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1. 发明授权

US07696355B2 Isothiazole carboxylic acid amides and the application thereof in order to protect plants 失效
标题翻译：异噻唑羧酸酰胺及其应用，以保护植物
公开(公告)号：US07696355B2
公开(公告)日：2010-04-13
申请号：US11589386
申请日：2006-10-30
申请人： Lutz Assmann , Dietmar Kuhnt , Hans-Ludwig Elbe , Christoph Erdelen , Stefan Dutzmann , Gerd Hänssler , Klaus Stenzel , Astrid Mauler-Machnik , Yoshinori Kitagawa , Haruko Sawada , Haruhiko Sakuma
发明人： Lutz Assmann , Dietmar Kuhnt , Hans-Ludwig Elbe , Christoph Erdelen , Stefan Dutzmann , Gerd Hänssler , Klaus Stenzel , Astrid Mauler-Machnik , Yoshinori Kitagawa , Haruko Sawada , Haruhiko Sakuma
IPC分类号： A01N43/80 , C07D275/02 , C07D275/03
CPC分类号： C07D275/03 , A01N43/80
摘要： Novel isothiazolecarboxamides of the formula in which R is as defined in the description, a plurality of processes for preparing the novel compounds and their use for protecting plants against attack by undesirable microorganisms and animal pests.
摘要翻译：式中R如本说明书所定义的新型异噻唑酰胺，多种制备新化合物的方法及其用于保护植物免受不想要的微生物和动物害虫侵袭的用途。

2. 发明授权

US06642181B2 Isothiazole carboxylic acid amides and the application thereof in order to protect plants 失效
公开(公告)号：US06642181B2
公开(公告)日：2003-11-04
申请号：US10010434
申请日：2001-12-06
申请人： Lutz Assmann , Dietmar Kuhnt , Hans-Ludwig Elbe , Christoph Erdelen , Stefan Dutzmann , Gerd Hänssler , Klaus Stenzel , Astrid Mauler-Machnik , Yoshinori Kitagawa , Haruko Sawada , Haruhiko Sakuma
发明人： Lutz Assmann , Dietmar Kuhnt , Hans-Ludwig Elbe , Christoph Erdelen , Stefan Dutzmann , Gerd Hänssler , Klaus Stenzel , Astrid Mauler-Machnik , Yoshinori Kitagawa , Haruko Sawada , Haruhiko Sakuma
IPC分类号： A01N4380
CPC分类号： C07D275/03 , A01N43/80
摘要： Novel isothiazolecarboxamides of the formula in which R is as defined in the description, a plurality of processes for preparing the novel compounds and their use for protecting plants against attack by undesirable microorganisms and animal pests.

3. 发明授权

US5849767A Chloropyridylcarbonyl derivatives 失效
标题翻译：氯吡啶基羰基衍生物
公开(公告)号：US5849767A
公开(公告)日：1998-12-15
申请号：US708995
申请日：1996-09-06
申请人： Yoshio Kurahashi , Haruko Sawada , Haruhiko Sakuma , Taro Kinbara , Koichi Moriya , Koichi Ishikawa , Asami Motonaga
发明人： Yoshio Kurahashi , Haruko Sawada , Haruhiko Sakuma , Taro Kinbara , Koichi Moriya , Koichi Ishikawa , Asami Motonaga
IPC分类号： A01N43/40 , A01N43/50 , A01N43/52 , A01N43/56 , A01N43/647 , A01N43/653 , A01N43/78 , C07D233/58 , C07D249/08 , C07D401/06 , C07D401/14 , C07D405/06 , C07D409/06 , C07D417/06
CPC分类号： C07D401/06 , A01N43/40 , A01N43/50 , A01N43/653 , C07D401/14 , C07D409/06
摘要： Novel chloropyridylcarbonyl derivatives of the formula ##STR1## in which Het is ##STR2## n is 1 or 2, R.sup.1 is hydrogen, optionally substituted C.sub.1-6 alkyl, optionally substituted C.sub.2-6 alkenyl, optionally substituted C.sub.3-6 alkynyl, optionally substituted phenyl or optionally substituted pyrimidinyl, and R.sup.2 and R.sup.3, independently of each other, are hydrogen or C.sub.1-4 alkyl, and acid addition salts and metal salt complexes thereof, are outstandingly active as microbicides.
摘要翻译：式（I）的新型氯吡啶基羰基衍生物，其中Het为氢，任选取代的C 1-6烷基，任选取代的C 2-6烯基，任选取代的C 3-6炔基，任选取代的苯基或任选取代的嘧啶基，R2和R3彼此独立地为氢或C1-4烷基，其酸加成盐和金属盐络合物作为杀微生物剂具有突出的活性。

