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1. 发明授权

US06423290B1 Method for recovering an organic solvent from an acidic waste stream such as in integrated chip manufacturing 失效
标题翻译：从酸性废物流中回收有机溶剂的方法，如集成芯片制造
公开(公告)号：US06423290B1
公开(公告)日：2002-07-23
申请号：US09585237
申请日：2000-05-31
申请人： Anilkumar C. Bhatt , Jerome J. Wagner
发明人： Anilkumar C. Bhatt , Jerome J. Wagner
IPC分类号： C01B719
CPC分类号： C01B7/198 , C01B7/195 , C07C17/38
摘要： An organic solvent is separated from a waste stream comprising hydrofluoric acid, an organic solvent and etchant contaminants. The process comprises separating the hydrofluoric acid by subjecting the waste stream to at least one of the following processes: ion exchange; extraction of the hydrofluoric acid; electrophoresis; converting the hydrofluoric acid to an insoluble salt; to thereby obtain a first composition containing the hydrofluoric acid and a second stream containing the organic solvent and being substantially free of the hydrofluoric acid; and then distilling the second stream to recover the organic solvent free of the etching contaminants.
摘要翻译：将有机溶剂与包含氢氟酸，有机溶剂和蚀刻剂污染物的废物流分离。该方法包括通过使废物流进行以下至少一种方法分离氢氟酸：离子交换;氢氟酸的提取;电泳;将氢氟酸转化为不溶性盐;从而获得含有氢氟酸的第一组合物酸和含有有机溶剂并且基本上不含氢氟酸的第二料流; 然后蒸馏第二流以回收没有蚀刻污染物的有机溶剂。

2. 发明授权

US5637442A Method for treating photolithographic developer and stripper waste streams containing resist or solder mask and gamma butyrolactone or benzyl alcohol 失效
标题翻译：用于处理含有抗蚀剂或焊接掩模和γ-丁内酯或苄醇的光刻显影剂和汽提废料流的方法
公开(公告)号：US5637442A
公开(公告)日：1997-06-10
申请号：US554639
申请日：1995-11-06
申请人： Anilkumar C. Bhatt , Gary S. Ksenak , Kostas I. Papathomas , James A. Shurtleff , Jerome J. Wagner
发明人： Anilkumar C. Bhatt , Gary S. Ksenak , Kostas I. Papathomas , James A. Shurtleff , Jerome J. Wagner
IPC分类号： G03F7/32 , G03F7/42 , B01D53/72 , B01D53/14 , G03F7/30
CPC分类号： G03F7/422 , G03F7/325 , G03F7/425 , Y10S210/908 , Y10S210/909
摘要： A method is disclosed for using the simple, environmentally friendly organic compounds gamma-butyrolactone and benzyl alcohol to develop and to strip free radical-initiated, addition polymerizable resists, cationically cured resists and solder masks and Vacrel photoresists. In all cases the developers and strippers include gamma butyrolactone or benzyl alcohol. The developers and strippers optionally also include a minor amount of methanol, ethanol, isopropyl alcohol, propylene glycol monomethylacetate, ethylene glycol monomethyl ether, formamide, nitromethane, propylene oxide, or methyl ethyl ketone, acetone and water. During development of the photopatterned resist or solder mask, the unpolymerized regions are dissolved in the disclosed developers. During stripping of the resist or solder mask, the polymerized regions are debonded from a circuit board in the disclosed strippers. Following removal of the developers and strippers, any residual monomers or polymers of the resist or solder mask as well as residual developing solution and stripping solution are rinsed from the printed circuit package. A method is also disclosed for treating the combined developer and stripper rinse effluents in an activated biomass to reduce the biological oxygen demand of the developer/stripper/resist/solder mask waste streams.
摘要翻译：公开了一种使用简单的，环境友好的有机化合物γ-丁内酯和苄醇来开发和剥离自由基引发的可加成聚合抗蚀剂，阳离子固化的抗蚀剂和焊接掩模和Vacrel光致抗蚀剂的方法。在所有情况下，显影剂和脱模剂包括γ-丁内酯或苄醇。显影剂和脱模剂任选地还包括少量甲醇，乙醇，异丙醇，丙二醇单甲基乙酸酯，乙二醇单甲醚，甲酰胺，硝基甲烷，环氧丙烷或甲基乙基酮，丙酮和水。在光刻图案的抗蚀剂或焊接掩模的显影期间，未聚合的区域溶解在所公开的显影剂中。在剥离抗蚀剂或焊接掩模期间，聚合区域从公开的剥离器中的电路板脱粘。在除去显影剂和剥离剂之后，从印刷电路封装中冲洗抗蚀剂或焊料掩模的任何残留单体或聚合物以及残留的显影溶液和剥离溶液。还公开了一种用于处理活性生物质中的组合的显影剂和汽提漂洗废液以减少显影剂/汽提器/抗蚀剂/阻燃剂/焊料掩模废物流的生物需氧量的方法。

