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1. 发明专利

GB837080A Production of aqueous dispersions of gluten and production of dry vital gluten therefrom 未知
公开(公告)号：GB837080A
公开(公告)日：1960-06-09
申请号：GB2234058
申请日：1958-07-11
申请人： PETER JOSEPH FERRARA
IPC分类号： A23J3/18
摘要： A stable aqueous dispersion of wet gluten derived from wheat flour is produced by admixing such wheat gluten with an aqueous solution of formic acid having a pH value of from 2 to 4.5. The aqueous solution of formic acid may contain an alkali metal formate, e.g. sodium formate, which may be present in the molar ratio formate: formic acid of from 1:15 to 1:1. Dry vital gluten derived from wheat flour may be obtained by dispersing the aqueous dispersion in the form of droplets in heated air or other inert gas, thereby heating it to a temperature not exceeding 120 DEG C., the drying being completed within 5 seconds.

2. 发明申请

US20080138178A1 High throughput serial wafer handling end station 审中-公开
标题翻译：高吞吐量串行晶圆处理终端
公开(公告)号：US20080138178A1
公开(公告)日：2008-06-12
申请号：US11634644
申请日：2006-12-06
申请人： Joseph Ferrara , Robert J. Mitchell
发明人： Joseph Ferrara , Robert J. Mitchell
IPC分类号： H01L21/677 , H01L21/68
CPC分类号： H01L21/67213 , C23C14/48 , H01L21/67201 , H01L21/67265 , H01L21/67745
摘要： An ion implantation apparatus, system, and method are provided for transferring a plurality of workpieces between vacuum and atmospheric pressures, wherein an alignment mechanism is operable to align a plurality of workpieces for generally simultaneous transportation to a dual-workpiece load lock chamber. The alignment mechanism comprises a characterization device, an elevator, and two vertically-aligned workpiece supports for supporting two workpieces. First and second atmospheric robots are configured to generally simultaneously transfer two workpieces at a time between load lock modules, the alignment mechanism, and a FOUP. Third and fourth vacuum robots are configured to transfer one workpiece at a time between the load lock modules and a process module.
摘要翻译：提供一种用于在真空和大气压之间传送多个工件的离子注入装置，系统和方法，其中对准机构可操作以对准多个工件以便大体上同时传送到双工件装载锁定室。对准机构包括表征装置，电梯和用于支撑两个工件的两个垂直对准的工件支撑件。第一和第二大气机器人被配置为一般在负载锁定模块，对准机构和FOUP之间同时传送两个工件。第三和第四真空机器人被配置为在加载锁模块和处理模块之间一次传送一个工件。

3. 发明授权

US07246985B2 Work-piece processing system 有权
标题翻译：工件加工系统
公开(公告)号：US07246985B2
公开(公告)日：2007-07-24
申请号：US10826419
申请日：2004-04-16
申请人： Joseph Ferrara
发明人： Joseph Ferrara
IPC分类号： H01L21/677
CPC分类号： H01L21/67213 , H01L21/67201 , H01L21/67742 , H01L21/67745 , H01L21/67748 , H01L21/67778 , Y10S414/139
摘要： A transfer system for use with a tool for processing a work-piece at low or vacuum pressure such as an ion implanter for implanting silicon wafers. An enclosure defines a low pressure region for processing of work-pieces placed at a work-piece processing station within the low pressure region. A two tier multiple work-piece isolation load lock transfers work-pieces from a higher pressure region to the lower pressure for processing and back to said higher pressure subsequent to said processing. A first robot transfers work-pieces within the low pressure region from the load locks to a processing station within the low pressure region. Multiple other robots positioned outside the low pressure region transfers work-pieces to and from the two tier work-piece isolation load locks from a source of said work-pieces prior to processing and to a destination of said work-pieces after said processing.
摘要翻译：一种用于在低或真空压力下处理工件的工具的转移系统，例如用于注入硅晶片的离子注入机。外壳限定用于处理放置在低压区域内的工件处理站的工件的低压区域。两层多件工件隔离负载锁将工件从较高压力区域转移到较低压力以进行处理，并在所述处理之后转回所述较高压力。第一机器人将低压区域内的工件从负载锁传送到低压区域内的处理站。位于低压区域之外的多个其它机器人在处理之前将工件与来自所述工件的来源的两层工件隔离负载锁转移到所述工件的所述处理之后的所述工件的目的地。