4. 发明授权

US5622914A Quinoline compounds as fungicides or bactericides 失效
标题翻译：喹啉化合物作为杀真菌剂或杀菌剂
公开(公告)号：US5622914A
公开(公告)日：1997-04-22
申请号：US529963
申请日：1995-09-19
申请人： Yoshio Kurahashi , Koichi Moriya , Haruko Sawada , Haruhiko Sakuma , Ryo Watanabe , Asami Ito
发明人： Yoshio Kurahashi , Koichi Moriya , Haruko Sawada , Haruhiko Sakuma , Ryo Watanabe , Asami Ito
IPC分类号： A01N43/50 , A01N43/56 , C07D401/04 , C07D521/00 , C07F7/08 , A01N43/42 , C07D215/44
CPC分类号： C07D231/12 , A01N43/50 , A01N43/56 , C07D233/56 , C07D249/08 , C07D401/04 , C07F7/0812
摘要： Combatting fungi and bacteria with quinoline derivatives of the formula ##STR1## in which X is a nitrogen atom and Y is a CH-group orY is a nitrogen atom and X is a CH-group,R is hydrogen, halogen, acetyl or alkyl which is optionally substituted by one to three radicals independently selected from the group consisting of alkoxy, phenyl, hydroxy, halogen and cyano, orR is alkenyl which is optionally substituted by one to three radicals independently selected from the group consisting of halogen, cyano, alkoxy, phenyl and hydroxy, orR is alkynyl which is optionally substituted by one to three radicals independently selected from the group consisting of halogen, phenyl, trimethylsilyl, hydroxy, cyano, alkoxy, alkylamino, dialkylamino, alkylcarbonyl, tolyl, alkoxycarbonyl and alkylcarbonyloxy, orR is cycloalkyl which is optionally substituted by one to three radicals independently selected from the group consisting of halogen and cyano,A is hydrogen or halogen andB is halogen or halogenoalkyl,or an acid addition salt or metal salt complex thereof, and processes for their preparation. Most of these compounds are new.
摘要翻译：用真菌和细菌与其中X是氮原子并且Y是CH-基团或Y是氮原子并且X是CH-基团的式（I）的喹啉衍生物反应，R是氢，卤素，乙酰基或烷基，其任选地被一至三个独立地选自烷氧基，苯基，羟基，卤素和氰基的基团取代，或R是任选被一至三个独立地选自卤素氰基，烷氧基，苯基和羟基，或R是任选被一至三个独立地选自卤素，苯基，三甲基甲硅烷基，羟基，氰基，烷氧基，烷基氨基，二烷基氨基，烷基羰基，甲苯基，烷氧基羰基和烷基羰基氧基，或R是任选被一至三个独立地选自卤素和氰基的基团取代的环烷基，A是氢或卤素，B是卤素或卤代烷基或其酸加成盐或金属盐络合物，及其制备方法。这些化合物大部分是新的。

