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    • 5. 发明申请
    • Semiconductor device having gate electrode connection to wiring layer
    • 具有栅电极连接到布线层的半导体器件
    • US20080203527A1
    • 2008-08-28
    • US12081960
    • 2008-04-24
    • Kazuhisa ItoiMasakazu SatoTatsuya Ito
    • Kazuhisa ItoiMasakazu SatoTatsuya Ito
    • H01L29/00
    • H01L28/10Y10T29/49117
    • A semiconductor device includes a semiconductor substrate having an electrode formed above a surface thereof; a first insulating resin layer that is provided over the semiconductor substrate and has a first opening defined at a position corresponding to the electrode; a first wiring layer that is provided on the first insulating resin layer and is connected to the electrode through the first opening; a second insulating resin layer provided over the first insulating resin layer and the first wiring layer, the second insulating resin layer having a second opening that is defined at a position different from the position of the first opening in a direction of the surface of the semiconductor substrate; and a second wiring layer that is provided on the second insulating resin layer and is connected to the first wiring layer through the second opening, wherein the second wiring layer includes an induction element, and a sum of a thickness of the first insulating resin layer and a thickness of the second insulating resin layer is not less than 5 μm and not more than 60 μm.
    • 半导体器件包括其表面上形成有电极的半导体衬底; 第一绝缘树脂层,设置在所述半导体衬底上并且具有限定在对应于所述电极的位置的第一开口; 第一布线层,设置在第一绝缘树脂层上,并通过第一开口连接到电极; 设置在所述第一绝缘树脂层和所述第一布线层上的第二绝缘树脂层,所述第二绝缘树脂层具有限定在与所述第一开口的位置不同的位置的第二开口,所述第二开口沿所述半导体的表面的方向 基质; 以及第二布线层,其设置在所述第二绝缘树脂层上并且通过所述第二开口连接到所述第一布线层,其中所述第二布线层包括感应元件,并且所述第一绝缘树脂层和 第二绝缘树脂层的厚度为5μm以上且60μm以下。
    • 8. 发明申请
    • Semiconductor device and method for manufacturing the same
    • 半导体装置及其制造方法
    • US20060022287A1
    • 2006-02-02
    • US11189134
    • 2005-07-26
    • Kazuhisa ItoiMasakazu SatoTatsuya Ito
    • Kazuhisa ItoiMasakazu SatoTatsuya Ito
    • H01L43/00
    • H01L28/10Y10T29/49117
    • A semiconductor device includes a semiconductor substrate having an electrode formed above a surface thereof; a first insulating resin layer that is provided over the semiconductor substrate and has a first opening defined at a position corresponding to the electrode; a first wiring layer that is provided on the first insulating resin layer and is connected to the electrode through the first opening; a second insulating resin layer provided over the first insulating resin layer and the first wiring layer, the second insulating resin layer having a second opening that is defined at a position different from the position of the first opening in a direction of the surface of the semiconductor substrate; and a second wiring layer that is provided on the second insulating resin layer and is connected to the first wiring layer through the second opening, wherein the second wiring layer includes an induction element, and a sum of a thickness of the first insulating resin layer and a thickness of the second insulating resin layer is not less than 5 μm and not more than 60 μm.
    • 半导体器件包括其表面上形成有电极的半导体衬底; 第一绝缘树脂层,设置在所述半导体衬底上并且具有限定在对应于所述电极的位置的第一开口; 第一布线层,设置在第一绝缘树脂层上,并通过第一开口连接到电极; 设置在所述第一绝缘树脂层和所述第一布线层上的第二绝缘树脂层,所述第二绝缘树脂层具有限定在与所述第一开口的位置不同的位置的第二开口,所述第二开口沿所述半导体的表面的方向 基质; 以及第二布线层,其设置在所述第二绝缘树脂层上并且通过所述第二开口连接到所述第一布线层,其中所述第二布线层包括感应元件,并且所述第一绝缘树脂层和 第二绝缘树脂层的厚度为5μm以上且60μm以下。