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1. 发明授权

US09298093B2 Polymers, photoresist compositions and methods of forming photolithographic patterns 有权
标题翻译：聚合物，光致抗蚀剂组合物和形成光刻图案的方法
公开(公告)号：US09298093B2
公开(公告)日：2016-03-29
申请号：US13341939
申请日：2011-12-31
申请人： Young Cheol Bae , Matthew M. Meyer , Jibin Sun , Seung-Hyun Lee , Jong Keun Park
发明人： Young Cheol Bae , Matthew M. Meyer , Jibin Sun , Seung-Hyun Lee , Jong Keun Park
IPC分类号： G03F7/00 , G03F7/20 , G03F7/039 , G03F7/32 , C08F220/28 , G03F7/004
CPC分类号： G03F7/2041 , C08F220/28 , G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397 , G03F7/325
摘要： Polymers containing a unit having a particular acetal moiety and photoresist compositions containing such a polymer. Substrates coated with the photoresist compositions and methods of forming photolithographic patterns. The polymers, photoresist compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.
摘要翻译：含有具有特定缩醛部分的单元的聚合物和含有这种聚合物的光致抗蚀剂组合物。用光致抗蚀剂组合物涂覆的基材和形成光刻图案的方法。聚合物，光致抗蚀剂组合物，方法和涂覆的基材在半导体器件的制造中具有特别的适用性。

2. 发明授权

US08771917B2 Monomers, polymers, photoresist compositions and methods of forming photolithographic patterns 有权
标题翻译：单体，聚合物，光致抗蚀剂组合物和形成光刻图案的方法
公开(公告)号：US08771917B2
公开(公告)日：2014-07-08
申请号：US13341931
申请日：2011-12-31
申请人： Matthias S. Ober , Young Cheol Bae , Yi Liu , Seung-Hyun Lee , Jong Keun Park
发明人： Matthias S. Ober , Young Cheol Bae , Yi Liu , Seung-Hyun Lee , Jong Keun Park
IPC分类号： G03F7/004 , C08F24/00 , G03F7/039 , G06F7/38
CPC分类号： G03F7/0397 , C07D307/93 , C07D317/24 , C08F24/00 , C08F220/28 , G03F7/0382 , G06F7/38 , Y10S430/111
摘要： Provided are (meth)acrylate monomers containing acetal moieties, polymers containing a unit formed from such a monomer and photoresist compositions containing such a polymer. The monomers, polymers and photoresist compositions are useful in forming photolithographic patterns. Also provided are substrates coated with the photoresist compositions, methods of forming photolithographic patterns and electronic devices. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.
摘要翻译：提供含有缩醛部分的（甲基）丙烯酸酯单体，含有由这种单体形成的单元的聚合物和含有这种聚合物的光致抗蚀剂组合物。单体，聚合物和光致抗蚀剂组合物可用于形成光刻图案。还提供了涂覆有光致抗蚀剂组合物的基材，形成光刻图案的方法和电子装置。组合物，方法和涂覆的基材在半导体器件的制造中具有特别的适用性。

3. 发明申请

US20120219902A1 PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PHOTOLITHOGRAPHIC PATTERNS 审中-公开
标题翻译：光刻胶组合物和形成光刻图案的方法
公开(公告)号：US20120219902A1
公开(公告)日：2012-08-30
申请号：US13407529
申请日：2012-02-28
申请人： Young Cheol Bae , Jong Keun Park , Seung-Hyun Lee , Yi Liu , Thomas Cardolaccia , Rosemary Bell
发明人： Young Cheol Bae , Jong Keun Park , Seung-Hyun Lee , Yi Liu , Thomas Cardolaccia , Rosemary Bell
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： G03F7/2041 , G03F7/0397 , G03F7/091 , G03F7/11 , G03F7/325
摘要： Provided are photoresist compositions useful in forming photolithographic patterns. Also provided are substrates coated with the photoresist compositions and methods of forming photolithographic patterns. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.
摘要翻译：提供了可用于形成光刻图案的光致抗蚀剂组合物。还提供了涂覆有光致抗蚀剂组合物的基材和形成光刻图案的方法。组合物，方法和涂覆的基材在半导体器件的制造中具有特别的适用性。

4. 发明申请

US20120219901A1 PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PHOTOLITHOGRAPHIC PATTERNS 有权
公开(公告)号：US20120219901A1
公开(公告)日：2012-08-30
申请号：US13407508
申请日：2012-02-28
申请人： Young Cheol BAE , Rosemary BELL , Thomas CARDOLACCIA , Seung-Hyun LEE , Yi LIU , Jong Keun PARK
发明人： Young Cheol BAE , Rosemary BELL , Thomas CARDOLACCIA , Seung-Hyun LEE , Yi LIU , Jong Keun PARK
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： G03F7/0397 , G03F7/091 , G03F7/2041 , G03F7/325
摘要： Provided are photoresist compositions useful in forming photolithographic patterns. Also provided are substrates coated with the photoresist compositions and methods of forming photolithographic patterns. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.

