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1. 发明授权

US08130364B2 Projection optical apparatus, exposure method and apparatus, photomask, and device and photomask manufacturing method 有权
标题翻译：投影光学装置，曝光方法和装置，光掩模，装置和光掩模制造方法
公开(公告)号：US08130364B2
公开(公告)日：2012-03-06
申请号：US12000074
申请日：2007-12-07
申请人： Masato Kumazawa , Hitoshi Hatada
发明人： Masato Kumazawa , Hitoshi Hatada
IPC分类号： G03B27/54 , G03B27/42 , G03B27/52
CPC分类号： G03F7/70791 , G03F7/70216 , G03F7/70275 , G03F7/70475
摘要： When forming a magnified image of a mask pattern on an object with a plurality of projection optical systems, projected images of the projection optical systems are formed to be accurately continuous to enable satisfactory pattern transfer. A first projection optical system directs light beam from point a on a mask to point A on a plate and forms a magnified image of the mask on the plate. A second projection optical system directs light beam from point b on the mask to point on the plate and forms a magnified image of the mask on the plate. A first line segment linking point A and point a′, which orthogonally projects point a on the plate, and a second line segment linking point B and point b′, which orthogonally projects point b on the plate PT, overlap each other as viewed in a non-scanning direction.
摘要翻译：当在具有多个投影光学系统的物体上形成掩模图案的放大图像时，投影光学系统的投影图像被形成为准确连续以实现令人满意的图案转印。第一投影光学系统将光束从掩模上的点a引导到板上的点A，并在该板上形成掩模的放大图像。第二投影光学系统将来自点b的光束引导到掩模上以指向板上并在该板上形成掩模的放大图像。连接点A和点a'的第一线段，其正交地投影在板上的点a，并且连接点B和点b'的第二线段，其在板PT上正交投影点b，彼此重叠，如非扫描方向。

2. 发明申请

US20080165334A1 Projection optical apparatus, exposure method and apparatus, photomask, and device and photomask manufacturing method 有权
标题翻译：投影光学装置，曝光方法和装置，光掩模，装置和光掩模制造方法
公开(公告)号：US20080165334A1
公开(公告)日：2008-07-10
申请号：US12000074
申请日：2007-12-07
申请人： Masato Kumazawa , Hitoshi Hatada
发明人： Masato Kumazawa , Hitoshi Hatada
IPC分类号： G03B27/42 , G03B27/54 , G03F1/00
CPC分类号： G03F7/70791 , G03F7/70216 , G03F7/70275 , G03F7/70475
摘要： When forming a magnified image of a mask pattern on an object with a plurality of projection optical systems, projected images of the projection optical systems are formed to be accurately continuous to enable satisfactory pattern transfer. A first projection optical system directs light beam from point a on a mask to point A on a plate and forms a magnified image of the mask on the plate. A second projection optical system directs light beam from point b on the mask to point on the plate and forms a magnified image of the mask on the plate. A first line segment linking point A and point a′, which orthogonally projects point a on the plate, and a second line segment linking point B and point b′, which orthogonally projects point b on the plate PT, overlap each other as viewed in a non-scanning direction.
摘要翻译：当在具有多个投影光学系统的物体上形成掩模图案的放大图像时，投影光学系统的投影图像形成为准确连续，以实现令人满意的图案转印。第一投影光学系统将光束从掩模上的点a引导到板上的点A，并在该板上形成掩模的放大图像。第二投影光学系统将来自点b的光束引导到掩模上以指向板上并在该板上形成掩模的放大图像。连接点A和点a'的第一线段，其正交地投影在板上的点a，并且连接点B和点b'的第二线段，其在板PT上正交投影点b，彼此重叠，如非扫描方向。

