专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明专利

GB252984A Improvements in apparatus for hand weaving 未知
公开(公告)号：GB252984A
公开(公告)日：1926-06-10
申请号：GB2802125
申请日：1925-11-07
申请人： HENRY JAMES THACKERAY , MARGARET LOUISE THACKERAY
IPC分类号： D03D29/00
摘要： 252,984. Thackeray, H. J., and Thackeray, M. L. Nov. 7, 1925. Hand power looms; treating wefts in looms ; bobbin-winding attachments, looms provided with. - A small hand loom using a continuous thread or threads for the warp comprises a frame A of hard wood &c. pivoted to a back support or legs E, which are folded up when not in use, the opposite end of the frame resting on the worker's knee and being furnished with an adjustable head C whereby the warp may be tensioned. One or more continuous threads are passed around the head C and back D and are inserted in the teeth of a comb or reed with a removable head F. The heald comprises a removable top rod &c. G having a continuous string I furnished with knotted loops into which alternate warp threads &c. are inserted, the loops being then hung on to the rod &c. G, which is then inserted into slots in the side pieces of the heald frame. When weaving a long fabric, an extension piece is attached to the back D by wooden screws. The weft is inserted by a bobbin J, which is wound by means of a bobbin winding device attached to the legs E and comprising a slotted chuck M to receive one end of the bobbin, the point of which is held in the cupped end of a set screw P. The chuck M is turned by a handle O and has a hole to receive a bobbin-fastening pin. The bobbins are made of deal with hard wood ends, the heads being pointed. A cross stick comprising a thin pointed rod somewhat longer than the width of the loom is used to facilitate the insertion of alternate warp threads in the loops of the heald. Two or more heald frames may be used, or a shed stick similar but wider than the cross stick may be passed under alternate wrap threads behind a single heald and be turned on its edge to form a shed.

2. 发明申请

US20080206671A1 Novel polymers and photoresist compositions 有权
标题翻译：新型聚合物和光致抗蚀剂组合物
公开(公告)号：US20080206671A1
公开(公告)日：2008-08-28
申请号：US12072790
申请日：2008-02-28
申请人： James Thackeray , Roger Nassar
发明人： James Thackeray , Roger Nassar
IPC分类号： G03F7/004 , G03F7/00
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0382 , G03F7/38 , Y10S430/106 , Y10S430/111
摘要： The invention relates to new polymers that comprise units that contain one or more photoacid generator groups and photoresists that contain the polymers. Preferred polymers of the invention are suitable for use in photoresists imaged at short wavelengths such as sub-250 nm or sub-200 nm, particularly 248 nm and 193 nm.
摘要翻译：本发明涉及包含含有一种或多种光酸产生剂基团的单元的新聚合物和含有聚合物的光致抗蚀剂。本发明优选的聚合物适用于在短波长（例如亚250nm或亚-200nm，特别是248nm和193nm）成像的光刻胶中。

3. 发明申请

US20060051706A1 Radiation sensitive compositions and methods 有权
公开(公告)号：US20060051706A1
公开(公告)日：2006-03-09
申请号：US11249813
申请日：2005-10-12
申请人： James Thackeray , Angelo Lamola
发明人： James Thackeray , Angelo Lamola
IPC分类号： G03C1/76
CPC分类号： G03F7/0382 , G03F7/004 , G03F7/0045 , G03F7/0226 , G03F7/038 , G03F7/039 , G03F7/0392 , G03F7/40
摘要： The present invention provides radiation sensitive compositions and methods that comprise novel means for providing relief images of enhanced resolution. In one aspect the invention provides a method for controlling diffusion of photogenerated acid comprising adding a polar compound to a radiation sensitive composition and applying a layer of the composition to a substrate; exposing the composition layer to activating radiation whereby a latent image is generated comprising a distribution of acid moieties complexed with the polar compound; and treating the exposed composition layer to provide an activating amount of acid.

4. 发明授权

US5210000A Photoresist and method for forming a relief image utilizing composition with copolymer binder having a major proportion of phenolic units and a minor proportion of non-aromatic cyclic alcoholic units 失效
标题翻译：光致抗蚀剂和利用具有主要比例的酚单元的共聚物粘合剂和少量非芳族环状醇单元的组合物形成浮雕图像的方法
公开(公告)号：US5210000A
公开(公告)日：1993-05-11
申请号：US832004
申请日：1992-02-06
申请人： James Thackeray , George W. Orsula , Roger Sinta
发明人： James Thackeray , George W. Orsula , Roger Sinta
IPC分类号： G03F7/023 , G03F7/029 , G03F7/038
CPC分类号： G03F7/0295 , G03F7/0233 , G03F7/038 , Y10S430/106 , Y10S430/11
摘要： A photoresist that utilizes a copolymer of a phenol and a cyclic alcohol having increased optical transmission properties relative to photoresists using fully aromatic phenolic resins. Preferred binders are hydrogenated novolak resins and hydrogenated polyvinyl phenol resins.
摘要翻译：相对于使用完全芳族酚醛树脂的光致抗蚀剂，利用苯酚和环状醇的共聚物的光致抗蚀剂具有增强的光学透射性能。优选的粘合剂是氢化酚醛清漆树脂和氢化聚乙烯基苯酚树脂。

5. 发明申请

US20060228647A1 Photoresist composition 有权
公开(公告)号：US20060228647A1
公开(公告)日：2006-10-12
申请号：US11387215
申请日：2006-03-23
申请人： James Thackeray , James Cameron , Roger Sinta
发明人： James Thackeray , James Cameron , Roger Sinta
IPC分类号： G03C1/00
CPC分类号： G03F7/0392 , G03F7/0045 , Y10S430/115 , Y10S430/121 , Y10S430/122 , Y10S430/126 , Y10S522/913
摘要： Photoresist compositions having a resin binder with an acid labile blocking group with an activation energy in excess of 20 Kcal/mol. for deblocking, a photoacid generator capable of generating a halogenated sulfonic acid upon photolysis and optionally, a base.

