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    • 1. 发明申请
    • TFT LCD ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF
    • TFT液晶阵列基板及其制造方法
    • US20090206346A1
    • 2009-08-20
    • US12434372
    • 2009-05-01
    • Chunping LongJigang ZhaoSeung Moo Rim
    • Chunping LongJigang ZhaoSeung Moo Rim
    • H01L33/00H01L21/336
    • H01L27/1288G02F1/136227G02F2001/136231G02F2001/136236H01L27/1214
    • The present invention discloses a method for manufacturing a TFT LCD array substrate by utilizing the gray tone mask technology and the photoresist lifting-off technology with only two masks in two photolithography processes, and to a TFT LCD array substrate manufactured by the same. In the resultant array substrate, the gate line and the data line are perpendicular to and intersect with each other to define the pixel area, and one of the gate line and the data line is continuous and the other is discontinuous. The array substrate is covered with a passivation protection film. The disconnected gate line or the data line is connected together through the via holes formed in the passivation protection film and the connecting conductive film formed on the passivation protection film. The data line and the source electrode and drain electrode of the TFT are made of the same conductive film, and the connecting conductive film and the pixel electrode are made of the same conductive film in the same photolithography process.
    • 本发明公开了通过在两个光刻工艺中仅使用两个掩模的灰色蒙版技术和光致抗蚀剂剥离技术以及由其制造的TFT LCD阵列基板来制造TFT LCD阵列基板的方法。 在合成的阵列基板中,栅极线和数据线彼此垂直并相交,以限定像素区域,并且栅极线和数据线之一是连续的,而另一个是不连续的。 阵列基板被钝化保护膜覆盖。 断开的栅线或数据线通过形成在钝化保护膜上的通孔和形成在钝化保护膜上的连接导电膜连接在一起。 TFT的数据线和源电极和漏电极由相同的导电膜制成,并且在相同的光刻工艺中,连接导电膜和像素电极由相同的导电膜制成。
    • 2. 发明授权
    • Thin film transistor liquid crystal display array substrate and manufacturing method thereof
    • 薄膜晶体管液晶显示阵列基板及其制造方法
    • US07851806B2
    • 2010-12-14
    • US12434372
    • 2009-05-01
    • Chunping LongJigang ZhaoSeung Moo Rim
    • Chunping LongJigang ZhaoSeung Moo Rim
    • H01L29/04H01L21/00
    • H01L27/1288G02F1/136227G02F2001/136231G02F2001/136236H01L27/1214
    • The present invention discloses a method for manufacturing a TFT LCD array substrate by utilizing the gray tone mask technology and the photoresist lifting-off technology with only two masks in two photolithography processes, and to a TFT LCD array substrate manufactured by the same. In the resultant array substrate, the gate line and the data line are perpendicular to and intersect with each other to define the pixel area, and one of the gate line and the data line is continuous and the other is discontinuous. The array substrate is covered with a passivation protection film. The disconnected gate line or the data line is connected together through the via holes formed in the passivation protection film and the connecting conductive film formed on the passivation protection film. The data line and the source electrode and drain electrode of the TFT are made of the same conductive film, and the connecting conductive film and the pixel electrode are made of the same conductive film in the same photolithography process.
