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1. 发明授权

US06272236B1 Inspection technique of photomask 有权
标题翻译：光掩模检测技术
公开(公告)号：US06272236B1
公开(公告)日：2001-08-07
申请号：US09618503
申请日：2000-07-18
申请人： Christophe Pierrat , James Burdorf
发明人： Christophe Pierrat , James Burdorf
IPC分类号： G06K982
CPC分类号： G06T7/0006 , G01N21/95607 , G03F1/84 , G03F7/70483 , G06T2207/30148
摘要： An improved technique for inspecting photomasks employs simulated images of the resist pattern. A simulated image of an original pattern is compared to a simulated image generated from a pattern captured from a photomask manufactured from the original pattern. Alternatively, simulated images generated from captured data from two different instances of the same original pattern formed in a photomask are compared.
摘要翻译：用于检查光掩模的改进技术使用抗蚀剂图案的模拟图像。将原始图案的模拟图像与从由原始图案制造的光掩模捕获的图案生成的模拟图像进行比较。或者，比较从在光掩模中形成的相同原始图案的两个不同实例的捕获数据生成的模拟图像。

2. 发明授权

US6033814A Method for multiple process parameter matching 失效
标题翻译：多进程参数匹配方法
公开(公告)号：US6033814A
公开(公告)日：2000-03-07
申请号：US31397
申请日：1998-02-26
申请人： James Burdorf , Christophe Pierrat
发明人： James Burdorf , Christophe Pierrat
IPC分类号： G03F7/20 , G03F9/00
CPC分类号： G03F7/705 , G03F7/70441 , Y10S430/143 , Y10S430/168
摘要： A computer-implemented method for matching parameters of outputs generated by a first and second process. The first process generates a first output having a characteristic measurable by a first parameter, and the second process generates a second output having the characteristic measurable by a second parameter. A computer having a processing unit and memory is provided. The computer generates a first model of the first parameter for the first process and a second model of the second parameter for the second process. The computer generates a first simulated output of the first process using the first model. A correction, which is a function of the second model and which compensates for the effect of the second process on the second parameter, is applied to the first simulated output to obtain a corrected output. The second process is applied to the corrected output to generate with the computer thereby a third output matching the first parameter of the first output.
摘要翻译：一种用于匹配由第一和第二进程产生的输出的参数的计算机实现的方法。第一过程产生具有可由第一参数测量的特征的第一输出，并且第二处理产生具有可由第二参数测量的特性的第二输出。提供具有处理单元和存储器的计算机。计算机生成用于第一进程的第一参数的第一模型和用于第二进程的第二参数的第二模型。计算机使用第一模型生成第一进程的第一模拟输出。作为第二模型的函数并且补偿第二过程对第二参数的影响的校正被应用于第一模拟输出以获得校正输出。将第二处理应用于经校正的输出以与计算机一起产生与第一输出的第一参数匹配的第三输出。

3. 发明授权

US06519501B2 Method of determining optimum exposure threshold for a given photolithographic model 失效
标题翻译：确定给定光刻模型的最佳曝光阈值的方法
公开(公告)号：US06519501B2
公开(公告)日：2003-02-11
申请号：US09768109
申请日：2001-01-23
申请人： Christophe Pierrat , James Burdorf
发明人： Christophe Pierrat , James Burdorf
IPC分类号： G06F1900
CPC分类号： G03F7/70558 , C09K8/42 , C09K8/508 , C09K8/80 , H01L22/20
摘要： A system and method for enhancing process latitude (tolerances) in the fabrication of devices and integrated circuits. A measuring point is selected corresponding to a feature of critical dimension. Then the pattern is convolved with the model, and its value and rate of change are calculated over a range of corresponding values of a first process parameter. Next, an optimum threshold having the largest rate of change, or contrast, is selected. Finally, proximity correction is performed using relevant parameters.
摘要翻译：一种用于增强器件和集成电路制造中的工艺纬度（公差）的系统和方法。根据关键尺寸的特征选择测量点。然后，该模式与模型进行卷积，并且其值和变化率在第一过程参数的对应值的范围上计算。接下来，选择具有最大变化率或对比度的最佳阈值。最后，使用相关参数进行邻近校正。

4. 发明授权

US06178360B1 Methods and apparatus for determining optimum exposure threshold for a given photolithographic model 失效
标题翻译：用于确定给定光刻模型的最佳曝光阈值的方法和装置
公开(公告)号：US06178360B1
公开(公告)日：2001-01-23
申请号：US09019208
申请日：1998-02-05
申请人： Christophe Pierrat , James Burdorf
发明人： Christophe Pierrat , James Burdorf
IPC分类号： G06F1900
CPC分类号： G03F7/70558 , C09K8/42 , C09K8/508 , C09K8/80 , H01L22/20
摘要： A system and method for enhancing process latitude (tolerances) in the fabrication of devices and integrated circuits. A measuring point is selected corresponding to a feature of critical dimension. Then the pattern is convolved with the model, and its value and rate of change are calculated over a range of corresponding values of a first process parameter. Next, an optimum threshold having the largest rate of change, or contrast, is selected. Finally, proximity correction is performed using relevant parameters.
摘要翻译：一种用于增强器件和集成电路制造中的工艺纬度（公差）的系统和方法。根据关键尺寸的特征选择测量点。然后，该模式与模型进行卷积，并且其值和变化率在第一过程参数的对应值的范围上计算。接下来，选择具有最大变化率或对比度的最佳阈值。最后，使用相关参数进行邻近校正。