5. 发明申请

US20120171617A1 POLYMERS, PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PHOTOLITHOGRAPHIC PATTERNS 有权
标题翻译：聚合物，光电组合物和形成光刻图案的方法
公开(公告)号：US20120171617A1
公开(公告)日：2012-07-05
申请号：US13341935
申请日：2011-12-31
申请人： Young Cheol BAE , Thomas H. Peterson , Yi Liu , Jong Keun Park , Seung-Hyun Lee , Thomas Cardolaccia
发明人： Young Cheol BAE , Thomas H. Peterson , Yi Liu , Jong Keun Park , Seung-Hyun Lee , Thomas Cardolaccia
IPC分类号： G03F7/20 , G03F7/004 , C08F224/00
CPC分类号： G03F7/0397 , C08F220/28 , G03F7/11 , G03F7/2041 , G03F7/322 , G03F7/325
摘要： Provided are polymers that include a unit comprising a particular acetal moiety and a unit comprising a lactone moiety. Also provided are photoresist compositions containing such a polymer, substrates coated with the photoresist compositions and methods of forming photolithographic patterns. The polymers, compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.
摘要翻译：提供的是包括包含特定缩醛部分的单元和包含内酯部分的单元的聚合物。还提供含有这种聚合物的光致抗蚀剂组合物，用光致抗蚀剂组合物涂覆的基材和形成光刻图案的方法。聚合物，组合物，方法和涂覆的基底在半导体器件的制造中具有特别的适用性。

6. 发明申请

US20080250132A1 SYSTEM FOR CONTROLLING AND MANAGING NETWORK APPARATUS AND METHOD THEREOF 有权
标题翻译：用于控制和管理网络设备的系统及其方法
公开(公告)号：US20080250132A1
公开(公告)日：2008-10-09
申请号：US12058599
申请日：2008-03-28
申请人： YUN-GEUN JI , JONG-KEUN PARK , NO-KWAN KWAK , SANG HWA OH , Gyoung-Bo Park , Young-Jae An
发明人： YUN-GEUN JI , JONG-KEUN PARK , NO-KWAN KWAK , SANG HWA OH , Gyoung-Bo Park , Young-Jae An
IPC分类号： G06F15/173 , H04L9/32
CPC分类号： H04L43/00 , H04L43/0817
摘要： Disclosed is a network device control and managing system and method. The network device control and managing system receives network device information and subscriber information from a database server of the network device control and managing system according to the manager's client information request and realizes hierarchical combined information. The system requests state information from the network device based on the state information request of the network device and receives the state information. The system requests a control from the network device based on the network device control request, receives a corresponding response message, and changes combined information. Therefore, the device states can be easily searched in the hierarchical manner (L3-L2-AP), and the problems of network devices can be quickly sensed. Also, software for the network devices is remotely updated, and the subscriber's after sales service request is remotely processed.
摘要翻译：公开了一种网络设备的控制和管理系统和方法。网络设备控制和管理系统根据管理者的客户端信息请求从网络设备控制和管理系统的数据库服务器接收网络设备信息和用户信息，实现分层组合信息。系统根据网络设备的状态信息请求从网络设备请求状态信息，并接收状态信息。系统根据网络设备控制请求从网络设备请求控制，接收相应的响应消息，并更改组合信息。因此，可以以分层方式（L3-L2-AP）容易地搜索设备状态，并且可以快速地感知网络设备的问题。而且，远程更新网络设备的软件，并且远程处理用户的售后服务请求。

7. 发明申请

US20130244180A1 PHOTORESIST OVERCOAT COMPOSITIONS AND METHODS OF FORMING ELECTRONIC DEVICES 审中-公开
公开(公告)号：US20130244180A1
公开(公告)日：2013-09-19
申请号：US13607733
申请日：2012-09-09
申请人： Young Cheol Bae , Rosemary Bell , Jong Keun Park , Seung-Hyun Lee
发明人： Young Cheol Bae , Rosemary Bell , Jong Keun Park , Seung-Hyun Lee
IPC分类号： G03F7/004 , G03F7/20
CPC分类号： C09D133/16 , C08K5/17 , C08K5/3415 , C08K5/3435 , C09D133/10 , G03F7/004 , G03F7/11 , G03F7/16 , G03F7/20 , G03F7/2041 , G03F7/30 , G03F7/325 , H01L21/3081 , Y10S430/114 , Y10S430/12
摘要： Provided are photoresist overcoat compositions, substrates coated with the overcoat compositions and methods of forming electronic devices by a negative tone development process. The compositions, coated substrates and methods find particular applicability in the manufacture of semiconductor devices.

