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1. 发明专利

GB969122A Diels-alder adductions with aromatic dienophiles 未知
公开(公告)号：GB969122A
公开(公告)日：1964-09-09
申请号：GB3684262
申请日：1962-09-28
申请人： JULIUS HYMAN
IPC分类号： C07C23/46
摘要： In the manufacture of Diels-Alder addition products from hexachlorocyclopentadiene and aromatic compounds in which the aromatic ring acts as a dienophile, the rate of reaction is increased by effecting the addition under superatmospheric pressure. The applied pressure should be at least 6,000 lb. per sq. inch, and the addition should be effected at a temperature of at least 100 DEG C., preferably 140-230 DEG C. Examples are given of the manufacture of addition products from hexachlorocyclopentadiene and naphthalene, 2-methylnaphthalene, anthracene, 2-ethylnaphthalene and 2-naphthoic acid. A product from hexachlorocyclopentadiene and 2-chloromethylnaphthalene is also mentioned. Specification 730,430 is referred to.

2. 发明授权

US4277939A Ion beam profile control apparatus and method 失效
标题翻译：离子束剖面控制装置及方法
公开(公告)号：US4277939A
公开(公告)日：1981-07-14
申请号：US27971
申请日：1979-04-09
申请人： Julius Hyman, Jr.
发明人： Julius Hyman, Jr.
IPC分类号： F03H1/00 , H01J27/02 , H01J37/08 , F02K9/00 , F03H5/00
CPC分类号： H01J37/08 , F03H1/0037 , H01J27/02
摘要： Ion chamber 20 receives electrons from cathode 28 and produces ions by electron bombardment in discharge plasma chamber 20. Ions are extracted through ion optics including screen 22 and accelerator electrode 24. Higher ion densities in the center of the discharge chamber are reduced by spoiler 42 which is operated at a potential between cathode and anode potential. This reduces double ionization and central peaking to provide a more uniform ion beam through the optics. By employing laterally positioned spoiler elements beam steering can be accomplished. The ion source is useful wherever a uniform beam profile is desirable as in ion implantation. Controlling the direction of beam density is useful in ion machining and in ion thrusters for space application.
摘要翻译：离子室20从阴极28接收电子并通过在放电等离子体室20中的电子轰击产生离子。通过离子光学器件提取离子，包括屏幕22和加速器电极24.放电室中心的较高的离子密度由扰流器42减少在阴极和阳极之间的电位下运行。这减少了双电离和中心峰值，以提供通过光学器件的更均匀的离子束。通过采用横向定位的扰流板元件，可以实现波束转向。离子源在离子注入中需要均匀的光束轮廓是有用的。控制光束密度的方向对于离子加工和用于空间应用的离子推进器是有用的。

3. 发明专利

FR978348A 未知
公开(公告)号：FR978348A
公开(公告)日：1951-04-12
申请号：FR978348D
申请日：1948-12-30
申请人： JULIUS HYMAN & COMPANY

4. 发明专利

GB364533A A method of treating cracked hydrocarbons to inhibit the formation of gum compounds 未知
公开(公告)号：GB364533A
公开(公告)日：1931-12-28
申请号：GB2271730
申请日：1930-07-28
申请人： JULIUS HYMAN , GEORGE WASHINGTON AYERS
IPC分类号： C10L1/10 , C10L1/12 , C10L1/18 , C10L1/22
摘要： Cracked distillates and other hydrocarbons for use as motor fuels are treated to prevent formation of gum by addition of ammonia or organic substitution compounds thereof and of catechol.

