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1. 发明专利

JP2012173130A Mirror adjustment tool, structure state change detection system, and structure state change detection method 有权
标题翻译：镜像调整工具，结构状态变化检测系统和结构状态变化检测方法
公开(公告)号：JP2012173130A
公开(公告)日：2012-09-10
申请号：JP2011035265
申请日：2011-02-21
申请人： Kobe Univ , Katsuyuki Nakada , Ushikata Shokai:Kk , 勝行中田 , 国立大学法人神戸大学 , 有限会社牛方商会
发明人： AKUTAGAWA SHINICHI , NAKADA KATSUYUKI , SASAKI HIROSHI
IPC分类号： G01C15/06 , G01C7/02 , G01C15/00
CPC分类号： Y02A20/402
摘要： PROBLEM TO BE SOLVED: To provide a structure state change detection system and a structure state change detection method that effectively monitor states of a natural structure and an artificial structure at low cost, and a mirror adjustment tool which adjusts an angle with high precision by equipping a structure with a mirror.SOLUTION: The structure state change detection system includes a target equipped with light emission means, a mirror, and a mirror adjustment tool which supports and adjusts the mirror, and detects a state change of a structure from whether light emitted by the light emission means is reflected by the mirror and reaches an observation point. The mirror adjustment tool comprises: a column buried in or fixed to the structure; a mirror support part to which the mirror is fixed; and a leg reception part which is provided to the column, and fixes the mirror support part by inserting a leg part provided to the mirror support part and filling the inside with a solidification material; an arm part which supports the mirror support part at one end and has the other end coupled and fixed to the column or leg reception part; and an angle adjustment mechanism capable of adjusting a tilt angle of the mirror support part.
摘要翻译：要解决的问题：提供一种以低成本有效地监测自然结构和人造结构的状态的结构状态变化检测系统和结构状态变化检测方法，以及调整角度高的镜面调节工具通过装配一个镜子的结构精度。解决方案：结构状态变化检测系统包括配备有发光装置，反射镜和支撑并调整反射镜的反射镜调节工具的目标，并且检测结构的状态变化是否由光发出的光发射装置被镜子反射并到达观察点。镜子调节工具包括：埋在或固定在结构上的柱; 镜子固定到的镜子支撑部分; 以及腿部接收部，其设置在所述列上，并且通过插入设置在所述镜支撑部的脚部并且用固化材料填充内侧来固定所述镜支撑部; 臂部，其在一端支撑镜支撑部，并且另一端连接并固定到柱或腿接收部; 以及能够调整镜支撑部的倾斜角度的角度调节机构。版权所有（C）2012，JPO＆INPIT

2. 发明申请

US20090268595A1 INFORMATION RECORDING MEDIUM AND RECORDING/REPRODUCING APPARATUS 审中-公开
标题翻译：信息记录介质和记录/再现设备
公开(公告)号：US20090268595A1
公开(公告)日：2009-10-29
申请号：US12109661
申请日：2008-04-25
申请人： Narutoshi Fukuzawa , Katsuyuki Nakada
发明人： Narutoshi Fukuzawa , Katsuyuki Nakada
IPC分类号： G11B7/24
CPC分类号： G11B5/59688 , B82Y10/00 , G11B5/743 , G11B5/82 , G11B5/855
摘要： On an information recording medium, a first region where first recording regions that are long in a radial direction are disposed at a predetermined pitch with first non-recording regions in between is provided in a preamble pattern region. A second recording region that connects first recording regions that are adjacent in a direction of rotation is provided in the first region. A second non-recording region that is longer in the direction of rotation than a length in the direction of rotation of the first non-recording regions at corresponding same-pattern-radius positions is provided at a position where a read of servo data is carried out following the first region.
摘要翻译：在信息记录介质中，在前导码图案区域中设置有第一区域，其中以径向方向长的第一记录区域以预定间距设置，其间具有第一非记录区域。在第一区域中设置有连接在旋转方向上相邻的第一记录区域的第二记录区域。在对应的同一图案半径位置处的第一非记录区域的旋转方向上的长度方向上比旋转方向更长的第二非记录区域设置在伺服数据的读取位置跟随第一个地区。

