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1. 发明申请

WO2013019770A1 ANTIREFLECTIVE SILICA COATINGS BASED ON SOL-GEL TECHNIQUE 审中-公开
标题翻译：基于SOL-GEL技术的抗反射硅胶涂层
公开(公告)号：WO2013019770A1
公开(公告)日：2013-02-07
申请号：PCT/US2012/048932
申请日：2012-07-31
申请人： INTERMOLECULAR, INC. , KUMAR, Nitin , KALYANKAR, Nikhil, D. , SUN, Zhi-Wen
发明人： KUMAR, Nitin , KALYANKAR, Nikhil, D. , SUN, Zhi-Wen
IPC分类号： B32B5/16
CPC分类号： C09D183/04 , B05D5/06 , C03C17/009 , C03C2217/425 , C03C2217/732 , C03C2218/113 , C08L83/04 , C23C18/00
摘要： Methods and compositions for forming durable porous low refractive index coatings on substrates are provided. In one embodiment, a method of forming a porous coating on a substrate is provided. The method comprises coating a substrate with a sol-formulation comprising a silane-based binder, silica-based nanoparticles, and an inter-particle interaction modifier for regulating interactions between the silica-based nanoparticles and annealing the coated substrate. Porous coatings formed according to the embodiments described herein demonstrate good optical properties (e.g., a low refractive index) while maintaining good mechanical durability due to the presence of the inter-particle interaction modifier. The inter- particle interaction modifier increases the strength of the particle network countering capillary forces produced during drying to maintain the porosity structure.
摘要翻译：提供了在基板上形成耐久的多孔低折射率涂层的方法和组合物。在一个实施方案中，提供了在基材上形成多孔涂层的方法。该方法包括用包含硅烷基粘合剂，二氧化硅基纳米颗粒和颗粒间相互作用改性剂的溶胶制剂涂覆基材，以调节二氧化硅基纳米颗粒之间的相互作用并退火涂覆的基材。根据本文所述的实施方案形成的多孔涂层由于存在颗粒间相互作用改性剂而保持良好的机械耐久性，表现出良好的光学性能（例如，低折射率）。颗粒间相互作用调节剂增加了颗粒网络抵抗干燥期间产生的毛细管力的强度，以保持孔隙结构。

2. 发明申请

WO2011035272A1 METHODS OF BUILDING CRYSTALLINE SILICON SOLAR CELLS FOR USE IN COMBINATORIAL SCREENING 审中-公开
标题翻译：建立晶体硅太阳能电池组合使用方法
公开(公告)号：WO2011035272A1
公开(公告)日：2011-03-24
申请号：PCT/US2010/049542
申请日：2010-09-20
申请人： INTERMOLECULAR, INC. , LI, Jian , NGUYEN, Minh, Anh , KALYANKAR, Nikhil , KUMAR, Nitin , HUNTER, James, Craig
发明人： LI, Jian , NGUYEN, Minh, Anh , KALYANKAR, Nikhil , KUMAR, Nitin , HUNTER, James, Craig
IPC分类号： H01L29/24
CPC分类号： H01L31/0516 , H01L21/228 , H01L31/02363 , H01L31/068 , H01L31/0682 , H01L31/1804 , H02S50/10 , Y02B10/10 , Y02E10/547 , Y02P70/521
摘要： Embodiments of the current invention describe methods of forming different types of crystalline silicon based solar cells that can be combinatorially varied and evaluated. Examples of these different types of solar cells include front and back contact silicon based solar cells, all-back contact solar cells, and selective emitter solar cells.
摘要翻译：本发明的实施例描述了可以组合地改变和评估的不同类型的晶体硅基太阳能电池的形成方法。这些不同类型的太阳能电池的实例包括正面和背面接触硅基太阳能电池，全背接触太阳能电池和选择性发射极太阳能电池。

