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1. 发明申请

WO2012051082A3 METHOD AND SYSTEM FOR FORMING HIGH ACCURACY PATTERNS USING CHARGED PARTICLE BEAM LITHOGRAPHY 审中-公开
标题翻译：使用充电颗粒光栅形成高精度图案的方法和系统
公开(公告)号：WO2012051082A3
公开(公告)日：2012-06-21
申请号：PCT/US2011055536
申请日：2011-10-09
申请人： D2S INC , FUJIMURA AKIRA , HAGIWARA KAZUYUKI , MEIER STEPHEN F , BORK INGO
发明人： FUJIMURA AKIRA , HAGIWARA KAZUYUKI , MEIER STEPHEN F , BORK INGO
IPC分类号： H01L21/027
CPC分类号： G06F17/5081 , G03F7/70441 , G06F17/5077 , G06F2217/12
摘要： A method and system for fracturing or mask data preparation for charged particle beam lithography are disclosed in which accuracy and/or edge slope of a pattern formed on a surface by a set of charged particle beam shots is enhanced by use of partially-overlapping shots. In some embodiments, dosages of the shots may vary with respect to each other before proximity effect correction. Particle beam simulation may be used to calculate the pattern and the edge slope. Enhanced edge slope can improve critical dimension (CD) variation and line-edge roughness (LER) of the pattern produced on the surface.
摘要翻译：公开了一种用于压电或掩模用于带电粒子束光刻的数据准备的方法和系统，其中通过使用部分重叠的镜头来增强由一组带电粒子束射击在一个表面上形成的图案的精度和/或边缘斜率。在一些实施例中，射击的剂量可以在邻近效应校正之前相对于彼此而变化。可以使用粒子束模拟来计算图案和边缘坡度。增强的边缘斜率可以改善表面上产生的图案的临界尺寸（CD）变化和线边缘粗糙度（LER）。

2. 发明申请

WO2012118621A3 METHOD AND SYSTEM FOR DESIGN OF ENHANCED PATTERNS FOR CHARGED PARTICLE BEAM LITHOGRAPHY 审中-公开
标题翻译：带电粒子束平版印刷的增强图案设计方法和系统
公开(公告)号：WO2012118621A3
公开(公告)日：2012-11-08
申请号：PCT/US2012025328
申请日：2012-02-16
申请人： D2S INC , FUJIMURA AKIRA , HAGIWARA KAZUYUKI , MEIER STEPHEN F , BORK INGO
发明人： FUJIMURA AKIRA , HAGIWARA KAZUYUKI , MEIER STEPHEN F , BORK INGO
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/68 , G03F1/78 , H01J37/3026 , H01J37/3174 , H01J2237/31769 , H01J2237/31771 , H01J2237/31776
摘要： A method and system for fracturing or mask data preparation are presented in which overlapping shots are generated to increase dosage in selected portions of a pattern, thus improving the fidelity and/or the critical dimension variation of the transferred pattern. In various embodiments, the improvements may affect the ends of paths or lines, or square or nearly-square patterns. Simulation is used to determine the pattern that will be produced on the surface.
摘要翻译：提出了一种用于压裂或掩模数据制备的方法和系统，其中生成重叠照射以增加图案的选定部分中的剂量，从而改善转印图案的保真度和/或临界尺寸变化。在各种实施例中，改进可以影响路径或线的端部，或者正方形或近似正方形的图案。模拟用于确定将在表面上产生的图案。

3. 发明申请

WO2012118621A2 METHOD AND SYSTEM FOR DESIGN OF ENHANCED PATTERNS FOR CHARGED PARTICLE BEAM LITHOGRAPHY 审中-公开
标题翻译：用于填充粒子束光刻的增强图案的设计方法和系统
公开(公告)号：WO2012118621A2
公开(公告)日：2012-09-07
申请号：PCT/US2012/025328
申请日：2012-02-16
申请人： D2S, INC. , FUJIMURA, Akira , HAGIWARA, Kazuyuki , MEIER, Stephen F. , BORK, Ingo
发明人： FUJIMURA, Akira , HAGIWARA, Kazuyuki , MEIER, Stephen F. , BORK, Ingo
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/68 , G03F1/78 , H01J37/3026 , H01J37/3174 , H01J2237/31769 , H01J2237/31771 , H01J2237/31776
摘要： A method and system for fracturing or mask data preparation are presented in which overlapping shots are generated to increase dosage in selected portions of a pattern, thus improving the fidelity and/or the critical dimension variation of the transferred pattern. In various embodiments, the improvements may affect the ends of paths or lines, or square or nearly-square patterns. Simulation is used to determine the pattern that will be produced on the surface.
摘要翻译：提出了一种用于压裂或掩模数据准备的方法和系统，其中产生重叠射击以增加图案的选定部分中的剂量，从而改善转印图案的保真度和/或临界尺寸变化。在各种实施例中，改进可能影响路径或线的端部，或方形或近似正方形的图案。模拟用于确定将在表面上产生的图案。

