会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 1. 发明专利
    • Method for simulating CIE standard illuminant using multi-channel LEDs and illumination system
    • AU2020213494A1
    • 2021-08-12
    • AU2020213494
    • 2020-01-13
    • JIN PENG
    • JIN PENG
    • G01J3/50
    • Provided in the present invention are a method for simulating a CIE standard illuminant using multi-channel LEDs and an illumination system. The method relates to adjusting, according to chromaticity coordinates, brightness of a main light source control channel, a wavelength supplement control channel, and a color temperature adjustment control channel, so as to enable mixed chromaticity coordinates to reach chromaticity coordinates of a CIE standard illuminant to be simulated. According to the method, LED control channels are reduced by means of grouping optimization; and the use of a filter, a technique abandoned by multi-channel LEDs, achieves qualitative transitions that the number of control channels is greatly reduced and the simulation of a standard illuminant light source using multi-channel LEDs can be controlled by means of single chromaticity, without the need of chromaticity control by means of spectroscopic conversion. In a process of simulating a CIE standard illuminant using multi-channel LEDs, the light source performance of a pure chromaticity technique having lower analysis performance surpasses or reaches the light source performance achieved by a spectroscopic chromaticity technique having higher analysis performance.
    • 6. 发明申请
    • IMPROVED LITHOGRAPHIC PROCESS
    • 改进的光刻过程
    • WO2005057289A1
    • 2005-06-23
    • PCT/GB2004/005048
    • 2004-12-01
    • THE UNIVERSITY OF BIRMINGHAMJIANG, KyleJIN, Peng
    • JIANG, KyleJIN, Peng
    • G03F7/20
    • G03F7/2008G03F7/20
    • The present invention provides a lithographic process for producing high aspect ratio parts from an epoxy-type negative photoresist comprising the steps of: (i) irradiating a prebaked masked epoxy-type negative photoresist on a substrate with light at a total energy density of from 18,000 to 35,000mJ/cm 2 , (ii) post-baking the exposed photoresist at elevated temperature, and (iii) developing the exposed photoresist in a solvent, wherein no more than 15 % of the energy density is contributed by light having a wavelength of 400nm or less. The invention also discloses a reciprocating microengine (10) comprising a cylinder (14), piston (12) and crankshaft made by the process.
    • 本发明提供了一种用于从环氧型负型光致抗蚀剂制造高纵横比部件的光刻工艺,其特征在于包括以下步骤:(i)在总能量密度为18,000的光照射基底上的预焙掩膜的环氧型负性光致抗蚀剂 至35,000mJ / cm 2,(ii)在升高的温度下对曝光的光致抗蚀剂进行后烘烤,和(iii)在溶剂中显影曝光的光致抗蚀剂,其中不超过15%的能量密度由具有 波长400nm以下。 本发明还公开了一种往复式微发动机(10),其包括由该过程制成的气缸(14),活塞(12)和曲轴。
    • 8. 发明申请
    • COMPOUNDS AND METHODS FOR MODULATING THE SILENCING OF A POLYNUCLEOTIDE OF INTEREST
    • 用于调节感兴趣的多核苷酸沉默的化合物和方法
    • WO2008073957A2
    • 2008-06-19
    • PCT/US2007087172
    • 2007-12-12
    • UNIV EMORYJIN PENG
    • JIN PENG
    • C12N15/111A61K31/4375A61K31/47A61K31/4741A61K31/519A61K31/7088C12N2310/14C12N2310/141C12N2320/50A61K2300/00
    • Methods and compositions comprising chemical compounds that modulate the silencing of a polynucleotide of interest in a cell are provided. Such chemical compounds when used in combination with an appropriate silencing element can be used to modulate (e.g., increase) the level of the polynucleotide targeted by the silencing element. Methods of using such compositions both in therapies involving RNAi -mediated suppression of gene expression, as well as, in vitro methods that allow for the targeted modulation of expression of a polynucleotide of interest are provided. Pharmaceutical or cosmetic compositions comprising such compounds and silencing elements also are disclosed. Methods for screening a compound of interest for the ability to modulate the activity of a heterologous silencing element also are provided.
    • 提供了包含调节细胞中感兴趣多核苷酸沉默的化学化合物的方法和组合物。 当与合适的沉默元件组合使用时,这些化学化合物可用于调节(例如增加)沉默元件靶向的多核苷酸的水平。 提供了在涉及RNAi介导的基因表达抑制的疗法中使用这种组合物的方法,以及允许针对性地调节目的多核苷酸表达的体外方法。 也公开了包含这些化合物和沉默元件的药物或美容组合物。 还提供了用于筛选感兴趣的化合物以调节异源沉默元件的活性的能力的方法。
    • 10. 发明申请
    • COMPOUNDS AND METHODS FOR MODULATING THE SILENCING OF A POLYNUCLEOTIDE OF INTEREST
    • 用于调节多焦点的沉降的化合物和方法
    • WO2008073961A8
    • 2009-08-06
    • PCT/US2007087186
    • 2007-12-12
    • UNIV EMORYJIN PENG
    • JIN PENG
    • A61K31/4439A61P31/12A61P43/00
    • A61K31/4439
    • Methods and compositions comprising chemical compounds that modulate the silencing of a polynucleotide of interest in a cell are provided. Such chemical compounds when used in combination with an appropriate silencing element can be used to modulate (increase or decrease) the level of the polynucleotide targeted by the silencing element. Methods of using such compositions both in therapies involving RNAi-mediated suppression of gene expression, as well as, in vitro methods that allow for the targeted modulation of expression of a polynucleotide of interest are provided. Pharmaceutical or cosmetic compositions comprising such compounds and silencing elements also are disclosed. Methods for screening a compound of interest for the ability to modulate the activity of a heterologous silencing element also are provided.
    • 提供了包含调节细胞中目的多核苷酸沉默的化合物的方法和组合物。 当与适当的沉默元件组合使用时,这种化合物可用于调节(增加或减少)沉默元件靶向的多核苷酸的水平。 提供了在涉及RNAi介导的基因表达抑制的治疗中使用这些组合物的方法,以及允许针对目的调节感兴趣的多核苷酸表达的体外方法。 还公开了包含这些化合物和沉默元件的药物或化妆品组合物。 还提供了筛选感兴趣的化合物调节异源沉默元件的活性能力的方法。