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    • 7. 发明授权
    • Method of measuring the refractive index profile and the core diameter
of optical fibers and preforms
    • 测量光纤和预制棒的折射率分布和芯直径的方法
    • US4362943A
    • 1982-12-07
    • US185202
    • 1980-09-08
    • Herman M. Presby
    • Herman M. Presby
    • G01M11/00G01N21/41G01N21/64
    • G01M11/37G01N21/412
    • Shaping of the refractive index profile of an optical fiber is typically achieved by changing the concentration of an index-modifying dopant within the glassy matrix preform. To measure the profile and the core diameter of the preform, in accordance with the present disclosure, the preform (10) is illuminated with a focused beam of ultraviolet radiation (15) whose beam width (w) is small compared to the preform core diameter (d). This induces a fluorescence along a thin pencil-like region (16) of the preform core whose intensity varies in proportion to the concentration of the dopant. Inasmuch as the latter is proportional to the refractive index, the intensity profile gives the index profile directly. A similar measure can also be made on fibers using microscopes for focusing the uv and observing the induced fluorescence. Use of this technique for controlling the rate at which a fiber is drawn is also described.
    • 光纤的折射率分布的成形通常通过改变玻璃态基体预制件内的折射率修饰掺杂剂的浓度来实现。 为了测量预型件的轮廓和芯直径,根据本公开,用聚光束的紫外线辐射(15)照射预成型件(10),其束宽度(w)比预制件芯直径小 (d)。 这会沿着预制核心的薄铅笔状区域(16)引起荧光,其强度与掺杂剂的浓度成比例地变化。 由于后者与折射率成比例,强度分布直接给出了折射率分布。 也可以使用显微镜对聚焦紫外线并观察诱导荧光的纤维进行类似的测量。 还描述了使用这种技术来控制纤维被拉伸的速率。
    • 10. 发明授权
    • Optical device with substrate and waveguide structure having thermal
matching interfaces
    • 具有基板和波导结构的光学器件具有热匹配接口
    • US5483613A
    • 1996-01-09
    • US291387
    • 1994-08-16
    • Allan J. BruceHerman M. Presby
    • Allan J. BruceHerman M. Presby
    • G02B6/122G02B6/10G02B6/12G02B6/126
    • G02B6/105G02B6/126G02B2006/12038
    • The present invention provides polarization-independent optical devices by reducing or eliminating strain-induced birefrigence associated with prior device structures. In a first embodiment, an optical device is produced comprising a doped silica substrate having a coefficient of thermal expansion between 8.times.10.sup.-7 .degree. C..sup.-1 and 15.times.10.sup.-7 .degree.C..sup.-1. On the doped silica substrate is formed a doped silica waveguiding structure having a coefficient of thermal expansion between 8.times.10.sup.-7 .degree. C..sup.-1 and 15.times.10.sup.-7 .degree. C..sup.-1. Alternatively, the coefficient of thermal expansion of the doped silica substrate is selected to be approximately 90% to 110% of the coefficient of thermal expansion of the doped silica waveguiding structure. In another aspect, the present invention provides an optical device comprising a doped silica substrate having a doping gradient from a lower surface to an upper surface. The doping level at the upper surface has a coefficient of thermal expansion approximating the coefficient of thermal expansion of a doped silica waveguiding structure formed thereon.
    • 本发明通过减少或消除与现有器件结构相关联的应变引发的双折射来提供偏振无关的光学器件。 在第一实施例中,制造的光学器件包括具有8×10 -7℃-1和15×10 -7℃-1之间的热膨胀系数的掺杂二氧化硅衬底。 在掺杂二氧化硅衬底上形成具有8×10 -7℃-1和15×10 -7℃-1之间的热膨胀系数的掺杂二氧化硅波导结构。 或者,掺杂二氧化硅衬底的热膨胀系数被选择为掺杂二氧化硅波导结构的热膨胀系数的大约90%至110%。 在另一方面,本发明提供一种光学器件,其包括掺杂二氧化硅衬底,其具有从下表面到上表面的掺杂梯度。 上表面的掺杂浓度具有近似于其上形成的掺杂二氧化硅波导结构的热膨胀系数的热膨胀系数。