会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 8. 发明授权
    • Exposure apparatus and device manufacturing method
    • 曝光装置和装置制造方法
    • US08259284B2
    • 2012-09-04
    • US12546930
    • 2009-08-25
    • Hisashi Namba
    • Hisashi Namba
    • G03B27/52
    • G03B27/52G03F7/70841G03F7/70891
    • An exposure apparatus of the present invention includes a vacuum container accommodating a structure, a vacuum pump configured to increase the degree of vacuum achieved inside the vacuum container, a radiation unit configured to perform a heat exchange through radiation for the structure, a temperature detecting unit configured to detect the temperature of the structure, and a control unit configured to control the radiation unit based on the detected temperature, wherein the radiation unit is arranged at a position determined so that the radiation unit does not interfere with a heat exchange achieved through radiation between the vacuum pump and the structure.
    • 本发明的曝光装置包括容纳结构的真空容器,配置成增加在真空容器内部获得的真空度的真空泵,被配置为通过用于结构的辐射进行热交换的辐射单元,温度检测单元 被配置为检测所述结构的温度;以及控制单元,被配置为基于所检测的温度来控制所述辐射单元,其中所述辐射单元被布置在确定为使得所述辐射单元不干扰通过辐射实现的热交换的位置 在真空泵和结构之间。