3. 发明申请

US20080123209A1 MAGNETIC RECORDING MEDIUM, RECORDING/REPRODUCING APPARATUS, AND STAMPER 失效
标题翻译：磁记录介质，记录/再现设备和印章
公开(公告)号：US20080123209A1
公开(公告)日：2008-05-29
申请号：US11944485
申请日：2007-11-23
申请人： Katsuyuki NAKADA , Mitsuru TAKAI , Kazuhiro HATTORI
发明人： Katsuyuki NAKADA , Mitsuru TAKAI , Kazuhiro HATTORI
IPC分类号： G11B5/09 , G11B5/82
CPC分类号： G11B5/855 , B82Y10/00 , G11B5/743
摘要： A rotary-type magnetic recording medium has servo patterns formed in servo pattern regions on a substrate by patterns including recording regions and non-recording regions. Burst signal units composed of the recording regions or the non-recording regions are formed in burst pattern regions in the servo pattern regions. The burst signal units are formed so that for at least one edge out of both edges along a direction of rotation of the magnetic recording medium, a center in the direction of rotation is positioned closer to the other edge than both ends in the direction of rotation, and a ratio of a length along a radial direction of the magnetic recording medium between both ends and the center of the one edge to a length along the radial direction between both ends of the one edge and both ends of the other edge is in a range of 0.2 or below.
摘要翻译：旋转型磁记录介质具有通过包括记录区域和非记录区域的图案在基板上的伺服图案区域中形成的伺服图案。由记录区域或非记录区域组成的突发信号单元形成在伺服图案区域中的突发模式区域中。突发信号单元被形成为使得对于沿着磁记录介质的旋转方向的两个边缘中的至少一个边缘，旋转方向上的中心比旋转方向上的两端更靠近另一边缘并且沿着一端的两端与一边的中心之间的磁记录介质的沿径向的长度与该另一边的两端两端之间沿径向的长度的比率为范围在0.2以下。

4. 发明申请

US20060275692A1 Method for forming concavo-convex pattern, method for manufacturing master disk, method for manufacturing stamper, and method for manufacturing magnetic recording medium 审中-公开
标题翻译：用于形成凹凸图案的方法，用于制造母盘的方法，用于制造压模的方法以及制造磁记录介质的方法
公开(公告)号：US20060275692A1
公开(公告)日：2006-12-07
申请号：US11445336
申请日：2006-06-02
申请人： Shuichi Okawa , Katsuyuki Nakada , Kazuhiro Hattori , Mitsuru Takai
发明人： Shuichi Okawa , Katsuyuki Nakada , Kazuhiro Hattori , Mitsuru Takai
IPC分类号： G03C5/00
CPC分类号： G11B5/855
摘要： A method for forming a concavo-convex pattern that can form a fine and complex concavo-convex pattern such as that corresponding to servo information with high precision, a method for manufacturing a master disk, a method for manufacturing a stamper, and a method for manufacturing a magnetic recording medium using that method for forming a concavo-convex pattern are provided. A resin layer formed over a resin layer supporting member is processed into an irregular concavo-convex pattern in which a dividing convex portion is formed in a part of concave portions of a predetermined basic concavo-convex pattern and at least some of concave portions are divided as compared with corresponding concave portions of the basic concavo-convex pattern. A recording layer (the resin layer supporting member) is etched based on the resin layer to be processed into a concavo-convex pattern obtained by bringing the irregular concavo-convex pattern close to the basic concavo-convex pattern.
摘要翻译：一种用于形成能够以高精度形成与伺服信息相对应的精细复杂凹凸图案的凹凸图案的方法，制造母盘的方法，制造压模的方法，以及用于制造使用这种形成凹凸图案的方法的磁记录介质。形成在树脂层支撑构件上的树脂层被加工成不规则的凹凸图案，其中在预定的基本凹凸图案的凹部的一部分中形成有分割凸部，并且至少部分凹部被分割与基本凹凸图案的相应凹部相比较。基于要加工的树脂层将记录层（树脂层支撑构件）蚀刻成通过使不规则凹凸图案接近基本凹凸图案而获得的凹凸图案。

5. 发明申请

US20050138803A1 Stamper for pattern transfer and manufacturing method thereof 审中-公开
标题翻译：图案转印用压模及其制造方法
公开(公告)号：US20050138803A1
公开(公告)日：2005-06-30
申请号：US10974834
申请日：2004-10-28
申请人： Shuichi Okawa , Kazuhiro Hattori , Katsuyuki Nakada , Mitsuru Takai
发明人： Shuichi Okawa , Kazuhiro Hattori , Katsuyuki Nakada , Mitsuru Takai
IPC分类号： B29C33/38 , B29L17/00 , B41C3/06 , C23F1/00 , C25D1/00 , G11B5/855 , G11B7/26 , B29C35/00 , A01J21/00 , H05K1/03
CPC分类号： G11B5/855 , B41C3/06 , G11B7/263 , Y10T29/49155
摘要： In a stamper which is used as a mold for pattern transfer, the problem is resolved in such a manner that at least the convex extreme surface of the stamper is formed of a material 110 with no crystalline peak in X-ray diffraction. Such a stamper can be manufactured by the method comprising the steps of forming a convex-concave pattern on a substrate, forming, on the convex-concave pattern, a layer of a material 110 with no crystalline peak in X-ray diffraction, and removing the layer of the material with no crystalline peak in X-ray diffraction from said substrate and convex-concave pattern in intimate contact with the layer.
摘要翻译：在用作图案转印用模具的压模中，解决了这样的问题，即，在X射线衍射中，至少压模的凸极的表面由材料110形成，没有结晶峰。这样的压模可以通过以下方法制造：包括以下步骤：在基板上形成凸凹图案，在凸凹图案上形成在X射线衍射中没有结晶峰的材料层110，以及去除在与所述基底的X射线衍射中没有结晶峰的材料层和与该层紧密接触的凸凹图案。