4. 发明申请

US20070001129A1 Method and apparatus for scanning a workpiece in a vacuum chamber of an ion beam implanter 失效
标题翻译：用于在离子束注入机的真空室中扫描工件的方法和装置
公开(公告)号：US20070001129A1
公开(公告)日：2007-01-04
申请号：US11173494
申请日：2005-07-01
申请人： Joseph Ferrara
发明人： Joseph Ferrara
IPC分类号： H01J37/20
CPC分类号： H01J37/20 , H01J37/3171 , H01J2237/166 , H01J2237/20228 , H01L21/26506 , H01L21/68764
摘要： An ion beam implanter includes an ion beam source for generating an ion beam moving along a beam line and an implantation chamber wherein a workpiece is positioned to intersect the ion beam for ion implantation of an implantation surface of the workpiece by the ion beam. The implanter further includes a workpiece support structure coupled to the implantation chamber and supporting the workpiece within an interior region of the implantation chamber, the workpiece support structure. The workpiece support structure includes a rotation member coupled to the implantation chamber for changing an implantation angle of the workpiece with respect to a portion of the ion beam within the implantation chamber. The workpiece support structure also includes a translation member movably coupled to the rotation member and supporting the workpiece for movement along a path of travel wherein at least some components of the translation member components are disposed within a reduced pressure translation member chamber. The translation member chamber is isolated from the implantation chamber interior region by a dynamic seal. A workpiece holder support arm of the translation member extends through the dynamic seal and into the implantation chamber.
摘要翻译：离子束注入机包括用于产生沿着束线移动的离子束的离子束源和注入室，其中工件被定位成与离子束相交，用于通过离子束离子注入工件的注入表面。所述注入机还包括耦合到所述注入室的工件支撑结构，并且将所述工件支撑在所述注入室的内部区域内，所述工件支撑结构。工件支撑结构包括联接到注入室的旋转构件，用于相对于植入室内的离子束的一部分改变工件的植入角度。工件支撑结构还包括可移动地联接到旋转构件并且支撑工件以沿着行进路径移动的平移构件，其中平移构件部件的至少一些部件设置在减压平移构件室内。翻译构件室通过动态密封与植入室内部区域隔离。平移构件的工件保持器支撑臂延伸穿过动态密封件并进入植入室。

5. 发明申请

US20060017010A1 Magnet for scanning ion beams 审中-公开
标题翻译：用于扫描离子束的磁体
公开(公告)号：US20060017010A1
公开(公告)日：2006-01-26
申请号：US10896821
申请日：2004-07-22
申请人： Bo Vanderberg , Kevin Wenzel , Robert Rathmell , Joseph Ferrara , David Sabo
发明人： Bo Vanderberg , Kevin Wenzel , Robert Rathmell , Joseph Ferrara , David Sabo
IPC分类号： G21G5/00
CPC分类号： H01J37/1475 , G21K1/093 , H01F7/202 , H01F41/0226 , H01J37/3171 , H01J2237/152
摘要： An ion beam implanter includes an ion beam source for generating an ion beam moving along a beam line and a vacuum or implantation chamber wherein a workpiece, such as a silicon wafer is positioned to intersect the ion beam for ion implantation of a surface of the workpiece by the ion beam. A scanning magnet is most preferably used to control a side to side scanning of the ion beam so that an entire implantation surface of the workpiece can be processed.
摘要翻译：离子束注入机包括用于产生沿束线移动的离子束的离子束源和真空或注入室，其中诸如硅晶片的工件被定位成与离子束相交以离子注入工件表面通过离子束。扫描磁体最优选地用于控制离子束的侧面扫描，使得可以处理工件的整个植入表面。

