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    • 3. 发明授权
    • Compounds capable of generating an acid by light irradiation
    • 能够通过光照射产生酸的化合物
    • US5237059A
    • 1993-08-17
    • US854853
    • 1992-03-20
    • Kan WakamatsuYuichi Wakata
    • Kan WakamatsuYuichi Wakata
    • B41M5/155C07C251/34C07C255/01C07C309/74C07C311/29C07C381/00C07D207/46C07D209/48C09K11/07
    • C07D209/48C07C309/74C07C381/00
    • A compound capable of generating an acid by light irradiation selected from the group consisting of oxime sulfonic acid esters of formula (I): ##STR1## wherein R.sup.1 is an alkyl group, each of R.sup.2 and R.sup.3 is selected from the group consisting of a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group and a cyano group, and R.sup.2 and R.sup.3 may optionally combine to form a ring; and N-hydroxyimidesulfonic acid esters of formula (II): ##STR2## wherein R.sup.1 is an alkyl group, and A is a group selected from the group consisting of a substituted or unsubstituted arylene group, a substituted or unsubstituted alkylene group and a substituted or unsubstituted alkenylene group, wherein the compound capable of generating an acid by light irradiation is useful as an image-forming materials, etc. and has high reactivity to light of from the near ultraviolet region to the visible region.
    • 能够通过光照射产生酸的化合物,其选自式(I)的肟磺酸酯:其中R 1是烷基,R 2和R 3各自选自 取代或未取代的烷基,取代或未取代的芳基和氰基,R 2和R 3可任选地结合形成环; 和式(II)的N-羟基酰亚胺磺酸酯:其中R 1是烷基,A是选自取代或未取代的亚芳基,取代或未取代的亚烷基和 取代或未取代的亚烯基,其中通过光照射产生酸的化合物可用作成像材料等,并且对从近紫外区域到可见光区域的光具有高反应性。