6. 发明申请

US20050127032A1 Master for concavo-convex pattern transfer and method for manufacturing stamp for manufacturing information recording medium 审中-公开
标题翻译：凹凸图案转印主体和用于制造信息记录介质的印章制造方法
公开(公告)号：US20050127032A1
公开(公告)日：2005-06-16
申请号：US10991779
申请日：2004-11-19
申请人： Katsuyuki Nakada , Kazuhiro Hattori
发明人： Katsuyuki Nakada , Kazuhiro Hattori
IPC分类号： G11B5/84 , B44C1/22 , C03C15/00 , C23F1/28 , C23F4/00 , C25D1/10 , G11B5/82 , G11B5/855 , G11B5/86 , G11B7/26
CPC分类号： B82Y10/00 , C03C15/00 , C23F1/28 , C23F4/00 , C25D1/10 , G11B5/743 , G11B5/82 , G11B5/855 , G11B5/865 , G11B7/261
摘要： A method for manufacturing a master for concavo-convex pattern transfer, which enables highly accurate manufacture of a master carrying a concavo-convex pattern including a convex portion at a large aspect ratio, and a method for manufacturing a stamp using the master are provided. A mask layer is formed in a predetermined pattern on an object to be etched having a higher rigidity than that of a resist material. The object to be etched is then etched so as to form a concavo-convex pattern on the surface thereof to obtain a master for concavo-convex pattern transfer. A material having a lower etching rate than that of the resist material and that of the object to be etched is used as a material of the mask layer.
摘要翻译：提供了一种用于制造用于凹凸图案转印的母版的方法，其能够高精度地制造承载具有大纵横比的凸部的凹凸图案的主体以及使用母版制造印章的方法。掩模层以比抗蚀剂材料刚性高的被蚀刻物体上的预定图案形成。然后蚀刻待蚀刻的物体，以在其表面上形成凹凸图案，以获得用于凹凸图案转印的母版。作为掩模层的材料，使用具有比抗蚀剂材料蚀刻速率低的蚀刻速率和被蚀刻对象的材料。

7. 发明授权

US07531103B2 Mask forming method, mask forming functional layer, dry etching method, and method of manufacturing an information recording medium 失效
标题翻译：掩模形成方法，掩模形成功能层，干蚀刻方法和信息记录介质的制造方法
公开(公告)号：US07531103B2
公开(公告)日：2009-05-12
申请号：US10947289
申请日：2004-09-23
申请人： Shuichi Okawa , Kazuhiro Hattori , Katsuyuki Nakada , Mitsuru Takai
发明人： Shuichi Okawa , Kazuhiro Hattori , Katsuyuki Nakada , Mitsuru Takai
IPC分类号： B44C1/22
CPC分类号： G11B5/82 , B82Y10/00 , G11B5/743 , G11B5/855 , Y10T428/24802
摘要： A mask forming method forms an A mask forming functional layer with an amorphous structure so as to cover an etched body, forms a B mask forming functional layer so as to cover the formed A mask forming functional layer, forms a convex/concave pattern in the formed B mask forming functional layer by carrying out a predetermined process to form a B mask on the A mask forming functional layer, and forms an A mask on the etched body by forming a convex/concave pattern in the A mask forming functional layer by dry etching the A mask forming functional layer using the B mask. By doing so, a convex/concave pattern with extremely small pattern fluctuations can be formed in the A mask forming functional layer.
摘要翻译：掩模形成方法形成具有非晶结构的A掩模形成功能层以覆盖蚀刻体，形成B掩模形成功能层，以覆盖所形成的A掩模形成功能层，在其中形成凸/凹图案通过在A掩模形成功能层上进行预定处理以形成B掩模形成B掩模形成功能层，并且通过在A掩模形成功能层中通过干燥形成凸/凹图案在蚀刻体上形成A掩模使用B掩模蚀刻形成A掩模的功能层。通过这样做，可以在A掩模形成功能层中形成具有极小图案波动的凸/凹图案。