4. 发明申请

WO2011025795A1 METHOD AND SYSTEM FOR MANUFACTURING A SURFACE USING CHARGED PARTICLE BEAM LITHOGRAPHY WITH VARIABLE BEAM BLUR 审中-公开
标题翻译：使用带有可变光束的电荷粒子束光刻制造表面的方法和系统
公开(公告)号：WO2011025795A1
公开(公告)日：2011-03-03
申请号：PCT/US2010/046559
申请日：2010-08-24
申请人： D2S, INC. , HAGIWARA, Kazuyuki , FUJIMURA, Akira
发明人： HAGIWARA, Kazuyuki , FUJIMURA, Akira
IPC分类号： H01J37/317 , G03F1/14 , G03F7/20
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , G03F1/36 , G03F1/68
摘要： A charged particle beam writer system is disclosed comprising a generator for a charged particle beam having a beam blur radius, wherein the beam blur radius may be varied from shot to shot, or between two or more groups of shots. A method for fracturing or mask data preparation or optical proximity correction is also disclosed comprising assigning a beam blur radius variation to each calculated charged particle beam writer shot. A method for forming a pattern on a surface is also disclosed comprising using a charged particle beam writer system and varying the beam blur radius from shot to shot. A method for manufacturing an integrated circuit using optical lithography is also disclosed, comprising using a charged particle beam writer system to form a pattern on a reticle, and varying the beam blur radius of the charged particle beam writer system from shot to shot.
摘要翻译：公开了一种带电粒子束写入器系统，其包括用于具有束模糊半径的带电粒子束的发生器，其中光束模糊半径可以从射击到射击，或者在两组或多组镜头之间变化。还公开了一种用于压裂或掩模数据准备或光学邻近校正的方法，其包括将光束模糊半径变化分配给每个计算的带电粒子束写入器镜头。还公开了一种用于在表面上形成图案的方法，其包括使用带电粒子束写入器系统并改变射束模糊半径从射击到射击。还公开了使用光刻法制造集成电路的方法，包括使用带电粒子束写入器系统在掩模版上形成图案，并且将带电粒子束写入器系统的光束模糊半径从镜头改变为镜头。

5. 发明申请

WO2012051082A2 METHOD AND SYSTEM FOR FORMING HIGH ACCURACY PATTERNS USING CHARGED PARTICLE BEAM LITHOGRAPHY 审中-公开
标题翻译：使用带电粒子束光刻技术形成高精度图案的方法和系统
公开(公告)号：WO2012051082A2
公开(公告)日：2012-04-19
申请号：PCT/US2011/055536
申请日：2011-10-09
申请人： D2S, INC. , FUJIMURA, Akira , HAGIWARA, Kazuyuki , MEIER, Stephen F. , BORK, Ingo
发明人： FUJIMURA, Akira , HAGIWARA, Kazuyuki , MEIER, Stephen F. , BORK, Ingo
IPC分类号： H01L21/027
CPC分类号： G06F17/5081 , G03F7/70441 , G06F17/5077 , G06F2217/12
摘要： A method and system for fracturing or mask data preparation for charged particle beam lithography are disclosed in which accuracy and/or edge slope of a pattern formed on a surface by a set of charged particle beam shots is enhanced by use of partially-overlapping shots. In some embodiments, dosages of the shots may vary with respect to each other before proximity effect correction. Particle beam simulation may be used to calculate the pattern and the edge slope. Enhanced edge slope can improve critical dimension (CD) variation and line-edge roughness (LER) of the pattern produced on the surface.
摘要翻译：公开了一种用于带电粒子束光刻的压裂或掩模数据准备的方法和系统，其中通过一组带电粒子束射击在表面上形成的图案的准确度和/或边缘斜率被增强通过使用部分重叠的镜头。在一些实施例中，在临近效应校正之前，镜头的剂量可以相对于彼此变化。粒子束模拟可用于计算图案和边缘斜率。增强的边缘斜率可以改善表面上产生的图案的临界尺寸（CD）变化和线边缘粗糙度（LER）。