5. 发明授权

US5152866A Plasma/radiation assisted molecular beam epitaxy method 失效
标题翻译：等离子/辐射辅助分子束外延法
公开(公告)号：US5152866A
公开(公告)日：1992-10-06
申请号：US532144
申请日：1990-05-31
申请人： Julius Hyman, Jr. , John R. Beattie , Jesse N. Matossian , Owen K. Wu , Juan F. Lam , Lawrence Anderson
发明人： Julius Hyman, Jr. , John R. Beattie , Jesse N. Matossian , Owen K. Wu , Juan F. Lam , Lawrence Anderson
IPC分类号： C30B23/02
CPC分类号： C30B23/02 , C30B29/48
摘要： A molecular beam epitaxy (MBE) growth method and apparatus is disclosed which achieves a significantly improved sticking coefficient for materials like Hg upon a substrate, and thus a higher efficiency. A highly ionized, low pressure plasma is formed consisting of a mixture of ions of one substance of a compound to be epitaxially grown, neutral particles of the substance and electrons, and also preferably both ionization and excitation radiation. The plasma is directed onto a substrate together with a flux of the other substance in the compound; the flux can be in the form of either a vapor, or a second plasma. Radiation assisted epitaxial growth for Hg compounds in which ionization and excitation radiation are formed from Hg vapor and used to assist epitaxial growth with neutral Hg particles is also described. The plasma is formed in a special discharge chamber having a hollow cathode with an emissive-mix-free cathode insert. The source is preferably a refractory metal such as rolled tantalum foil, which is substantially emissive-material-free and does not contaminate the plasma. Good results are obtained by allowing the plasma to simply diffuse out through an exit port in the discharge chamber, without special extraction assemblies required by prior ion thrusters. Hg sticking coefficients have been improved by a factor of 40 or more.
摘要翻译：公开了一种分子束外延（MBE）生长方法和装置，其实现了对衬底上的诸如Hg的材料的显着改善的粘附系数，并且因此具有更高的效率。形成高离子化的低压等离子体，其由外延生长的化合物的一种物质的离子和物质的中性粒子和电子的混合物组成，并且还优选电离和激发辐射。等离子体与化合物中另一种物质的助熔剂一起引导到基底上; 通量可以是蒸汽或第二等离子体的形式。还描述了汞化合物的辐射辅助外延生长，其中电离和激发辐射由Hg蒸气形成并用于辅助外延生长与中性Hg颗粒。等离子体形成在具有空心阴极的特殊放电室中，其具有无发射混合阴极插入物。来源优选是难熔金属，例如轧制钽箔，其基本上不发射材料，并且不污染等离子体。通过允许等离子体简单地通过放电室中的出口扩散出来，而不需要先前的离子推进器所需的特殊提取组件，可获得良好的结果。 Hg粘附系数提高了40倍以上。

6. 发明专利

FR1061637A 未知
公开(公告)号：FR1061637A
公开(公告)日：1954-04-14
申请号：FR1061637D
申请日：1951-04-17
申请人： JULIUS HYMAN AND COMPANY
IPC分类号： C07D303/10 , C07D331/02

7. 发明专利

FR1059759A 未知
公开(公告)号：FR1059759A
公开(公告)日：1954-03-29
申请号：FR1059759D
申请日：1950-08-26
申请人： JULIUS HYMAN & COMPANY
IPC分类号： C07C13/39 , C07C23/27

8. 发明专利

CH281998A Verfahren zur Herstellung einer neuen insektiziden Verbindung. 未知
公开(公告)号：CH281998A
公开(公告)日：1952-04-15
申请号：CH281998D
申请日：1948-12-31
申请人： JULIUS HYMAN & COMPANY
发明人： HYMAN COMPANY JULIUS
IPC分类号： C07C23/46

