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    • 1. 发明申请
    • A METHOD AND SYSTEM FOR FACILITATING THE FORMATION OF A NETWORKED COLLABORATIVE ENVIRONMENT
    • 一种促进形成网络协作环境的方法和系统
    • WO2007048185A1
    • 2007-05-03
    • PCT/AU2006/001585
    • 2006-10-26
    • COMMONWEALTH SCIENTIFIC AND INDUSTRIAL RESEARCH ORGANISATIONCHAN, Jonathan, Chan-LonROGERS, Peter, GlynnAGAHARI, Darwin
    • CHAN, Jonathan, Chan-LonROGERS, Peter, GlynnAGAHARI, Darwin
    • H04L9/32
    • H04L63/0272
    • The present invention relates to a system and method for facilitating the formation of a Networked Collaborative Environment between a number of participants. People in companies often wish to form relationships, so as to participate in virtual enterprise, for example, which may require each participant to have access to a limited amount of each others resources. The present invention provides a system which enables participants to form a Networked Collaborative Environment, via a network infrastructure, in which each participant allocates resources (such as computing resources) to the collaborative environment. The system includes a device for receiving collaboration data from each of the participants, the collaboration data including data on the resources that they are allocating (including URLs, for example). The collaboration data is utilised by an engine which takes the data and configures a network to implement the supporting network functionality for the collaborative environment, including the resources contributed by the participants.
    • 本发明涉及一种用于在多个参与者之间形成联网协作环境的系统和方法。 企业中的人们往往希望形成关系,以便参与虚拟企业,例如,这可能要求每个参与者获得有限的其他资源。 本发明提供一种系统,其使得参与者能够经由网络基础设施形成网络协作环境,其中每个参与者将资源(诸如计算资源)分配给协作环境。 该系统包括用于从每个参与者接收协作数据的设备,协作数据包括关于他们正在分配的资源的数据(例如包括URL)。 协作数据被引擎采用,该引擎采用数据并配置网络来实现协作环境的支持网络功能,包括参与者贡献的资源。
    • 7. 发明申请
    • APPARATUS, SYSTEM, AND METHOD FOR MANAGING PROJECT CUSTOMIZATION, COMPLIANCE DOCUMENTATION, AND COMMUNICATION
    • 管理项目自定义,合规文件和通信的设备,系统和方法
    • US20070061774A1
    • 2007-03-15
    • US11530845
    • 2006-09-11
    • Jonathan ChanBenjamin ChanRobert MetlerTimothy MetlerNicholas Pasto
    • Jonathan ChanBenjamin ChanRobert MetlerTimothy MetlerNicholas Pasto
    • G06F9/44
    • G06F8/20G06Q10/06
    • An apparatus, system, and method are disclosed for managing construction projects. The present invention may include an option library module configured to provide a set of building options defined by a general contractor. The invention may also include an option set library module configured to allow a general contractor to define subsets of options from the option library module, the subsets of options organized into custom categories configured for selection of a single option by a customer. Additionally, the invention may include a room library module configured to allow the general contractor to define one or more room structures that the general contractor can associate with the one or more subsets of options, the room structure comprising an organizational unit representing a location related to a specific project or project template. Advantageously, this allows a general contractor to manage complex project customization without requiring programming knowledge.
    • 公开了用于管理建筑项目的装置,系统和方法。 本发明可以包括配置为提供由总承包商定义的一组建筑物选项的选项库模块。 本发明还可以包括选项集库模块,其被配置为允许总承包商从选项库模块定义选项的子集,将组织的子集划分成被配置为由客户选择单个选项的自定义类别。 另外,本发明可以包括房间库模块,其被配置为允许总承包商定义总承包商可以与一个或多个选项子集相关联的一个或多个房间结构,房间结构包括表示与 一个具体的项目或项目模板。 有利的是,这允许总承包商管理复杂的项目定制,而不需要编程知识。
    • 8. 发明授权
    • Porous silicon undercut etching deterrent masks and related methods
    • 多孔硅底切蚀刻威慑面具及相关方法
    • US07205665B1
    • 2007-04-17
    • US11242237
    • 2005-10-03
    • Vinh ChungJonathan Chan Mallari
    • Vinh ChungJonathan Chan Mallari
    • H01L23/48H01L23/52H01L29/40
    • H01L21/3063H01L21/3083
    • The disclosed invention relates to masked silicon structures and methods for making porous silicon in selected areas of a silicon substrate via anodic etching. The masked silicon structures comprise: (1) a frontside barrier layer; and (2) a backside opaque ohmic contact layer. The frontside barrier layer includes a plurality of discrete barrier openings bounded by a contiguous frontside portion of the barrier layer, thereby defining a first aperture having a first shape and a first center point. The backside opaque ohmic contact layer includes a second aperture bounded by a contiguous backside portion of the ohmic contact layer, thereby defining a second aperture having a second shape and a second center point. The first and second center points share a perpendicular axis. The first shape is substantially the same as the second shape but slightly larger, and is trans-concentrically positioned relative to the second shape about the shared axis.
    • 所公开的发明涉及通过阳极蚀刻在硅衬底的选定区域中制造多孔硅的掩模硅结构和方法。 掩模硅结构包括:(1)前侧阻挡层; 和(2)背面不透明欧姆接触层。 前侧阻挡层包括由阻挡层的相邻前侧部分限定的多个离散阻挡开口,从而限定具有第一形状和第一中心点的第一孔。 背面不透明欧姆接触层包括由欧姆接触层的连续背侧部分限定的第二孔,由此限定具有第二形状和第二中心点的第二孔。 第一和第二中心点共享垂直轴。 第一形状基本上与第二形状相同但略大,并且相对于围绕共享轴线的第二形状反式同心地定位。