会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 3. 发明申请
    • CMP retaining ring
    • CMP保持环
    • US20070224864A1
    • 2007-09-27
    • US11440461
    • 2006-05-24
    • John BurnsMatthew FullerMartin ForbesJeffery KingMark Smith
    • John BurnsMatthew FullerMartin ForbesJeffery KingMark Smith
    • H01R3/00
    • B24B37/32Y10T29/49826
    • An improved chemical mechanical polishing retaining ring. A representative embodiment comprises a base portion made from a wear-resistant plastic material, and an upper portion, or backbone portion, made from a stiffer and more wear resistant material. One of the base or backbone portion is preferably overmolded onto the other. The base portion can be generally defined by a flat pad-contacting surface, an outer surface, and an inner surface. The base portion can additionally include channels extending from the outer surface to the inner surface to facilitate transfer of slurry to and from the substrate to be polished during the process. One or both of the base portion or backbone portion further includes a plurality of circular ribs that serve to create additional bonding surface with the overmolded material. The retaining ring may additionally includes a plurality of bosses with threaded insert holes by which the retaining ring is attached to a chemical mechanical polishing system.
    • 改进的化学机械抛光保持环。 代表性的实施例包括由耐磨塑料材料制成的基部,以及由更硬和更耐磨的材料制成的上部或主体部分。 基部或骨架部分中的一个优选地包覆成型在另一个上。 基部一般可以由平垫接触表面,外表面和内表面限定。 基部可以另外包括从外表面延伸到内表面的通道,以便于在该过程期间将浆料转移到待抛光的基底上和从基底转移。 基部或骨架部分中的一个或两个还包括多个圆形肋,其用于与包覆成型的材料产生附加的粘合表面。 保持环可以另外包括具有螺纹插入孔的多个凸台,保持环通过该凸起附接到化学机械抛光系统。
    • 4. 发明申请
    • Kinematic coupling with textured contact surfaces
    • 具有纹理接触表面的运动耦合
    • US20070170089A1
    • 2007-07-26
    • US11339462
    • 2006-01-25
    • John BurnsMartin ForbesMatthew FullerJeffery KingMark Smith
    • John BurnsMartin ForbesMatthew FullerJeffery KingMark Smith
    • B65D85/00
    • H01L21/67379Y10S414/14
    • A substrate kinematic coupling or guide plate for a substrate carrier having textured or patterned surfaces at the points of contact to reduce frictional forces generated between automated processing equipment and the kinematic coupling. The textured surface reduces the contact area between the processing equipment and the contact portion of the kinematic coupling, thereby reducing the resultant frictional force. By reducing the frictional force, the substrate carrier more readily settles on the mounting pins of the processing equipment, thus avoiding intolerable height and angular deviations during automated access to the substrates. Textures include, but are not limited to, a knurl pattern, ridges running laterally along the contact portions, and ridges running longitudinally along the contact portions. The textures may be formed by a blow molding, injection molding or in an overmolding process, or by a machining or imprinting process.
    • 用于衬底载体的衬底运动耦合或引导板,其在接触点处具有纹理化或图案化表面,以减少在自动处理设备和运动耦合之间产生的摩擦力。 纹理表面减小了处理设备与运动联接器的接触部分之间的接触面积,从而减少了所产生的摩擦力。 通过减小摩擦力,基板载体更容易落在加工设备的安装销上,从而在自动进入基板期间避免不可容忍的高度和角度偏差。 纹理包括但不限于滚花图案,沿着接触部横向延伸的脊和沿着接触部分纵向延伸的脊。 纹理可以通过吹塑,注模或包覆成型工艺,或通过机械加工或压印加工形成。