6. 发明授权

US07375355B2 Ribbon beam ion implanter cluster tool 有权
标题翻译：丝带束离子注入机群集工具
公开(公告)号：US07375355B2
公开(公告)日：2008-05-20
申请号：US11432977
申请日：2006-05-12
申请人： Joseph Ferrara , Patrick R. Splinter , Michael A. Graf , Victor M. Benveniste
发明人： Joseph Ferrara , Patrick R. Splinter , Michael A. Graf , Victor M. Benveniste
IPC分类号： H01J37/317
CPC分类号： H01J37/3171 , H01J37/16 , H01J2237/0822 , H01J2237/20 , H01J2237/244 , H01L21/26513 , H01L21/26566 , H01L21/67213
摘要： An ion implantation cluster tool for implanting ions into a workpiece is provided, wherein a plurality of beamline assemblies having a respective plurality of ion beamlines associated therewith are positioned about a common process chamber. Each of the plurality of ion beamline assemblies are selectively isolated from the common process chamber, and the plurality of beamline intersect at a processing region of the process chamber. A scanning apparatus positioned within the common process chamber is operable to selectively translate a workpiece holder in one or more directions through each of the plurality of ion beamlines within the processing region, and a common dosimetry apparatus within the common process chamber is operable to measure one or more properties of each of the plurality of ion beamlines. A load lock chamber is operably coupled to the common process chamber for exchange of workpieces between the common process chamber and an external environment.
摘要翻译：提供了用于将离子注入到工件中的离子注入簇工具，其中具有与其相关联的多个离子束线的多个束线组件围绕公共处理室定位。多个离子束线组件中的每一个与公共处理室选择性地隔离，并且多个束线在处理室的处理区域相交。定位在公共处理室内的扫描设备可操作以选择性地将工件保持器在一个或多个方向上通过处理区域内的多个离子束线中的每一个，并且公共处理室内的常见剂量测量装置可操作以测量一个或更多的多个离子束线中的每一个的性质。负载锁定室可操作地联接到公共处理室，用于在公共处理室和外部环境之间交换工件。

7. 发明申请

US20060033046A1 SCANNING SYSTEMS AND METHODS FOR PROVIDING IONS FROM AN ION BEAM TO A WORKPIECE 有权
标题翻译：扫描系统和将离子从离子束提供给工件的方法
公开(公告)号：US20060033046A1
公开(公告)日：2006-02-16
申请号：US10917997
申请日：2004-08-13
申请人： Joseph Ferrara , Michael Graf , Bo Vanderberg
发明人： Joseph Ferrara , Michael Graf , Bo Vanderberg
IPC分类号： H01J37/317
CPC分类号： H01J37/3171 , H01J2237/1507 , H01J2237/20207 , H01J2237/30455 , H01J2237/30483 , H01J2237/31703
摘要： Ion implantation scanning systems and methods are presented for providing ions from an ion beam to a treatment surface of a workpiece, wherein a beam is electrically or magnetically scanned in a single direction or plane and an implanted workpiece is rotated about an axis that is at a non-zero angle relative to the beam scan plane, where the workpiece rotation and the beam scanning are synchronized to provide the beam to the workpiece treatment surface at a generally constant angle of incidence.
摘要翻译：提供了离子注入扫描系统和方法，用于将离子从离子束提供到工件的处理表面，其中光束在单个方向或平面上电或磁扫描，并且植入的工件围绕位于相对于光束扫描平面的非零角度，其中工件旋转和光束扫描被同步，以大致恒定的入射角将光束提供给工件处理表面。

8. 发明授权

US06992310B1 Scanning systems and methods for providing ions from an ion beam to a workpiece 有权
标题翻译：用于从离子束向工件提供离子的扫描系统和方法
公开(公告)号：US06992310B1
公开(公告)日：2006-01-31
申请号：US10917997
申请日：2004-08-13
申请人： Joseph Ferrara , Michael A. Graf , Bo H. Vanderberg
发明人： Joseph Ferrara , Michael A. Graf , Bo H. Vanderberg
IPC分类号： H01J37/317 , H01J37/20
CPC分类号： H01J37/3171 , H01J2237/1507 , H01J2237/20207 , H01J2237/30455 , H01J2237/30483 , H01J2237/31703
摘要： Ion implantation scanning systems and methods are presented for providing ions from an ion beam to a treatment surface of a workpiece, wherein a beam is electrically or magnetically scanned in a single direction or plane and an implanted workpiece is rotated about an axis that is at a non-zero angle relative to the beam scan plane, where the workpiece rotation and the beam scanning are synchronized to provide the beam to the workpiece treatment surface at a generally constant angle of incidence.
摘要翻译：提供了离子注入扫描系统和方法，用于将离子从离子束提供到工件的处理表面，其中光束在单个方向或平面上电或磁扫描，并且植入的工件围绕位于相对于光束扫描平面的非零角度，其中工件旋转和光束扫描被同步，以大致恒定的入射角将光束提供给工件处理表面。

