J2237/226 , H01J2237/2505
摘要： There is a limit in range and distance in which an electron beam can interfere and electron interference is implemented within a range of a coherence length. Therefore, interference images are consecutively recorded for each interference region width from an interference image of a reference wave and an observation region adjacent to the reference wave by considering that a phase distribution regenerated and observed by an interference microscopy is a differential between phase distributions of two waves used for interference and a differential image between phase distributions of a predetermined observation region and a predetermined reference wave is acquired by acquiring integrating phase distributions acquired by individually regenerating the interference images. This work enables a wide range of interference image which is more than a coherence length by arranging phase distribution images performed and acquired in the respective phase distributions in a predetermined order.
摘要翻译：电子束可能干扰的范围和距离有限制，并且在相干长度的范围内实现电子干扰。因此，通过考虑到由干涉显微镜再生和观测到的相位分布是两相的相位分布之间的差分，从参考波的干涉图像和与参考波相邻的观察区域的每个干涉区域宽度连续记录干涉图像通过获取通过单独再生干涉图像获得的积分相位分布来获取用于干扰的波和预定观察区域和预定参考波的相位分布之间的差分图像。通过以预定的顺序排列在各个相位分布中执行和获取的相位分布图像，能够实现大于相干长度的宽范围的干涉图像。

10. 发明授权

US07939801B2 Electron beam observation device using pre-specimen magnetic field as image-forming lens and specimen observation method 有权
标题翻译：电子束观测装置采用试样前磁场作为成像透镜和样本观察方法
公开(公告)号：US07939801B2
公开(公告)日：2011-05-10
申请号：US12270422
申请日：2008-11-13
申请人： Hiroto Kasai , Ken Harada
发明人： Hiroto Kasai , Ken Harada
IPC分类号： H01J37/26
CPC分类号： H01J37/26 , H01J37/141 , H01J37/20 , H01J2237/14 , H01J2237/20 , H01J2237/201 , H01J2237/2802
摘要： An electron beam observation device includes a mechanism which disposes a specimen at an upstream side in an electron beam traveling direction outside an objective lens, from which an image is transferred under a magnification of ⅕ to 1/30, in addition to an inside of the objective lens in which a specimen is disposed at a time of ordinary observation.
摘要翻译：一种电子束观察装置，其特征在于，具有将物镜外侧的电子束行进方向的上游侧的样本配置在除了内侧以外的图像在⅕〜在普通观察时放置样本的物镜。

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