3. 发明申请

WO2010111197A2 ACID CHEMISTRIES AND METHODOLOGIES FOR TEXTURING TRANSPARENT CONDUCTIVE OXIDE MATERIALS 审中-公开
标题翻译：用于纹理透明导电氧化物材料的酸化学和方法
公开(公告)号：WO2010111197A2
公开(公告)日：2010-09-30
申请号：PCT/US2010028199
申请日：2010-03-22
申请人： INTERMOLECULAR INC , SUN ZHI-WEN , KUMAR NITIN , ZHANG GUIZHEN , NGUYEN MINH ANH , KALYANKAR NIKHIL
发明人： SUN ZHI-WEN , KUMAR NITIN , ZHANG GUIZHEN , NGUYEN MINH ANH , KALYANKAR NIKHIL
IPC分类号： H01L31/042
CPC分类号： C23C14/5873 , C03C17/36 , C03C17/3678 , C03C2217/944 , C03C2218/32 , C09K13/04 , C23C14/086 , H01L31/02366 , Y02E10/50
摘要： Surface texturing of the transparent conductive oxide (TCO) front contact of a thin film photovoltaic (TFPV) solar cell is needed to enhance the light-trapping capability of the TFPV solar cells and thus improving the solar cell efficiency. Embodiments of the current invention describe chemical formulations and methods for the wet etching of the TCO. The formulations and methods may be optimized to tune the surface texturing of the TCO as desired.
摘要翻译：需要薄膜光伏（TFPV）太阳能电池的透明导电氧化物（TCO）前触点的表面纹理来增强TFPV太阳能电池的光捕获能力，从而提高太阳能电池效率。本发明的实施方案描述了用于湿法蚀刻TCO的化学配方和方法。可以优化配方和方法以根据需要调整TCO的表面纹理。

4. 发明申请

WO2010111197A3 ACID CHEMISTRIES AND METHODOLOGIES FOR TEXTURING TRANSPARENT CONDUCTIVE OXIDE MATERIALS 审中-公开
公开(公告)号：WO2010111197A3
公开(公告)日：2010-09-30
申请号：PCT/US2010/028199
申请日：2010-03-22
申请人： INTERMOLECULAR, INC. , SUN, Zhi-Wen , KUMAR, Nitin , ZHANG, Guizhen , NGUYEN, Minh Anh , KALYANKAR, Nikhil
发明人： SUN, Zhi-Wen , KUMAR, Nitin , ZHANG, Guizhen , NGUYEN, Minh Anh , KALYANKAR, Nikhil
IPC分类号： H01L31/042
摘要： Surface texturing of the transparent conductive oxide (TCO) front contact of a thin film photovoltaic (TFPV) solar cell is needed to enhance the light-trapping capability of the TFPV solar cells and thus improving the solar cell efficiency. Embodiments of the current invention describe chemical formulations and methods for the wet etching of the TCO. The formulations and methods may be optimized to tune the surface texturing of the TCO as desired.

5. 发明申请

WO2010019722A3 COMBINATORIAL APPROACH TO THE DEVELOPMENT OF CLEANING FORMULATIONS FOR GLUE REMOVAL IN SEMICONDUCTOR APPLICATIONS 审中-公开
标题翻译：在半导体应用中去除玻璃清洁制剂的组合方法
公开(公告)号：WO2010019722A3
公开(公告)日：2010-05-14
申请号：PCT/US2009053624
申请日：2009-08-12
申请人： INTERMOLECULAR INC , KALYANKAR NIKHIL D , LANG CHI-I , FRESCO ZACHARY
发明人： KALYANKAR NIKHIL D , LANG CHI-I , FRESCO ZACHARY
IPC分类号： C11D7/08 , B08B3/10 , C11D7/30 , C11D7/50
CPC分类号： C11D11/0047 , B08B3/10 , C11D7/265 , C11D7/28 , C11D7/34 , C11D7/36 , C11D7/5004
摘要： Embodiments of the current invention describe cleaning solutions to clean the surface of a photomask, methods of cleaning the photomask using at least one of the cleaning solutions, and combinatorial methods of formulating the cleaning solutions. The cleaning solutions are formulated to preserve the optical properties of the photomask, and in particular, of a phase-shifting photomask.
摘要翻译：本发明的实施例描述了清洁光掩模表面的清洁溶液，使用至少一种清洁溶液清洁光掩模的方法以及配制清洁溶液的组合方法。制备清洁溶液以保持光掩模的光学性质，特别是相移光掩模。

