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    • 2. 发明授权
    • Fast-response phase-locked loop charge-pump driven by low voltage input
    • 由低电压输入驱动的快速响应锁相环电荷泵
    • US08022740B2
    • 2011-09-20
    • US12718935
    • 2010-03-05
    • I-chang WuChungwen LoKeng Leong Fong
    • I-chang WuChungwen LoKeng Leong Fong
    • H03L7/06
    • H03L7/0896
    • Phase-locked loop charge pump driven by low voltage input. In one aspect, a phase-locked loop circuit includes a phase frequency detector operating at a low voltage and providing low-voltage sourcing control signals and low-voltage sinking control signals at the low voltage. A charge pump operates at a high voltage and includes a sourcing control circuit coupled to the low-voltage sourcing control signals and selectively causing the charge pump to source the sourcing current to an output of the charge pump based on the low-voltage sourcing control signals. The charge pump also includes a sinking control circuit that receives the low-voltage sinking control signals and selectively causes the charge pump to sink the sinking current from the output of the charge pump based on the low-voltage sinking control signals.
    • 锁相环电荷泵由低电压输入驱动。 一方面,锁相环电路包括在低电压下工作的相位频率检测器,并在低电压下提供低电压源控制信号和低电压吸收控制信号。 电荷泵以高电压工作,并且包括耦合到低电压源控制信号的源极控制电路,并且基于低电压源控制信号选择性地使电荷泵将源电流源源于电荷泵的输出 。 电荷泵还包括一个吸收控制电路,其接收低电压吸收控制信号,并且基于低压吸收控制信号选择性地使电荷泵从电荷泵的输出吸收吸收电流。
    • 3. 发明授权
    • Apparatus and method for reducing particle contamination in an etcher
    • 用于减少蚀刻器中颗粒污染的装置和方法
    • US06423175B1
    • 2002-07-23
    • US09413654
    • 1999-10-06
    • Yu Chih HuangCherng Chang TsueiI Chang Wu
    • Yu Chih HuangCherng Chang TsueiI Chang Wu
    • C23F102
    • H01L21/67069H01J37/32642H01J2237/022
    • An apparatus and a method for reducing particle contamination by a polymeric film in a plasma etcher are described. In the apparatus for dry etching a wafer, a wafer holder and a ring member positioned juxtaposed to the holder are provided wherein the ring member is used to confine a plasma cloud generated in the chamber cavity onto an exposed surface of the wafer. The ring member has surface areas that is substantially exposed to the chamber interior, the surface areas are roughened to a depth between about 1 &mgr;m and about 10 &mgr;m between peaks and valleys formed in the roughened surfaces by either a sand-blasting method or by a chemical etching method. When the sand-blasting method is utilized to roughen the surface of the ring member, i.e., a focus ring in a reactive ion etching apparatus, particles having a mesh size between 200 mesh and 80 mesh may be suitably used. The roughened surfaces on the focus ring improve adhesion between a polymeric film necessarily produced during the plasma etching process for sidewall passivation and the surface of the quartz focus ring such that polymer film does not flake-off to form contaminants for the wafer positioned in the etch chamber.
    • 描述了一种用于在等离子体蚀刻器中减少由聚合物膜引起的颗粒污染的装置和方法。 在用于干蚀刻晶片的装置中,提供了与保持器并置的晶片保持器和环形构件,其中环构件用于将在室腔中产生的等离子体云限制在晶片的暴露表面上。 环形构件具有基本上暴露于腔室内部的表面区域,表面区域通过喷砂方法或通过喷砂方法在粗糙表面形成的峰和谷之间粗糙化至约1μm和约10μm之间的深度 化学蚀刻法。 当使用喷砂方法来粗糙化环形构件的表面即反应离子蚀刻装置中的聚焦环时,可以适当地使用具有200目和80目之间的网格尺寸的颗粒。 聚焦环上的粗糙表面提高了在用于侧壁钝化的等离子体蚀刻工艺期间必须产生的聚合物膜与石英聚焦环的表面之间的粘合性,使得聚合物膜不会剥落以形成位于蚀刻中的晶片的污染物 房间。
    • 8. 发明授权
    • Method and apparatus for a crystal oscillator to achieve fast start-up time, low power and frequency calibration
    • 用于晶体振荡器的方法和装置,以实现快速启动时间,低功率和频率校准
    • US07348861B1
    • 2008-03-25
    • US11095630
    • 2005-03-31
    • I-chang WuChung Wen LoKeng Leong Fong
    • I-chang WuChung Wen LoKeng Leong Fong
    • H03B5/32H03L5/00
    • H03B5/366H03L3/00
    • One embodiment of the present invention includes a frequency generation circuit including a control module, an oscillator circuit coupled to the control module, the oscillator circuit having a start-up time defined by the time required to reach a desired frequency. The oscillator circuit includes an amplifier having an input and an output and being programmably-alterable by the control module, a first capacitor coupled to the input of the amplifier and being programmably-alterable, in capacitance, by the control module, a second capacitor coupled to the output of the amplifier, a crystal resonator coupled to the first and second capacitors for generating an output signal having a desired frequency, wherein fast start-up time is achieved.
    • 本发明的一个实施例包括频率产生电路,其包括控制模块,耦合到控制模块的振荡器电路,振荡器电路具有由达到期望频率所需的时间所限定的启动时间。 振荡器电路包括具有输入和输出的放大器,并且可由控制模块编程地改变;第一电容器,耦合到放大器的输入端,并且可由控制模块以电容方式可编程地改变第二电容器耦合 耦合到放大器的输出,耦合到第一和第二电容器的晶体谐振器,用于产生具有期望频率的输出信号,其中实现了快速启动时间。
    • 10. 发明申请
    • FAST-RESPONSE PHASE-LOCKED LOOP CHARGE-PUMP DRIVEN BY LOW VOLTAGE INPUT
    • 通过低电压输入驱动的快速响应相位锁定循环充电泵
    • US20100156484A1
    • 2010-06-24
    • US12718935
    • 2010-03-05
    • I-chang WUChungwen LOKeng Leong FONG
    • I-chang WUChungwen LOKeng Leong FONG
    • H03L7/06
    • H03L7/0896
    • Phase-locked loop charge pump driven by low voltage input. In one aspect, a phase-locked loop circuit includes a phase frequency detector operating at a low voltage and providing low-voltage sourcing control signals and low-voltage sinking control signals at the low voltage. A charge pump operates at a high voltage and includes a sourcing control circuit coupled to the low-voltage sourcing control signals and selectively causing the charge pump to source the sourcing current to an output of the charge pump based on the low-voltage sourcing control signals. The charge pump also includes a sinking control circuit that receives the low-voltage sinking control signals and selectively causes the charge pump to sink the sinking current from the output of the charge pump based on the low-voltage sinking control signals.
    • 锁相环电荷泵由低电压输入驱动。 一方面,锁相环电路包括在低电压下工作的相位频率检测器,并在低电压下提供低电压源控制信号和低电压吸收控制信号。 电荷泵以高电压工作,并且包括耦合到低电压源控制信号的源极控制电路,并且基于低电压源控制信号选择性地使电荷泵将源电流源源于电荷泵的输出 。 电荷泵还包括一个吸收控制电路,其接收低电压吸收控制信号,并且基于低压吸收控制信号选择性地使电荷泵从电荷泵的输出吸收吸收电流。