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1. 发明授权

US09294940B2 Method and apparatus for determining transmission power of preamble in wireless communication system 有权
标题翻译：用于确定无线通信系统中前导码的传输功率的方法和装置
公开(公告)号：US09294940B2
公开(公告)日：2016-03-22
申请号：US14130650
申请日：2012-07-09
申请人： Hyun Woo Lee , Hyuk Min Son , Hye Young Choi , Seung Hee Han , Jin Min Kim
发明人： Hyun Woo Lee , Hyuk Min Son , Hye Young Choi , Seung Hee Han , Jin Min Kim
IPC分类号： H04W24/02 , H04W52/32 , H04W74/08 , H04L5/00 , H04W52/24
CPC分类号： H04W72/0473 , H04L5/001 , H04W24/02 , H04W24/10 , H04W52/242 , H04W52/325 , H04W52/34 , H04W74/0833
摘要： Provided are a method and an apparatus for determining transmission power of a preamble in a wireless communication system. A terminal estimates secondary cell (SCell) path loss with respect to a downlink (DL) component carrier (CC), which is in a linkage relationship with an uplink (UL) component carrier inside the SCell; decides the transmission power of a physical random access channel (PRACH) preamble based on the SCell path loss that is estimated; and transmits the PRACH preamble to a base station through the ULCC inside the SCell, based on the transmission power that is decided.
摘要翻译：提供一种用于确定无线通信系统中的前导码的发送功率的方法和装置。终端估计与SCell内的上行链路（UL）分量载波处于链路关系的下行链路（DL）分量载波（CC）的二次小区（SCell）路径损耗; 基于所估计的SCell路径损耗来决定物理随机接入信道（PRACH）前导码的发送功率; 并且基于所决定的发送功率，通过SCell内的ULCC将PRACH前导码发送到基站。

2. 发明申请

US20150291172A1 APPARATUS FOR PREVENTING VEHICLE FROM ABRUPTLY ACCELERATING 审中-公开
标题翻译：防止车辆从急剧加速的装置
公开(公告)号：US20150291172A1
公开(公告)日：2015-10-15
申请号：US14389161
申请日：2013-12-20
申请人： Jin Min Kim
发明人： Jin Min Kim
IPC分类号： B60W30/188 , F02D41/22 , B60K28/10
CPC分类号： B60W30/1884 , B60K28/10 , B60K28/14 , F02D33/003 , F02D41/22 , F02D2200/101 , F02D2400/11
摘要： The present invention relates to an apparatus for preventing a vehicle from abruptly accelerating, which is electrically connected between the fuel supply line of a vehicle and the starter. The apparatus comprises an electromagnetic switch that cuts off the fuel supply of the fuel supply line if a circuit breaker cuts off the current at a predetermined engine revolution per minute. The apparatus has a simple structure manufactured at a low cost, and almost completely prevents the accident caused by abrupt acceleration of a vehicle by cutting off the fuel supply immediately when the vehicle reaches the predetermined engine revolution per minute causing the abrupt acceleration.
摘要翻译：本发明涉及一种用于防止车辆突然加速的装置，其电连接在车辆的燃料供应管线和起动器之间。该装置包括电磁开关，如果断路器以每分钟预定的发动机转数切断电流，则该电磁开关切断燃料供应管线的燃料供应。该装置具有以低成本制造的简单结构，并且几乎完全通过当车辆达到每分钟预定的发动机转数导致突然加速时切断燃料供应而几乎完全防止车辆突然加速引起的事故。