6. 发明授权

US5128232A Photoresist composition with copolymer binder having a major proportion of phenolic units and a minor proportion of non-aromatic cyclic alcoholic units 失效
标题翻译：具有苯酚单体的主要成分和非芳香环烷醇单体的较小比例的共聚物粘合剂的光催化组合物
公开(公告)号：US5128232A
公开(公告)日：1992-07-07
申请号：US354800
申请日：1989-05-22
申请人： James Thackeray , George W. Orsula , Roger Sinta
发明人： James Thackeray , George W. Orsula , Roger Sinta
IPC分类号： G03F7/023 , G03F7/029 , G03F7/038 , H01L21/027
CPC分类号： G03F7/0295 , G03F7/0233 , G03F7/038 , Y10S430/106 , Y10S430/11
摘要： A photoresist that utilizes a copolymer of a phenol and a cyclic alcohol having increased optical transmission properties relative to photoresists using fully aromatic phenolic resins. Preferred binders are hydrogenated novolak resins and hydrogenated polyvinyl phenol resins.

7. 发明申请

US20070042289A1 Coating compositions for use with an overcoated photoresist 有权
标题翻译：用于外涂光致抗蚀剂的涂料组合物
公开(公告)号：US20070042289A1
公开(公告)日：2007-02-22
申请号：US11481209
申请日：2006-07-05
申请人： James Thackeray , Gerald Wayton , Charles Szmanda
发明人： James Thackeray , Gerald Wayton , Charles Szmanda
IPC分类号： G03C1/00
CPC分类号： G03F7/11 , G03F7/0392 , G03F7/091
摘要： Underlying coating compositions are provided for use with an overcoated photoresist composition. In one aspect, the coating composition can be crosslinked and comprise one or more components that contain one or more acid-labile groups and/or one or more base-reactive groups that are reactive following crosslinking. In another aspect, underlying coating composition are provided that can be treated to provide a modulated water contact angle. Preferred coating compositions can enhance lithographic performance of an associated photoresist composition.
摘要翻译：提供底涂层组合物用于外涂光致抗蚀剂组合物。在一个方面，涂料组合物可以是交联的并且包含一种或多种含有一个或多个酸不稳定基团的组分和/或一个或多个在交联后是反应性的碱反应性基团。在另一方面，提供了可以处理以提供调制水接触角的下面的涂料组合物。优选的涂料组合物可以增强相关光致抗蚀剂组合物的平版印刷性能。

8. 发明申请

US20060204892A1 Dyed photoresists and methods and articles of manufacture comprising same 失效
公开(公告)号：US20060204892A1
公开(公告)日：2006-09-14
申请号：US11418520
申请日：2006-05-03
申请人： James Mori , James Thackeray , Roger Sinta , Rosemary Bell , Robin Miller-Fahey , Timothy Adams , Thomas Zydowsky , Edward Pavelchek , Manuel doCanto
发明人： James Mori , James Thackeray , Roger Sinta , Rosemary Bell , Robin Miller-Fahey , Timothy Adams , Thomas Zydowsky , Edward Pavelchek , Manuel doCanto
IPC分类号： G03C1/76
CPC分类号： G03F7/091 , G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/111 , Y10S430/127
摘要： The present invention provides new photoresist compositions that comprise a resin binder, a photoactive component, particularly an acid generator, and a dye material that contains one or more chromophores that can reduce undesired reflections of exposure radiation. Preferred dye compounds are polymeric materials that include one or more chromophores such as anthracene and other polycyclic moieties that effectively absorb deep UV exposure radiation.

9. 发明申请

US20060110682A1 Antihalation compositions 失效
公开(公告)号：US20060110682A1
公开(公告)日：2006-05-25
申请号：US11328928
申请日：2006-01-09
申请人： James Thackeray , George Orsula
发明人： James Thackeray , George Orsula
IPC分类号： G03C1/76
CPC分类号： G03F7/38 , G03F7/091
摘要： Antihalation compositions and methods for reducing the reflection of exposure radiation of a photoresist overcoated said compositions. The antihalation compositions of the invention comprise a resin binder and material capable of causing a thermally induced crosslinking reaction of the resin binder.

10. 发明申请

US20050019705A1 Thick film photoresists and methods for use thereof 审中-公开
标题翻译：厚膜光致抗蚀剂及其使用方法
公开(公告)号：US20050019705A1
公开(公告)日：2005-01-27
申请号：US10924351
申请日：2004-08-23
申请人： James Thackeray , James Mori , Gary Teng
发明人： James Thackeray , James Mori , Gary Teng
IPC分类号： G03F7/004 , G03F7/039 , G03F7/16 , G03F7/26 , G03F7/38 , H01L21/027 , G03F7/00
CPC分类号： G03F7/0392 , G03F7/168 , G03F7/38
摘要： New methods and compositions are provided that enable application and processing of photoresist as thick coating layers, e.g. at dried layer (post soft-bake) thicknesses of in excess of 2 microns. Resists can be imaged at short wavelengths in accordance with the invention, including 248 nm.
摘要翻译：提供了新的方法和组合物，其使得能够应用和加工光致抗蚀剂作为厚涂层。在干燥层（软后烘烤）上的厚度超过2微米。根据本发明，抗蚀剂可以以短波长成像，包括248nm。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式