5. 发明授权

US6091845A Inspection technique of photomask 失效
标题翻译：光掩模检测技术
公开(公告)号：US6091845A
公开(公告)日：2000-07-18
申请号：US28878
申请日：1998-02-24
申请人： Christophe Pierrat , James Burdorf
发明人： Christophe Pierrat , James Burdorf
IPC分类号： G01N21/956 , G03F1/84 , G03F7/20 , G06T7/00 , G06K9/82
CPC分类号： G06T7/0006 , G01N21/95607 , G03F1/84 , G03F7/70483 , G06T2207/30148
摘要： An improved technique for inspecting photomasks employs simulated images of the resist pattern. A simulated image of an original pattern is compared to a simulated image generated from a pattern captured from a photomask manufactured from the original pattern. Alternatively, simulated images generated from captured data from two different instances of the same original pattern formed in a photomask are compared.
摘要翻译：用于检查光掩模的改进技术使用抗蚀剂图案的模拟图像。将原始图案的模拟图像与从由原始图案制造的光掩模捕获的图案生成的模拟图像进行比较。或者，比较从在光掩模中形成的相同原始图案的两个不同实例的捕获数据生成的模拟图像。

6. 发明授权

US5795688A Process for detecting defects in photomasks through aerial image comparisons 失效
标题翻译：通过空中图像比较来检测光掩模中的缺陷的过程
公开(公告)号：US5795688A
公开(公告)日：1998-08-18
申请号：US696652
申请日：1996-08-14
申请人： James Burdorf , Christophe Pierrat
发明人： James Burdorf , Christophe Pierrat
IPC分类号： G01N21/956 , G03F1/36 , G03F1/84 , G03F7/20 , G01N21/00 , G03F9/00
CPC分类号： G03F1/36 , G01N21/95607 , G03F1/84 , G03F7/7065 , G03F7/70666
摘要： The present invention provides a process for performing automatic inspection of advanced design photomasks. In a preferred embodiment, an aerial image of a portion of a photomask is generated. A simulated image corresponding to original pattern data is also generated. The aerial image and simulated image are then compared and discrepancies are detected as possible defects.
摘要翻译：本发明提供一种用于执行先进设计光掩模的自动检查的方法。在优选实施例中，产生光掩模的一部分的空间图像。也产生与原始图案数据对应的模拟图像。然后比较空中图像和模拟图像，并将差异作为可能的缺陷进行检测。

7. 发明授权

US06985847B2 System and method for process matching 失效
公开(公告)号：US06985847B2
公开(公告)日：2006-01-10
申请号：US10231627
申请日：2002-08-29
申请人： James Burdorf , Christophe Pierrat
发明人： James Burdorf , Christophe Pierrat
IPC分类号： G06F9/45 , G06F17/50
CPC分类号： G03F7/705 , G03F7/70441 , Y10S430/143 , Y10S430/168
摘要： A computer-implemented method for matching parameters of outputs generated by a first and second process. The first process generates a first output having a characteristic measurable by a first parameter, and the second process generates a second output having the characteristic measurable by a second parameter. A computer having a processing unit and memory is provided. The computer generates a first model of the first parameter for the first process and a second model of the second parameter for the second process. The computer generates a first simulated output of the first process using the first model. A correction, which is a function of the second model and which compensates for the effect of the second process on the second parameter, is applied to the first simulated output to obtain a corrected output. The second process is applied to the corrected output to generate with the computer thereby a third output matching the first parameter of the first output.

8. 发明授权

US06463403B1 System and method for process matching 失效
标题翻译：过程匹配的系统和方法
公开(公告)号：US06463403B1
公开(公告)日：2002-10-08
申请号：US09460565
申请日：1999-12-14
申请人： James Burdorf , Christophe Pierrat
发明人： James Burdorf , Christophe Pierrat
IPC分类号： G06F9455
CPC分类号： G03F7/705 , G03F7/70441 , Y10S430/143 , Y10S430/168
摘要： A computer-implemented method for matching parameters of outputs generated by a first and second process. The first process generates a first output having a characteristic measurable by a first parameter, and the second process generates a second output having the characteristic measurable by a second parameter. A computer having a processing unit and memory is provided. The computer generates a first model of the first parameter for the first process and a second model of the second parameter for the second process. The computer generates a first simulated output of the first process using the first model. A correction, which is a function of the second model and which compensates for the effect of the second process on the second parameter, is applied to the first simulated output to obtain a corrected output. The second process is applied to the corrected output to generate with the computer thereby a third output matching the first parameter of the first output.
摘要翻译：一种用于匹配由第一和第二进程产生的输出的参数的计算机实现的方法。第一过程产生具有可由第一参数测量的特征的第一输出，并且第二处理产生具有可由第二参数测量的特性的第二输出。提供具有处理单元和存储器的计算机。计算机生成用于第一进程的第一参数的第一模型和用于第二进程的第二参数的第二模型。计算机使用第一模型生成第一进程的第一模拟输出。作为第二模型的函数并且补偿第二过程对第二参数的影响的校正被应用于第一模拟输出以获得校正输出。将第二处理应用于经校正的输出以与计算机一起产生与第一输出的第一参数匹配的第三输出。

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