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    • 2. 发明申请
    • Method and Structure for Screening NFET-to-PFET Device Performance Offsets Within a CMOS Process
    • 在CMOS工艺中筛选NFET至PFET器件性能偏移的方法和结构
    • US20090144024A1
    • 2009-06-04
    • US11949066
    • 2007-12-03
    • Jeffrey H. Oppold
    • Jeffrey H. Oppold
    • G21C17/00
    • H01L22/34
    • A method of screening on-chip variation in NFET-to-PFET device performance for as-manufactured integrated circuits (ICs) made using a CMOS process. The method includes defining an acceptable frequency- or period-based NFET-to-PFET device performance envelope by simulating a pair of ring oscillators, one of which contains only NFET transistors and the other of which contains only PFET transistors. The ring oscillators are then fabricated into each as-manufactured ICs. At screening time, the ring oscillators in each fabricated IC are tested to measure their frequencies (periods). These frequencies (periods) are then compared to the performance envelope to determine whether the NFET-to-PFET device performance of the corresponding IC is acceptable or not.
    • 筛选使用CMOS工艺制造的制造集成电路(IC)的NFET至PFET器件性能的片上变化的方法。 该方法包括通过模拟一对环形振荡器来定义可接受的基于频率或周期的NFET至PFET器件性能包络,其中一个环形振荡器仅包含NFET晶体管,另一个仅包含PFET晶体管。 然后将环形振荡器制造成每个制造的IC。 在筛选时间,测试每个制造的IC中的环形振荡器以测量它们的频率(周期)。 然后将这些频率(周期)与性能包络进行比较,以确定相应IC的NFET至PFET器件性能是否可接受。
    • 5. 发明授权
    • Method and structure for screening NFET-to-PFET device performance offsets within a CMOS process
    • 在CMOS工艺中屏蔽NFET至PFET器件性能偏移的方法和结构
    • US08196088B2
    • 2012-06-05
    • US11949066
    • 2007-12-03
    • Jeffrey H. Oppold
    • Jeffrey H. Oppold
    • G06F11/22G06F17/50
    • H01L22/34
    • A method of screening on-chip variation in NFET-to-PFET device performance for as-manufactured integrated circuits (ICs) made using a CMOS process. The method includes defining an acceptable frequency- or period-based NFET-to-PFET device performance envelope by simulating a pair of ring oscillators, one of which contains only NFET transistors and the other of which contains only PFET transistors. The ring oscillators are then fabricated into each as-manufactured ICs. At screening time, the ring oscillators in each fabricated IC are tested to measure their frequencies (periods). These frequencies (periods) are then compared to the performance envelope to determine whether the NFET-to-PFET device performance of the corresponding IC is acceptable or not.
    • 筛选使用CMOS工艺制造的制造集成电路(IC)的NFET至PFET器件性能的片上变化的方法。 该方法包括通过模拟一对环形振荡器来定义可接受的基于频率或周期的NFET至PFET器件性能包络,其中一个环形振荡器仅包含NFET晶体管,另一个仅包含PFET晶体管。 然后将环形振荡器制造成每个制造的IC。 在筛选时间,测试每个制造的IC中的环形振荡器以测量它们的频率(周期)。 然后将这些频率(周期)与性能包络进行比较,以确定相应IC的NFET至PFET器件性能是否可接受。
    • 7. 发明申请
    • Structure for a Method and Structure for Screening NFET-to-PFET Device Performance Offsets Within a CMOS Process
    • 在CMOS工艺中筛选NFET至PFET器件性能偏移的方法和结构的结构
    • US20090140245A1
    • 2009-06-04
    • US12128273
    • 2008-05-28
    • Jeffrey H. Oppold
    • Jeffrey H. Oppold
    • H01L27/092
    • H01L27/092H01L22/34H01L2924/0002H01L2924/00
    • A design structure of a method of screening on-chip variation in NFET-to-PFET device performance for as-manufactured integrated circuits (ICs) made using a CMOS process. The method includes defining an acceptable frequency- or period-NFET-to-PFET device performance envelope by simulating a pair of ring oscillators, one of which contains only NFET transistors and the other of which contains only PFET transistors. The ring oscillators are then fabricated into each as-manufactured ICs. At screening time, the ring oscillators in each fabricated IC are tested to measure their frequencies (periods). These frequencies (periods) are then compared to the performance envelope to determine whether the NFET-to-PFET device performance of the corresponding IC is acceptable or not.
    • 一种筛选使用CMOS工艺制造的制造集成电路(IC)的NFET至PFET器件性能的片上变化的方法的设计结构。 该方法包括通过模拟一对环形振荡器来定义可接受的频率或周期NFET至PFET器件性能包络,其中一个环形振荡器仅包含NFET晶体管,而另一个只包含PFET晶体管。 然后将环形振荡器制造成每个制造的IC。 在筛选时间,测试每个制造的IC中的环形振荡器以测量它们的频率(周期)。 然后将这些频率(周期)与性能包络进行比较,以确定相应IC的NFET至PFET器件性能是否可接受。