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1. 发明授权

US08734907B2 Coating of shield surfaces in deposition systems 有权
标题翻译：在沉积系统中涂覆屏蔽表面
公开(公告)号：US08734907B2
公开(公告)日：2014-05-27
申请号：US13365070
申请日：2012-02-02
申请人： Vibhu Jindal , Junichi Kageyama
发明人： Vibhu Jindal , Junichi Kageyama
IPC分类号： B05D3/10
CPC分类号： C23C14/564 , B82Y10/00 , B82Y40/00 , C23C14/34 , C23C14/35 , G03F1/22 , G03F1/60
摘要： A deposition chamber shield having a stainless steel coating of from about 100 microns to about 250 microns thick wherein the coated shield has a surface roughness of between about 300 microinches and about 800 microinches and a surface particle density of less than about 0.1 particles/mm2 of particles between about 1 micron and about 5 microns in size and no particles below about 1 micron in size, and process for production thereof is disclosed.
摘要翻译：一种沉积室屏蔽，其具有约100微米至约250微米厚的不锈钢涂层，其中涂覆的屏蔽物具有约300微英寸至约800微英寸的表面粗糙度和小于约0.1微米/ mm 2的表面颗粒密度公开了尺寸为约1微米至约5微米且尺寸小于约1微米的颗粒的颗粒及其生产方法。

2. 发明申请

US20120145534A1 PROCESS FOR PRODUCING REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY AND PROCESS FOR PRODUCING SUBSTRATE WITH FUNCTIONAL FILM FOR THE MASK BLANK 失效
标题翻译：用于生产用于EUV光刻的反射掩模的方法和用于生产具有用于掩蔽空白的功能膜的基板的方法
公开(公告)号：US20120145534A1
公开(公告)日：2012-06-14
申请号：US12967724
申请日：2010-12-14
申请人： Junichi KAGEYAMA
发明人： Junichi KAGEYAMA
IPC分类号： C23C14/14 , C23C14/34
CPC分类号： C23C14/46 , C23C14/18 , C23C14/3464 , G03F1/24
摘要： To provide a process for producing an EUV mask blank, capable of reducing foreign matter attributable to a sputtering target, and a process for producing a substrate with a functional film for such a mask blank.A process for producing a reflective mask blank for EUVL, which comprises at least a step of forming a Mo/Si multilayer reflective film, a step of forming a ruthenium (Ru) film or Ru compound film as a protective layer on the multilayer reflective film, and a step of forming an absorber layer to absorb EUV light, on the Ru film or Ru compound film, wherein the formation of the Mo film, the Si film, and the Ru film or Ru compound film, is carried out by means of an ion beam sputtering method, and in the formation of the Si film of the Mo/Si multilayer reflective film and in the formation of the Ru film or Ru compound film, the target angle, the type of the process gas, the process gas pressure, the RF power of ion source, the suppresser voltage, the ion beam voltage and the ion beam current are adjusted to be substantially the same; and based on an erosion region of a sputtering target used for the formation of the Si film, an erosion region and a non-erosion region of a sputtering target to be used for the formation of the Ru film or Ru compound film, are predicted, roughening treatment is applied to the non-erosion region thus predicted of the Ru target or Ru compound target, and then the formation of the Ru film or Ru compound film is carried out.
摘要翻译：提供能够减少归因于溅射靶的异物的EUV掩模毛坯的制造方法以及用于制造这种掩模毛坯用功能膜的基板的工序。一种用于EUVL的反射掩模板的制造方法，其至少包括形成Mo / Si多层反射膜的步骤，在多层反射膜上形成钌（Ru）膜或Ru化合物膜作为保护层的步骤以及在Ru膜或Ru化合物膜上形成吸收EUV光的吸收层的步骤，其中Mo膜，Si膜和Ru膜或Ru化合物膜的形成通过以下方式进行：离子束溅射法，并且在形成Mo / Si多层反射膜的Si膜中，并且在形成Ru膜或Ru化合物膜时，目标角度，处理气体的类型，工艺气体压力，将离子源的RF功率，抑制电压，离子束电压和离子束电流调整为基本相同; 并且基于用于形成Si膜的溅射靶的侵蚀区域，预测用于形成Ru膜或Ru化合物膜的溅射靶的侵蚀区域和非侵蚀区域，对如此预测的Ru靶或Ru化合物靶的非腐蚀区域进行粗糙化处理，然后进行Ru膜或Ru化合物膜的形成。

