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    • 2. 发明授权
    • Large aperture imaging optical systems
    • 大孔径成像光学系统
    • US08169717B2
    • 2012-05-01
    • US12802405
    • 2010-06-07
    • J. Brian Caldwell
    • J. Brian Caldwell
    • G02B13/02G02B9/34G02B15/14G02B23/14
    • G02B13/18G02B13/00G02B13/14G02B13/20
    • Large aperture optical systems that are extremely well corrected over a large flat field and over a large spectral range are disclosed. Breathing and aberration variation during focusing are optionally controlled by moving at least two groups of lens elements independently. Aberration correction in general is aided by allowing the working distance to become short relative to the format diagonal. Field curvature is largely corrected by a steeply curved concave surface relatively close to the image plane. This allows the main collective elements to be made of low-index anomalous dispersion materials in order to correct secondary spectrum. In wide-angle example embodiments, distortion may be controlled with an aspheric surface near the front of the lens.
    • 公开了在大平坦场和超大光谱范围内非常好的校正的大孔径光学系统。 可以通过独立地移动至少两组透镜元件来控制聚焦期间的呼吸和像差变化。 一般来说,通过允许工作距离相对于格式对角线变短来辅助校正。 场曲率通过相对靠近图像平面的急剧弯曲的凹面很大程度地校正。 这允许主要集合要素由低折射率异常色散材料制成,以便校正二次光谱。 在广角示例实施例中,可以用靠近镜头前方的非球面来控制失真。
    • 3. 发明授权
    • Afocal Galilean attachment lens with high pupil magnification
    • 非焦距伽利略附件镜头具有高瞳孔放大率
    • US07808718B2
    • 2010-10-05
    • US12387001
    • 2009-04-27
    • James A. FrazierJ. Brian Caldwell
    • James A. FrazierJ. Brian Caldwell
    • G02B15/06G02B13/00
    • G02B27/0081G02B13/04
    • An afocal Galilean attachment lens is disclosed, with the lens comprising, along an optical axis, a first lens group with overall negative optical power and a second lens group with overall positive power. The first and second lens groups are arranged to define a Galilean configuration. The lens also has exit and an entrance pupils with respective diameters DEX and DEN that define a pupil magnification PM=DEX/DEN>4 and in some embodiments PM>10. The afocal Galilean attachment lens also has a length parameter defined LP>200 and in some embodiments LP>700. The extreme length of the afocal Galilean attachment allows for photographing or filming objects that are remote or otherwise hard to photograph while also providing a relatively large depth of field.
    • 公开了一种非焦距伽利略附件透镜,透镜包括沿光轴的具有总体负光焦度的第一透镜组和具有总体正光焦度的第二透镜组。 第一和第二透镜组被布置以限定伽利略配置。 透镜还具有出口和具有各自直径DEX和DEN的入射光瞳,其限定瞳孔放大率PM = DEX / DEN> 4,并且在一些实施例中PM> 10。 非焦距伽利略附件透镜还具有限定的长度参数LP> 200,在一些实施例中,LP> 700。 无焦距伽利略附件的极限长度允许拍摄或拍摄遥控或其他难以拍摄的物体,同时还提供相对较大的景深。
    • 5. 发明授权
    • Large aperture imaging optical system
    • 大孔径成像光学系统
    • US07733581B2
    • 2010-06-08
    • US12229031
    • 2008-08-19
    • J. Brian Caldwell
    • J. Brian Caldwell
    • G02B13/02G02B15/14G02B23/14
    • G02B13/20G02B13/18
    • Large aperture optical systems that are extremely well corrected over a large flat field and over a large spectral range are disclosed. Breathing and aberration variation during focusing are optionally controlled by moving at least two groups of lens elements independently. Aberration correction in general is aided by allowing the working distance to become short relative to the format diagonal. Field curvature is largely corrected by a steeply curved concave surface relatively close to the image plane. This allows the main collective elements to be made of low-index anomalous dispersion materials in order to correct secondary spectrum. In wide-angle example embodiments, distortion may be controlled with an aspheric surface near the front of the lens.
    • 公开了在大平坦场和超大光谱范围内非常好的校正的大孔径光学系统。 可以通过独立地移动至少两组透镜元件来控制聚焦期间的呼吸和像差变化。 一般来说,通过允许工作距离相对于格式对角线变短来辅助校正。 场曲率通过相对靠近图像平面的急剧弯曲的凹面很大程度地校正。 这允许主要集合要素由低折射率异常色散材料制成,以便校正二次光谱。 在广角示例实施例中,可以用靠近镜头前方的非球面来控制失真。
    • 7. 发明申请
    • Afocal galilean attachement lens with high pupil magnification
    • 焦距较高的瞳孔放大镜
    • US20090237810A1
    • 2009-09-24
    • US12387001
    • 2009-04-27
    • James A. FrazierJ. Brian Caldwell
    • James A. FrazierJ. Brian Caldwell
    • G02B13/00
    • G02B27/0081G02B13/04
    • An afocal Galilean attachment lens is disclosed, with the lens comprising, along an optical axis, a first lens group with overall negative optical power and a second lens group with overall positive power. The first and second lens groups are arranged to define a Galilean configuration. The lens also has exit and an entrance pupils with respective diameters DEX and DEN that define a pupil magnification PM=DEX/DEN>4 and in some embodiments PM>10. The afocal Galilean attachment lens also has a length parameter defined LP>200 and in some embodiments LP>700. The extreme length of the afocal Galilean attachment allows for photographing or filming objects that are remote or otherwise hard to photograph while also providing a relatively large depth of field.
    • 公开了一种非焦距伽利略附件透镜,透镜包括沿光轴的具有总体负光焦度的第一透镜组和具有总体正光焦度的第二透镜组。 第一和第二透镜组被布置以限定伽利略配置。 透镜还具有出口和具有各自直径DEX和DEN的入射光瞳,其限定瞳孔放大率PM = DEX / DEN> 4,并且在一些实施例中PM> 10。 非焦距伽利略附件透镜还具有限定的长度参数LP> 200,在一些实施例中,LP> 700。 无焦距伽利略附件的极限长度允许拍摄或拍摄遥控或其他难以拍摄的物体,同时还提供相对较大的景深。
    • 8. 发明申请
    • Large aperture imaging optical system
    • 大孔径成像光学系统
    • US20090052064A1
    • 2009-02-26
    • US12229031
    • 2008-08-19
    • J. Brian Caldwell
    • J. Brian Caldwell
    • G02B9/12G02B9/60
    • G02B13/20G02B13/18
    • Large aperture optical systems that are extremely well corrected over a large flat field and over a large spectral range are disclosed. Breathing and aberration variation during focusing are optionally controlled by moving at least two groups of lens elements independently. Aberration correction in general is aided by allowing the working distance to become short relative to the format diagonal. Field curvature is largely corrected by a steeply curved concave surface relatively close to the image plane. This allows the main collective elements to be made of low-index anomalous dispersion materials in order to correct secondary spectrum. In wide-angle example embodiments, distortion may be controlled with an aspheric surface near the front of the lens.
    • 公开了在大平坦场和超大光谱范围内非常好的校正的大孔径光学系统。 可以通过独立地移动至少两组透镜元件来控制聚焦期间的呼吸和像差变化。 一般来说,通过允许工作距离相对于格式对角线变短来辅助校正。 场曲率通过相对靠近图像平面的急剧弯曲的凹面很大程度地校正。 这允许主要集合要素由低折射率异常色散材料制成,以便校正二次光谱。 在广角示例实施例中,可以用靠近镜头前方的非球面来控制失真。