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    • 1. 发明申请
    • SUBSTRATE PROCESSING APPARATUS
    • 基板处理装置
    • WO2018043976A1
    • 2018-03-08
    • PCT/KR2017/009107
    • 2017-08-22
    • JUSUNG ENGINEERING CO., LTD.
    • SHIN, Seung ChulYOO, Jin HyukLEE, Min SuCHOI, Dong Hwan
    • H01L21/027H01L21/687H01L21/683
    • A substrate processing apparatus may include a first disk provided in a chamber and configured to perform a turning motion and to include a plurality of seating holes periodically arranged within a specific radius from a center axis, a plurality of second disks provided in the seating holes, respectively, and configured to perform a revolving and rotating motion in accordance with the turning motion of the first disk, a first rotary connector structure provided between the second disk and the seating hole to allow for a rotating motion of and for an electric connection to the second disk, an electrostatic chuck provided on the second disk and configured to hold a substrate using an electric power supplied through the first rotary connector structure, and a first magnetic gear fixed to the second disk and configured to exert a torque on the second disk, and a second magnetic gear provided in the chamber to be interact with the first magnetic gear but prevented from turning.
    • 衬底处理设备可以包括:第一盘,其设置在腔室中并且被配置为执行转动运动并且包括多个从中心轴线以特定半径周期性地布置的座孔;多个 第二盘,所述第二盘分别设置在所述座孔中,并且构造成根据所述第一盘的转动运动进行旋转和旋转运动;第一旋转连接器结构,设置在所述第二盘和所述座孔之间以允许旋转运动 用于与所述第二盘片电连接;静电卡盘,其设置在所述第二盘片上并且被配置为利用通过所述第一旋转连接器结构提供的电力来保持衬底;以及第一磁齿轮,其被固定到所述第二盘片并且被配置为 在第二盘上施加扭矩,并且设置在腔室中的第二磁齿轮与第一磁齿轮相互作用但防止转动
    • 7. 发明申请
    • SUBSTRATE HEATING APPARATUS
    • 基板加热装置
    • WO2009008673A2
    • 2009-01-15
    • PCT/KR2008/004060
    • 2008-07-10
    • JUSUNG ENGINEERING CO., LTD.PARK, Won SeokKIM, Ki DuckLEE, Yong HyunCHOI, Seung Dae
    • PARK, Won SeokKIM, Ki DuckLEE, Yong HyunCHOI, Seung Dae
    • H01L21/324
    • H01L21/67115
    • A substrate heating apparatus is provided. The substrate heating apparatus includes a chamber, a substrate supporting unit configured to support at least one substrate where a thin film is formed on the top surface thereof, and at least one heating unit disposed in a region adjacent to the rear surface of the substrate. The heating unit includes a plurality of reflecting units arranged under the substrate, at least one lamp heating unit disposed inside the plurality of reflecting units, and a short- wavelength blocking layer disposed on the lamp heating unit. By providing the lamp heating unit under the substrate where the thin film or pattern is formed on the top surface, and supplying heat energy to the rear surface of the substrate, it is possible to prevent the degradation in efficiency of the thin film, such as degradation of the thin film formed on the top surface of the substrate due to the heat source or the peeling of the thin film due to the temperature deviation between the substrate and the thin film. Furthermore, the heat energy is widely spread out at the central region of the rear surface of the substrate, and the heat energy is focused at the edge region of the substrate, thereby heating the large-sized substrate uniformly.
    • 提供了一种基板加热装置。 该基板加热设备包括腔室,基板支撑单元和至少一个加热单元,基板支撑单元被构造为支撑至少一个基板,其中,在基板的顶表面上形成有薄膜,并且至少一个加热单元设置在与基板的后表面相邻的区域中。 加热单元包括布置在基板下方的多个反射单元,布置在多个反射单元内的至少一个灯加热单元以及布置在灯加热单元上的短波长阻挡层。 通过将灯加热单元设置在顶表面上形成有薄膜或图案的基板下,并且将热能供应到基板的背表面,可以防止薄膜的效率降低,例如 由于热源或由于衬底和薄膜之间的温度偏差导致的薄膜剥离而在衬底的顶表面上形成的薄膜退化。 此外,热能广泛散布在基板后表面的中央区域,并且热能集中在基板的边缘区域,从而均匀地加热大尺寸基板。