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1. 发明授权

US09399817B2 Magnetron source, magnetron sputtering apparatus and magnetron sputtering method 有权
标题翻译：磁控管源，磁控溅射装置和磁控溅射法
公开(公告)号：US09399817B2
公开(公告)日：2016-07-26
申请号：US13977314
申请日：2011-09-30
申请人： Yangchao Li , Bo Geng , Xuewei Wu , Guoqing Qiu , Xu Liu
发明人： Yangchao Li , Bo Geng , Xuewei Wu , Guoqing Qiu , Xu Liu
IPC分类号： C23C14/35 , H01J37/34
CPC分类号： C23C14/35 , H01J37/3408 , H01J37/3455 , H01J37/347
摘要： Provided is a magnetron source, which comprises a target material, a magnetron located thereabove and a scanning mechanism connected to the magnetron for controlling the movement of the magnetron above the target material. The scanning mechanism comprises a peach-shaped track, with the magnetron movably disposed thereon; a first driving shaft, with the bottom end thereof connected with the origin of the polar coordinates of the peach-shaped track, for driving the peach-shaped track to rotate about the axis of the first driving shaft; a first driver connected to the first driving shaft for driving the first driving shaft to rotate; and a second driver for driving the magnetron to move along the peach-shaped track via a transmission assembly. A magnetron sputtering device including the magnetron and a method for magnetron sputtering using the magnetron sputtering device are also provided.
摘要翻译：提供了一种磁控管源，其包括目标材料，位于其上的磁控管和连接到磁控管的扫描机构，用于控制磁控管在目标材料上方的移动。扫描机构包括桃形轨道，磁控管可移动地设置在其上; 第一驱动轴，其底端与桃形轨道的极坐标的原点连接，用于驱动桃形轨道围绕第一驱动轴的轴线旋转; 连接到第一驱动轴的第一驱动器，用于驱动第一驱动轴旋转; 以及第二驱动器，用于驱动磁控管经由传输组件沿着桃形轨迹移动。还提供了包括磁控管的磁控溅射装置和使用磁控溅射装置的磁控溅射方法。

2. 发明申请

US20130277205A1 MAGNETRON SOURCE, MAGNETRON SPUTTERING APPARATUS AND MAGNETRON SPUTTERING METHOD 有权
标题翻译： MAGNETRON源，MAGNETRON喷溅设备和MAGNETRON喷溅方法
公开(公告)号：US20130277205A1
公开(公告)日：2013-10-24
申请号：US13977314
申请日：2011-09-30
申请人： Yangchao Li , Bo Geng , Xuewei Wu , Guoqing Qiu , Xu Liu
发明人： Yangchao Li , Bo Geng , Xuewei Wu , Guoqing Qiu , Xu Liu
IPC分类号： C23C14/35
CPC分类号： C23C14/35 , H01J37/3408 , H01J37/3455 , H01J37/347
摘要： Provided is a magnetron source, which comprises a target material, a magnetron located thereabove and a scanning mechanism connected to the magnetron for controlling the movement of the magnetron above the target material. The scanning mechanism comprises a peach-shaped track, with the magnetron movably disposed thereon; a first driving shaft, with the bottom end thereof connected with the origin of the polar coordinates of the peach-shaped track, for driving the peach-shaped track to rotate about the axis of the first driving shaft; a first driver connected to the first driving shaft for driving the first driving shaft to rotate; and a second driver for driving the magnetron to move along the peach-shaped track via a transmission assembly. A magnetron sputtering device including the magnetron and a method for magnetron sputtering using the magnetron sputtering device are also provided.
摘要翻译：提供了一种磁控管源，其包括目标材料，位于其上的磁控管和连接到磁控管的扫描机构，用于控制磁控管在目标材料上方的移动。扫描机构包括桃形轨道，磁控管可移动地设置在其上; 第一驱动轴，其底端与桃形轨道的极坐标的原点连接，用于驱动桃形轨道围绕第一驱动轴的轴线旋转; 连接到第一驱动轴的第一驱动器，用于驱动第一驱动轴旋转; 以及第二驱动器，用于驱动磁控管经由传输组件沿着桃形轨迹移动。还提供了包括磁控管的磁控溅射装置和使用磁控溅射装置的磁控溅射方法。

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