9. 发明授权

US6142883A Golf stance alignment training device 失效
标题翻译：高尔夫姿态对准训练装置
公开(公告)号：US6142883A
公开(公告)日：2000-11-07
申请号：US179220
申请日：1998-10-27
申请人： Joseph Ferrara
发明人： Joseph Ferrara
IPC分类号： A63B69/36
CPC分类号： A63B69/3667
摘要： The golf alignment device of this invention is an adjustable frame, comprising a first side of said frame marked with indicia for positioning the forward foot of the golfer and being marked with indicia for placement of the rear foot according to the club to be used; a slotted second side of the frame extending from the end of the first side of the frame nearest the forward foot, which second side bears indicia for placement of the golf ball; a slotted third side extending from the other end of the first side; a fourth side joined to the ends of the second and third sides to form a frame; a first ball marker arm extending from the second side and within the frame, which arm is perpendicular to the second side and a pivotal second marker arm extending within the frame from the first side, the second marker arm being disposed such that an imaginary line extending from the center of its terminal end within the frame intersects a point just beyond the terminal end of the first marker arm situated within the frame.
摘要翻译：本发明的高尔夫对准装置是可调节的框架，包括标记有用于定位高尔夫球杆的前脚的标记的所述框架的第一侧，并且标记有用于根据要使用的球杆放置后脚的标记; 所述框架的开槽的第二侧从所述框架的所述第一侧的端部最靠近所述前脚延伸，所述第二侧面具有用于放置所述高尔夫球的标记; 从所述第一侧的另一端延伸的开槽的第三侧; 第四侧，与第二侧和第三侧的端部相连以形成框架; 从所述第二侧和所述框架内延伸的第一球标记臂，所述臂垂直于所述第二侧，以及枢转的第二标记臂，其在所述框架内从所述第一侧延伸，所述第二标记臂被布置成使得假想线延伸从框架的终端的中心与刚好超出位于框架内的第一标记臂的终端的点相交。

10. 发明授权

US07750320B2 System and method for two-dimensional beam scan across a workpiece of an ion implanter 有权
标题翻译：用于离子注入机工件二维束扫描的系统和方法
公开(公告)号：US07750320B2
公开(公告)日：2010-07-06
申请号：US11644623
申请日：2006-12-22
申请人： Joseph Ferrara , Bo H. Vanderberg , Michael A. Graf
发明人： Joseph Ferrara , Bo H. Vanderberg , Michael A. Graf
IPC分类号： G21K5/10
CPC分类号： H01J37/3171 , H01J37/09 , H01J2237/022 , H01J2237/024 , H01J2237/0458 , H01J2237/057 , H01J2237/24528 , H01J2237/30455 , H01J2237/30483 , H01J2237/31705
摘要： A workpiece or semiconductor wafer is tilted as a ribbon beam is swept up and/or down the workpiece. In so doing, the implant angle or the angle of the ion beam relative to the workpiece remains substantially constant across the wafer. This allows devices to be formed substantially consistently on the wafer. Resolving plates move with the beam as the beam is scanned up and/or down. This allows desired ions to impinge on the wafer, but blocks undesirable contaminants.
摘要翻译：当工件或半导体晶片沿着工件扫过和/或向下时，工件或半导体晶片被倾斜。在这样做时，植入角度或离子束相对于工件的角度在晶片上保持基本恒定。这允许在晶片上基本上一致地形成器件。当光束向上扫描和/或向下扫描时，解析板随着光束移动。这允许所需的离子撞击在晶片上，但阻止不期望的污染物。

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