3. 发明申请

US20090180415A1 METHOD, APPARATUS AND COMPUTER READABLE MEDIUM FOR REDUCING POWER-CONSUMPTION OF WIRELESS NETWORK DEVICE 有权
标题翻译：方法，装置和计算机可读介质，用于减少无线网络设备的功耗
公开(公告)号：US20090180415A1
公开(公告)日：2009-07-16
申请号：US12273803
申请日：2008-11-19
申请人： Jong-ho PARK , Ji-sang KIM , Jin-min KIM
发明人： Jong-ho PARK , Ji-sang KIM , Jin-min KIM
IPC分类号： G08C17/02
CPC分类号： H04W52/0212 , H04L67/327 , H04W52/0229 , Y02D70/142 , Y02D70/146
摘要： A method, an apparatus, and a computer-readable medium to reduce power consumption of a wireless network device, the method including: receiving a packet; and determining whether to transmit the received packet to a host based on a state of the host and a packet transmission standard set for the host. Accordingly, it is possible to extend a period of use of a wireless portable terminal using an Internet protocol (IP)-based wireless network.
摘要翻译：一种减少无线网络设备的功耗的方法，装置和计算机可读介质，所述方法包括：接收分组; 以及基于所述主机的状态以及为所述主机设置的分组传输标准来确定是否将所接收的分组发送到主机。因此，可以使用基于互联网协议（IP）的无线网络来延长无线便携式终端的使用时间。

4. 发明申请

US20070231716A1 PLASMA ETCHING CHAMBER AND METHOD FOR MANUFACTURING PHOTOMASK USING THE SAME 有权
标题翻译：等离子体蚀刻室及其制造方法
公开(公告)号：US20070231716A1
公开(公告)日：2007-10-04
申请号：US11758258
申请日：2007-06-05
申请人： Jeong-Yun LEE , Jin-Min KIM , Hae-Young JEONG , Young-Hwa NO , Sang-Joon YOON , Sung-Yong CHO
发明人： Jeong-Yun LEE , Jin-Min KIM , Hae-Young JEONG , Young-Hwa NO , Sang-Joon YOON , Sung-Yong CHO
IPC分类号： G03F1/00
CPC分类号： H01J37/32724 , G03F1/80 , H01J37/32009 , H01J2237/2001
摘要： A plasma etching chamber of a plasma etching apparatus used in an etching process for manufacturing a photomask and a method for manufacturing a photomask using the same. The plasma etching chamber includes an electrode having a supporting surface for supporting a photomask substrate and a top surface surrounding the supporting surface, a heat transfer element installed along a peripheral edge of the supporting surface, and a heater for supplying heat to the heat transfer element. In the method for manufacturing a photomask, a shading layer is formed on a transparent substrate. A photoresist layer pattern is formed on the shading layer to partially expose the shading layer. The shading layer is etched to form a shading layer pattern, using plasma with the photoresist layer pattern as an etching mask, under a state in which the temperature of at least one portion of the peripheral edge of the transparent substrate is maintained higher than a temperature at a center of the transparent substrate.
摘要翻译：用于制造光掩模的蚀刻工艺中使用的等离子体蚀刻装置的等离子体蚀刻室和使用其的光掩模的制造方法。等离子体蚀刻室包括具有用于支撑光掩模基板的支撑表面和围绕支撑表面的顶表面的电极，沿着支撑表面的周缘安装的传热元件，以及用于向传热元件供热的加热器。在光掩模的制造方法中，在透明基板上形成遮光层。在遮光层上形成光致抗蚀剂层图案，以部分地曝光遮光层。在使透明基板的周边边缘的至少一部分的温度保持高于温度的状态下，将遮光层蚀刻以形成遮光层图案，使用具有光致抗蚀剂层图案的等离子体作为蚀刻掩模在透明基板的中心。

5. 发明授权

US5804339A Fidelity ratio corrected photomasks and methods of fabricating fidelity ratio corrected photomasks 失效
标题翻译：保真度校正光掩模和制造保真度校正光掩模的方法
公开(公告)号：US5804339A
公开(公告)日：1998-09-08
申请号：US754685
申请日：1996-11-21
申请人： Jin-min Kim
发明人： Jin-min Kim
IPC分类号： G03F1/76 , G03F7/20 , H01L21/027 , G03F9/00
CPC分类号： G03F7/2022 , G03F1/44
摘要： Methods of fabricating a photomask including a correction exposure utilizing a correction exposure mask. The methods include exposing a photoresist with an activating agent utilizing a predetermined exposure pattern with a first exposure dosage. The photoresist is also exposed with a correction exposure dosage of an activating agent using a correction exposure pattern. The correction exposure dosage is less than the first exposure dosage. The correction exposure pattern may include a portion of the predetermined exposure pattern having a low pattern fidelity ratio. Photomasks fabricated according to the methods of the present invention are also provided.
摘要翻译：使用校正曝光掩模制造包括校正曝光的光掩模的方法。所述方法包括利用具有第一曝光剂量的预定曝光图案用活化剂曝光光致抗蚀剂。使用校正曝光图案也用激活剂的校正曝光剂量曝光光致抗蚀剂。矫正暴露剂量小于第一次暴露剂量。校正曝光图案可以包括具有低图案保真度比的预定曝光图案的一部分。还提供了根据本发明的方法制造的光掩模。

