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1. 发明申请

WO2021142098A1 WORKPIECE SUPPORT SYSTEM FOR PLASMA TREATMENT AND METHOD OF USING THE SAME 审中-公开
公开(公告)号：WO2021142098A1
公开(公告)日：2021-07-15
申请号：PCT/US2021/012471
申请日：2021-01-07
申请人： NORDSON CORPORATION , HARROUN, James , PRESTON, David, A.
发明人： ZHAO, Jiangang , CONDRASHOFF, Robert, S.
IPC分类号： H01J37/32 , H01L21/673 , H01J37/32779 , H01J37/32788 , H01L21/6732 , H01L21/67323
摘要： In one example, a workpiece support structure of a plasma treatment chamber has upper and lower ends, and first and second support members that extend between the upper and lower ends. The support members are electrically isolated from one another and offset from one another along a horizontal direction so as to define a cavity therebetween. The first and second support members support electrodes within the cavity such that (1) the electrodes are offset from one another along the vertical direction, (2) the electrodes extend between the first and second support members along the first horizontal direction, (3) a first set of the electrodes are electrically coupled to the first support member and electrically isolated from the second support member, and (4) a second set of the electrodes, different from the first set, are electrically coupled to the second support member and electrically isolated from the first support member.

2. 发明申请

WO2009067284A1 QUICK-CHANGE PRECURSOR MANIFOLD FOR LARGE-AREA CVD AND PECVD 审中-公开
标题翻译：快速更换前列腺切口用于大面积CVD和PECVD
公开(公告)号：WO2009067284A1
公开(公告)日：2009-05-28
申请号：PCT/US2008/075041
申请日：2008-09-02
申请人： OPTISOLAR, INC. , HARROUN, James, S.
发明人： HARROUN, James, S.
IPC分类号： C23C16/455
CPC分类号： C23C16/50 , C23C16/45565 , C23C16/45574 , C23C16/45578
摘要： A tube-array showerhead for CVD or PECVD on large substrates delivers precursors to a process chamber via an array of tubes drilled with precision holes The tubes rapidly become contaminated with use and must be changed frequently to maintain process quality An improved manifold tor a tube-array showerhead, intended tor processes with a low pressure differential between the tubes and pioce&s chambci, includes holding-stubs to hold each tube by its ends outside the manifold block At least one holding-stub for each tube is spπng-loaded along the direction of the tube's operating axis Contaminated tubes can be removed, and clean tubes installed, without disassembling the manifolds or disturbing any high-pressure-differential seals to the ambient atmosphere or precursoi supplies This invention reduces production costs by decreasing chamber down-time and reducing the risk of creating leaks when tubes are changed.
摘要翻译：用于大型基板上的CVD或PECVD的管阵淋浴头通过钻孔精密孔的管阵列将前体提供给处理室。管迅速被使用而被污染，必须频繁更换以保持过程质量。阵列喷头，管和压缩口之间的低压差的目标工艺包括固定杆，以将其每个管的端部保持在歧管块的外部。每个管的至少一个固定支柱沿着管的操作轴可以去除受污染的管，并且安装清洁管，而不拆卸歧管或干扰任何高压差密封到环境大气或前兆供应本发明通过减少室停机时间降低生产成本并降低风险当管更换时产生泄漏。

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