8. 发明申请

US20070023704A1 PATTERN DRAWING METHOD, STAMPER MANUFACTURING METHOD, AND PATTERN DRAWING APPARATUS 失效
标题翻译：图案绘图方法，冲压器制造方法和图案绘图装置
公开(公告)号：US20070023704A1
公开(公告)日：2007-02-01
申请号：US11457545
申请日：2006-07-14
申请人： Katsuyuki Nakada , Kazuhiro Hattori , Shuichi Okawa
发明人： Katsuyuki Nakada , Kazuhiro Hattori , Shuichi Okawa
IPC分类号： G21K5/10
CPC分类号： H01J37/3026 , B82Y10/00 , B82Y40/00 , G11B5/82 , G11B5/855 , H01J37/3174
摘要： A pattern drawing method capable of drawing a pattern such that opposite ends of a formation region on an inner periphery side and an outer periphery side are substantially linearly formed. A drawing beam is intermittently irradiated N times onto a generally belt-shaped exposure area extending in a direction of rotation of the substrate from one end to the other end of the belt-shaped exposure area in the direction of rotation of the substrate, the belt-shaped exposure area being defined within a formation region, in which one of the convex or concave portions is to be formed, to thereby irradiate the drawing beam onto N generally belt-shaped irradiation areas extending in the direction of rotation of the substrate.
摘要翻译：一种图形绘制方法，其能够绘制使内周侧和外周侧的形成区域的相对端基本线性地形成的图案。拉伸梁被间歇地照射N次到沿着基板的旋转方向延伸的大致带状的曝光区域，从基板的旋转方向的带状曝光区域的一端到另一端，带形状的曝光区域被限定在其中要形成一个凸部或凹部的形成区域内，从而将拉伸光束照射到在基板的旋转方向上延伸的N个大致带状的照射区域上。

9. 发明申请

US20100108640A1 DRAWING METHOD, STAMPER MANUFACTURING METHOD, INFORMATION RECORDING MEDIUM MANUFACTURING METHOD, AND DRAWING APPARATUS 审中-公开
标题翻译：绘图方法，冲压器制造方法，信息记录介质制造方法和绘图装置
公开(公告)号：US20100108640A1
公开(公告)日：2010-05-06
申请号：US12611148
申请日：2009-11-03
申请人： Katsuyuki NAKADA , Mitsuru TAKAI , Kazuhiro HATTORI
发明人： Katsuyuki NAKADA , Mitsuru TAKAI , Kazuhiro HATTORI
IPC分类号： B44C1/22 , B29C59/00 , C23F1/08
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/70383
摘要： A drawing method and a drawing apparatus use a drawing beam to draw a pattern, which will be used when forming a concave/convex pattern, on a resin layer formed on a substrate. When doing so, to prevent insufficient exposure to the drawing beam in certain parts of the pattern that tend to be insufficiently exposed, the number of irradiation of the drawing beam is changed. By doing so, the production of defects in the concave/convex pattern is avoided and the pattern can be made finer.
摘要翻译：拉伸方法和拉伸装置在形成在基板上的树脂层上使用拉伸梁来画出在形成凹凸图案时使用的图案。当这样做时，为了防止在图案的某些部分中暴露于拉伸光束的曝光不足的倾向，改变了拉伸光束的照射次数。通过这样做，避免了产生凹凸图案中的缺陷，并且可以使图案更细。

10. 发明授权

US07388215B2 Pattern drawing method, stamper manufacturing method, and pattern drawing apparatus 失效
标题翻译：图案绘制方法，压模制造方法和图案描绘装置
公开(公告)号：US07388215B2
公开(公告)日：2008-06-17
申请号：US11457545
申请日：2006-07-14
申请人： Katsuyuki Nakada , Kazuhiro Hattori , Shuichi Okawa
发明人： Katsuyuki Nakada , Kazuhiro Hattori , Shuichi Okawa
IPC分类号： G21K5/10 , H01J37/30
CPC分类号： H01J37/3026 , B82Y10/00 , B82Y40/00 , G11B5/82 , G11B5/855 , H01J37/3174
摘要： A pattern drawing method capable of drawing a pattern such that opposite ends of a formation region on an inner periphery side and an outer periphery side are substantially linearly formed. A drawing beam is intermittently irradiated N times onto a generally belt-shaped exposure area extending in a direction of rotation of the substrate from one end to the other end of the belt-shaped exposure area in the direction of rotation of the substrate, the belt-shaped exposure area being defined within a formation region, in which one of the convex or concave portions is to be formed, to thereby irradiate the drawing beam onto N generally belt-shaped irradiation areas extending in the direction of rotation of the substrate.
摘要翻译：一种图形绘制方法，其能够绘制使内周侧和外周侧的形成区域的相对端基本线性地形成的图案。拉伸梁被间歇地照射N次到沿着基板的旋转方向延伸的大致带状的曝光区域，从基板的旋转方向的带状曝光区域的一端到另一端，带形状的曝光区域被限定在其中要形成一个凸部或凹部的形成区域内，从而将拉伸光束照射到在基板的旋转方向上延伸的N个大致带状的照射区域上。

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