6. 发明授权

US09185669B2 Synchronization method for distributed antenna system and apparatus using the same 有权
标题翻译：分布式天线系统的同步方法及其使用方法
公开(公告)号：US09185669B2
公开(公告)日：2015-11-10
申请号：US13606491
申请日：2012-09-07
申请人： Hyun Woo Lee , Hyuk Min Son , Hye Young Choi , Seung Hee Han , Jin Min Kim
发明人： Hyun Woo Lee , Hyuk Min Son , Hye Young Choi , Seung Hee Han , Jin Min Kim
IPC分类号： H04J3/00 , H04W56/00 , H04W52/24
CPC分类号： H04W56/001 , H04W52/242 , H04W56/0005 , H04W56/0015 , H04W56/0045
摘要： A method for uplink synchronization in a distributed antenna system is provided. A user equipment determines a transmission offset based on a transmission point for uplink synchronization, allocates uplink synchronization signal to a second communication channel based on the transmission offset, and transmits the uplink transmission signal to the transmission point for uplink synchronization through the second communication channel.
摘要翻译：提供了一种用于分布式天线系统中的上行链路同步的方法。用户设备基于用于上行链路同步的传输点确定传输偏移，基于传输偏移将上行链路同步信号分配给第二通信信道，并且通过第二通信信道将上行链路传输信号发送到用于上行链路同步的传输点。

7. 发明申请

US20140192757A1 METHOD AND DEVICE FOR ACQUIRING RESOURCE FOR UPLINK CONTROL CHANNEL IN WIRELESS COMMUNICATION SYSTEM 有权
标题翻译：无线通信系统上网控制通道资源获取方法与设备
公开(公告)号：US20140192757A1
公开(公告)日：2014-07-10
申请号：US14237663
申请日：2012-08-10
申请人： Hyun Woo Lee , Hyuk Min Son , Hye Young Choi , Seung Hee Han , Jin Min Kim
发明人： Hyun Woo Lee , Hyuk Min Son , Hye Young Choi , Seung Hee Han , Jin Min Kim
IPC分类号： H04L5/00
CPC分类号： H04L5/0055 , H04L1/1861 , H04L5/0007 , H04L5/001 , H04L5/0035 , H04L5/0053 , H04W72/04
摘要： Provided are a method and device for acquiring a PUCCH (physical uplink control channel) resource index in a wireless communication system. A terminal acquires a PUCCH resource index indicating a dynamic PUCCH region corresponding to an e-PDCCH (enhanced physical downlink control channel). The PUCCH resource index is acquired based on the smallest CCE (control channel element) index wherein the e-PDCCH is allocated, and a first dynamic PUCCH region corresponding to the e-PDCCH is not overlapped with the dynamic PUCCH region corresponding to PDCCH.
摘要翻译：提供了一种在无线通信系统中获取PUCCH（物理上行链路控制信道）资源索引的方法和装置。终端获取表示与e-PDCCH（增强物理下行链路控制信道）对应的动态PUCCH区域的PUCCH资源索引。基于其中分配了e-PDCCH的最小CCE（控制信道要素）索引获取PUCCH资源索引，并且与e-PDCCH对应的第一动态PUCCH区域与对应于PDCCH的动态PUCCH区域不重叠。