3. 发明授权

US08427628B2 Exposure apparatus, exposure method and device fabricating method 有权
标题翻译：曝光装置，曝光方法和装置制造方法
公开(公告)号：US08427628B2
公开(公告)日：2013-04-23
申请号：US12753713
申请日：2010-04-02
申请人： Hitoshi Hatada
发明人： Hitoshi Hatada
IPC分类号： G03B27/42 , G03B27/32
CPC分类号： G03F7/70358 , G03F7/70216 , G03F7/70275 , G03F7/70791
摘要： An exposure method for exposing a plate with an image of a pattern of a mask comprises: reciprocating the mask along X direction, synchronizing a movement of the mask and a movement of the plate to +X direction, projecting an image of a first pattern of the mask onto the plate as an erected image with respect to +X direction during a first period in which the mask that is reciprocating is moved in +X direction, and projecting an image of a second pattern of the mask onto the plate as an inverted image with respect to +X direction during a second period in which the mask that is reciprocating is moved in −X direction.
摘要翻译：用于对具有掩模图案的图像进行曝光的曝光方法包括：使掩模沿X方向往复移动，使掩模的移动与板的移动同步到+ X方向，将第一图案的图像投影到将在往复移动的掩模在+ X方向移动的第一时段期间相对于+ X方向的垂直图像的掩模作为垂直图像，并将掩模的第二图案的图像投影到板上作为倒置在往复移动的掩模在-X方向移动的第二时段期间相对于+ X方向的图像。

4. 发明申请

US20100290019A1 EXPOSURE APPARATUS, EXPOSURE METHOD AND DEVICE FABRICATING METHOD 有权
标题翻译：曝光装置，曝光方法和装置制造方法
公开(公告)号：US20100290019A1
公开(公告)日：2010-11-18
申请号：US12753713
申请日：2010-04-02
申请人： Hitoshi HATADA
发明人： Hitoshi HATADA
IPC分类号： G03B27/54 , G03B27/58
CPC分类号： G03F7/70358 , G03F7/70216 , G03F7/70275 , G03F7/70791
摘要： An exposure method for exposing a plate with an image of a pattern of a mask comprises: reciprocating the mask along X direction, synchronizing a movement of the mask and a movement of the plate to +X direction, projecting an image of a first pattern of the mask onto the plate as an erected image with respect to +X direction during a first period in which the mask that is reciprocating is moved in +X direction, and projecting an image of a second pattern of the mask onto the plate as an inverted image with respect to +X direction during a second period in which the mask that is reciprocating is moved in −X direction.
摘要翻译：用于对具有掩模图案的图像进行曝光的曝光方法包括：使掩模沿X方向往复移动，使掩模的移动与板的移动同步到+ X方向，将第一图案的图像投影到将在往复移动的掩模在+ X方向移动的第一时段期间相对于+ X方向的垂直图像的掩模作为垂直图像，并将掩模的第二图案的图像投影到板上作为倒置在往复移动的掩模在-X方向移动的第二时段期间相对于+ X方向的图像。

5. 发明授权

US06811953B2 Exposure apparatus, method for manufacturing therof, method for exposing and method for manufacturing microdevice 有权
标题翻译：曝光装置，制造方法，曝光方法以及制造微型装置的方法
公开(公告)号：US06811953B2
公开(公告)日：2004-11-02
申请号：US09861698
申请日：2001-05-22
申请人： Hitoshi Hatada , Masaki Kato , Motoo Koyama , Hiroshi Shirasu , Masahiro Iguchi
发明人： Hitoshi Hatada , Masaki Kato , Motoo Koyama , Hiroshi Shirasu , Masahiro Iguchi
IPC分类号： G01B1100
CPC分类号： G03F9/7026 , G03F7/70275 , G03F7/70358
摘要： The memory unit stores the correlation of the positional change in the image planes of the projection optical modules in the focusing direction and the light quantity change. The image plane position determination unit finds the positional change value of the image planes of the projection optical modules based on the correlation information that is stored in the memory unit and the information on changes in the amount of light that is emitted to the projection optical modules. The compensation value calculating unit calculates the compensation value corresponding to the change in the amount of curvature in the image planes of the projection optical modules. The compensating unit compensates the change value in conformity with the compensation value. The focus compensation optical system is driven based on the change value that is compensated.
摘要翻译：存储单元存储投影光学模块在聚焦方向上的图像平面中的位置变化与光量变化的相关性。图像平面位置确定单元基于存储在存储单元中的相关信息和关于发射到投影光学模块的光量变化的信息，找出投影光学模块的图像平面的位置变化值。补偿值计算单元计算与投影光学模块的图像平面中的曲率量的变化相对应的补偿值。补偿单元根据补偿值补偿变化值。基于补偿的变化值驱动聚焦补偿光学系统。

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