9. 发明专利

GB618432A Improvements in or relating to method of forming halogenated organic compounds and the products resulting therefrom 未知
公开(公告)号：GB618432A
公开(公告)日：1949-02-22
申请号：GB847546
申请日：1946-03-19
申请人： JULIUS HYMAN
IPC分类号： C07C23/18 , C07C23/38
摘要： Halogenated Diels-Alder adducts of a hexahalocyclopentadiene with a conjugated diene are prepared by halogenating the hexahalocyclopentadiene adduct, to give addition halogenation or substitution of halogen for hydrogen or for another halogen atom. The products are useful as insecticides. In examples: (1) chlorine is passed into a solution of the adduct of hexachlorocyclopentadiene and cyclopentadiene in carbon tetrachloride, giving octachlorodicyclopentadiene-dihydride; the same product may also be obtained by chlorination under pressure; (2) the adduct starting material of (1) is brominated in carbon tetrachloride in the absence of light and oxygen, in the presence of diphenylamine to give the expected dibromo compound; the addition of a small quantity of aluminium bromide to the reaction mixture causes the bromine to substitute to give hexachloromonobromodicyclopentadiene; (3) the starting material of (1) is treated with liquid anhydrous hydrogen fluoride and lead peroxide in chloroform solution in a steel bomb to produce the difluoride; (4) the Diels-Alder adduct of hexabromocyclopentadiene and cyclopentadiene is chlorinated in carbon tetrachloride to give the dichloro-addition product; (5) a solution of the starting material of (1) in carbon tetrachloride is treated with bromine in the presence of lauryl peroxide giving 1-bromohexachlorodicyclopentadiene; (6) the starting material of (1) is chlorinated with sulphuryl chloride in carbon tetrachloride in the presence of benzoyl peroxide to give a chloro-derivative C10H5Cl7; (7) the product of (5) is treated with sodium iodide in acetone, replacing the bromine atom with an iodine atom; (8) the product of (5) is treated with silver chloride gel, replacing the bromine atom with a chlorine atom; (9) chlorine is passed into a solution of the product of (5) in carbon tetrachloride to give a mixture of 1-chloro- and 1-bromo-octachlorodicyclopentadiene-dihydride; (10) the product of (5) is treated with chlorine and antimony pentachloride in carbon tetrachloride giving the 1-bromo-2,3-dichloro-hexachlorodicyclopentadienedihydride; (11) the adduct of hexachlorocyclopentadiene and methylcyclopentadiene is chlorinated to give a mixture of chloromethyland methyl - octachlorodicyclopentadiene - di - hydride, and (12) the adduct of hexachlorocyclopentadiene and isoprene (1,4,5,6,7,7-hexachloro-3-isopropenyl D 5-bicycloheptene-(1,2,2)) is chlorinated to give the dichloro-addition product. Specification 614,931 is referred to. p ALSO:Insecticides contain as the active ingredient a halogenated Diels-Alder adduct of a hexahalocyclopentadiene with a conjugated diolefine. The insecticides may be used as dusts, oil sprays, aerosols and water emulsions. In examples insecticides are prepared comprising a hydrocarbon oil base containing 1 per cent of an organic thiocyanate and, as the lethal constituent, (1) octacheorodicyclopentadiene dihydride; (2) and (5) a monobromo derivative of the hexachlorocyclopentadiene-cyclopentadiene adduct; (9) a mixture of 1-chloro-and 1-bromo octachlorocyclopentadiene dihydride; (11) a mixture of chloromethyl and methyl-octachlorodicyclopentadiene dihydride, and (12) the dichloride of the adduct of hexachloro-cyclopentadiene and isoprene. Specification 614,931 is referred to.

10. 发明授权

US5132597A Hollow cathode plasma switch with magnetic field 失效
标题翻译：带有磁场的中空阴极等离子开关
公开(公告)号：US5132597A
公开(公告)日：1992-07-21
申请号：US675584
申请日：1991-03-26
申请人： Dan M. Goebel , Robert L. Poeschel , Robert W. Schumacher , Julius Hyman, Jr.
发明人： Dan M. Goebel , Robert L. Poeschel , Robert W. Schumacher , Julius Hyman, Jr.
IPC分类号： H01J17/44 , H01J17/06 , H01J17/14 , H01J17/54
CPC分类号： H01J17/54 , H01J17/063 , H01J17/14
摘要： A diverging magnetic field is established between the cathode and control electrode of a hollow cathode plasma switch to expand the plasma at a passageway through the control electrode, thus significantly increasing the switch's current handling capability. Preferred ranges of magnetic field strength, gas pressure, spacing between the hollow cathode and control electrode, and the mesh aperture size for the control grid are described.

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