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    • 5. 发明授权
    • Methods for high temperature processing of epitaxial chips
    • 外延芯片的高温处理方法
    • US08410511B2
    • 2013-04-02
    • US12589056
    • 2009-10-16
    • Scott M. ZimmermanKarl W. BeesonWilliam R. Livesay
    • Scott M. ZimmermanKarl W. BeesonWilliam R. Livesay
    • H01L29/22H01L21/20
    • H01L33/32H01L31/0236H01L31/052H01L31/054H01L31/056H01L31/0687H01L33/0075H01L2924/0002H01L2924/00
    • High temperature semiconducting materials in a freestanding epitaxial chip enables the use of high temperature interconnect and bonding materials. Process materials can be used which cure, fire, braze, or melt at temperatures greater than 400 degrees C. These include, but are not limited to, brazing alloys, laser welding, high-temperature ceramics and glasses. High temperature interconnect and bonding materials can additionally exhibit an index of refraction intermediate to that of the freestanding epitaxial chip and its surrounding matrix. High index, low melting point glasses provide a hermetic seal of the semiconductor device and also index match the freestanding epitaxial chip thereby increasing extraction efficiency. In this manner, a variety of organic free semiconducting devices, such as solid-sate lighting sources, can be created which exhibit superior life, efficiency, and environmental stability.
    • 独立外延芯片中的高温半导体材料可以使用高温互连和接合材料。 可以使用在大于400摄氏度的温度下固化,起火,钎焊或熔化的工艺材料。这些材料包括但不限于钎焊合金,激光焊接,高温陶瓷和玻璃。 高温互连和接合材料还可以呈现折射率中间到独立外延芯片及其周围矩阵的折射率。 高折射率低熔点玻璃提供了半导体器件的气密密封,并且还具有与独立外延芯片匹配的指标,从而提高了提取效率。 以这种方式,可以产生各种有机自由半导体器件,例如固体照明源,其表现出优异的寿命,效率和环境稳定性。