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    • 1. 发明申请
    • CUSHIONING MATERIAL FOR POLISHING PAD
    • 抛光垫用料
    • WO2006085614A2
    • 2006-08-17
    • PCT/JP2006302355
    • 2006-02-10
    • NHK SPRING CO LTDKAWAGUCHI HIROMASAKIMURA TOSHIAKIKAWAKAMI TAKESHI
    • KAWAGUCHI HIROMASAKIMURA TOSHIAKIKAWAKAMI TAKESHI
    • B24B37/20C08J5/14C08L75/04H01L21/304
    • B24B37/24Y10T428/249989Y10T428/249991Y10T428/249992
    • Disclosed is a cushioning material for polishing pads which hardly suffers swelling deformation caused by water since it is extremely low in water-absorbing properties and water-swelling properties. This cushioning material for polishing pads is composed of a polyurethane foam which is capable of polishing even a semiconductor wafer having an undulated surface or a wafer having a local step that is formed during circuit formation so that the undulation or step becomes shallower by uniformly polishing the entire surface of the wafer along the undulation or step. Specifically disclosed is a polyurethane foam obtained by reaction between a polyol and a polyisocyanate which is characterized by having a contact angle with water of not less than 90°. The polyurethane foam is preferably made by using a hydrophobic polyol, and it is also preferable that the polyurethane foam has a self-skin layer.
    • 公开了一种用于抛光垫的缓冲材料,其由于吸水性和水溶胀性极低而几乎不会受到水引起的溶胀变形。 用于抛光垫的缓冲材料由聚氨酯泡沫构成,其能够抛光甚至具有波纹表面的半导体晶片或具有在电路形成期间形成的局部台阶的晶片,从而通过均匀抛光所述波动或阶梯变浅 晶圆的整个表面沿起伏或阶跃。 具体公开了通过多元醇与多异氰酸酯反应得到的聚氨酯泡沫体,其特征在于与水的接触角不小于90°。 聚氨酯泡沫优选通过使用疏水多元醇制成,并且还优选聚氨酯泡沫具有自 - 表皮层。