8. 发明申请

US20140161089A1 METHOD OF PERFORMING A RANDOM ACCESS PROCESS AND WIRELESS DEVICE USING SAME 有权
标题翻译：执行随机访问过程的方法和使用该方法的无线设备
公开(公告)号：US20140161089A1
公开(公告)日：2014-06-12
申请号：US14235320
申请日：2012-08-10
申请人： Joon Kui Ahn , Jin Min Kim , Hyun Woo Lee , Suck Chel Yang , Dong Youn Seo , Seung Hee Han
发明人： Joon Kui Ahn , Jin Min Kim , Hyun Woo Lee , Suck Chel Yang , Dong Youn Seo , Seung Hee Han
IPC分类号： H04W74/08 , H04L5/00
CPC分类号： H04W74/0833 , H04L5/0053 , H04W74/02
摘要： Provided are a method of performing a random access process and wireless device using same in a wireless communication system. A first random access process and a second random access process are triggered in one subframe, and a wireless device selects one of the first random access process and the second random access process. The wireless device transmits a random access preamble on the selected random access process from the one subframe to a base station.
摘要翻译：提供了一种在无线通信系统中执行随机接入处理的方法和使用其的无线设备。在一个子帧中触发第一随机接入过程和第二随机接入过程，并且无线设备选择第一随机接入过程和第二随机接入过程之一。无线设备在所选择的随机接入过程中从一个子帧向基站发送随机接入前导码。

9. 发明申请

US20130242951A1 SYNCHRONIZATION METHOD FOR DISTRIBUTED ANTENNA SYSTEM AND APPARATUS USING THE SAME 有权
标题翻译：用于分布式天线系统的同步方法和使用该方法的装置
公开(公告)号：US20130242951A1
公开(公告)日：2013-09-19
申请号：US13606491
申请日：2012-09-07
申请人： Hyun Woo LEE , Hyuk Min SON , Hye Young CHOI , Seung Hee HAN , Jin Min KIM
发明人： Hyun Woo LEE , Hyuk Min SON , Hye Young CHOI , Seung Hee HAN , Jin Min KIM
IPC分类号： H04W56/00
CPC分类号： H04W56/001 , H04W52/242 , H04W56/0005 , H04W56/0015 , H04W56/0045
摘要： A method for uplink synchronization in a distributed antenna system is provided. A user equipment determines a transmission offset based on a transmission point for uplink synchronization, allocates uplink synchronization signal to a second communication channel based on the transmission offset, and transmits the uplink transmission signal to the transmission point for uplink synchronization through the second communication channel.
摘要翻译：提供了一种用于分布式天线系统中的上行链路同步的方法。用户设备基于用于上行链路同步的传输点确定传输偏移，基于传输偏移将上行链路同步信号分配给第二通信信道，并且通过第二通信信道将上行链路传输信号发送到用于上行链路同步的传输点。

10. 发明授权

US07601469B2 Plasma etching chamber and method for manufacturing photomask using the same 有权
公开(公告)号：US07601469B2
公开(公告)日：2009-10-13
申请号：US11758258
申请日：2007-06-05
申请人： Jeong-Yun Lee , Jin-Min Kim , Hae-Young Jeong , Young-Hwa No , Sang-Joon Yoon , Sung-Yong Cho
发明人： Jeong-Yun Lee , Jin-Min Kim , Hae-Young Jeong , Young-Hwa No , Sang-Joon Yoon , Sung-Yong Cho
IPC分类号： G03F1/00 , G03F7/26
CPC分类号： H01J37/32724 , G03F1/80 , H01J37/32009 , H01J2237/2001
摘要： A plasma etching chamber of a plasma etching apparatus used in an etching process for manufacturing a photomask and a method for manufacturing a photomask using the same. The plasma etching chamber includes an electrode having a supporting surface for supporting a photomask substrate and a top surface surrounding the supporting surface, a heat transfer element installed along a peripheral edge of the supporting surface, and a heater for supplying heat to the heat transfer element. In the method for manufacturing a photomask, a shading layer is formed on a transparent substrate. A photoresist layer pattern is formed on the shading layer to partially expose the shading layer. The shading layer is etched to form a shading layer pattern, using plasma with the photoresist layer pattern as an etching mask, under a state in which the temperature of at least one portion of the peripheral edge of the transparent substrate is maintained higher than a temperature at a center of the transparent substrate.

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