3. 发明授权

US5310428A Solvent stabilization process and method of recovering solvent 失效
标题翻译：溶剂稳定化方法及溶剂回收方法
公开(公告)号：US5310428A
公开(公告)日：1994-05-10
申请号：US994868
申请日：1992-12-22
申请人： Anilkumar C. Bhatt , Kostas I. Papathomas , Terry D. Sinclair , Jerome J. Wagner
发明人： Anilkumar C. Bhatt , Kostas I. Papathomas , Terry D. Sinclair , Jerome J. Wagner
IPC分类号： B29C41/12 , B01D3/00 , G03F7/30 , G03F7/42 , H01L21/027 , H01L21/30 , B08B3/08
CPC分类号： G03F7/3092
摘要： Disclosed is a method of thermally stabilizing an effluent stream from an industrial process, such as a photolithographic process, to allow thermally manageable recovery of the solvent. In the separation and recovery process the solvent is exposed to temperatures that can cause polymerization of the relatively small amounts of monomer still contained therein. This polymerization is an exothermic polymerization, which can accelerate the polymerization of the remaining monomer, potentially causing a thermally initiated, exothermic, run away polymerization. Run away, thermally initiated, exothermic polymerization can materially degrade the solvent. The thermally initiated, run away exothermic reaction is inhibited by the inclusion of a thermal stabilizer or polymerization inhibitor.
摘要翻译：公开了一种热稳定来自工业过程（例如光刻工艺）的流出物流的方法，以允许溶剂的热处理回收。在分离和回收过程中，溶剂暴露于可能导致其中仍然含有的相对少量单体的聚合的温度。该聚合是放热聚合，其可以加速剩余单体的聚合，潜在地引起热引发的放热聚合。逃逸，热引发，放热聚合可能会使溶剂物理降解。通过包含热稳定剂或阻聚剂来抑制热引发的，逃逸的放热反应。

4. 发明授权

US06187965B1 Process for recovering high boiling solvents from a photolithographic waste stream comprising at least 10 percent by weight of monomeric units 失效
标题翻译：从包含至少10重量％单体单元的光刻废料流中回收高沸点溶剂的方法
公开(公告)号：US06187965B1
公开(公告)日：2001-02-13
申请号：US09188007
申请日：1998-11-06
申请人： Anilkumar C. Bhatt , Jerome J. Wagner
发明人： Anilkumar C. Bhatt , Jerome J. Wagner
IPC分类号： C07C2980
CPC分类号： C07D307/33 , C07C29/80 , C07C33/20 , C07C33/22 , C07C33/24
摘要： A method of recovering benzyl alcohol, gamma butyrolactone, or propylene carbonate from an impure effluent stream of an industrial process is provided. The effluent waste stream contains greater than about 10 percent by weight of monomeric units that are reacted to form larger oligomers and polymers. The first step in the recovery process involves polymerizing the monomeric units present in the effluent waste stream under conditions effective to reduce the concentration of monomeric units in the waste stream to less than about 10 weight percent. The waste stream then is fed to a first separation stage where it is separated into (i) a gaseous stream of water, soluble gases, and volatile contaminants and (ii) a suspension comprising the high boiling solvent, semi-volatile materials, and non-volatile contaminants and materials. Then the dewatered, low vapor pressure, high boiling solvent-containing suspension is either distilled or evaporated to separate the high boiling solvent from non-volatile materials. In this second separation stage, the solvent-containing suspension is separated into (i) a solvent-containing fraction, and (ii) a sludge fraction. The sludge fraction contains non-volatile materials in the high boiling solvent.
摘要翻译：提供了从工业过程不纯的流出物流中回收苄醇，γ-丁内酯或碳酸亚丙酯的方法。流出物废物流含有大于约10重量％的单体单元，其被反应以形成较大的低聚物和聚合物。回收过程中的第一步包括在有效降低废物流中的单体单元浓度至小于约10重量％的条件下聚合存在于流出物废物流中的单体单元。然后将废物流送入第一分离阶段，在该分离阶段将其分离为（i）气态的水流，可溶性气体和挥发性污染物，和（ii）包含高沸点溶剂，半挥发性物质和非挥发性物质的悬浮液挥发性污染物和材料。然后将脱水，低蒸气压，高沸点溶剂的悬浮液蒸馏或蒸发，以将高沸点溶剂与非挥发性物质分离。在该第二分离阶段，将含溶剂的悬浮液分离成（i）含溶剂的级分，和（ii）污泥馏分。污泥级分在高沸点溶剂中含有非挥发性物质。