6. 发明申请

WO2010025031A3 METHOD FOR OPTICAL PROXIMITY CORRECTION, DESIGN AND MANUFACTURING OF A RETICLE USING CHARACTER PROJECTION LITHOGRAPHY 审中-公开
标题翻译：用于光学邻近校正的方法，使用字符投影平版印刷设计和制造标题的方法
公开(公告)号：WO2010025031A3
公开(公告)日：2010-04-22
申请号：PCT/US2009053327
申请日：2009-08-10
申请人： D2S INC , FUJIMURA AKIRA , GLASSER LANCE , MITSUHASHI TAKASHI , HAGIWARA KAZUYUKI
发明人： FUJIMURA AKIRA , GLASSER LANCE , MITSUHASHI TAKASHI , HAGIWARA KAZUYUKI
IPC分类号： G03F7/20 , G03F1/16 , H01L21/027
CPC分类号： G03F7/2037 , B82Y10/00 , B82Y40/00 , G03F1/68 , H01J37/3174
摘要： A method and system for manufacturing a surface having a multiplicity of slightly different patterns is disclosed. The method comprises using a stencil mask having a set of characters for forming the patterns on the surface and reducing shot count or total write time by use of a character varying technique. Application of such a method to fracturing, mask data preparation, or proximity effect correct is also disclosed. A method for optical proximity correction of a design of a pattern on a surface is also disclosed, comprising inputting desired patterns for the substrate and inputting a set of characters, some of which are complex characters, that may be used to form the pattern on the surface. A method of creating glyphs is also disclosed.
摘要翻译：公开了一种用于制造具有多种略微不同图案的表面的方法和系统。该方法包括使用具有一组字符的模板掩模用于在表面上形成图案，并通过使用字符变化技术减少拍摄次数或总写入时间。还公开了将这种方法应用于压裂，掩模数据准备或邻近效应校正。还公开了一种用于对表面上的图案的设计进行光学邻近校正的方法，包括输入用于基底的期望图案并输入一组字符，其中一些是复杂字符，可用于形成表面。还公开了一种创建字形的方法。

7. 发明申请

WO2010025031A2 METHOD FOR OPTICAL PROXIMITY CORRECTION, DESIGN AND MANUFACTURING OF A RETICLE USING CHARACTER PROJECTION LITHOGRAPHY 审中-公开
标题翻译：使用特征投影算术的光学近似校正，设计和制造方法
公开(公告)号：WO2010025031A2
公开(公告)日：2010-03-04
申请号：PCT/US2009/053327
申请日：2009-08-10
申请人： D2S, INC. , FUJIMURA, Akira , GLASSER, Lance , MITSUHASHI, Takashi , HAGIWARA, Kazuyuki
发明人： FUJIMURA, Akira , GLASSER, Lance , MITSUHASHI, Takashi , HAGIWARA, Kazuyuki
IPC分类号： G03F7/20 , H01L21/027 , G03F1/16
CPC分类号： G03F7/2037 , B82Y10/00 , B82Y40/00 , G03F1/68 , H01J37/3174
摘要： A method and system for manufacturing a surface having a multiplicity of slightly different patterns is disclosed. The method comprises using a stencil mask having a set of characters for forming the patterns on the surface and reducing shot count or total write time by use of a character varying technique. Application of such a method to fracturing, mask data preparation, or proximity effect correct is also disclosed. A method for optical proximity correction of a design of a pattern on a surface is also disclosed, comprising inputting desired patterns for the substrate and inputting a set of characters, some of which are complex characters, that may be used to form the pattern on the surface. A method of creating glyphs is also disclosed.
摘要翻译：公开了一种用于制造具有多种略微不同图案的表面的方法和系统。该方法包括使用具有用于在表面上形成图案的一组字符的模板掩模，并且通过使用字符变化技术减少镜头计数或总写入时间。还公开了这种方法对压裂，掩模数据准备或邻近效应正确的应用。还公开了一种用于表面上的图案设计的光学邻近校正的方法，包括输入用于衬底的期望图案并输入一组字符，其中一些字符是复杂字符，其可以用于在图案上形成图案表面。还公开了一种创建字形的方法。

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