3. 发明申请

US20120100464A1 GLASS SUBSTRATE-HOLDING TOOL 失效
标题翻译：玻璃基板保持工具
公开(公告)号：US20120100464A1
公开(公告)日：2012-04-26
申请号：US12909399
申请日：2010-10-21
申请人： Junichi KAGEYAMA
发明人： Junichi KAGEYAMA
IPC分类号： G03F1/00 , B23Q3/00 , G03F7/20
CPC分类号： H01L21/6831 , G03F1/24 , G03F7/70741 , H01L21/67742
摘要： To provide a glass substrate-holding tool which is capable of avoiding scratching to the deposition surface of a glass substrate and dusting thereby caused as well as scratching and deposition of foreign substances at a center portion of the rear surface of the substrate and which is capable of suppressing dusting from the holding tool itself at the time of forming a multi-layered reflection film and an absorptive layer.A glass substrate-holding tool having, formed on a surface of a flat base, a catching portion for catching and holding by van der Waals forces, wherein the catching portion is in contact with only the periphery of the glass substrate.
摘要翻译：为了提供一种玻璃基板保持工具，其能够避免刮擦玻璃基板的沉积表面并引起粉尘，从而引起外来物质在基板后表面的中心部分的划伤和沉积，并且能够在形成多层反射膜和吸收层时抑制来自保持工具本身的粉尘。一种玻璃基板保持工具，其形成在平坦基座的表面上，用于通过范德华力捕获和保持的捕获部分，其中捕获部分仅与玻璃基板的周边接触。

4. 发明授权

US4472228A Cold drawn high-orientation multilayered film and process for manufacture of said film 失效
公开(公告)号：US4472228A
公开(公告)日：1984-09-18
申请号：US559461
申请日：1983-12-08
申请人： Isao Yoshimura , Osamu Mizukami , Hideo Hata , Junichi Kageyama , Takashi Kaneko
发明人： Isao Yoshimura , Osamu Mizukami , Hideo Hata , Junichi Kageyama , Takashi Kaneko
IPC分类号： B29C55/00 , B29C49/00 , B29C55/02 , B29C55/12 , B29K23/00 , B29L9/00 , B32B27/08 , B32B27/32 , C08J7/04 , B29D7/24
CPC分类号： B29C55/023 , B32B27/08 , C08J7/042 , B29K2023/06 , B29K2023/083 , B29K2096/005 , C08J2323/06 , Y10S428/91 , Y10T428/2495 , Y10T428/26 , Y10T428/269 , Y10T428/31725 , Y10T428/31743 , Y10T428/31746 , Y10T428/31797 , Y10T428/31801 , Y10T428/31855 , Y10T428/31909 , Y10T428/3192
摘要： A high-orientation multilayered film incorporates at least one cold drawn, highly oriented resin layer excellent in mechanical strength and suitable mainly for use as packaging material. Because of its specific stratal construction which is highly adaptable to afford a wide variety of specific functions, the composite film is suitable for manufacture of thermally shrinkable films which excel in transparency and in ability to shrink rapidly particularly at low temperatures. Also disclosed is a process for drawing at specific low temperatures at high expansion ratios the aforementioned multiplicity of resin layers either all by themselves or in conjunction with layers of other resins by utilizing the cold drawability of the aforementioned resin layers excelling in mechanical strength.

5. 发明授权

US4430378A Cold drawn high-orientation multilayered film and process for manufacture of said film 失效
公开(公告)号：US4430378A
公开(公告)日：1984-02-07
申请号：US460012
申请日：1983-01-21
申请人： Isao Yoshimura , Osamu Mizukami , Hideo Hata , Junichi Kageyama , Takashi Kaneko
发明人： Isao Yoshimura , Osamu Mizukami , Hideo Hata , Junichi Kageyama , Takashi Kaneko
IPC分类号： B29C55/00 , B29C49/00 , B29C55/02 , B29C55/12 , B29K23/00 , B29L9/00 , B32B27/08 , B32B27/32 , C08J7/04
CPC分类号： B29C55/023 , B32B27/08 , C08J7/042 , B29K2023/06 , B29K2023/083 , B29K2096/005 , C08J2323/06 , Y10S428/91 , Y10T428/2495 , Y10T428/26 , Y10T428/269 , Y10T428/31725 , Y10T428/31743 , Y10T428/31746 , Y10T428/31797 , Y10T428/31801 , Y10T428/31855 , Y10T428/31909 , Y10T428/3192
摘要： A high-orientation multilayered film incorporates at least one cold drawn, highly oriented resin layer excellent in mechanical strength and suitable mainly for use as packaging material. Because of its specific stratal construction which is highly adaptable to afford a wide variety of specific functions, the composite film is suitable for manufacture of thermally shrinkable films which excel in transparency and in ability to shrink rapidly particularly at low temperatures. Also disclosed is a process for drawing at specific low temperatures at high expansion ratios the aforementioned multiplicity of resin layers either all by themselves or in conjunction with layers of other resins by utilizing the cold drawability of the aforementioned resin layers excelling in mechanical strength.