5. 发明授权

US06946055B2 Method for recovering an organic solvent from a waste stream containing supercritical CO2 失效
标题翻译：从含有超临界CO2的废物流中回收有机溶剂的方法
公开(公告)号：US06946055B2
公开(公告)日：2005-09-20
申请号：US09934864
申请日：2001-08-22
申请人： Anilkumar C. Bhatt , Jerome J. Wagner
发明人： Anilkumar C. Bhatt , Jerome J. Wagner
IPC分类号： B01D19/00 , B01D1/24 , B01D3/14 , C01B32/50 , C07C68/08 , C23F1/46 , H01L21/306 , B01D1/00 , C01B3/20 , C01B3/24
CPC分类号： C07C68/08 , C01B32/50 , Y02P20/544 , Y10S159/16 , C07C69/96
摘要： An organic solvent is separated from a waste stream containing supercritical CO2, an organic solvent and etchant contaminants. The process includes separating the supercritical CO2 by subjecting the waste stream to elevated temperature and/or reduced pressure to thereby obtain a first composition containing the supercritical CO2 and a second composition containing the organic solvent and being substantially free of the supercritical CO2; and then removing non-volatile etching contaminants from the second stream search as by at least one of the following: evaporation; distillation; filtration; centrifugation; and settling.
摘要翻译：将有机溶剂与含有超临界CO 2废物流，有机溶剂和蚀刻剂污染物分离。该方法包括通过对废物流进行升高的温度和/或减压来分离超临界CO 2，从而获得含有超临界CO 2的第一组合物和第二组合物含有有机溶剂并基本上不含超临界CO 2; 然后通过以下至少一个方式从第二流搜索中除去非挥发性蚀刻污染物：蒸发; 蒸馏过滤; 离心并定居。

