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    • 2. 发明授权
    • Method for via etching in organo-silica-glass
    • 有机硅玻璃中经过蚀刻的方法
    • US06914004B2
    • 2005-07-05
    • US10237371
    • 2002-09-09
    • Keith J. Thompson
    • Keith J. Thompson
    • H01L21/28H01L21/3065H01L21/311H01L21/768H01L23/522
    • H01L21/76802H01L21/31116
    • According to one embodiment of the invention, a method for via etching in a dielectric material includes providing a wafer (200) having a substrate (202), an etch stop layer (210) disposed outwardly from the substrate, an Organo-Silica-Glass layer (212) disposed outwardly from the etch stop layer (210), and a photoresist layer (216) disposed outwardly from the Organo-Silica-Glass layer (212), and positioning the wafer (200) within a process chamber (114). The method further includes introducing a first source gas mixture (110) into the process chamber (114) to etch a first portion of the Organo-Silica-Glass layer (212) utilizing the first source gas mixture (110), and introducing a second source gas mixture (110) into the process chamber (114) to etch, for a predetermined time period, a second portion of the Organo-Silica-Glass layer (212) down to the etch stop layer (210). The second source gas mixture (110) includes a fluorocarbon, a noble gas, carbon monoxide, and nitrogen.
    • 根据本发明的一个实施例,用于电介质材料中的通孔蚀刻的方法包括提供具有衬底(202)的晶片(200),从衬底向外设置的蚀刻停止层(210),有机硅玻璃 从蚀刻停止层(210)向外设置的层(212)和从有机硅 - 玻璃层(212)向外设置的光致抗蚀剂层(216),并将晶片(200)定位在处理室(114)内, 。 该方法还包括将第一源气体混合物(110)引入处理室(114)中,以利用第一源气体混合物(110)蚀刻有机硅 - 玻璃层(212)的第一部分,并引入第二源气体混合物 源气体混合物(110)进入处理室(114),以在预定时间段内将有机硅 - 玻璃层(212)的第二部分蚀刻到蚀刻停止层(210)。 第二源气体混合物(110)包括碳氟化合物,惰性气体,一氧化碳和氮气。
    • 5. 发明申请
    • APPARATUS AND SYSTEM FOR TRAPPING DEBRIS AND ARRESTING SPARKS
    • 用于追捕和毁灭火星的装置和系统
    • US20110277454A1
    • 2011-11-17
    • US12777730
    • 2010-05-11
    • Peter ChristiansonKeith J. Thompson
    • Peter ChristiansonKeith J. Thompson
    • F01N3/035F01N3/021
    • F01N3/06F01N3/035F01N3/0821F01N2230/06
    • Described herein are various embodiments of an apparatus and system for trapping debris and arresting sparks that overcomes at least some shortcomings of the prior art approaches. According to one embodiment, an apparatus is disclosed for mitigating failure of an exhaust after-treatment component in an internal combustion engine system capable of generating an exhaust gas stream. The apparatus includes a housing that includes an exhaust inlet, exhaust outlet, and exhaust flow channel positioned between the exhaust inlet and outlet. Also, the apparatus includes a tubular-shaped mesh screen positioned substantially entirely within the exhaust flow channel. The mesh screen includes a closed end positioned proximate the exhaust inlet of the housing and an opposing open end positioned proximate the exhaust outlet of the housing. The mesh screen is configured to capture failed exhaust after-treatment component particles within the exhaust gas stream.
    • 这里描述了用于捕获碎片和阻止火花的装置和系统的各种实施例,其克服了现有技术方法的至少一些缺点。 根据一个实施例,公开了一种用于减轻能够产生废气流的内燃机系统中的废气后处理部件的故障的装置。 该装置包括壳体,其包括位于排气入口和出口之间的排气入口,排气出口和排气流动通道。 而且,该装置还包括基本上完全位于排气流动通道内的管状网眼筛网。 筛网包括邻近壳体的排气入口定位的封闭端和邻近壳体排气出口定位的相对开口端。 网筛被配置为捕获废气流内的失效的废气后处理组分颗粒。