6. 发明授权

US08734586B2 Process for cleaning shield surfaces in deposition systems 有权
标题翻译：在沉积系统中清洁屏蔽表面的工艺
公开(公告)号：US08734586B2
公开(公告)日：2014-05-27
申请号：US13365077
申请日：2012-02-02
申请人： Vibhu Jindal , Junichi Kageyama
发明人： Vibhu Jindal , Junichi Kageyama
IPC分类号： B08B7/00
CPC分类号： G03F1/22 , B08B7/04 , B82Y10/00 , B82Y40/00 , C23C14/34 , C23C14/564 , G03F1/60
摘要： A process for cleaning and restoring deposition shield surfaces which results in a cleaned shield having a surface roughness of between about 200 microinches and about 500 microinches and a particle surface density of less than about 0.1 particles/mm2 of particles between about 1 micron and about 5 microns in size and no particles less than about 1 micron in size and method for use thereof is disclosed.
摘要翻译：一种用于清洁和恢复沉积屏蔽表面的方法，其导致具有约200微英寸至约500微英寸之间的表面粗糙度和小于约0.1微米/ mm 2的颗粒的颗粒表面密度在约1微米至约5微米之间的清洁屏蔽公开了尺寸微米和尺寸小于约1微米的颗粒及其使用方法。

7. 发明授权

US4501634A Cold drawn high-orientation multilayered film and process for manufacture of said film 失效
标题翻译：冷拉高取向多层膜及其制造方法
公开(公告)号：US4501634A
公开(公告)日：1985-02-26
申请号：US548018
申请日：1983-11-01
申请人： Isao Yoshimura , Osamu Mizukami , Hideo Hata , Junichi Kageyama , Takashi Kaneko
发明人： Isao Yoshimura , Osamu Mizukami , Hideo Hata , Junichi Kageyama , Takashi Kaneko
IPC分类号： B29C55/00 , B29C49/00 , B29C55/02 , B29C55/12 , B29K23/00 , B29L9/00 , B32B27/08 , B32B27/32 , C08J7/04
CPC分类号： B29C55/023 , B32B27/08 , C08J7/042 , B29K2023/06 , B29K2023/083 , B29K2096/005 , C08J2323/06 , Y10S428/91 , Y10T428/2495 , Y10T428/26 , Y10T428/269 , Y10T428/31725 , Y10T428/31743 , Y10T428/31746 , Y10T428/31797 , Y10T428/31801 , Y10T428/31855 , Y10T428/31909 , Y10T428/3192
摘要： A high-orientation multilayered film incorporates at least one cold drawn, highly oriented resin layer excellent in mechanical strength and suitable mainly for use as packaging material. Because of its specific stratal construction which is highly adaptable to afford a wide variety of specific functions, the composite film is suitable for manufacture of thermally shrinkable films which excel in transparency and in ability to shrink rapidly particularly at low temperatures. Also disclosed is a process for drawing at specific low temperatures at high expansion ratios the aforementioned multiplicity of resin layers either all by themselves or in conjunction with layers of other resins by utilizing the cold drawability of the aforementioned resin layers excelling in mechanical strength.
摘要翻译：高取向多层薄膜包含至少一种机械强度优异的冷拉伸高取向树脂层，主要用作包装材料。由于其具有高度适应性以提供多种特定功能的特定的地层结构，因此复合膜适用于制造透明性高，特别是在低温下快速收缩的热收缩膜。还公开了通过利用机械强度优异的上述树脂层的冷拉伸性，在上述多个树脂层的特定低温下，全部本身或与其它树脂的层结合而在高膨胀率下拉伸的方法。