6. 发明授权

US5281723A Propylene carbonate recovery process 失效
标题翻译：碳酸亚丙酯回收工艺
公开(公告)号：US5281723A
公开(公告)日：1994-01-25
申请号：US925349
申请日：1992-08-04
申请人： Nageshwer R. Bantu , Anilkumar C. Bhatt , Ross W. Keesler , Konstantinos Papathomas , Terry D. Sinclair , Jerome J. Wagner
发明人： Nageshwer R. Bantu , Anilkumar C. Bhatt , Ross W. Keesler , Konstantinos Papathomas , Terry D. Sinclair , Jerome J. Wagner
IPC分类号： B01D3/00 , C07D317/36 , G03F7/30 , G03F7/42 , H01L21/02 , H01L21/027 , H01L21/30 , C07D317/08
CPC分类号： C07D317/36
摘要： Disclosed is a method of recovering a cyclic alkylene carbonate, such as propylene carbonate, from an effluent stream of a process in which the cyclic alkylene carbonate removes an organic photoresist material from a substrate. The effluent is a cyclic alkylene carbonate effluent, e.g., a propylene carbonate effluent, of the carbonate, water, and polymeric solids. In the recovery process the cyclic alkylene carbonate effluent is fed to a heat exchanger, and separated into (i) water and volatiles, and (ii) cyclic carbonate. This lowers the concentration of water in the cyclic alkylene carbonate to a level that is low enough to substantially avoid hydrolysis of cyclic alkylene carbonate to the corresponding glycol. The dewatered cyclic alkylene carbonate is evaporated to separate the cyclic alkylene carbonate from high boiling materials and polymeric solids. The dewatered cyclic alkylene carbonate is separated into (i) a cyclic alkylene carbonate fraction, and (ii) a photoresist solids fraction. The photoresist materials fractions contains photoresist material in the alkylene carbonate. The cyclic alkylene carbonate fraction is further separated in a fractionation means into a higher vapor pressure alkylene glycol fraction, and a lower vapor pressure alkylene carbonate fraction.
摘要翻译：公开了从循环碳酸亚烃酯从底物去除有机光致抗蚀剂材料的方法的流出物流中回收碳酸亚环己基碳酸酯的方法。流出物是碳酸酯，水和聚合物固体的环状碳酸亚烃酯流出物，例如碳酸亚丙酯流出物。在回收过程中，将环状碳酸亚烃酯流出物进料到热交换器中，并分离成（i）水和挥发物，和（ii）环状碳酸酯。这将环状碳酸亚烃酯中的水的浓度降低至足以基本上避免环状亚烷基碳酸酯水解成相应的二醇的水平。将脱水的环状碳酸亚烃酯蒸发以从环烷烃碳酸酯与高沸点物质和聚合物固体分离。将脱水的环状碳酸亚烃酯分离成（i）环状碳酸亚烷基酯馏分，（ii）光致抗蚀剂固体分数。光致抗蚀剂材料部分在碳酸亚烷基酯中含有光致抗蚀剂材料。环状亚烷基碳酸酯部分在分馏装置中进一步分离成较高蒸气压亚烷基二醇馏分和较低蒸气压的碳酸亚烃酯馏分。

7. 发明授权

US5994597A Process for recovering high boiling solvents from a photolithographic waste stream comprising less than 10 percent by weight monomeric units 有权
标题翻译：从包含少于10重量％单体单元的光刻废料流中回收高沸点溶剂的方法
公开(公告)号：US5994597A
公开(公告)日：1999-11-30
申请号：US188006
申请日：1998-11-06
申请人： Anilkumar C. Bhatt , Jerome J. Wagner
发明人： Anilkumar C. Bhatt , Jerome J. Wagner
IPC分类号： C07C29/80 , C07C69/96 , C07D307/33 , C07D317/36
CPC分类号： C07C29/80
摘要： A method of recovering solvents from an impure effluent stream of an industrial process. The effluent waste stream contains less than about 10 percent by weight of monomeric units that are reacted to form larger oligomers and polymers. The waste stream contains dissolved polymers, polymeric particles, and the hydrolysis, oxidation and/or other decomposition products of one of the solvents. In one embodiment, the first step involves filtering particulate matter from the waste stream. In another embodiment, the filtering step is omitted. The filtered or unfiltered waste stream is fed to a first separation stage for separation into (i) a gaseous stream of water, soluble gases, and volatile contaminants and (ii) a suspension comprising the solvent, water, semi-volatile and non-volatile contaminants, and photoresist products. Following the first separation stage, the dewatered solvent-containing suspension is either distilled or evaporated to separate the solvent from photoresist products and other non-volatile contaminants. Then the solvent-containing suspension is separated into (i) a solvent vapor fraction which contains solvent and semi-volatile contaminants such as plasticizers and monomers, and (ii) a sludge fraction which contains non-volatile contaminants such as polymer and benzoic acid. Thereafter, the solvent vapor fraction is fed into a vapor stripper to strip the semi-volatile contaminants from the solvent vapor fraction using an organic solvent as a mass transfer medium. This removes the semi-volatiles from the solvent-containing vapor fraction and produces a solvent vapor fraction that is essentially pure.
摘要翻译：从工业过程不纯的流出物流中回收溶剂的方法。流出物废物流含有小于约10重量％的单体单元，其被反应形成较大的低聚物和聚合物。废物流含有溶解的聚合物，聚合物颗粒以及其中一种溶剂的水解，氧化和/或其它分解产物。在一个实施方案中，第一步骤涉及从废物流中过滤颗粒物质。在另一个实施例中，省略了过滤步骤。过滤或未过滤的废物流被送入第一分离阶段以分离为（i）气态的水，可溶性气体和挥发性污染物流，和（ii）包含溶剂，水，半挥发性和非挥发性的悬浮液污染物和光致抗蚀剂产品。在第一分离阶段之后，将脱水的含溶剂的悬浮液蒸馏或蒸发以将溶剂与光致抗蚀剂产物和其它非挥发性污染物分离。然后将含溶剂的悬浮液分离成（i）含有溶剂和半挥发性污染物如增塑剂和单体的溶剂蒸汽馏分，和（ii）含有非挥发性污染物如聚合物和苯甲酸的污泥馏分。此后，将溶剂蒸气馏分送入蒸汽汽提器中，以使用有机溶剂作为传质介质从溶剂蒸气馏分中分离出半挥发性污染物。这从含溶剂的蒸汽馏分中除去半挥发物，并产生基本上纯的溶剂蒸气馏分。