6. 发明申请

WO2012125271A1 SOL-GEL BASED HYDROPHOBIC ULTRA LOW REFRACTIVE INDEX ANTI-REFLECTIVE COATINGS 审中-公开
标题翻译：基于溶胶凝胶的超声波超低折射率抗反射涂层
公开(公告)号：WO2012125271A1
公开(公告)日：2012-09-20
申请号：PCT/US2012/026371
申请日：2012-02-23
申请人： INTERMOLECULAR. INC. , KALYANKAR, Nikhil , KUMAR, Nitin
发明人： KALYANKAR, Nikhil , KUMAR, Nitin
IPC分类号： B05D5/00
CPC分类号： C03C17/007 , C03C17/34 , C03C2217/425 , C03C2217/732 , C03C2218/113 , C03C2218/32 , C08K5/5403 , C08K5/5419 , C09D1/00 , C09D5/006 , C09D7/63
摘要： Embodiments of the invention relate generally to methods and compositions for forming porous low refractive index coatings on substrates. In one embodiment, a method of forming a porous coating on a substrate is provided. The method comprises coating a substrate with a sol-gel composition comprising at least one self assembling molecular porogen and annealing the coated substrate to remove the at least one self assembling molecular porogen to form the porous coating. Use of the self assembling molecular porogens leads to the formation of stable pores with larger volume and an increased reduction in the refractive index of the coating. Further, the size and interconnectivity of the pores may be controlled via selection of the self assembling molecular porogens structure, the total porogen fraction, polarity of the molecule and solvent, and other physiochemical properties of the gel phase.
摘要翻译：本发明的实施方案一般涉及在基底上形成多孔低折射率涂层的方法和组合物。在一个实施方案中，提供了在基材上形成多孔涂层的方法。该方法包括用包含至少一种自组装分子致孔剂的溶胶 - 凝胶组合物涂覆底物并退火涂覆的基底以除去至少一个自组装分子致孔剂以形成多孔涂层。使用自组装分子致孔剂导致形成具有较大体积的稳定孔，并且涂层的折射率降低。此外，孔的尺寸和互连性可以通过选择自组装分子致孔剂结构，总致孔剂分数，分子和溶剂的极性以及凝胶相的其它物理化学性质来控制。

7. 发明申请

WO2010019722A2 COMBINATORIAL APPROACH TO THE DEVELOPMENT OF CLEANING FORMULATIONS FOR GLUE REMOVAL IN SEMICONDUCTOR APPLICATIONS 审中-公开
标题翻译：半导体应用中除胶剂清洗剂组合清洗剂的组合方法
公开(公告)号：WO2010019722A2
公开(公告)日：2010-02-18
申请号：PCT/US2009/053624
申请日：2009-08-12
申请人： INTERMOLECULAR, INC. , KALYANKAR, Nikhil, D. , LANG, Chi-I , FRESCO, Zachary
发明人： KALYANKAR, Nikhil, D. , LANG, Chi-I , FRESCO, Zachary
IPC分类号： C11D7/08 , C11D7/30 , C11D7/50 , B08B3/10
CPC分类号： C11D11/0047 , B08B3/10 , C11D7/265 , C11D7/28 , C11D7/34 , C11D7/36 , C11D7/5004
摘要： Embodiments of the current invention describe cleaning solutions to clean the surface of a photomask, methods of cleaning the photomask using at least one of the cleaning solutions, and combinatorial methods of formulating the cleaning solutions. The cleaning solutions are formulated to preserve the optical properties of the photomask, and in particular, of a phase-shifting photomask.
摘要翻译：本发明的实施例描述了清洁光掩模表面的清洁溶液，使用至少一种清洁溶液清洁光掩模的方法以及配制清洁溶液的组合方法。清洁溶液的配制是为了保持光掩模的光学特性，特别是相移光掩模的光学特性。

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