8. 发明授权

US08921031B2 Photoresist overcoat compositions and methods of forming electronic devices 有权
标题翻译：光刻胶外涂层组合物和形成电子器件的方法
公开(公告)号：US08921031B2
公开(公告)日：2014-12-30
申请号：US13607733
申请日：2012-09-09
申请人： Young Cheol Bae , Rosemary Bell , Jong Keun Park , Seung-Hyun Lee
发明人： Young Cheol Bae , Rosemary Bell , Jong Keun Park , Seung-Hyun Lee
IPC分类号： G03F7/004 , G03F7/20 , G03F7/30 , G03F7/11 , G03F7/32
CPC分类号： C09D133/16 , C08K5/17 , C08K5/3415 , C08K5/3435 , C09D133/10 , G03F7/004 , G03F7/11 , G03F7/16 , G03F7/20 , G03F7/2041 , G03F7/30 , G03F7/325 , H01L21/3081 , Y10S430/114 , Y10S430/12
摘要： Provided are photoresist overcoat compositions, substrates coated with the overcoat compositions and methods of forming electronic devices by a negative tone development process. The compositions, coated substrates and methods find particular applicability in the manufacture of semiconductor devices.
摘要翻译：提供光刻胶外涂层组合物，涂覆有外涂层组合物的基材和通过负色调显影方法形成电子器件的方法。组合物，涂覆的基底和方法在半导体器件的制造中特别适用。

9. 发明申请

US20130011783A1 MONOMERS, POLYMERS, PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PHOTOLITHOGRAPHIC PATTERNS 有权
标题翻译：单体，聚合物，光电组合物和形成光刻图案的方法
公开(公告)号：US20130011783A1
公开(公告)日：2013-01-10
申请号：US13341931
申请日：2011-12-31
申请人： Matthias S. Ober , Young Cheol Bae , Yi Liu , Seung-Hyun Lee , Jong Keun Park
发明人： Matthias S. Ober , Young Cheol Bae , Yi Liu , Seung-Hyun Lee , Jong Keun Park
IPC分类号： C08F224/00 , C07D407/06 , G03F7/20 , C08F124/00 , G03F7/004
CPC分类号： G03F7/0397 , C07D307/93 , C07D317/24 , C08F24/00 , C08F220/28 , G03F7/0382 , G06F7/38 , Y10S430/111
摘要： Provided are (meth)acrylate monomers containing acetal moieties, polymers containing a unit formed from such a monomer and photoresist compositions containing such a polymer. The monomers, polymers and photoresist compositions are useful in forming photolithographic patterns. Also provided are substrates coated with the photoresist compositions, methods of forming photolithographic patterns and electronic devices. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.
摘要翻译：提供含有缩醛部分的（甲基）丙烯酸酯单体，含有由这种单体形成的单元的聚合物和含有这种聚合物的光致抗蚀剂组合物。单体，聚合物和光致抗蚀剂组合物可用于形成光刻图案。还提供了涂覆有光致抗蚀剂组合物的基材，形成光刻图案的方法和电子装置。组合物，方法和涂覆的基材在半导体器件的制造中具有特别的适用性。

10. 发明申请

US20120288794A1 POLYMERS, PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PHOTOLITHOGRAPHIC PATTERNS 有权
标题翻译：聚合物，光电组合物和形成光刻图案的方法
公开(公告)号：US20120288794A1
公开(公告)日：2012-11-15
申请号：US13341939
申请日：2011-12-31
申请人： Young Cheol BAE , Matthew M. Meyer , Jibin Sun , Seung-Hyun Lee , Jong Keun Park
发明人： Young Cheol BAE , Matthew M. Meyer , Jibin Sun , Seung-Hyun Lee , Jong Keun Park
IPC分类号： C08F224/00 , G03F7/20 , G03F7/004
CPC分类号： G03F7/2041 , C08F220/28 , G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397 , G03F7/325
摘要： Provided are polymers containing a unit having a particular acetal moiety and photoresist compositions containing such a polymer. Also provided are substrates coated with the photoresist compositions and methods of forming photolithographic patterns. The polymers, photoresist compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.
摘要翻译：提供的是含有具有特定缩醛部分的单元和含有这种聚合物的光致抗蚀剂组合物的聚合物。还提供了涂覆有光致抗蚀剂组合物的基材和形成光刻图案的方法。聚合物，光致抗蚀剂组合物，方法和涂覆的基材在半导体器件的制造中具有特别的适用性。

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