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    • 2. 发明授权
    • Method for forming thin film pattern and flat display device having the same
    • 用于形成薄膜图案的方法和具有该薄膜图案的平面显示装置
    • US08703394B2
    • 2014-04-22
    • US13157363
    • 2011-06-10
    • Jeong-Oh KimJung-Il LeeKang-Il KimJung-Ho BangJung-Sun Beak
    • Jeong-Oh KimJung-Il LeeKang-Il KimJung-Ho BangJung-Sun Beak
    • G03F7/26
    • H01L27/1288H01L27/1214Y10T428/24802
    • The present disclosure is a method for forming a thin film pattern to form a micron-pattern and a flat display device having the same. The method for forming a thin film pattern includes the steps of forming first to third thin film layers on a substrate in succession, forming a first photoresist pattern on the third thin film layer, patterning the second and third thin film layers using the first photoresist pattern as a mask to form first and second thin film mask pattern having line widths different from each other, forming a second photoresist pattern at a region where the first and second thin film mask patterns do not overlap positioned between the first thin film layer and the second thin film mask pattern, removing the first and second thin film mask patterns, and patterning the first thin film layer using the second photoresist pattern as a mask.
    • 本公开是形成薄膜图案以形成微米图案的方法和具有该微图案的平板显示装置。 用于形成薄膜图案的方法包括以下步骤:在基板上连续形成第一至第三薄膜层,在第三薄膜层上形成第一光致抗蚀剂图案,使用第一光致抗蚀剂图案图案化第二和第三薄膜层 作为掩模形成具有彼此不同的线宽度的第一和第二薄膜掩模图案,在第一和第二薄膜掩模图案不重叠的区域处形成第二光致抗蚀剂图案,该区域位于第一薄膜层和第二薄膜掩模图案之间 薄膜掩模图案,去除第一和第二薄膜掩模图案,并且使用第二光致抗蚀剂图案作为掩模对第一薄膜层进行图案化。
    • 7. 发明申请
    • METHOD FOR FORMING THIN FILM PATTERN AND FLAT DISPLAY DEVICE HAVING THE SAME
    • 用于形成薄膜图案的方法和具有该薄膜图案的平面显示装置
    • US20110305882A1
    • 2011-12-15
    • US13157363
    • 2011-06-10
    • Jeong-Oh KimJung-Il LeeKang-Il KimJung-Ho BangJung-Sun Beak
    • Jeong-Oh KimJung-Il LeeKang-Il KimJung-Ho BangJung-Sun Beak
    • B32B3/10G03F7/20
    • H01L27/1288H01L27/1214Y10T428/24802
    • The present disclosure is a method for forming a thin film pattern to form a micron-pattern and a flat display device having the same. The method for forming a thin film pattern includes the steps of forming first to third thin film layers on a substrate in succession, forming a first photoresist pattern on the third thin film layer, patterning the second and third thin film layers using the first photoresist pattern as a mask to form first and second thin film mask pattern having line widths different from each other, forming a second photoresist pattern at a region where the first and second thin film mask patterns do not overlap positioned between the first thin film layer and the second thin film mask pattern, removing the first and second thin film mask patterns, and patterning the first thin film layer using the second photoresist pattern as a mask.
    • 本公开是形成薄膜图案以形成微米图案的方法和具有该微图案的平板显示装置。 用于形成薄膜图案的方法包括以下步骤:在基板上连续形成第一至第三薄膜层,在第三薄膜层上形成第一光致抗蚀剂图案,使用第一光致抗蚀剂图案图案化第二和第三薄膜层 作为掩模形成具有彼此不同的线宽度的第一和第二薄膜掩模图案,在第一和第二薄膜掩模图案不重叠的区域处形成第二光致抗蚀剂图案,该区域位于第一薄膜层和第二薄膜掩模图案之间 薄膜掩模图案,去除第一和第二薄膜掩模图案,并且使用第二光致抗蚀剂图案作为掩模对第一薄膜层进行图案化。