8. 发明授权

US5571417A Method for treating photolithographic developer and stripper waste streams containing resist or solder mask and gamma butyrolactone or benzyl alcohol 失效
标题翻译：用于处理含有抗蚀剂或焊接掩模和γ-丁内酯或苄醇的光刻显影剂和汽提废料流的方法
公开(公告)号：US5571417A
公开(公告)日：1996-11-05
申请号：US365088
申请日：1994-12-28
申请人： Anilkumar C. Bhatt , Gary S. Ksenak , Kostas I. Papathomas , James A. Shurtleff , Jerome J. Wagner
发明人： Anilkumar C. Bhatt , Gary S. Ksenak , Kostas I. Papathomas , James A. Shurtleff , Jerome J. Wagner
IPC分类号： G03F7/32 , G03F7/42 , C02F3/02
CPC分类号： G03F7/422 , G03F7/325 , G03F7/425 , Y10S210/908 , Y10S210/909
摘要： A method is disclosed for using the simple, environmentally-friendly organic compounds gamma-butyrolactone and benzyl alcohol to develop and to strip free radical-initiated, addition polymerizable resists, cationically cured resists and solder masks and Vacrel photoresists. In all cases the developers and strippers include gamma butyrolactone or benzyl alcohol. The developers and strippers optionally also include a minor amount of methanol, ethanol, isopropyl alcohol, propylene glycol monomethylacetate, ethylene glycol monomethyl ether, formamide, nitromethane, propylene oxide, or methyl ethyl ketone, acetone and water. During development of the photopatterned resist or solder mask, the unpolymerized regions are dissolved in the disclosed developers. During stripping of the resist or solder mask, the polymerized regions are debonded from a circuit board in the disclosed strippers. Following removal of the developers and strippers, any residual monomers or polymers of the resist or solder mask as well as residual developing solution and stripping solution are rinsed from the printed circuit package. A method is also disclosed for treating the combined developer and stripper rinse effluents in an activated biomass to reduce the biological oxygen demand of the developer/stripper/resist/solder mask waste streams.
摘要翻译：公开了一种使用简单的，环境友好的有机化合物γ-丁内酯和苄醇来开发和剥离自由基引发的可加成聚合抗蚀剂，阳离子固化的抗蚀剂和焊接掩模和Vacrel光致抗蚀剂的方法。在所有情况下，显影剂和脱模剂包括γ-丁内酯或苄醇。显影剂和脱模剂任选地还包括少量甲醇，乙醇，异丙醇，丙二醇单甲基乙酸酯，乙二醇单甲醚，甲酰胺，硝基甲烷，环氧丙烷或甲基乙基酮，丙酮和水。在光刻图案的抗蚀剂或焊接掩模的显影期间，未聚合的区域溶解在所公开的显影剂中。在剥离抗蚀剂或焊接掩模期间，聚合区域从公开的剥离器中的电路板脱粘。在除去显影剂和剥离剂之后，从印刷电路封装中冲洗抗蚀剂或焊料掩模的任何残留单体或聚合物以及残留的显影溶液和剥离溶液。还公开了一种用于处理活性生物质中的组合的显影剂和汽提漂洗废液以减少显影剂/汽提器/抗蚀剂/阻燃剂/焊料掩模废物流的生物需氧量的方法。

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