    • 本发明公开了通过在两个光刻工艺中仅使用两个掩模的灰色蒙版技术和光致抗蚀剂剥离技术以及由其制造的TFT LCD阵列基板来制造TFT LCD阵列基板的方法。 在合成的阵列基板中,栅极线和数据线彼此垂直并相交,以限定像素区域,并且栅极线和数据线之一是连续的,而另一个是不连续的。 阵列基板被钝化保护膜覆盖。 断开的栅线或数据线通过形成在钝化保护膜上的通孔和形成在钝化保护膜上的连接导电膜连接在一起。 TFT的数据线和源电极和漏电极由相同的导电膜制成,并且在相同的光刻工艺中,连接导电膜和像素电极由相同的导电膜制成。
    • 3. 发明申请
    • TFT LCD ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF
    • TFT液晶阵列基板及其制造方法
    • US20070298554A1
    • 2007-12-27
    • US11767600
    • 2007-06-25
    • Chunping LONGJigang ZhaoSeung Moo Rim
    • Chunping LONGJigang ZhaoSeung Moo Rim
    • H01L21/84
    • H01L27/1288G02F1/136227G02F2001/136231G02F2001/136236H01L27/1214
    • The present invention discloses a method for manufacturing a TFT LCD array substrate by utilizing the gray tone mask technology and the photoresist lifting-off technology with only two masks in two photolithography processes, and to a TFT LCD array substrate manufactured by the same. In the resultant array substrate, the gate line and the data line are perpendicular to and intersect with each other to define the pixel area, and one of the gate line and the data line is continuous and the other is discontinuous. The array substrate is covered with a passivation protection film. The disconnected gate line or the data line is connected together through the via holes formed in the passivation protection film and the connecting conductive film formed on the passivation protection film. The data line and the source electrode and drain electrode of the TFT are made of the same conductive film, and the connecting conductive film and the pixel electrode are made of the same conductive film in the same photolithography process.
    • 本发明公开了通过在两个光刻工艺中仅使用两个掩模的灰色蒙版技术和光致抗蚀剂剥离技术以及由其制造的TFT LCD阵列基板来制造TFT LCD阵列基板的方法。 在合成的阵列基板中,栅极线和数据线彼此垂直并相交,以限定像素区域,并且栅极线和数据线之一是连续的,而另一个是不连续的。 阵列基板被钝化保护膜覆盖。 断开的栅线或数据线通过形成在钝化保护膜上的通孔和形成在钝化保护膜上的连接导电膜连接在一起。 TFT的数据线和源电极和漏电极由相同的导电膜制成,并且在相同的光刻工艺中,连接导电膜和像素电极由相同的导电膜制成。
    • 5. 发明授权
    • Manufacturing method for a TFT LCD array substrate
    • TFT LCD阵列基板的制造方法
    • US07531394B2
    • 2009-05-12
    • US11767600
    • 2007-06-25
    • Chunping LongJigang ZhaoSeung Moo Rim
    • Chunping LongJigang ZhaoSeung Moo Rim
    • H01L21/00
    • H01L27/1288G02F1/136227G02F2001/136231G02F2001/136236H01L27/1214
    • The present invention discloses a method for manufacturing a TFT LCD array substrate by utilizing the gray tone mask technology and the photoresist lifting-off technology with only two masks in two photolithography processes, and to a TFT LCD array substrate manufactured by the same. In the resultant array substrate, the gate line and the data line are perpendicular to and intersect with each other to define the pixel area, and one of the gate line and the data line is continuous and the other is discontinuous. The array substrate is covered with a passivation protection film. The disconnected gate line or the data line is connected together through the via holes formed in the passivation protection film and the connecting conductive film formed on the passivation protection film. The data line and the source electrode and drain electrode of the TFT are made of the same conductive film, and the connecting conductive film and the pixel electrode are made of the same conductive film in the same photolithography process.
    • 本发明公开了通过在两个光刻工艺中仅使用两个掩模的灰色蒙版技术和光致抗蚀剂剥离技术以及由其制造的TFT LCD阵列基板来制造TFT LCD阵列基板的方法。 在合成的阵列基板中,栅极线和数据线彼此垂直并相交,以限定像素区域,并且栅极线和数据线之一是连续的,而另一个是不连续的。 阵列基板被钝化保护膜覆盖。 断开的栅线或数据线通过形成在钝化保护膜上的通孔和形成在钝化保护膜上的连接导电膜连接在一起。 TFT的数据线和源电极和漏电极由相同的导电膜制成,并且在相同的光刻工艺中,连接导电膜和像素电极由相同的导电膜制成。