5. 发明授权

US5576160A Composite of silver halide photographic light-sensitive material and radiation fluorescent screen 失效
标题翻译：复合的卤化银照相感光材料和辐射荧光屏
公开(公告)号：US5576160A
公开(公告)日：1996-11-19
申请号：US498777
申请日：1995-07-05
申请人： Kazuyoshi Goan , Haruhiko Sakuma , Takuji Hasegawa , Kazuhiro Iwasaki
发明人： Kazuyoshi Goan , Haruhiko Sakuma , Takuji Hasegawa , Kazuhiro Iwasaki
IPC分类号： G21K4/00 , G03C1/00 , G03C1/46 , G03C1/825 , G03C5/17 , G03C5/29
CPC分类号： G03C5/17 , Y10S430/167
摘要： A composite for radiography is disclosed which essentially consists of a) a silver halide photographic light-sensitive material comprising a transparent support and at least one light-sensitive silver halide emulsion layer provided on each side of the support, b) fluorescent screen A having a 80 kVp X-ray energy absorption of 40% or more and c) fluorescent screen B having a 80 kVp X-ray energy absorption of 50% or more and the absorption more than fluorescent screen A, the material being sandwiched between the screens A and B in such a manner that emulsion layer A is in close contact with screen A and emulsion layer B is in close contact with screen B, wherein the slope of the straight portion in the characteristic curve of emulsion layer A is less than that of emulsion layer B and emulsion layers A and B of the silver halide photographic light-sensitive material have sensitivity on an exposed side that an exposure necessary to give a density of the minimum density +0.5 is 0.027 to 0.040 lux.multidot.second.
摘要翻译：公开了用于射线照相的复合材料，其基本上由以下组成：a）包含透明支撑体的卤化银摄影感光材料和设置在支持体的每一侧上的至少一种感光卤化银乳剂层，b）荧光屏A， 80kVp X射线能量吸收为40％以上，c）荧光屏B具有80kVp的X射线能量吸收50％以上，吸收大于荧光屏A，该材料夹在屏幕A和 B，乳液层A与筛网A紧密接触，乳液层B与筛网B紧密接触，其中乳液层A的特性曲线中直线部分的斜率小于乳剂层的斜率 B和卤化银照相感光材料的乳剂层A和B在曝光侧具有敏感性，使得给出最小密度+0.5的密度所需的曝光为0.027至0.0 40 luxxsecond。

6. 发明授权

US5268251A Light-sensitive silver halide photographic material image quality- and gradation-adaptable to photographing purposes and image forming method therefor 失效
标题翻译：感光卤化银照相材料图像质量和渐变 - 适用于拍摄目的和图像形成方法
公开(公告)号：US5268251A
公开(公告)日：1993-12-07
申请号：US901237
申请日：1992-06-19
申请人： Haruhiko Sakuma
发明人： Haruhiko Sakuma
IPC分类号： G03C1/005 , G03C1/46 , G03C5/16 , G03C5/17
CPC分类号： G03C5/17 , G03C1/46 , G03C5/16 , G03C1/0051 , G03C2001/03535 , G03C2001/03558 , G03C2001/0357 , G03C2200/52 , G03C2200/58 , Y10S430/167
摘要： A light sensitive silver halide photographic material for the use of X-ray photography, wherein the effective contrast characteristics of the photographic material can be changed as required for the type image being exposed, as a function of the number and disposition of fluorescent intensifying screens. The photographic material has a support carrying first and second emulsion layers on each side thereof. The first layer has a maximum density and sensitivity higher than that of the second layer; the second layer has a density of not more than 0.2 when exposed from the side of the first layer with sufficient irradiation to give the first layer a density of 1.0; and the slope connecting two points corresponding to densities of 0.8 and 1.3 above the fog or baseline on a characteristic curve of the first layer is more than the slope of a line connecting two points of 0.3 and 0.5 above the fog or baseline on a characteristic curve of the second layer.

7. 发明授权

US5173396A Silver halide photographic light-sensitive material 失效
标题翻译：卤化银照相感光材料
公开(公告)号：US5173396A
公开(公告)日：1992-12-22
申请号：US814314
申请日：1991-12-23
申请人： Satoru Nagasaki , Haruhiko Sakuma , Hiroyuki Hashimoto , Kazuya Tsukada
发明人： Satoru Nagasaki , Haruhiko Sakuma , Hiroyuki Hashimoto , Kazuya Tsukada
IPC分类号： G03C1/30 , G03C1/825 , G03C1/89
CPC分类号： G03C1/825 , G03C1/30 , G03C1/89
摘要： A light-sensitive silver halide photographic material is disclosed. The photographic material comprises an antistatic layer comprising a water-soluble electric conductive polymer, hydrophobic polymer particles and a hardener; and a hydrophilic colloidal layer containing a polyhydric alcohol. The photographic material may further comprises an electric conductive layer at the outer than a silver halide emulsion layer from the support, and the hydrophobic polymer particle may contain a dye. The photographic material is suitable for the use of an X-ray recording film.
摘要翻译：公开了感光卤化银照相材料。照相材料包括含有水溶性导电聚合物，疏水聚合物颗粒和硬化剂的抗静电层; 和含有多元醇的亲水胶体层。照相材料还可以包括位于外部的导电层，而不是来自载体的卤化银乳剂层，并且疏水性聚合物颗粒可以含有染料。照相材料适用于使用X射线记录膜。

