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    • 2. 发明授权
    • Liquid crystal display having high aperture ratio and high transmittance
    • 具有高开口率和高透射率的液晶显示器
    • US06429918B1
    • 2002-08-06
    • US09428273
    • 1999-10-27
    • Woo Ho ChoiSeong Jun AnJong Yob Jeon
    • Woo Ho ChoiSeong Jun AnJong Yob Jeon
    • G02F11335
    • G02F1/134363G02F2001/136218
    • Disclosed is a liquid crystal display having high aperture ratio and high transmittance that is capable of reducing the size of a leakage light generating region. The present invention provides a liquid crystal display comprising: a lower substrate; a gate bus line and a data bus line, both disposed in an active matrix type so as to define a sub-pixel on the lower substrate; a counter electrode formed at the sub-pixel region of the lower substrate, made of a transparent material, wherein a common signal is applied to the counter electrode; a pixel electrode formed at the sub-pixel region of the lower substrate, made of a transparent material, wherein the pixel electrode forms a fringe field with the counter electrode; a thin film transistor formed at an intersection of the gate bus line and the data bus line, wherein when the gate bus line is selected, the thin film transistor transmits a signal of the data bus line to the pixel electrode; an upper substrate opposed to the lower substrate with intervening a selected distance; a black matrix formed at an inner surface of the upper substrate and arranged so as to define the sub-pixel; a shielding electrode formed at an inner surface of the upper substrate and disposed at a location corresponding to the data bus line of the lower substrate; and a liquid crystal layer sandwiched between the upper and the lower substrates, wherein when the gate bus line is not selected, the shielding electrode forms an electric field with the data bus line.
    • 公开了一种具有高开口率和高透射率的液晶显示器,其能够减小泄漏光产生区域的尺寸。本发明提供一种液晶显示器,包括:下基板; 栅极总线和数据总线,均以有源矩阵型布置,以便在下基板上限定子像素; 形成在所述下基板的子像素区域处的由透明材料制成的对电极,其中向所述对电极施加公共信号; 形成在所述下基板的子像素区域的由透明材料制成的像素电极,其中所述像素电极与所述对电极形成边缘场; 形成在栅极总线和数据总线的交点处的薄膜晶体管,其中当选择栅极总线时,薄膜晶体管将数据总线的信号传输到像素电极; 与下基板相对的上基板,插入选定的距离; 黑色矩阵,形成在所述上基板的内表面并且被布置以限定所述子像素; 屏蔽电极,形成在上基板的内表面并且设置在与下基板的数据总线相对应的位置处; 以及夹在上基板和下基板之间的液晶层,其中,当不选择栅极总线时,屏蔽电极与数据总线形成电场。
    • 3. 发明授权
    • Method of manufacturing liquid crystal display device
    • 制造液晶显示装置的方法
    • US06362858B1
    • 2002-03-26
    • US09456188
    • 1999-12-07
    • Jong Yob JeonJung Yeal Lee
    • Jong Yob JeonJung Yeal Lee
    • G02F1136
    • G02F1/1362G02F1/134363
    • Disclosed is a method of manufacturing a fringe field switching mode liquid crystal display device which can simplify process by reducing mask number. According to the present invention, a first transparent metal layer and a first metal layer are sequentially deposited on a transparent insulating substrate and patterned using a first mask. Next, a gate insulating layer, an amorphous silicon layer and a silicon nitride layer are sequentially deposited on the overall substrate and the silicon nitride layer is patterned using a second mask. The pattern portion is then patterned using a third mask so as to be exposed in the shape of a plate. Thereafter, a doped amorphous silicon layer and a second metal layer are sequentially deposited on the overall substrate and the second metal layer is patterned using the fourth mask. The doped amorphous silicon layer and the amorphous silicon layer are then etched using the source and drain as a mask. Next, a passivation layer is formed on the overall substrate and etched so as to expose a portion of the source. Thereafter, a second transparent metal layer is deposited on the passivation layer so as to fill the contact hole and patterned using a sixth mask.
    • 公开了一种制造边缘场开关模式液晶显示装置的方法,其可以通过减少掩模数来简化工艺。 根据本发明,第一透明金属层和第一金属层依次沉积在透明绝缘基板上并使用第一掩模进行图案化。 接下来,在整个基板上依次沉积栅极绝缘层,非晶硅层和氮化硅层,并且使用第二掩模对氮化硅层进行图案化。 然后使用第三掩模对图案部分进行图案化,以便以板的形状暴露。 此后,掺杂的非晶硅层和第二金属层顺序地沉积在整个基板上,并且使用第四掩模对第二金属层进行图案化。 然后使用源极和漏极作为掩模蚀刻掺杂的非晶硅层和非晶硅层。 接下来,在整个基板上形成钝化层并进行蚀刻以暴露源的一部分。 此后,在钝化层上沉积第二透明金属层,以便填充接触孔并使用第六掩模进行图案化。