8. 发明授权

US4469753A Cold drawn high-orientation multilayered film and process for manufacture of said film 失效
公开(公告)号：US4469753A
公开(公告)日：1984-09-04
申请号：US559463
申请日：1983-12-08
申请人： Isao Yoshimura , Osamu Mizukami , Hideo Hata , Junichi Kageyama , Takashi Kaneko
发明人： Isao Yoshimura , Osamu Mizukami , Hideo Hata , Junichi Kageyama , Takashi Kaneko
IPC分类号： B29C55/00 , B29C49/00 , B29C55/02 , B29C55/12 , B29K23/00 , B29L9/00 , B32B27/08 , B32B27/32 , C08J7/04
CPC分类号： B29C55/023 , B32B27/08 , C08J7/042 , B29K2023/06 , B29K2023/083 , B29K2096/005 , C08J2323/06 , Y10S428/91 , Y10T428/2495 , Y10T428/26 , Y10T428/269 , Y10T428/31725 , Y10T428/31743 , Y10T428/31746 , Y10T428/31797 , Y10T428/31801 , Y10T428/31855 , Y10T428/31909 , Y10T428/3192
摘要： A high-orientation multilayered film incorporates at least one cold drawn, highly oriented resin layer excellent in mechanical strength and suitable mainly for use as packaging material. Because of its specific stratal construction which is highly adaptable to afford a wide variety of specific functions, the composite film is suitable for manufacture of thermally shrinkable films which excel in transparency and in ability to shrink rapidly particularly at low temperatures. Also disclosed is a process for drawing at specific low temperatures at high expansion ratios the aforementioned multiplicity of resin layers either all by themselves or in conjunction with layers of other resins by utilizing the cold drawability of the aforementioned resin layers excelling in mechanical strength.

9. 发明授权

US4469752A Cold drawn high-orientation multilayered film and process for manufacture of said film 失效
公开(公告)号：US4469752A
公开(公告)日：1984-09-04
申请号：US559462
申请日：1983-12-08
申请人： Isao Yoshimura , Osamu Mizukami , Hideo Hata , Junichi Kageyama , Takashi Kaneko
发明人： Isao Yoshimura , Osamu Mizukami , Hideo Hata , Junichi Kageyama , Takashi Kaneko
IPC分类号： B29C55/00 , B29C49/00 , B29C55/02 , B29C55/12 , B29K23/00 , B29L9/00 , B32B27/08 , B32B27/32 , C08J7/04
CPC分类号： B29C55/023 , B32B27/08 , C08J7/042 , B29K2023/06 , B29K2023/083 , B29K2096/005 , C08J2323/06 , Y10S428/91 , Y10T428/2495 , Y10T428/26 , Y10T428/269 , Y10T428/31725 , Y10T428/31743 , Y10T428/31746 , Y10T428/31797 , Y10T428/31801 , Y10T428/31855 , Y10T428/31909 , Y10T428/3192
摘要： A high-orientation multilayered film incorporates at least one cold drawn, highly oriented resin layer excellent in mechanical strength and suitable mainly for use as packaging material. Because of its specific stratal construction which is highly adaptable to afford a wide variety of specific functions, the composite film is suitable for manufacture of thermally shrinkable films which excel in transparency and in ability to shrink rapidly particularly at low temperatures. Also disclosed is a process for drawing at specific low temperatures at high expansion ratios the aforementioned multiplicity of resin layers either all by themselves or in conjunction with layers of other resins by utilizing the cold drawability of the aforementioned resin layers excelling in mechanical strength.

10. 发明申请

US20130202991A1 PROCESS FOR CLEANING SHIELD SURFACES IN DEPOSITION SYSTEMS 有权
标题翻译：沉积系统中清洁屏蔽表面的方法
公开(公告)号：US20130202991A1
公开(公告)日：2013-08-08
申请号：US13365077
申请日：2012-02-02
申请人： Vibhu Jindal , Junichi Kageyama
发明人： Vibhu Jindal , Junichi Kageyama
IPC分类号： G03F1/22 , B24C1/00 , C23C16/04
CPC分类号： G03F1/22 , B08B7/04 , B82Y10/00 , B82Y40/00 , C23C14/34 , C23C14/564 , G03F1/60
摘要： A process for cleaning and restoring deposition shield surfaces which results in a cleaned shield having a surface roughness of between about 200 microinches and about 500 microinches and a particle surface density of less than about 0.1 particles/mm2 of particles between about 1 micron and about 5 microns in size and no particles less than about 1 micron in size and method for use thereof is disclosed.
摘要翻译：一种用于清洁和恢复沉积屏蔽表面的方法，其导致具有约200微英寸至约500微英寸之间的表面粗糙度和小于约0.1微米/ mm 2的颗粒的颗粒表面密度在约1微米至约5微米之间的清洁屏蔽公开了尺寸微米和尺寸小于约1微米的颗粒及其使用方法。

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