8. 发明授权

US5081007A Method for processing a silver halide light-sensitive photographic material and an automatic processor therefor 失效
标题翻译：用于处理银盐敏感摄影材料的方法及其自动处理器
公开(公告)号：US5081007A
公开(公告)日：1992-01-14
申请号：US244374
申请日：1988-09-14
申请人： Haruhiko Sakuma
发明人： Haruhiko Sakuma
IPC分类号： G03C5/26
CPC分类号： G03C5/26 , Y10S430/164 , Y10S430/167
摘要： A method for processing a silver halide light-sensitive photographic material by a super rapid process and an automatic processing machine used therefor is disclosed. The method comprises a step of processing an imagewise exposed silver halide light-sensitive photogrpahic material comprising a support and a photographic component layer provided on at least one side of said support, under conditions satisfying the equation given below:50.ltoreq.1.sup.0.75 .times.T.ltoreq.124wherein l is the length of a path along which said silver halide light-sensitive photographic material to be conveyed for processing, the length being more than 0.7 m and less than 3.1 m, T is time, expressed in terms of seconds, necessary for said silver halide light-sensitive photographic material to pass through said path.

9. 发明授权

US5001046A Silver halide photographic light-sensitive material 失效
标题翻译：卤化银照相感光材料
公开(公告)号：US5001046A
公开(公告)日：1991-03-19
申请号：US467320
申请日：1990-01-18
申请人： Chika Honda , Haruhiko Sakuma
发明人： Chika Honda , Haruhiko Sakuma
IPC分类号： G03C1/005 , G03C1/035 , G03C1/765 , G03C5/26
CPC分类号： G03C1/035 , G03C1/005 , G03C1/765 , G03C5/26 , G03C2001/03535 , G03C2200/27 , Y10S430/164
摘要： A sheet of silver halide photographic light-sensitive material is disclosed, which is suitable for an ultra-rapid processing and improved on decreased fog due to corner cutting the sheet. The sheet of photographic material is comprised of a light-sensitive layer, provided on a support, containing a silver halide grain composed of at least two phases and the silver iodide content of outermost phase is at least 1 mol % lower than that of inside phase contiguous to said outermost phase, and 10% to 100% of surface area of said silver halide grain is occupied with (111) face, and the total gelatin amount of component layers on the same side of the support including said light-sensitive layer is within the range of from 2.0 g/m.sup.2 to 3.5 g/m.sup.2.

10. 发明申请

US20050159464A1 Isothiazole carboxylic acid amides and the application thereof in order to protect plants 失效
标题翻译：异噻唑羧酸酰胺及其应用，以保护植物
公开(公告)号：US20050159464A1
公开(公告)日：2005-07-21
申请号：US11021201
申请日：2004-12-22
申请人： Lutz Assmann , Dietmar Kuhnt , Hans-Ludwig Elbe , Christoph Erdelen , Stefan Dutzmann , Gerd Hanssler , Klaus Stenzel , Astrid Mauler-Machnik , Yoshinori Kitagawa , Haruko Sawada , Haruhiko Sakuma
发明人： Lutz Assmann , Dietmar Kuhnt , Hans-Ludwig Elbe , Christoph Erdelen , Stefan Dutzmann , Gerd Hanssler , Klaus Stenzel , Astrid Mauler-Machnik , Yoshinori Kitagawa , Haruko Sawada , Haruhiko Sakuma
IPC分类号： C07D275/02 , A01N43/80 , A01P3/00 , A01P7/04 , C07D275/03 , A61K31/425
CPC分类号： C07D275/03 , A01N43/80
摘要： Novel isothiazolecarboxamides of the formula in which R is as defined in the description, a plurality of processes for preparing the novel compounds and their use for protecting plants against attack by undesirable microorganisms and animal pests.
摘要翻译：式中R如本说明书所定义的新型异噻唑酰胺，多种制备新化合物的方法及其用于保护植物免受不想要的微生物和动物害虫侵袭的用途。

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